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1. 发明授权

US5558902A Method for detecting contaminants carried by a fluid 失效
标题翻译：用于检测流体携带的污染物的方法
公开(公告)号：US5558902A
公开(公告)日：1996-09-24
申请号：US471649
申请日：1995-06-05
申请人： Anthony Sayka , Patricia A. Vargas
发明人： Anthony Sayka , Patricia A. Vargas
IPC分类号： B05B12/00 , B05B12/08 , B05C11/08 , B05D1/00 , H01L21/00 , G01N21/00
CPC分类号： B05B12/004 , B05B12/082 , B05D1/005 , H01L21/6715 , B05C11/08
摘要： A coating method for detecting the presence of contaminants carried by a liquid that is applied as a coating on a workpiece. A tube guides the liquid along a flow path to the workpiece. A light source illuminates the liquid along the flow path with an optical fiber or other light carrier, and light is scattered by any contaminants present in the liquid. Light scattered by the contaminant particles is more intense than light scattered by the other liquid particles, and this brighter scattered light is detected by a light detector positioned adjacent to the fluid flow path. The coating system is particularly well suited for use in a spin-on coating process that applies a liquid, such as a photoresist material or a dielectric material, to a semiconductor wafer or other workpiece that is secured to a rotating turntable and rotated to receive a coating of the liquid.
摘要翻译：一种用于检测由作为涂层涂覆在工件上的液体携带的污染物的存在的涂覆方法。管将液体沿着流动路径引导到工件。光源用光纤或其他轻载体照亮沿着流动路径的液体，并且光被存在于液体中的任何污染物散射。由污染物颗粒散射的光比通过其它液体颗粒散射的光更强烈，并且这种较亮的散射光由邻近流体流动路径定位的光检测器检测。该涂层系统特别适合用于将液体（例如光致抗蚀剂材料或电介质材料）施加到半导体晶片或其它工件上的旋涂工艺，所述半导体晶片或其它工件被固定到旋转的转盘并旋转以接收液体涂层。

2. 发明授权

US5313818A Contaminant monitor for a flowing liquid 失效
标题翻译：流动液体的污染物监测器
公开(公告)号：US5313818A
公开(公告)日：1994-05-24
申请号：US976060
申请日：1992-11-12
申请人： Anthony Sayka , Christopher D. Reynes , Bradley G. Williams , Gerardo F. Martinez
发明人： Anthony Sayka , Christopher D. Reynes , Bradley G. Williams , Gerardo F. Martinez
IPC分类号： G01N7/14 , H01L21/00
CPC分类号： H01L21/6715 , G01N7/14
摘要： A method for detecting bubbles in a liquid characterized by the steps of: a) flowing a liquid through a chamber; b) allowing bubbles in the liquid to escape within the chamber; and c) sensing the gaseous volume within the chamber to determine whether any gas bubbles were present in the liquid. An apparatus of the present invention includes a sealed chamber, a pump for pumping a liquid through the sealed chamber, and a mechanism for detecting gaseous accumulation within the chamber. The mechanism for detecting gaseous accumulation preferably includes a floating device having a float portion and a magnet portion, and a magnetic detector for detecting the magnetic field strength generated by the magnet portion. The magnetic field strength can be used to calculate the liquid level within the chamber which can, in turn, used to calculate the gaseous volume within the chamber. An analyzer coupled to the magnetic detector may produce a detection signal when the gaseous volume exceeds a predetermined criteria to alarm an operator that excessive amount of bubbles are present in the liquid.
摘要翻译：一种用于检测液体中的气泡的方法，其特征在于以下步骤：a）使液体流过腔室; b）允许液体中的气泡在室内逸出; 以及c）感测室内的气体体积以确定液体中是否存在任何气泡。本发明的装置包括密封室，用于泵送通过密封室的液体的泵和用于检测室内的气体积聚的机构。用于检测气体积聚的机构优选地包括具有浮动部分和磁体部分的浮动装置和用于检测由磁体部分产生的磁场强度的磁性检测器。可以使用磁场强度来计算室内的液位，其又可以用于计算室内的气体体积。耦合到磁检测器的分析器可以在气体体积超过预定标准时产生检测信号，以向操作者报告液体中存在过量的气泡。

3. 发明授权

US5743135A Optical-fiber liquid-level monitor 失效
标题翻译：光纤液位监视器
公开(公告)号：US5743135A
公开(公告)日：1998-04-28
申请号：US387036
申请日：1995-02-10
申请人： Anthony Sayka , Robert J. Rocks
发明人： Anthony Sayka , Robert J. Rocks
IPC分类号： G01F23/292 , G01F23/64
CPC分类号： G01F23/2922 , G01F23/2927 , Y10S250/901 , Y10S250/904
摘要： A liquid level monitor uses a tube to confine a float to a vertical path with a canister containing a lower liquid and an upper liquid which meet at a liquid boundary, the level of which is to be monitored. Light from a light-emitting diode is conveyed to a vertical position of the tube by an optical fiber. A second optical fiber is arranged in a diametrically opposed position of the tube to detect light transmitted across the tube from the first optical fiber. The float is more transmissive than either liquid. When the level of the boundary falls to the level of the optical fibers, received light increases. The second optical fiber conveys this return light to a photodetector, the output of which can be used to trigger an alarm indicating that the boundary level is low.
摘要翻译：液面监视器使用管子将浮子限定在垂直路径上，该容器包含下液体和上液体，所述液体和液体在液面边界处相遇，液面将被监控。来自发光二极管的光通过光纤传送到管的垂直位置。第二光纤布置在管的直径相对的位置，以检测从第一光纤穿过管传输的光。浮子比任一种液体更透透。当边界的水平下降到光纤的水平时，接收的光线增加。第二光纤将该返回光传送到光电检测器，其输出可用于触发指示边界电平低的警报。

4. 发明授权

US5312039A Electro-optic monitor for fluid spray pattern 失效
标题翻译：液体喷雾模式的电光监视器
公开(公告)号：US5312039A
公开(公告)日：1994-05-17
申请号：US902181
申请日：1992-06-22
申请人： Anthony Sayka , Allen Page
发明人： Anthony Sayka , Allen Page
IPC分类号： B05B12/08 , H01L21/00 , B67D5/00 , B05B17/00
CPC分类号： H01L21/6715 , B05B12/082
摘要： Method and apparatus for monitoring the fluid spray pattern of fluid sprayed by a nozzle onto a semiconductor wafer during processing of the wafer. A light source is positioned to illuminate the fluid sprayed in a pattern P from the nozzle, and one or more photodetectors are positioned to receive light scattered by the fluid spray. Each photodetector develops an electrical signal in response to receipt of the scattered light, and these electrical signals are received and analyzed by a comparison means. One or more reference signals representing a desired fluid spray pattern P.sub.0 is stored in the comparison means, and each electrical signal for the pattern P is compared with the corresponding reference signal for the pattern P.sub.0 by the comparison means. If one or more signal for the pattern P differs substantially from the corresponding reference signal for the desired pattern P.sub.0, an alarm may be generated and/or delivery of fluid by the nozzle may be terminated.
摘要翻译：用于在晶片处理期间监测由喷嘴喷射到半导体晶片上的流体的流体喷射图案的方法和装置。光源被定位成从喷嘴照射以图案P喷射的流体，并且一个或多个光电检测器被定位成接收通过流体喷射散射的光。每个光电检测器响应于散射光的接收而产生电信号，并且这些电信号被比较装置接收和分析。表示期望的流体喷射图案P0的一个或多个参考信号被存储在比较装置中，并且通过比较装置将用于图案P的每个电信号与对应的图形P0的参考信号进行比较。如果用于图案P的一个或多个信号与期望图案P0的相应参考信号显着不同，则可能产生警报并且/或可以终止由喷嘴输送流体。

5. 发明授权

US5509375A Apparatus and method for detecting contaminants carried by a fluid 失效
标题翻译：用于检测流体携带的污染物的装置和方法
公开(公告)号：US5509375A
公开(公告)日：1996-04-23
申请号：US250659
申请日：1994-05-27
申请人： Anthony Sayka , Patricia A. Vargas
发明人： Anthony Sayka , Patricia A. Vargas
IPC分类号： B05B12/00 , B05B12/08 , B05C11/08 , B05D1/00 , H01L21/00 , B05C11/00 , G01N21/00 , G01V8/00
CPC分类号： B05B12/004 , B05B12/082 , B05D1/005 , H01L21/6715 , B05C11/08
摘要： A coating system for detecting the presence of contaminants carried by a fluid that is applied as a coating on a workpiece. A tube guides the fluid along a flow path to the workpiece. A light source illuminates the fluid along at least a portion of the flow path, and this light is scattered by any contaminants present in the fluid. Light scattered by the contaminant particles is more intense than light scattered by the other fluid particles, and this brighter scattered light is detected by a light detector positioned adjacent to the fluid flow path. If one or more contaminant particles is detected in the fluid, a warning signal can be given and/or the flow of fluid can be stopped. This coating system is particularly well suited for use in a spin-on coating process that applies a liquid, such as a photoresist material or a dielectric material, to a semiconductor wafer or other workpiece that is secured to a rotating turntable.
摘要翻译：一种用于检测由作为涂层涂覆在工件上的流体所携带的污染物的存在的涂层系统。管将流体沿着流动路径引导到工件。光源沿着流路的至少一部分照亮流体，并且该光被流体中存在的任何污染物散射。由污染物颗粒散射的光比通过其它流体颗粒散射的光更强烈，并且通过位于流体流动路径附近的光检测器来检测该较亮的散射光。如果在流体中检测到一个或多个污染物颗粒，则可以给出警告信号和/或可以停止流体流动。该涂覆系统特别适合用于将液体（例如光致抗蚀剂材料或电介质材料）施加到固定到旋转转盘上的半导体晶片或其它工件的旋涂工艺中。

6. 发明授权

US5392113A Semiconductor wafer defect monitoring 失效
标题翻译：半导体晶圆缺陷监测
公开(公告)号：US5392113A
公开(公告)日：1995-02-21
申请号：US954200
申请日：1992-09-30
申请人： Anthony Sayka , Stacy W. Hall , Judy U. Galloway , Pierre Leroux , Bryan D. Schmidt , Daniel D. Siems , Henry B. Taylor, III , Edward R. Vokoun
发明人： Anthony Sayka , Stacy W. Hall , Judy U. Galloway , Pierre Leroux , Bryan D. Schmidt , Daniel D. Siems , Henry B. Taylor, III , Edward R. Vokoun
IPC分类号： G01N21/95 , G01N21/88
CPC分类号： G01N21/9501
摘要： Method and apparatus for detecting the presence of selected types of defects, such as chemical stains from a liquid photoresist material or a liquid dielectric material, on a non-visible chosen surface of a semiconductor water that has undergone at least one processing step. In one embodiment, a support substrate for, the wafer is provided that has a highly reflecting surface adjacent to the chosen surface. The reflecting surface and the chosen surface are moved apart, and the chosen surface is illuminated with light to form an optical image of the chosen surface. The optical image of the chosen surface is reflected in the reflecting surface, and the reflected optical image is examined for the presence of selected types of defects. In another embodiment, a portion of this reflecting surface is initially contiguous to the chosen surface. A selected defect, if any, on the chosen surface changes a surface characteristic of the reflecting surface so that the presence of this defect on the chosen surface is visually perceptible on the reflecting surface.
摘要翻译：用于检测在经过至少一个处理步骤的半导体水的不可见的选定表面上存在选定类型的缺陷（例如来自液态光致抗蚀剂材料或液体介电材料的化学污渍）的存在的方法和装置。在一个实施例中，提供了一种用于晶片的支撑基板，其具有与所选择的表面相邻的高反射表面。反射表面和所选择的表面被移动分开，并且所选择的表面被光照射以形成所选表面的光学图像。所选择的表面的光学图像被反射在反射表面中，并且检查反射的光学图像以存在所选择的缺陷类型。在另一个实施例中，该反射表面的一部分最初与所选择的表面相邻。所选择的表面上的选定的缺陷（如果有的话）改变反射表面的表面特性，使得在所选择的表面上存在该缺陷在反射表面上在视觉上是可察觉的。

7. 发明授权

US5349237A Integrated circuit package including a heat pipe 失效
标题翻译：集成电路封装包括一个热管
公开(公告)号：US5349237A
公开(公告)日：1994-09-20
申请号：US854486
申请日：1992-03-20
申请人： Anthony Sayka , Mohammad A. Siddiqui
发明人： Anthony Sayka , Mohammad A. Siddiqui
IPC分类号： H01L23/427 , H01L23/433 , H01L23/28
CPC分类号： H01L23/427 , H01L23/4334 , H01L2224/48247 , H01L2224/48465 , H01L24/48 , H01L2924/00014 , H01L2924/01013 , H01L2924/01029 , H01L2924/14 , H01L2924/181 , H01L2924/1815
摘要： A plastic-encapsulated integrated circuit includes a package formed of plastic, an integrated circuit embedded in the package, and heat-dissipating means for conducting heat from the integrated circuit, which means include a hermetically sealed container formed of a heat conductive material embedded in the package and extending from the integrated circuit to at least an outer surface of the package, and a volatile fluid disposed in the container. In operation, the volatile fluid absorbs heat from the integrated circuit when it changes from the liquid state to the vapor state, and dissipates heat when it changes from the vapor state to the liquid state.
摘要翻译：塑料封装的集成电路包括由塑料制成的封装，嵌入封装中的集成电路，以及用于从集成电路传导热量的散热装置，该装置包括由嵌入在该封装件中的导热材料形成的气密密封容器包装并从集成电路延伸到包装的至少外表面，以及布置在容器中的挥发性流体。在操作中，当挥发性流体从液态转变为蒸汽状态时，集成电路吸收热量，并且当其从蒸气状态变为液态时，其散发热量。

8. 发明授权

US5477409A Fusion heat sink for integrated circuit 失效
标题翻译：用于集成电路的融合散热器
公开(公告)号：US5477409A
公开(公告)日：1995-12-19
申请号：US158124
申请日：1993-11-24
申请人： Anthony Sayka
发明人： Anthony Sayka
IPC分类号： H01L23/34 , H01L23/427 , H02H5/04 , H05K7/20
CPC分类号： H01L23/34 , H01L23/4275 , H01L2924/0002
摘要： An integrated circuit system includes an integrated circuit with a heat sink assembly including a fusible core. In the event that power dissipation by the integrated circuit threatens to exceed its safe operating range, the fusible core melts, absorbing the heat of fusion and delaying further temperature increases. A motor is repeatedly activated to attempt to rotate a shaft within the fusible core. When the core is solid, the shaft cannot be turned, but once it melts the shaft turns. The shafts motion is detected and used to trigger a reduction in the drive clock frequency of the integrated circuit. This reduces power consumption and dissipation until the integrated circuit cools and the heat sink core solidifies.
摘要翻译：集成电路系统包括具有散热器组件的集成电路，其包括可熔芯。如果集成电路的功耗有可能超过其安全工作范围，则熔芯熔化，吸收熔化热并延迟温度升高。电动机反复地被激活以试图在可熔芯内转动轴。当芯体坚固时，轴不能转动，但一旦熔化轴转动。检测轴运动并用于触发集成电路的驱动时钟频率的降低。这降低了功耗和消耗，直到集成电路冷却，并且散热片芯固化。

9. 发明授权

US5472825A Metal interconnect fabrication with dual plasma silicon dioxide deposition and etchback 失效
标题翻译：金属互连制造与双等离子体二氧化硅沉积和回蚀
公开(公告)号：US5472825A
公开(公告)日：1995-12-05
申请号：US126469
申请日：1993-09-24
申请人： Anthony Sayka
发明人： Anthony Sayka
IPC分类号： H01L21/768 , H01L21/8238 , H01L23/532 , G03F7/00
CPC分类号： H01L21/76801 , H01L21/76805 , H01L21/76819 , H01L21/76829 , H01L21/76834 , H01L21/8238 , H01L23/53223 , H01L2924/0002
摘要： In the fabrication of an integrated circuit, an intermetal dielectric is formed using a plural plasma processes that can be performed without having to transfer the wafer in the interim. This saves on wafer handling. A wafer with a patterned first metal wafer is placed into a plasma chamber. A relatively low-power noble gas plasma is applied to clean the wafer. A reactive plasma treatment is then used to deposit silicon dioxide to a thickness greater than ultimately desired. A noble gas plasma is used to etch back the silicon dioxide. Spin-on glass is then applied. The previous etch back aids the conformance of the spin-on glass to the underlying structure. The spin-on glass can be polished for further planarization. A second silicon dioxide layer can be deposited on top of the spin-on glass. Via apertures can be photolithographically defined through the three-layer dielectric. Finally, second layer metal is deposited and patterned. The method provides for high wafer throughput, while minimizing voids at the interface between the spin-on glass and the underlying silicon dioxide layer.
摘要翻译：在集成电路的制造中，使用多个等离子体处理形成金属间电介质，该等离子体处理可以在不必在此期间转移晶片的情况下进行。这节省了晶片处理。具有图案化的第一金属晶片的晶片被放置在等离子体室中。施加相对低功率的惰性气体等离子体来清洁晶片。然后使用反应性等离子体处理将二氧化硅沉积到大于最终期望的厚度。使用惰性气体等离子体来回吸二氧化硅。然后应用旋转玻璃。先前的回蚀有助于旋涂玻璃与底层结构的一致性。旋涂玻璃可以抛光以进一步平坦化。可以在旋涂玻璃的顶部上沉积第二个二氧化硅层。通孔可通过三层电介质光刻定义。最后，沉积和图案化第二层金属。该方法提供高晶圆生产量，同时使旋涂玻璃和下面的二氧化硅层之间的界面处的空隙最小化。

10. 发明授权

US5310621A Semiconductor photolithography with superficial plasma etch 失效
标题翻译：半导体光刻与表面等离子蚀刻
公开(公告)号：US5310621A
公开(公告)日：1994-05-10
申请号：US880470
申请日：1992-05-06
申请人： Anthony Sayka
发明人： Anthony Sayka
IPC分类号： G03F7/09 , G03F7/00
CPC分类号： G03F7/09
摘要： A photolithographic process involves the use of plasma to effect a superficial etch of a semiconductor wafer prior to the application of photoresist. Photoresist is applied directly on the wafer, without using an adhesion promotor. The photoresist is then exposed to patterned light. After exposure, the photoresist is developed leaving the desired photoresist mask on the wafer. Due to the superficial etch, curling of the photoresist is minimized, enhancing the selective protection provided by the photoresist to the wafer below.
摘要翻译：光刻工艺涉及在施加光致抗蚀剂之前使用等离子体来实现半导体晶片的表面蚀刻。光致抗蚀剂直接施加在晶片上，而不使用粘合促进剂。然后将光致抗蚀剂暴露于图案化的光。曝光后，显影光致抗蚀剂，留下晶片上所需的光刻胶掩模。由于表面蚀刻，光刻胶的卷曲最小化，从而增强了光致抗蚀剂对下面的晶片的选择性保护。

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