会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 8. 发明授权
    • Control method of nonvolatile memory device
    • 非易失性存储器件的控制方法
    • US08908431B2
    • 2014-12-09
    • US13607038
    • 2012-09-07
    • Sunil ShimJinman HanSang-Wan NamWon-Taeck Jung
    • Sunil ShimJinman HanSang-Wan NamWon-Taeck Jung
    • G11C16/10H01L27/115H01L29/792G11C16/34G11C16/16
    • G11C16/3418G11C16/10G11C16/14G11C16/16G11C16/349H01L27/11578H01L27/11582H01L29/7926
    • According to example embodiments, a control method of a nonvolatile memory device, which includes a plurality of memory blocks on a substrate, each memory block including a plurality of sub blocks stacked in a direction perpendicular to the substrate and being configured to be erased independently and each sub block including a plurality of memory cells stacked in the direction perpendicular to the substrate. The control method includes comparing a count value of a first memory block with a reference value, the count value determined according to the number of program, read, or erase operations executed at the first memory block after data is programmed in the first memory block; and if the count value is greater than or equal to the reference value, performing a reprogram operation in which data programmed in first the memory block is read and the read data is programmed in a second memory block.
    • 根据示例性实施例,一种非易失性存储器件的控制方法,其包括在衬底上的多个存储块,每个存储块包括沿垂直于衬底的方向堆叠的多个子块,并且被配置为独立擦除, 每个子块包括在垂直于衬底的方向上堆叠的多个存储单元。 控制方法包括将第一存储块的计数值与参考值进行比较,所述计数值根据在第一存储器块中的数据被编程之后在第一存储器块执行的程序,读取或擦除操作的数量确定; 并且如果所述计数值大于或等于所述参考值,则执行重新编程操作,其中在第一存储器块中编程的数据被读取并且所读取的数据被编程在第二存储器块中。
    • 10. 发明申请
    • THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE AND A METHOD OF FABRICATING THE SAME
    • 三维半导体存储器件及其制造方法
    • US20130313629A1
    • 2013-11-28
    • US13830208
    • 2013-03-14
    • Sunil ShimJaehoon JangHansoo KimSungmi HwangWonseok ChoJinsoo Lim
    • Sunil ShimJaehoon JangHansoo KimSungmi HwangWonseok ChoJinsoo Lim
    • H01L29/792
    • H01L29/7926H01L27/11556H01L27/11582
    • A method of forming a semiconductor memory device includes stacking a plurality of alternating first insulating layers and first sacrificial layers on a substrate to form a first multilayer structure, forming a first hole through the first multilayer structure, forming a first semiconductor pattern in the first hole, stacking a plurality of alternating second insulating layers and second sacrificial layers on the first multilayer structure to form a second multilayer structure, forming a second hole through the second multilayer structure to be aligned with the first hole, forming a second semiconductor pattern in the second hole, forming a trench to expose sidewalls of the first and second insulating layers at a side of the first and second semiconductor patterns, removing at least some portions of the first and second sacrificial layers to form a plurality of recess regions, forming an information storage layer, and forming a conductive pattern.
    • 一种形成半导体存储器件的方法包括在衬底上堆叠多个交替的第一绝缘层和第一牺牲层以形成第一多层结构,通过第一多层结构形成第一孔,在第一孔中形成第一半导体图案 在所述第一多层结构上堆叠多个交替的第二绝缘层和第二牺牲层以形成第二多层结构,通过所述第二多层结构形成与所述第一孔对准的第二孔,在所述第二多层结构中形成第二半导体图案 形成沟槽,以在第一和第二半导体图案的一侧露出第一绝缘层和第二绝缘层的侧壁,去除第一和第二牺牲层的至少一部分以形成多个凹陷区域,形成信息存储器 层,形成导电图案。