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    • 1. 发明授权
    • Apparatus and method for measuring residual stress and photoelastic effect of optical fiber
    • 用于测量光纤的残余应力和光弹效应的装置和方法
    • US06678433B2
    • 2004-01-13
    • US09939877
    • 2001-08-27
    • Jin-Han KimSung-Koog OhYong-Woo ParkUn-Chul PaekDug-Young Kim
    • Jin-Han KimSung-Koog OhYong-Woo ParkUn-Chul PaekDug-Young Kim
    • G02B626
    • G01M11/088G01L1/242
    • An apparatus and method for measuring residual stress and photoelastic effect of an optical fiber is disclosed. The apparatus includes a rotating light diffuser for providing temporally averaged uniform image by restraining spatial coherence of light emitted from a light source to be completely scattered, a collecting lens for aligning the light passed through the rotating light diffuser in an optical fiber, a linear birefringence device for linearly controlling the polarization state of the aligned light input from the collecting lens, a condenser for condensing the light passed through the linear birefringence device on a place where the optical fiber is located, a fixed polarizer for transforming the polarization state of the light passed through the optical fiber to the intensity distribution by allowing the light emitted from the linear birefringence device to transmit the optical fiber, an objective lens for obtaining a magnified optical fiber image having the intensity distribution of the light transmitted the optical fiber, and a unit for measuring transmittance variation given to the optical fiber depending on locations.
    • 公开了一种用于测量光纤的残余应力和光弹性效应的装置和方法。 该装置包括旋转光漫射器,用于通过抑制从光源发射的光完全散射的空间相干性来提供时间上均匀的图像,用于将通过旋转光扩散器的光对准在光纤中的聚光透镜,线性双折射 用于线性控制从收集透镜输入的对准光的偏振状态的装置,用于将通过线性双折射装置的光聚光在光纤所处的位置的聚光器,用于变换光的偏振状态的固定偏振器 通过允许从线性双折射装置发射的光透射光纤而使光纤通过光强分布,用于获得具有透射光纤的光的强度分布的放大光纤图像的物镜和单元 用于测量给予操作的透射率变化 取决于位置。
    • 2. 发明授权
    • Apparatus and method for measuring residual stress and photoelastic effect of optical fiber
    • 用于测量光纤的残余应力和光弹效应的装置和方法
    • US06647162B2
    • 2003-11-11
    • US09803873
    • 2001-03-13
    • Dug-Young KimYong-Woo ParkUn-Chul PaekMun-Hyun Do
    • Dug-Young KimYong-Woo ParkUn-Chul PaekMun-Hyun Do
    • G01N2100
    • G01L1/242G01L5/0047
    • Disclosed is an apparatus for measuring a residual stress and a photoelastic effect of an optical fiber, which includes: a light source; a rotary type optical diffuser distanced from the light source in a predetermined distance for suppressing the spatial coherence of a light radiated in the light source; an optical condenser for condensing the radiated light passed through the optical diffuser into a spot where the optical fiber is located; a polarizer for polarizing the light passed through the optical condenser into a 45° linear polarized light from an axis of the optical fiber; a polarization analyzer, installed at 90° angle with respect to the polariscope and attached closely with the optical fiber, to prevent the penetration by the background image of the optical fiber; an optical fiber strain unit including a strain sensor for straining the optical fiber on the polarization analyzer toward a longitudinal direction and measuring the strain on the optical fiber; an object lens for magnifying the image of the light penetrated through the optical fiber; and a charge coupled device (CCD) array for measuring the penetration variation of the optical fiber caused from the strain caused by the optical fiber strain unit over the optical fiber.
    • 公开了一种用于测量光纤的残余应力和光弹性效应的装置,其包括:光源; 旋转型光学扩散器,其以预定距离从光源远离,以抑制在光源中照射的光的空间相干性; 用于将通过光漫射器的辐射光聚光到光纤所在的光点的光学冷凝器; 用于将通过所述光学冷凝器的光偏振成从所述光纤的轴线成45°线偏振光的偏振器; 极化分析仪,相对于偏振器安装在90°角并与光纤紧密连接,以防止光纤的背景图像穿透; 光纤应变单元,包括:应变传感器,用于使所述偏振分析仪上的光纤向纵向拉伸;测量所述光纤上的应变; 用于放大穿过光纤的光的图像的物镜; 以及用于测量由光纤应变单元在光纤上引起的应变引起的光纤的穿透变化的电荷耦合器件(CCD)阵列。
    • 8. 发明授权
    • Organic light-emitting display device and method of manufacturing the same
    • 有机发光显示装置及其制造方法
    • US08835205B2
    • 2014-09-16
    • US13022530
    • 2011-02-07
    • Yong-Woo Park
    • Yong-Woo Park
    • H01L21/00
    • H01L27/3246
    • An organic light-emitting display device including a pixel-defining layer and a spacer, and a method of manufacturing the same. The method includes: forming an organic insulating material layer on a pixel electrode; placing a half-tone mask including a light-blocking portion, a partial-transmitting portion, and a light-transmitting portion on the organic insulating material layer and performing an exposure process so that the pixel electrode corresponds to the light-transmitting portion, a pixel-defining layer at least partially surrounding the pixel electrode corresponds to the partial-transmitting portion, and a spacer adjacent to the pixel-defining layer corresponds to the light-blocking portion; and etching a portion of the organic insulating material layer that is exposed so that a pixel area on the pixel electrode is at least partially surrounded by the pixel-defining layer and the spacer. A taper angle of the pixel-defining layer is between about 15 degrees to about 30 degrees.
    • 包括像素限定层和间隔物的有机发光显示装置及其制造方法。 该方法包括:在像素电极上形成有机绝缘材料层; 将有遮光部分,部分透光部分和透光部分的半色调掩模放置在有机绝缘材料层上,并进行曝光处理,使得像素电极对应于透光部分, 至少部分地围绕像素电极的像素限定层对应于部分透射部分,并且与像素限定层相邻的间隔物对应于遮光部分; 并且蚀刻暴露的有机绝缘材料层的一部分,使得像素电极上的像素区域至少部分地被像素限定层和间隔物包围。 像素限定层的锥角在约15度至约30度之间。