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    • 1. 发明授权
    • Automatic accel voltage tracking system for an ion thruster
    • 离子推进器自动加速跟踪系统
    • US06964396B2
    • 2005-11-15
    • US10011387
    • 2001-12-04
    • John D. WilliamsPrakash C. SoniJohn R. Beattie
    • John D. WilliamsPrakash C. SoniJohn R. Beattie
    • B64G1/40B64G1/42F03H1/00
    • F03H1/0043B64G1/405B64G1/428F03H1/0018
    • A voltage tracking system for an ion thruster includes a discharge chamber, a screen grid, an accelerator grid, and an accelerator grid voltage controller. The discharge chamber contains plasma at a given potential. The screen grid is adjacent to the discharge chamber and is voltage biased relative to the plasma to form a plasma sheath that repels electrons and attracts ions from the discharge chamber plasma. The accelerator grid is adjacent to the screen grid and has a voltage for accelerating the ions to create thrust and prevent any electrons from backstreaming into the ion thruster from the beam plasma. The accelerator grid voltage controller supplies voltage to the accelerator grid. The accelerator grid voltage controller adjusts the magnitude of the accelerator grid voltage to minimize the amount of voltage required to prevent electron backstreaming into the ion thruster.
    • 用于离子推进器的电压跟踪系统包括排放室,筛网,加速器网格和加速器电网电压控制器。 放电室包含给定电位的等离子体。 屏栅与放电室相邻并且相对于等离子体进行电压偏压以形成排斥电子并从放电室等离子体吸引离子的等离子体护套。 加速器网格与筛网相邻,并且具有用于加速离子以产生推力的电压,并且防止任何电子从束等离子体回流到离子推进器中。 加速器电网电压控制器向加速器电网提供电压。 加速器电网电压控制器调节加速器电网电压的大小,以最小化防止电子回流到离子推进器中所需的电压量。
    • 3. 发明授权
    • Plasma/radiation assisted molecular beam epitaxy method and apparatus
    • 等离子体/辐射辅助分子束外延法和装置
    • US5048457A
    • 1991-09-17
    • US531711
    • 1990-05-31
    • Julius Hyman, Jr.John R. BeattieJesse N. MatossianOwen K. WuJuan F. LamLawrence Anderson
    • Julius Hyman, Jr.John R. BeattieJesse N. MatossianOwen K. WuJuan F. LamLawrence Anderson
    • C30B23/02
    • C30B23/02C30B29/48
    • A molecular beam epitaxy (MBE) growth method and apparatus is disclosed which achieves a significantly improved sticking coefficient for materials like Hg upon a substrate, and thus a higher efficiency. A highly ionized, low pressure plasma is formed consisting of a mixture of ions of one substance of a compound to be epitaxially grown, neutral particles of the substance and electrons, and also preferably both ionization and excitation radiation. The plasma is directed onto a substrate together with a flux of the other substance in the compound; the flux can be in the form of either a vapor, or a second plasma. Radiation assisted epitaxial growth for Hg compounds in which ionization and excitation radiation are formed from Hg vapor and used to assist epitaxial growth with neutral Hg particles is also described. The plasma is formed in a special discharge chamber having a hollow cathode with an emissive-mix-free cathode insert. The source is preferably a refractory metal such as rolled tantalum foil, which is substantially emissive-material-free and does not contaminate the plasma. Good results are obtained by allowing the plasma to simply diffuse out through an exit port in the discharge chamber, without special extraction assemblies required by prior ion thrusters. Hg sticking coefficients have been improved by a factor of 40 or more.
    • 公开了一种分子束外延(MBE)生长方法和装置,其实现了对衬底上的诸如Hg的材料的显着改善的粘附系数,并且因此具有更高的效率。 形成高离子化的低压等离子体,其由外延生长的化合物的一种物质的离子和物质的中性粒子和电子的混合物组成,并且还优选电离和激发辐射。 等离子体与化合物中另一种物质的助熔剂一起引导到基底上; 通量可以是蒸汽或第二等离子体的形式。 还描述了汞化合物的辐射辅助外延生长,其中电离和激发辐射由Hg蒸气形成并用于辅助外延生长与中性Hg颗粒。 等离子体形成在具有空心阴极的特殊放电室中,其具有无发射混合阴极插入物。 来源优选是难熔金属,例如轧制钽箔,其基本上不发射材料,并且不污染等离子体。 通过允许等离子体简单地通过放电室中的出口扩散出来,而不需要先前的离子推进器所需的特殊提取组件,可获得良好的结果。 Hg粘附系数提高了40倍以上。
    • 4. 发明授权
    • Emission current control system for multiple hollow cathode devices
    • 多个空心阴极器件的发射电流控制系统
    • US4733530A
    • 1988-03-29
    • US892559
    • 1986-08-04
    • John R. BeattieDonald J. Hancock
    • John R. BeattieDonald J. Hancock
    • F01K21/04F02C3/30F02C6/18F03H1/00H01J3/08H01J27/02H05H1/00
    • H01J27/022F03H1/0012F03H1/0037
    • An emission current control system for balancing the individual emission currents from an array of hollow cathodes has current sensors for determining the current drawn by each cathode from a power supply. Each current sensor has an output signal which has a magnitude proportional to the current. The current sensor output signals are averaged, the average value so obtained being applied to a respective controller for controlling the flow of an ion source material through each cathode. Also applied to each controller are the respective sensor output signals for each cathode and a common reference signal. The flow of source material through each hollow cathode is thereby made proportional to the current drawn by that cathode, the average current drawn by all of the cathodes, and the reference signal. Thus, the emission current of each cathode is controlled such that each is made substantially equal to the emission current of each of the other cathodes. When utilized as a component of a multiple hollow cathode ion propulsion motor, the emission current control system of the invention provides for balancing the thrust of the motor about the thrust axis and also for preventing premature failure of a hollow cathode source due to operation above a maximum rated emission current.
    • 用于平衡来自空心阴极阵列的各个发射电流的发射电流控制系统具有用于确定由每个阴极从电源吸取的电流的电流传感器。 每个电流传感器具有与电流成正比的输出信号。 当前的传感器输出信号被平均,所得到的平均值被施加到相应的控制器,用于控制通过每个阴极的离子源材料的流动。 也适用于每个控制器是用于每个阴极的相应传感器输出信号和公共参考信号。 因此,源材料通过每个中空阴极的流动与由该阴极吸取的电流,由所有阴极吸引的平均电流和参考信号成比例。 因此,控制每个阴极的发射电流,使得每个阴极的发射电流基本上等于每个其它阴极的发射电流。 当用作多空心阴极离子推进电动机的组件时,本发明的发射电流控制系统提供了平衡电动机围绕推力轴线的推力,并且还用于防止由于上述操作以上的中空阴极源的过早失效 最大额定发射电流。
    • 6. 发明授权
    • Electric thruster made with surface treatments for improved thermal management
    • 电动推进器采用表面处理方式进行热管理
    • US06619028B2
    • 2003-09-16
    • US10011159
    • 2001-12-05
    • Kurt B. KreinerJohn R. Beattie
    • Kurt B. KreinerJohn R. Beattie
    • H05H100
    • F03H1/0037F03H1/0031
    • An electric thruster has at least a portion of a surface of at least one of the component elements of its housing surface treated to increase the thermal transmission at the surface. The surface treatment is selected to increase the thermal absorption and thence the absorption of heat at the interiorly facing surfaces of the treated component, and/or to increase the thermal emissivity and thence radiation heat loss at the exteriorly facing surfaces of the treated component, and/or to increase the effective surface area through which heat is absorbed or emitted. The surface-treated housing components are assembled together with a cathode assembly, an ionization chamber, a propellant gas source, and a magnetic structure to form an electric thruster.
    • 电推进器具有处理其壳体表面的至少一个构成元件的表面的至少一部分,以增加表面处的热传递。 选择表面处理以增加热处理部件的内表面处的热吸收和热吸收,和/或增加处理部件的外表面处的热辐射率和辐射热损失,以及 /或增加吸收或发射热量的有效表面积。 表面处理的壳体部件与阴极组件,电离室,推进剂气体源和磁性结构组装在一起以形成电推进器。
    • 7. 发明授权
    • Ion thruster with ion-extraction grids having compound contour shapes
    • 离子推进器具有复合轮廓形状的离子提取网格
    • US06250070B1
    • 2001-06-26
    • US09569708
    • 2000-05-09
    • Kurt B. KreinerJohn R. BeattieAlois WittmannLewis S. Pilcher
    • Kurt B. KreinerJohn R. BeattieAlois WittmannLewis S. Pilcher
    • F03H100
    • H05H1/54F03H1/0043H01J27/024
    • An ion thruster has a source of a plasma, and an ion-optics system located in sufficient proximity to the source of the plasma to extract ions therefrom. The ion-optics system includes at least two grids arranged in a facing-but-spaced-apart relationship to each other, with each grid being axisymmetric about a grid axis. Each grid includes a peripheral region defining a grid plane perpendicular to the grid axis, a first region of curvature adjacent to the peripheral region, and a second region of curvature along the grid axis such that the first region of curvature lies between the second region of curvature and the peripheral region. The first region of curvature is a convexly curved segment of a first sphere relative to the grid plane, and the second region of curvature is a concavely curved segment of a second sphere relative to the grid plane.
    • 离子推进器具有等离子体源,离子光学系统位于足够靠近等离子体源的位置以从其中提取离子。 离子光学系统包括至少两个彼此相对且间隔开的关系布置的网格,每个网格围绕网格轴线是对称的。 每个网格包括限定垂直于网格轴的网格平面的周边区域,与周边区域相邻的第一曲率区域和沿着网格轴线的第二曲率区域,使得第一曲率区域位于第二区域 曲率和周边区域。 所述第一曲率区域是第一球体相对于所述格子平面的凸曲面段,并且所述第二曲率区域是相对于所述格子平面的第二球体的凹曲曲线段。
    • 8. 发明授权
    • Plasma/radiation assisted molecular beam epitaxy method
    • 等离子/辐射辅助分子束外延法
    • US5152866A
    • 1992-10-06
    • US532144
    • 1990-05-31
    • Julius Hyman, Jr.John R. BeattieJesse N. MatossianOwen K. WuJuan F. LamLawrence Anderson
    • Julius Hyman, Jr.John R. BeattieJesse N. MatossianOwen K. WuJuan F. LamLawrence Anderson
    • C30B23/02
    • C30B23/02C30B29/48
    • A molecular beam epitaxy (MBE) growth method and apparatus is disclosed which achieves a significantly improved sticking coefficient for materials like Hg upon a substrate, and thus a higher efficiency. A highly ionized, low pressure plasma is formed consisting of a mixture of ions of one substance of a compound to be epitaxially grown, neutral particles of the substance and electrons, and also preferably both ionization and excitation radiation. The plasma is directed onto a substrate together with a flux of the other substance in the compound; the flux can be in the form of either a vapor, or a second plasma. Radiation assisted epitaxial growth for Hg compounds in which ionization and excitation radiation are formed from Hg vapor and used to assist epitaxial growth with neutral Hg particles is also described. The plasma is formed in a special discharge chamber having a hollow cathode with an emissive-mix-free cathode insert. The source is preferably a refractory metal such as rolled tantalum foil, which is substantially emissive-material-free and does not contaminate the plasma. Good results are obtained by allowing the plasma to simply diffuse out through an exit port in the discharge chamber, without special extraction assemblies required by prior ion thrusters. Hg sticking coefficients have been improved by a factor of 40 or more.
    • 公开了一种分子束外延(MBE)生长方法和装置,其实现了对衬底上的诸如Hg的材料的显着改善的粘附系数,并且因此具有更高的效率。 形成高离子化的低压等离子体,其由外延生长的化合物的一种物质的离子和物质的中性粒子和电子的混合物组成,并且还优选电离和激发辐射。 等离子体与化合物中另一种物质的助熔剂一起引导到基底上; 通量可以是蒸汽或第二等离子体的形式。 还描述了汞化合物的辐射辅助外延生长,其中电离和激发辐射由Hg蒸气形成并用于辅助外延生长与中性Hg颗粒。 等离子体形成在具有空心阴极的特殊放电室中,其具有无发射混合阴极插入物。 来源优选是难熔金属,例如轧制钽箔,其基本上不发射材料,并且不污染等离子体。 通过允许等离子体简单地通过放电室中的出口扩散出来,而不需要先前的离子推进器所需的特殊提取组件,可获得良好的结果。 Hg粘附系数提高了40倍以上。
    • 9. 发明授权
    • Ion thruster having a hollow cathode assembly with an encapsulated heater, and its fabrication
    • 离子推进器具有带封装加热器的中空阴极组件及其制造
    • US06336318B1
    • 2002-01-08
    • US09496889
    • 2000-02-02
    • Louis Raymond FalceJohn R. Beattie
    • Louis Raymond FalceJohn R. Beattie
    • F03H100
    • B64G1/405F03H1/0031
    • An ion thruster has a hollow cathode assembly including a heater with an inner ceramic sleeve and an outer ceramic sleeve. The outer ceramic sleeve overlies the inner ceramic sleeve with a filament volume between the two sleeves. A wound filament has windings disposed within the filament volume, and a mass of ceramic powder fills the remaining portion of the filament volume between the windings of the filament. A cathode is disposed within the inner ceramic sleeve of the heater. The heater is assembled by preparing the filament and forming it into a wound cylinder, and then encapsulating it and the powder between the inner and the outer ceramic sleeves. The hollow cathode assembly may serve as a portion of a plasma source or as a portion of a charge neutralizer.
    • 离子推进器具有中空阴极组件,其包括具有内部陶瓷套筒和外部陶瓷套筒的加热器。 外陶瓷套管覆盖在内陶瓷套筒之间,其中两个套筒之间具有细丝体积。 卷绕的细丝具有设置在细丝体积内的绕组,并且大量的陶瓷粉末填充在细丝的绕组之间的细丝容积的剩余部分。 阴极设置在加热器的内陶瓷套筒内。 加热器通过制备长丝并将其成形为缠绕圆筒,然后将其包封并将粉末包封在内部和外部陶瓷套筒之间来组装。 空心阴极组件可以用作等离子体源的一部分或作为电荷中和剂的一部分。
    • 10. 发明授权
    • Ion thruster having grids made of oriented pyrolytic graphite
    • 离子推进器具有由定向热解石墨制成的网格
    • US06318069B1
    • 2001-11-20
    • US09496888
    • 2000-02-02
    • Louis Raymond FalceJohn R. Beattie
    • Louis Raymond FalceJohn R. Beattie
    • F03H100
    • F03H1/0043B64G1/405
    • An ion thruster includes a source of a plasma of ions and electrons, and an ion-optics system located in sufficient proximity to the source of the plasma to extract ions therefrom. The ion-optics system has at least two domed grids arranged in a facing-but-spaced-apart relationship to each other. Each grid has a local reference vector that is perpendicular to the surface of the grid and a reference plane perpendicular to the reference vector. Each of the grids is formed of anisotropic pyrolytic graphite having an “ab” crystallographic plane that lies substantially in the reference plane. In one form, the “ab” crystallographic plane lies coplanar with the reference plane at all locations on each domed grid made of pyrolytic graphite. In another form, the “ab” crystallographic plane has a constant orientation at all locations on the domed grid. In yet another form, wherein the ion-optics system has an axis of thrust, the “ab” crystallographic plane of the pyrolytic graphite lies substantially perpendicular to the axis of thrust.
    • 离子推进器包括离子和电子的等离子体源,以及离子光学系统,其位于足够接近等离子体源以从其中提取离子。 离子光学系统具有至少两个互相排列成相互间隔开的间隔格栅。 每个网格具有垂直于网格表面的垂直于参考矢量的参考平面的局部参考矢量。 每个栅格由具有基本上在参考平面中的“ab”结晶平面的各向异性热解石墨形成。 在一种形式中,“ab”结晶平面在由热解石墨制成的每个圆顶网格上的所有位置处与参考平面共面。 在另一种形式中,“ab”结晶平面在圆顶网格上的所有位置具有恒定的取向。 在另一种形式中,其中离子光学系统具有推力轴,热解石墨的“ab”结晶平面基本上垂直于推力轴线。