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1. 发明授权

US06344105B1 Techniques for improving etch rate uniformity 有权
标题翻译：提高蚀刻速率均匀性的技术
公开(公告)号：US06344105B1
公开(公告)日：2002-02-05
申请号：US09345639
申请日：1999-06-30
申请人： John E. Daugherty , Neil Benjamin , Jeff Bogart , Vahid Vahedi , David Cooperberg , Alan Miller , Yoko Yamaguchi
发明人： John E. Daugherty , Neil Benjamin , Jeff Bogart , Vahid Vahedi , David Cooperberg , Alan Miller , Yoko Yamaguchi
IPC分类号： H01L2100
CPC分类号： H01L21/67069 , H01J37/32623 , H01J37/32642 , H01L21/68721 , H01L21/68735 , Y10S156/915
摘要： Improved methods and apparatus for ion-assisted etch processing in a plasma processing system are disclosed. In accordance with various aspects of the invention, an elevated edge ring, a grooved edge ring, and a RF coupled edge ring are disclosed. The invention operates to improve etch rate uniformity across a substrate (wafer). Etch rate uniformity improvement provided by the invention not only improves fabrication yields but also is cost efficient and does not risk particulate and/or heavy metal contamination.
摘要翻译：公开了用于等离子体处理系统中的离子辅助蚀刻处理的改进方法和装置。根据本发明的各个方面，公开了一种高边缘环，带槽边缘环和RF耦合边缘环。本发明用于提高衬底（晶片）上的蚀刻速率均匀性。本发明提供的蚀刻率均匀性改进不仅提高了制造成本，而且成本有效，并且不会对颗粒和/或重金属污染造成危害。

2. 发明申请

US20070119545A1 METHOD TO IMPROVE PROFILE CONTROL AND N/P LOADING IN DUAL DOPED GATE APPLICATIONS 审中-公开
标题翻译：改进双层门控应用中的配置文件控制和N / P加载的方法
公开(公告)号：US20070119545A1
公开(公告)日：2007-05-31
申请号：US11627025
申请日：2007-01-25
申请人： Helene Del Puppo , Frank Lin , Chris Lee , Vahid Vahedi , Thomas Kamp , Alan Miller , Saurabh Ullal , Harmeet Singh
发明人： Helene Del Puppo , Frank Lin , Chris Lee , Vahid Vahedi , Thomas Kamp , Alan Miller , Saurabh Ullal , Harmeet Singh
IPC分类号： H01L21/306
CPC分类号： H01L21/32137
摘要： A semiconductor processing system is provided. The semiconductor processing system includes a chamber. The chamber includes a gas inlet, a top electrode configured to strike a plasma inside the chamber, and a support for holding a substrate. A controller configured to detect a passivation starved condition during an etching operation is provided. The controller is further configured to introduce a passivation enhancing gas through the gas inlet during the etching operation in response to detecting the passivation starved condition.
摘要翻译：提供半导体处理系统。半导体处理系统包括腔室。腔室包括气体入口，构造成撞击室内的等离子体的顶部电极和用于保持衬底的支撑件。提供了一种被配置为在蚀刻操作期间检测钝化不足状态的控制器。控制器还被配置为响应于检测到钝化不足状况而在蚀刻操作期间通过气体入口引入钝化增强气体。

3. 发明申请

US20070117399A1 METHOD TO IMPROVE PROFILE CONTROL AND N/P LOADING IN DUAL DOPED GATE APPLICATIONS 有权
标题翻译：改进双层门控应用中的配置文件控制和N / P加载的方法
公开(公告)号：US20070117399A1
公开(公告)日：2007-05-24
申请号：US11627016
申请日：2007-01-25
申请人： Helene Del Puppo , Frank Lin , Chris Lee , Vahid Vahedi , Thomas Kamp , Alan Miller , Saurabh Ullal , Harmeet Singh
发明人： Helene Del Puppo , Frank Lin , Chris Lee , Vahid Vahedi , Thomas Kamp , Alan Miller , Saurabh Ullal , Harmeet Singh
IPC分类号： H01L21/8242 , H01L21/302
CPC分类号： H01L21/32137
摘要： A method for etching a polysilicon gate structure in a plasma etch chamber is provided. The method initiates with defining a pattern protecting a polysilicon film to be etched. Then, a plasma is generated. Next, substantially all of the polysilicon film that is unprotected is etched. Then, a silicon containing gas is introduced and a remainder of the polysilicon film is etched while introducing a silicon containing gas. An etch chamber configured to introduce a silicon containing gas during an etch process is also provided.
摘要翻译：提供了一种在等离子体蚀刻室中蚀刻多晶硅栅极结构的方法。该方法开始于限定保护待蚀刻的多晶硅膜的图案。然后，产生等离子体。接下来，蚀刻大部分未被保护的多晶硅膜。然后，引入含硅气体，并且在引入含硅气体的同时蚀刻剩余的多晶硅膜。还提供了一种被配置为在蚀刻工艺期间引入含硅气体的蚀刻室。

4. 发明授权

US07204934B1 Method for planarization etch with in-situ monitoring by interferometry prior to recess etch 有权
标题翻译：在凹陷蚀刻之前用干涉测量法进行原位监测的平面蚀刻方法
公开(公告)号：US07204934B1
公开(公告)日：2007-04-17
申请号：US10002676
申请日：2001-10-31
申请人： Linda Braly , Vahid Vahedi , Erik Edelberg , Alan Miller
发明人： Linda Braly , Vahid Vahedi , Erik Edelberg , Alan Miller
IPC分类号： H01L21/66 , G01L21/30
CPC分类号： H01L21/7684 , H01L21/32115 , H01L21/32137 , H01L21/763
摘要： A method for processing recess etch operations in substrates is provided including forming a hard mask over the substrate and etching a trench in the substrate using the hard mask, and forming a dielectric layer over the hard mask and in the trench, where the dielectric layer lines the trench. A conductive material is then applied over the dielectric layer such that a blanket of the conductive material lies over the hard mask and fills the trench, and the conductive material is etched to substantially planarize the conductive material. The etching of the conductive material triggers an endpoint just before all of the conductive material is removed from over the dielectric layer that overlies the bard mask. The conductive material is recess etched to remove the conductive material over the dielectric layer that overlies the hard mask and removes at least part of the conductive material from within the trench.
摘要翻译：提供了一种用于在衬底中处理凹陷蚀刻操作的方法，包括在衬底上形成硬掩模并使用硬掩模蚀刻衬底中的沟槽，以及在硬掩模和沟槽中形成电介质层，其中电介质层线沟渠。然后将导电材料施加在介电层上，使得导电材料的覆盖层位于硬掩模上方并填充沟槽，并且蚀刻导电材料以使导电材料基本上平坦化。导电材料的蚀刻恰好在所有的导电材料从覆盖在吟诵掩模上的电介质层上除去之前触发端点。导电材料被凹入蚀刻以去除覆盖在硬掩模上的电介质层上的导电材料，并从沟槽内去除至少一部分导电材料。

5. 发明授权

US07316785B2 Methods and apparatus for the optimization of etch resistance in a plasma processing system 有权
标题翻译：用于优化等离子体处理系统中的耐蚀刻性的方法和装置
公开(公告)号：US07316785B2
公开(公告)日：2008-01-08
申请号：US10883282
申请日：2004-06-30
申请人： Yoko Yamaguchi Adams , George Stojakovic , Alan Miller
发明人： Yoko Yamaguchi Adams , George Stojakovic , Alan Miller
IPC分类号： C03C25/68
CPC分类号： H01J37/32862 , H01J37/32082 , H01L21/3065
摘要： In a plasma processing system, including a plasma processing chamber, a method of optimizing the etch resistance of a substrate material is described. The method includes flowing pre-coat gas mixture into the plasma processing chamber, wherein the pre-coat gas mixture has an affinity for a etchant gas flow mixture; striking a first plasma from the pre-coat gas mixture; and introducing a substrate comprising the substrate material. The method also includes flowing the etchant gas mixture into the plasma processing chamber; striking a second plasma from the etchant gas mixture; and etching the substrate with the second plasma. Wherein the first plasma creates a pre-coat residual on a set of exposed surfaces in the plasma processing chamber, and the etch resistance of the substrate material is maintained.
摘要翻译：在包括等离子体处理室的等离子体处理系统中，描述了优化衬底材料的耐蚀刻性的方法。该方法包括将预涂气体混合物流入等离子体处理室，其中预涂气体混合物对蚀刻剂气流混合物具有亲和性; 从预涂气体混合物中冲出第一个等离子体; 以及引入包括所述基板材料的基板。该方法还包括使蚀刻剂气体混合物流入等离子体处理室; 从蚀刻剂气体混合物中冲击第二个等离子体; 并用第二等离子体蚀刻衬底。其中第一等离子体在等离子体处理室中的一组暴露表面上产生预涂层残留物，并且保持基材材料的耐蚀刻性。

6. 发明申请

US20140274020A1 SAFETY ENHANCING CELLPHONE FUNCTIONALITY LIMITATION SYSTEM 审中-公开
标题翻译：安全增强电话功能限制系统
公开(公告)号：US20140274020A1
公开(公告)日：2014-09-18
申请号：US13912144
申请日：2013-06-06
申请人： Alan Miller
发明人： Alan Miller
IPC分类号： H04W4/04 , H04W8/22
CPC分类号： H04M1/72577 , G01S5/14 , H04W4/021 , H04W4/027 , H04W4/029 , H04W4/38 , H04W4/48 , H04W4/50 , H04W8/22
摘要： Apparatus for the management of mobile telephone device functionality while the mobile telephone device is located within a vehicle, comprising a plurality of wireless sensors is disclosed. Each of the sensors receives position indication signals emitted by the mobile telephone device, and the Mets signals indicating the position of each sensor relative to the mobile telephone device, the wireless sensors being positioned at different positions in the period a transmitter transmits a signal to the mobile telephone device, causing the mobile telephone device to transmit the position indicating signals to the sensors. A processor is coupled to receive the signals indicating the position of each sensor relative to the signals indicating the position of each sensor relative to the mobile telephone device. The processor comprises a computational logic unit and a data storage device for storing software for computing the position of the mobile telephone device.
摘要翻译：公开了一种用于在移动电话设备位于车辆内时管理移动电话设备功能的装置，包括多个无线传感器。每个传感器接收由移动电话设备发射的位置指示信号，并且Mets信号指示每个传感器相对于移动电话设备的位置，无线传感器位于发射机向其发送信号的周期内的不同位置移动电话设备，使得移动电话设备向传感器发送位置指示信号。处理器被耦合以接收指示每个传感器相对于指示每个传感器相对于移动电话设备的位置的信号的信号的信号。处理器包括计算逻辑单元和用于存储用于计算移动电话设备的位置的软件的数据存储设备。

7. 发明申请

US20140274018A1 SAFETY ENHANCING CELLPHONE FUNCTIONALITY LIMITATION SYSTEM 审中-公开
标题翻译：安全增强电话功能限制系统
公开(公告)号：US20140274018A1
公开(公告)日：2014-09-18
申请号：US13844409
申请日：2013-03-15
申请人： Alan Miller
发明人： Alan Miller
IPC分类号： H04W4/04 , H04W8/22
CPC分类号： H04M1/72577 , G01S5/14 , H04W4/021 , H04W4/027 , H04W4/029 , H04W4/38 , H04W4/48 , H04W4/50 , H04W8/22
摘要： Apparatus for the management of mobile telephone device functionality while the mobile telephone device is located within a vehicle, comprising a plurality of wireless sensors is disclosed. Each of the sensors receives position indicating signals emitted by the mobile telephone device, and the signals indicating the position of each sensor relative to the mobile telephone device, the wireless sensors being positioned at different positions in the car. A transmitter transmits a signal to the mobile telephone device, causing the mobile telephone device to transmit the position indicating signals to the sensors. A software algorithm resident on a storage device associated with the computational logic unit controls the functionality of the mobile telephone device in response to the position of the mobile telephone device within the vehicle and the speed of the vehicle.
摘要翻译：公开了一种用于在移动电话设备位于车辆内时管理移动电话设备功能的装置，包括多个无线传感器。每个传感器接收由移动电话设备发出的位置指示信号，以及指示每个传感器相对于移动电话设备的位置的信号，无线传感器位于汽车的不同位置。发射机向移动电话设备发送信号，使得移动电话设备向位置传感器发送位置指示信号。驻留在与计算逻辑单元相关联的存储设备上的软件算法响应于移动电话设备在车辆内的位置和车辆的速度来控制移动电话设备的功能。

8. 发明申请

US20070028976A1 Flow development chamber 有权
标题翻译：流动开发室
公开(公告)号：US20070028976A1
公开(公告)日：2007-02-08
申请号：US11475742
申请日：2006-06-26
申请人： Darin Lane , Walter Prince , Alan Miller
发明人： Darin Lane , Walter Prince , Alan Miller
IPC分类号： F15B21/00
CPC分类号： B65G53/58 , B65G53/08 , B65G53/48 , B65G53/521 , Y10T137/0396 , Y10T137/2076 , Y10T137/2098 , Y10T137/2104 , Y10T137/2109
摘要： A system and method for conveying flowable material through a conduit that creates a strong laminar flow of the material surrounded by a boundary layer flow of the same or a different flowable material, such that long transport distances through dramatic elevation and directional changes can be achieved. Some embodiments of the system include a blower assembly, an inlet conduit, an outlet conduit and a mixing chamber, wherein the mixing chamber includes an outer barrel, an inner barrel and an accelerating chamber. Low pressure air is supplied to the system by the blower assembly and mixed with particulate material. The air/material mixture is transported through the mixing chamber into the accelerating chamber and through the outlet conduit. In other embodiments, the particulate material is mixed with the air in the accelerating chamber. Other embodiments of the system include only the mixing chamber, where a flow of at least one flowable material in the form of high or low pressure gas, liquid, and/or particulates suspended within the gas or liquid enters either laterally or axially, forms boundary layer and laminar flows, and exits through the accelerating chamber.
摘要翻译：用于输送可流动材料通过管道的系统和方法，其形成由相同或不同的可流动材料的边界层流动围绕的材料的强层流，使得可以实现通过显着的升高和方向改变的长的输送距离。该系统的一些实施例包括鼓风机组件，入口导管，出口导管和混合室，其中混合室包括外筒，内筒和加速室。低压空气由鼓风机组件供给系统并与颗粒材料混合。空气/材料混合物通过混合室输送到加速室并通过出口导管。在其他实施例中，颗粒材料与加速室中的空气混合。该系统的其它实施例仅包括混合室，其中悬浮在气体或液体中的高压或低压气体，液体和/或微粒形式的至少一种可流动材料的流动横向或轴向进入，形成边界层和层流，并通过加速室离开。

9. 发明申请

US20060032410A1 Tray attachable to a steering wheel 审中-公开
标题翻译：托盘可连接到方向盘
公开(公告)号：US20060032410A1
公开(公告)日：2006-02-16
申请号：US10914674
申请日：2004-08-10
申请人： Alan Miller
发明人： Alan Miller
IPC分类号： A47B37/00 , A47B23/00
CPC分类号： B60N3/005 , A47B13/02
摘要： A steering wheel tray is used on a steering wheel to support a horizontal tray that can be used to take notes coming over the cell phone. Of course, the driver could not be driving at this time. The tray consists of a plate that is attached to the surface of the steering wheel by upper spring loaded hooks that engage the rim of the steering wheel. At the bottom of the plate there is attached a tray that can be moved into a forward position toward the driver by way of a ratchet hinge.
摘要翻译：在方向盘上使用方向盘托盘，以支撑水平托架，该水平托盘可以用于记录来自手机的笔记本。当然，司机目前无法开车。托盘包括一个通过与方向盘边缘相接合的上弹簧加载的钩连接到方向盘表面的板。在板的底部附有托盘，其可以通过棘轮铰链朝向驾驶员移动到向前的位置。

10. 发明授权

US06467118B2 Modular polymeric matrix composite load bearing deck structure 失效
标题翻译：模块化聚合物基体复合载荷甲板结构
公开(公告)号：US06467118B2
公开(公告)日：2002-10-22
申请号：US09886219
申请日：2001-06-22
申请人： Chris Dumlao , Kristina Lauraitis , Les Fisher , Alan Miller , Eric Abrahamson
发明人： Chris Dumlao , Kristina Lauraitis , Les Fisher , Alan Miller , Eric Abrahamson
IPC分类号： E01D1912
CPC分类号： E04D13/1656 , B63B5/00 , E01D19/125 , E01D2101/40
摘要： A load bearing deck structure is made from at least one sandwich panel formed of a ploymer matrix composite material. The sandwich panel comprises a plurality of substantially hollow, elongated core members having side walls, the core members being provided with an upper facesheet and a lower facesheet. Each facesheet is formed integrally with the side walls of the core members and at least one of the side walls is disposed at an oblique angle to one of the upper and lower facesheets so that the side walls and facesheets define a polygonal shape when viewed in cross section.
摘要翻译：承载甲板结构由至少一个由聚酯基复合材料形成的夹层板制成。所述夹芯板包括多个具有侧壁的基本中空的细长芯部件，所述芯部件设置有上面板和下面板。每个面板与芯构件的侧壁一体地形成，并且至少一个侧壁以与上下面板之一成倾斜的角度设置，使得侧视图和面板在横向看时形成多边形部分。

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