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2. 发明授权

US5392113A Semiconductor wafer defect monitoring 失效
标题翻译：半导体晶圆缺陷监测
公开(公告)号：US5392113A
公开(公告)日：1995-02-21
申请号：US954200
申请日：1992-09-30
申请人： Anthony Sayka , Stacy W. Hall , Judy U. Galloway , Pierre Leroux , Bryan D. Schmidt , Daniel D. Siems , Henry B. Taylor, III , Edward R. Vokoun
发明人： Anthony Sayka , Stacy W. Hall , Judy U. Galloway , Pierre Leroux , Bryan D. Schmidt , Daniel D. Siems , Henry B. Taylor, III , Edward R. Vokoun
IPC分类号： G01N21/95 , G01N21/88
CPC分类号： G01N21/9501
摘要： Method and apparatus for detecting the presence of selected types of defects, such as chemical stains from a liquid photoresist material or a liquid dielectric material, on a non-visible chosen surface of a semiconductor water that has undergone at least one processing step. In one embodiment, a support substrate for, the wafer is provided that has a highly reflecting surface adjacent to the chosen surface. The reflecting surface and the chosen surface are moved apart, and the chosen surface is illuminated with light to form an optical image of the chosen surface. The optical image of the chosen surface is reflected in the reflecting surface, and the reflected optical image is examined for the presence of selected types of defects. In another embodiment, a portion of this reflecting surface is initially contiguous to the chosen surface. A selected defect, if any, on the chosen surface changes a surface characteristic of the reflecting surface so that the presence of this defect on the chosen surface is visually perceptible on the reflecting surface.
摘要翻译：用于检测在经过至少一个处理步骤的半导体水的不可见的选定表面上存在选定类型的缺陷（例如来自液态光致抗蚀剂材料或液体介电材料的化学污渍）的存在的方法和装置。在一个实施例中，提供了一种用于晶片的支撑基板，其具有与所选择的表面相邻的高反射表面。反射表面和所选择的表面被移动分开，并且所选择的表面被光照射以形成所选表面的光学图像。所选择的表面的光学图像被反射在反射表面中，并且检查反射的光学图像以存在所选择的缺陷类型。在另一个实施例中，该反射表面的一部分最初与所选择的表面相邻。所选择的表面上的选定的缺陷（如果有的话）改变反射表面的表面特性，使得在所选择的表面上存在该缺陷在反射表面上在视觉上是可察觉的。

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