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    • 1. 发明授权
    • Method of etching a semiconductor substrate
    • 蚀刻半导体衬底的方法
    • US5851928A
    • 1998-12-22
    • US562865
    • 1995-11-27
    • Jerry D. CripeJerry L. WhiteCarl E. D'Acosta
    • Jerry D. CripeJerry L. WhiteCarl E. D'Acosta
    • H01L21/301H01L21/306H01L21/308H01L21/302
    • H01L21/30608H01L21/3081
    • A method of etching a semiconductor substrate (11) includes thinning (102) the semiconductor substrate (11), providing (103) a support layer (30) for the semiconductor substrate (11), providing (104) an etch mask (28) over the semiconductor substrate (11), and etching (105) the semiconductor substrate (11) using an etchant mixture of hydrofluoric acid, nitric acid, phosphoric acid, sulfuric acid, and a wetting agent at a temperature below ambient. The method is capable of using one etch step (105) and one etch mask (28) to form a plurality of trenches (12, 13) having the same width (15, 17) but different depths (16, 18) and different orientations. The method can be used to singulate different sizes and configurations of semiconductor dice from the semiconductor substrate (11).
    • 蚀刻半导体衬底(11)的方法包括使半导体衬底(11)变薄(102),提供(103)用于半导体衬底(11)的支撑层(30),提供(104)蚀刻掩模(28) 并且在低于环境温度的温度下使用氢氟酸,硝酸,磷酸,硫酸和润湿剂的蚀刻剂混合物蚀刻(105)半导体衬底(105)。 该方法能够使用一个蚀刻步骤(105)和一个蚀刻掩模(28)形成具有相同宽度(15,17)但不同深度(16,18)和不同取向的多个沟槽(12,13) 。 该方法可用于从半导体衬底(11)中分离出不同尺寸和结构的半导体晶片。
    • 8. 发明授权
    • Apparatus for testing electronic devices in hostile media
    • 用于在敌对媒体中测试电子设备的装置
    • US5703482A
    • 1997-12-30
    • US283435
    • 1994-08-01
    • Jerry D. CripeTheresa Ann MaudieCharles L. ReedMichael P. Menchio
    • Jerry D. CripeTheresa Ann MaudieCharles L. ReedMichael P. Menchio
    • G01R31/28G01R31/26
    • G01R31/2817
    • An apparatus for testing electronic devices in hostile media includes an isolation tank (24) which contains an inert or relatively inert material (26) such as fluorinated hydrocarbon liquid. Within the isolation tank (24) submersed in the inert or relatively inert material (26), is at least one test chamber (12) containing hostile and/or volatile test medium (14) such as a fuel mixture. Adjacent to the test chamber (12) and also within isolation tank (24) is a loading chamber (30) via which electronic devices to be tested are coupled to the test tank (12). The loading chamber (30), test tank (12) and isolation tank (24) are all isolated from the ambient environment and are oxygen free because they each contain a gas purge lines (33,35,38) providing an inert or relatively inert gas to a positive pressure within the respective tanks and chamber. The electronic devices (16) are electrically connected through a lid over the loading chamber (30) to computer control equipment (50) which provides for functional in situ testing.
    • 用于在敌对介质中测试电子设备的装置包括:隔离箱(24),其包含惰性或相对惰性的材料(26),例如氟化烃液体。 浸没在惰性或相对惰性的材料(26)内的隔离槽(24)内是至少一个包含敌对和/或挥发性试验介质(14)的测试室(12),例如燃料混合物。 邻近测试室(12)并且还在隔离箱(24)内的是装载室(30),待测试的电子装置通过该装载室连接到测试罐(12)。 装载室(30),试验箱(12)和隔离箱(24)都与环境环境隔离,无氧,因为它们各自包含提供惰性或相对惰性的气体吹扫管线(33,35,38) 气体在相应的罐和腔室内达到正压。 电子设备(16)通过盖子在装载室(30)上电连接到计算机控制设备(50),该设备提供功能性的原位测试。
    • 9. 发明授权
    • Vapor reduction system for solvent bottles
    • 用于溶剂瓶的蒸气还原系统
    • US5273088A
    • 1993-12-28
    • US884444
    • 1992-05-18
    • Jerry D. CripeMichael P. Menchio
    • Jerry D. CripeMichael P. Menchio
    • B09B3/00B65B1/04
    • B09B3/0058
    • A vapor reduction system for a solvent bottle (12) which is performed in an enclosure (11). A timer (23) controls events during a purge cycle. A vent (14) removes vapors from the enclosure to a vapor treatment system. Pressurized gas is forced through the solvent bottle (12) which vaporizes solvent liquid. A receptacle (16) receives solvent liquid and vapor forced from solvent bottle (12). A line (17) removes to solvent liquid from the receptacle (16) to an environmentally safe container. A second line (18) removes solvent vapor from the receptacle (16) to the vapor treatment system. A fire extinguishing system (31) senses and extinguishes any fire which may develop.
    • 一种用于在外壳(11)中执行的溶剂瓶(12)的蒸汽还原系统。 定时器(23)在清洗循环期间控制事件。 排气口(14)将外壳中的蒸气除去到蒸气处理系统。 加压气体被迫通过使溶剂液体蒸发的溶剂瓶(12)。 容器(16)容纳从溶剂瓶(12)强制的溶剂液体和蒸汽。 管线(17)将溶剂液体从容器(16)移至环境安全的容器。 第二管线(18)将溶剂蒸气从容器(16)中除去至蒸气处理系统。 灭火系统(31)可以感测和熄灭任何可能发生的火灾。