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1. 发明申请

US20080130878A1 Method for generating, operating, and using a sparse w-NAF key for encryption 有权
标题翻译：用于生成，操作和使用稀疏w-NAF密钥进行加密的方法
公开(公告)号：US20080130878A1
公开(公告)日：2008-06-05
申请号：US11889366
申请日：2007-08-13
申请人： Jeong-hyun Yi , Jung-hee Cheon , Tae-chul Jung , Tae-Kyoung Kwon , Hong-tae Kim , Mun-kyu Lee
发明人： Jeong-hyun Yi , Jung-hee Cheon , Tae-chul Jung , Tae-Kyoung Kwon , Hong-tae Kim , Mun-kyu Lee
IPC分类号： H04L9/28
CPC分类号： G06F7/725 , H04L9/0841 , H04L9/3013
摘要： A method for generating, operating, and using a sparse w-NAF key for encryption is disclosed. The method for generating a key comprises generating a string of a number of coefficients, in which at most one coefficient, excluding 0, among a consecutive w number of coefficients, corresponds to a positive odd integer equal to or less than 2w (w being a natural number equal to or more than 2); and outputting the generated string as a key. Accordingly, an encryption is executed through an exponential operation or scalar multiplication using a sparse w-NAF key having the scarce coefficients, excluding 0, such that an encryption pace is improved.
摘要翻译：公开了一种用于生成，操作和使用用于加密的稀疏w-NAF密钥的方法。用于产生密钥的方法包括生成多个系数的串，其中连续的w个系数中除了0以外的至多一个系数对应于等于或小于2的正奇整数（w为等于或大于2的自然数）; 并输出生成的字符串作为关键字。因此，通过使用具有稀疏系数的稀疏w-NAF密钥通过指数运算或标量乘法来执行加密，排除0，使得加密步速提高。

2. 发明授权

US06729950B2 Chemical mechanical polishing pad having wave shaped grooves 有权
标题翻译：具有波浪形凹槽的化学机械抛光垫
公开(公告)号：US06729950B2
公开(公告)日：2004-05-04
申请号：US10129386
申请日：2002-05-03
申请人： Inha Park , Tae-Kyoung Kwon , Jaeseok Kim , In-Ju Hwang
发明人： Inha Park , Tae-Kyoung Kwon , Jaeseok Kim , In-Ju Hwang
IPC分类号： B24D1100
CPC分类号： B24B37/26 , H01L21/30625 , Y10S451/921
摘要： Disclosed is a chemical mechanical polishing pad formed at a polishing surface thereof with a plurality of concentric wave-shaped grooves having different radiuses while having the same shape. Each groove has a desired depth, width, and shape. The chemical mechanical polishing pad provides effects of effectively controlling a flow of slurry during a polishing process, thereby achieving a stability in the polishing process in terms of a polishing rate, and achieving an enhancement in the planarization of a wafer.
摘要翻译：公开了一种化学机械抛光垫，其在其研磨表面上形成有具有不同半径的多个同心波浪形凹槽，同时具有相同的形状。每个凹槽具有所需的深度，宽度和形状。化学机械抛光垫提供了在抛光过程中有效控制浆料流动的效果，从而在抛光速率方面实现了抛光工艺的稳定性，并且实现了晶片平坦化的增强。

3. 发明申请

US20080130516A1 P2p Overplay Network Construction Method and Apparatus 审中-公开
标题翻译： P2p Overplay网络构建方法与装置
公开(公告)号：US20080130516A1
公开(公告)日：2008-06-05
申请号：US11793791
申请日：2005-10-21
申请人： Tae-Wan You , Seung Yun Lee , Ho-Sik Cho , Min-Ji Nam , Kun-Woo Park , Tae-Kyoung Kwon , Yang-Hee Choi
发明人： Tae-Wan You , Seung Yun Lee , Ho-Sik Cho , Min-Ji Nam , Kun-Woo Park , Tae-Kyoung Kwon , Yang-Hee Choi
IPC分类号： H04L12/28
CPC分类号： H04L67/104 , H04L67/1046 , H04L67/1065 , H04L67/1093
摘要： Provided are a method and apparatus for constructing a peer-to-peer (P2P) overlay network. The method of constructing a peer-to-peer (P2P) overlay network to obtain ID values of a plurality of nodes using a distributed hash table (DHT) and registering a node wishing to join the P2P overlay network where the plurality of nodes are sequentially located based on the obtained ID values, includes: (a) transmitting a join request message from the node wishing to join the P2P overlay network to a key node of the P2P overlay network; (b) a first node that received the join request message determining whether an ID value of the node wishing to join the P2P overlay network is a between value of an ID value of the first node and an ID value of a second node next to the first node, while sequentially transmitting the join request message to the plurality of nodes; and (c), if the first node determines that the ID value of the node wishing to join the P2P overlay network is the between value, registering the node wishing to join the P2P overlay network between the first and second nodes. Therefore, it is possible to more easily and efficiently search for sharing resources stored by each of the nodes.
摘要翻译：提供了一种用于构建对等（P2P）覆盖网络的方法和装置。一种构建对等（P2P）覆盖网络以使用分布式哈希表（DHT）获得多个节点的ID值并注册希望加入多个节点依次为P2P覆盖网络的节点的方法基于获得的ID值定位，包括：（a）从希望加入P2P覆盖网络的节点向P2P覆盖网络的关键节点发送加入请求消息; （b）接收到加入请求消息的第一节点，确定希望加入P2P覆盖网络的节点的ID值是否在第一节点的ID值与第二节点旁边的第二节点的ID值之间第一节点，同时顺序地向多个节点发送加入请求消息; 以及（c）如果第一节点确定希望加入P2P覆盖网络的节点的ID值是相互之间的值，则注册希望在第一和第二节点之间加入P2P覆盖网络的节点。因此，可以更容易且有效地搜索由每个节点存储的共享资源。

4. 发明申请

US20070173187A1 Chemical mechanical polishing pad with micro-holes 审中-公开
标题翻译：化学机械抛光垫带微孔
公开(公告)号：US20070173187A1
公开(公告)日：2007-07-26
申请号：US11651197
申请日：2007-01-08
申请人： Inha Park , Tae-Kyoung Kwon , Jaeseok Kim
发明人： Inha Park , Tae-Kyoung Kwon , Jaeseok Kim
IPC分类号： B24D11/00
CPC分类号： B24B37/26
摘要： Disclosed is a chemical mechanical polishing pad formed at a polishing surface thereof with micro-holes each having a desired cross-sectional area while having a desired depth. The shape, size, and density of the micro-holes can be optionally adjusted. The chemical mechanical polishing pad provides an effect of maintaining a desired polishing rate during a polishing process. In accordance with the present invention, the micro-holes can have diverse arrangements depending on given process conditions.
摘要翻译：公开了一种化学机械抛光垫，其在其抛光表面上形成有具有期望的横截面积的微孔，同时具有期望的深度。可以任意调整微孔的形状，尺寸和密度。化学机械抛光垫提供在抛光过程中保持所需抛光速率的效果。根据本发明，微孔可以根据给定的工艺条件具有不同的布置。

5. 发明授权

US06794605B2 Method for fabricating chemical mechanical polshing pad using laser 有权
标题翻译：使用激光制造化学机械抛光垫的方法
公开(公告)号：US06794605B2
公开(公告)日：2004-09-21
申请号：US10110800
申请日：2002-12-02
申请人： Inha Park , Tae-Kyoung Kwon , Jaeseok Kim , In-Ju Hwang
发明人： Inha Park , Tae-Kyoung Kwon , Jaeseok Kim , In-Ju Hwang
IPC分类号： B23K2638
CPC分类号： B23K26/0823 , A61B2017/564 , B23K26/0861 , B23K26/361 , B23K26/382 , B23K26/389 , B23K26/40 , B23K2101/35 , B23K2103/42 , B23K2103/50 , B24B37/26 , B24D11/001
摘要： Disclosed is a method for forming micro-holes, perforated holes, or grooves on a chemical mechanical polishing pad by a laser. This method involves the steps of determining a pattern of micro-holes, grooves, or perforated holes to be formed on a polishing pad, inputting the determined pattern to a computer numerical control (CNC) controller, and driving a laser device adapted to irradiate a laser beam and a table adapted to conduct a three-dimensional movement and rotation while supporting the polishing pad, under the control of the CNC controller based on the inputted pattern, thereby irradiating the laser beam from the laser device onto the polishing pad supported by the table while moving the table in accordance with the inputted pattern, so that micro-holes, grooves, or perforated holes having a pattern corresponding to the determined pattern are formed on the polishing pad. In accordance with the present invention, it is possible to form diverse patterns of micro-holes, perforated holes or grooves exhibiting superior effects in a polishing process.
摘要翻译：公开了一种通过激光在化学机械抛光垫上形成微孔，穿孔或凹槽的方法。该方法包括确定要在抛光垫上形成的微孔，凹槽或穿孔的图案的步骤，将确定的图案输入到计算机数控（CNC）控制器，以及驱动适于照射激光束和适于在支撑抛光垫的同时支撑抛光垫的台面，在CNC控制器基于所输入的图案的控制下，将来自激光装置的激光束照射到由同时根据输入的图案移动桌子，使得在抛光垫上形成具有对应于所确定的图案的图案的微孔，凹槽或穿孔。根据本发明，可以在抛光工艺中形成具有优异效果的多孔图案的微孔，穿孔或凹槽。

6. 发明授权

US06377643B1 Apparatus for detecting a synchronization signal in a digital data record/replay device 失效
标题翻译：用于检测数字数据记录/重放装置中的同步信号的装置
公开(公告)号：US06377643B1
公开(公告)日：2002-04-23
申请号：US09227160
申请日：1999-01-08
申请人： Doo-Hee Lee , Tae-Kyoung Kwon
发明人： Doo-Hee Lee , Tae-Kyoung Kwon
IPC分类号： H04L700
CPC分类号： G11B27/3027 , G11B20/1426 , G11B20/1833 , H04L1/004 , H04L7/042
摘要： An apparatus for detecting a sync signal in a digital data record/replay device having a parallel clock generator, a parallel data generator, and a window unit comprises: a sync signal detector for comparing a pattern matching sync signal output from a sync pattern detector with an output signal of the window unit and detecting a sync signal according to clocks of the parallel clock generator; a latch unit for latching the sync signal detected by the sync signal detector and outputting the sync signal as a sync position signal according to clocks of the parallel clock generator; an identification error correction code (ID ECC) controller for generating an ID ECC control signal according to the sync position signal of the latch unit; an ID ECC decoder for decoding ID areas of parallel data generated by the parallel data generator; and a sync signal checking unit for outputting the sync position signal of the latch unit as a final sync signal and, when errors are detected as a result of the ID ECC decoding, sending a control signal to the window unit. The present invention can check sync signals using the ID ECC and restore normal sync signals when an initial sync signal is erroneously detected due to unstableness of initial window signal or when sync signals are missed and erroneously detected due to change of clocks during the normal replay.
摘要翻译：一种用于检测具有并行时钟发生器，并行数据发生器和窗口单元的数字数据记录/重放装置中的同步信号的装置，包括：同步信号检测器，用于将从同步模式检测器输出的模式匹配同步信号与窗口单元的输出信号，并根据并行时钟发生器的时钟检测同步信号; 锁存单元，用于锁存由同步信号检测器检测到的同步信号，并根据并行时钟发生器的时钟输出同步信号作为同步位置信号; 识别纠错码（ID ECC）控制器，用于根据所述锁存单元的同步位置信号产生ID ECC控制信号; 用于解码由并行数据发生器产生的并行数据的ID区域的ID ECC解码器; 以及同步信号检查单元，用于输出锁存单元的同步位置信号作为最终同步信号，并且当作为ID ECC解码的结果检测到错误时，向窗口单元发送控制信号。本发明可以使用ID ECC来检查同步信号，并且由于初始窗口信号的不稳定性或当由于正常重放期间的时钟变化而丢失并错误地检测到初始同步信号时，恢复正常同步信号。

7. 发明授权

US06875096B2 Chemical mechanical polishing pad having holes and or grooves 有权
标题翻译：具有孔或凹槽的化学机械抛光垫
公开(公告)号：US06875096B2
公开(公告)日：2005-04-05
申请号：US10110802
申请日：2001-08-29
申请人： Inha Park , Tae-Kyoung Kwon , Jaeseok Kim
发明人： Inha Park , Tae-Kyoung Kwon , Jaeseok Kim
IPC分类号： B24B37/00 , B24B37/04 , B24D13/14 , H01L21/304 , H01L21/306 , B24D11/00
CPC分类号： B24B37/26 , H01L21/30625
摘要： Disclosed is a chemical mechanical polishing pad formed with holes, grooves or a combination thereof. The chemical mechanical polishing pad is characterized in that a plurality of concentric circles each having grooves, holes, or a combination thereof are formed at a polishing surface of the polishing pad. The chemical mechanical polishing pad provides effects of effectively controlling a flow of slurry during a polishing process, thereby achieving a stability in the polishing process in terms of a polishing rate, and achieving an enhancement in the planarization of a wafer.
摘要翻译：公开了一种形成有孔，槽或其组合的化学机械抛光垫。化学机械抛光垫的特征在于，在抛光垫的抛光表面上形成有多个具有凹槽，孔或其组合的同心圆。化学机械抛光垫提供了在抛光过程中有效控制浆料流动的效果，从而在抛光速率方面实现了抛光工艺的稳定性，并且实现了晶片平坦化的增强。

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