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1. 发明授权

US06447232B1 Semiconductor wafer processing apparatus having improved wafer input/output handling system 失效
标题翻译：具有改进的晶片输入/输出处理系统的半导体晶片处理设备
公开(公告)号：US06447232B1
公开(公告)日：2002-09-10
申请号：US08994737
申请日：1997-12-19
申请人： Jeffry A. Davis , Kert L. Dolechek , Gary L. Curtis
发明人： Jeffry A. Davis , Kert L. Dolechek , Gary L. Curtis
IPC分类号： B65G4907
CPC分类号： H01L21/67754 , H01L21/67126 , H01L21/67173 , H01L21/6719 , H01L21/67313 , H01L21/67326 , H01L21/67769 , H01L21/67772 , H01L21/67775 , H01L21/67778 , H01L21/67781 , H01L21/68707 , Y10S134/902 , Y10S414/139 , Y10S414/14
摘要： A processor for processing articles, such as semiconductor wafers, in a substantially clean atmosphere is set forth. The processor includes an enclosure defining a substantially enclosed clean processing chamber and at least one processing station disposed in the processing chamber. An interface section is disposed adjacent an interface end of the enclosure. The interface section includes at least one interface port through which a pod containing articles for processing are loaded or unloaded to or from the processor. The interface section is hygienically separated from the processing chamber since the interface section is generally not as clean as the highly hygienic processing chamber. An article extraction mechanism adapted to seal with the pod is employed. The mechanism is disposed to allow extraction of the articles contained within the pod into the processing chamber without exposing the articles to ambient atmospheric conditions in the interface section. The article processor also preferably includes an article insertion mechanism that is adapted to seal with a pod disposed in the interface section. The article insertion mechanism is disposed to allow insertion of the articles into the pod after processing by the at least one processing station. The article insertion mechanism allows the insertion of the articles without exposing the articles to ambient atmospheric conditions in the interface section.
摘要翻译：阐述了一种用于在基本上清洁的气氛中处理诸如半导体晶片的制品的处理器。处理器包括限定基本封闭的清洁处理室的外壳和设置在处理室中的至少一个处理站。接口部分设置在外壳的接口端附近。接口部分包括至少一个接口端口，通过该至少一个接口端口将包含用于处理的物品的容器装载或者从处理器卸载。接口部分与处理室卫生地分开，因为界面部分通常不像高度卫生的处理室那么干净。采用适于与荚密封的物品提取机构。该机构被设置为允许将容纳在容器内的物品提取到处理室中，而不会使物品暴露于接口部分中的环境大气条件。物品处理器还优选地包括物品插入机构，其适于与设置在界面部分中的容器密封。物品插入机构设置成允许在由至少一个处理站处理之后将物品插入容器中。物品插入机构允许物品的插入，而不会使物品暴露在界面部分中的环境大气条件下。

2. 发明授权

US06799932B2 Semiconductor wafer processing apparatus 失效
标题翻译：半导体晶片处理装置
公开(公告)号：US06799932B2
公开(公告)日：2004-10-05
申请号：US10457944
申请日：2003-06-09
申请人： Jeffry A. Davis , Kert L. Dolechek , Gary L. Curtis
发明人： Jeffry A. Davis , Kert L. Dolechek , Gary L. Curtis
IPC分类号： B65G49107
CPC分类号： H01L21/67754 , H01L21/67173 , H01L21/6732 , H01L21/67769 , H01L21/67772 , H01L21/67775 , H01L21/67778 , H01L21/67781 , H01L21/68707 , Y10S414/135 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A processor for processing articles, such as semiconductor wafers, in a substantially clean atmosphere is set forth. The processor includes an enclosure defining a substantially enclosed clean processing chamber and at least one processing station disposed in the processing chamber. An interface section is disposed adjacent an interface end of the enclosure. The interface section includes at least one interface port through which a pod containing articles for processing are loaded or unloaded to or from the processor. The interface section is hygienically separated from the processing chamber since the interface section is generally not as clean as the highly hygienic processing chamber. An article extraction mechanism adapted to seal with the pod is employed. The mechanism is disposed to allow extraction of the articles contained within the pod into the processing chamber without exposing the articles to ambient atmospheric conditions in the interface section. The article processor also preferably includes an article insertion mechanism that is adapted to seal with a pod disposed in the interface section. The article insertion mechanism is disposed to allow insertion of the articles into the pod after processing by the at least one processing station. The article insertion mechanism allows the insertion of the articles without exposing the articles to ambient atmospheric conditions in the interface section.
摘要翻译：阐述了一种用于在基本上清洁的气氛中处理诸如半导体晶片的制品的处理器。处理器包括限定基本封闭的清洁处理室的外壳和设置在处理室中的至少一个处理站。接口部分设置在外壳的接口端附近。接口部分包括至少一个接口端口，通过该至少一个接口端口将包含用于处理的物品的容器装载或者从处理器卸载。接口部分与处理室卫生地分开，因为界面部分通常不像高度卫生的处理室那么干净。采用适于与荚密封的物品提取机构。该机构被设置为允许将容纳在容器内的物品提取到处理室中，而不会使物品暴露于接口部分中的环境大气条件。物品处理器还优选地包括物品插入机构，其适于与设置在界面部分中的容器密封。物品插入机构设置成允许在由至少一个处理站处理之后将物品插入容器中。物品插入机构允许物品的插入，而不会使物品暴露在界面部分中的环境大气条件下。

3. 发明授权

US06652219B2 Semiconductor wafer processing apparatus having improved wafer input/output handling system 失效
标题翻译：具有改进的晶片输入/输出处理系统的半导体晶片处理设备
公开(公告)号：US06652219B2
公开(公告)日：2003-11-25
申请号：US10205158
申请日：2002-07-25
申请人： Jeffry A. Davis , Kert L. Dolechek , Gary L. Curtis
发明人： Jeffry A. Davis , Kert L. Dolechek , Gary L. Curtis
IPC分类号： B65G4907
CPC分类号： H01L21/67754 , H01L21/67126 , H01L21/67173 , H01L21/6719 , H01L21/67313 , H01L21/67326 , H01L21/67769 , H01L21/67772 , H01L21/67775 , H01L21/67778 , H01L21/67781 , H01L21/68707 , Y10S134/902 , Y10S414/139 , Y10S414/14
摘要： A processor for processing articles, such as semiconductor wafers, includes an enclosure defining a substantially enclosed clean processing chamber and at least one processing station disposed in the processing chamber. An interface section is disposed adjacent an interface end of the enclosure. The interface section includes at least one interface port through which a pod containing articles for processing are loaded or unloaded to or from the processor. An article extraction mechanism adapted to seal with the pod removes articles from the pod without exposing the articles to ambient atmospheric conditions in the interface section. The article processor also preferably includes an article insertion mechanism adapted to seal with a pod in the interface section. The article insertion mechanism allows insertion of the articles into the pod after processing by at least one processing station.
摘要翻译：用于处理诸如半导体晶片的制品的处理器包括限定基本封闭的清洁处理室的外壳和设置在处理室中的至少一个处理站。接口部分设置在外壳的接口端附近。接口部分包括至少一个接口端口，通过该至少一个接口端口将包含用于处理的物品的容器装载或者从处理器卸载。适于与容器密封的物品提取机构将物品从物料盒中取出，而不会使物品暴露在界面部分的环境大气条件下。物品处理器还优选地包括适于与接口部分中的容器密封的物品插入机构。物品插入机构允许在由至少一个处理站处理之后将物品插入到容器中。

4. 发明授权

US06599075B2 Semiconductor wafer processing apparatus 失效
公开(公告)号：US06599075B2
公开(公告)日：2003-07-29
申请号：US10180793
申请日：2002-06-25
申请人： Jeffry A. Davis , Kert L. Dolechek , Gary L. Curtis
发明人： Jeffry A. Davis , Kert L. Dolechek , Gary L. Curtis
IPC分类号： B65G4907
CPC分类号： H01L21/67754 , H01L21/67173 , H01L21/6719 , H01L21/67313 , H01L21/67769 , H01L21/67772 , H01L21/67775 , H01L21/67778 , H01L21/67781 , H01L21/68707 , Y10S414/137 , Y10S414/139
摘要： A processor for processing articles, such as semiconductor wafers, in a substantially clean atmosphere is set forth. The processor includes an enclosure defining a substantially enclosed clean processing chamber and at least one processing station disposed in the processing chamber. An interface section is disposed adjacent an interface end of the enclosure. The interface section includes at least one interface port through which a pod containing articles for processing are loaded or unloaded to or from the processor. The interface section is hygienically separated from the processing chamber since the interface section is generally not as clean as the highly hygienic processing chamber. An article extraction mechanism adapted to seal with the pod is employed. The mechanism is disposed to allow extraction of the articles contained within the pod into the processing chamber without exposing the articles to ambient atmospheric conditions in the interface section. The article processor also preferably includes an article insertion mechanism that is adapted to seal with a pod disposed in the interface section. The article insertion mechanism is disposed to allow insertion of the articles into the pod after processing by the at least one processing station. The article insertion mechanism allows the insertion of the articles without exposing the articles to ambient atmospheric conditions in the interface section.

5. 发明授权

US06273110B1 Automated semiconductor processing system 失效
标题翻译：自动半导体处理系统
公开(公告)号：US06273110B1
公开(公告)日：2001-08-14
申请号：US09112259
申请日：1998-07-08
申请人： Jeffry A. Davis , Kevin P. Meyer , Kert L. Dolechek
发明人： Jeffry A. Davis , Kevin P. Meyer , Kert L. Dolechek
IPC分类号： B08B700
CPC分类号： H01L21/67754 , H01L21/67126 , H01L21/67173 , H01L21/6719 , H01L21/67313 , H01L21/67326 , H01L21/67769 , H01L21/67772 , H01L21/67775 , H01L21/67778 , H01L21/67781 , H01L21/68707 , Y10S134/902 , Y10S414/139 , Y10S414/14
摘要： An automated semiconductor processing system has an indexer bay perpendicularly aligned with a process bay within a clean air enclosure. An indexer in the indexer bay provides stocking or storage for work in progress semiconductor wafers. Process chambers are located in the process bay. A process robot moves between the indexer bay and process bay to carry semi-conductor wafers to and from the process chambers. The process robot has a robot arm vertically movable along a lift rail. Semiconductor wafers are carried offset from the robot arm, to better avoid contamination. The automated system is compact and requires less clean room floor space.
摘要翻译：自动半导体处理系统具有与清洁空气封闭体内的工艺间隔垂直对准的分度器托架。索引器托架中的索引器为进行中的半导体晶片提供放样或存储。过程室位于过程托架中。过程机器人在分度器托架和过程间隔之间移动，以将半导体晶片运送到处理室和从处理室运送。过程机器人具有可沿升降轨道垂直移动的机器人臂。半导体晶片从机器人手臂偏移，以更好地避免污染。自动化系统紧凑，需要较少的洁净室空间。

6. 发明授权

US06736148B2 Automated semiconductor processing system 失效
标题翻译：自动半导体处理系统
公开(公告)号：US06736148B2
公开(公告)日：2004-05-18
申请号：US09862752
申请日：2001-05-22
申请人： Jeffry A. Davis , Kevin P. Meyer , Kert L. Dolechek
发明人： Jeffry A. Davis , Kevin P. Meyer , Kert L. Dolechek
IPC分类号： B08B704
CPC分类号： H01L21/68707 , A01G18/64 , H01L21/67742 , H01L21/67754 , H01L21/67769 , H01L21/67772 , H01L21/67775 , H01L21/67781 , Y10S134/902
摘要： An automated semiconductor processing system has an indexer bay perpendicularly aligned with a process bay within a clean air enclosure. An indexer in the indexer bay provides stocking or storage for work in progress semiconductor wafers. Process chambers are located in the process bay. A process robot moves between the indexer bay and process bay to carry semi-conductor wafers to and from the process chambers. The process robot has a robot arm vertically moveable along a lift rail. Semiconductor wafers are carried offset from the robot arm, to better avoid contamination. The automated system is compact and requires less clean room floor space.
摘要翻译：自动半导体处理系统具有与清洁空气封闭体内的工艺间隔垂直对准的分度器托架。索引器托架中的索引器为进行中的半导体晶片提供放样或存储。过程室位于过程托架中。过程机器人在分度器托架和过程间隔之间移动，以将半导体晶片运送到处理室和从处理室传送半导体晶片。过程机器人具有可沿着升降轨道垂直移动的机器人手臂。半导体晶片从机器人手臂偏移，以更好地避免污染。自动化系统紧凑，需要较少的洁净室空间。

7. 发明授权

US06279724B1 Automated semiconductor processing system 有权
标题翻译：自动半导体处理系统
公开(公告)号：US06279724B1
公开(公告)日：2001-08-28
申请号：US09274511
申请日：1999-03-23
申请人： Jeffry A. Davis
发明人： Jeffry A. Davis
IPC分类号： B65G2500
CPC分类号： H01L21/67754 , H01L21/67742 , H01L21/67769 , H01L21/67772 , H01L21/67775 , H01L21/67781 , H01L21/68707 , Y10S414/14
摘要： An automated semiconductor processing system has an indexer bay perpendicularly aligned with a process bay within a clean air enclosure. An indexer in the indexer bay provides stocking or storage for work in progress semiconductor wafers. Process chambers are located in the process bay. A process robot moves between the indexer bay and process bay to carry semi-conductor wafers to and from the process chambers. The process robot has a robot arm vertically moveable along a lift rail. Semiconductor wafers are carried offset from the robot arm, to better avoid contamination. The automated system is compact and requires less clean room floor space.
摘要翻译：自动半导体处理系统具有与清洁空气封闭体内的工艺间隔垂直对准的分度器托架。索引器托架中的索引器为进行中的半导体晶片提供放样或存储。过程室位于过程托架中。过程机器人在分度器托架和过程间隔之间移动，以将半导体晶片运送到处理室和从处理室传送半导体晶片。过程机器人具有可沿着升降轨道垂直移动的机器人手臂。半导体晶片从机器人手臂偏移，以更好地避免污染。自动化系统紧凑，需要较少的洁净室空间。

8. 发明授权

US07278813B2 Automated processing system 失效
标题翻译：自动化处理系统
公开(公告)号：US07278813B2
公开(公告)日：2007-10-09
申请号：US10334688
申请日：2002-12-30
申请人： Jeffry A. Davis , Gordon Ray Nelson , Daniel P. Bexten
发明人： Jeffry A. Davis , Gordon Ray Nelson , Daniel P. Bexten
IPC分类号： B65G49/07
CPC分类号： H01L21/67775 , H01L21/67769 , H01L21/67781 , H01L21/68707 , Y10S414/137
摘要： An automated processing system has an indexer bay perpendicularly aligned with a process bay within a clean air enclosure. An indexer in the indexer bay provides stocking or storage for work in progress wafers or articles. Process chambers are located in the process bay. A transfer robot moves wafers from a pod unsealed at a docking station into a carrier at a transfer station. The carrier has tapered or stepped outside surfaces engaging corresponding inside surfaces on a rotor within a process chamber. A process robot moves between the indexer bay and process bay to carry wafers to and from the process chambers. The process robot has a robot arm vertically moveable along a lift rail. Wafers are carried offset from the robot arm, to better avoid contamination. The automated system is compact and requires less clean room floor space.
摘要翻译：自动处理系统具有与清洁空气封闭体内的处理室垂直对准的分度器托架。索引器托架中的索引器提供放置或存储用于正在进行的晶片或物品。过程室位于过程托架中。传送机器人将来自对接站的密封件中的晶片从传送站移动到载体中。载体具有与处理室内的转子上的相应内表面接合的锥形或阶梯状的外表面。过程机器人在分度器托架和过程间隔之间移动以将晶片运送到处理室和从处理室运送晶片。过程机器人具有可沿着升降轨道垂直移动的机器人手臂。晶片从机器人手臂偏移，以更好地避免污染。自动化系统紧凑，需要较少的洁净室空间。

9. 发明授权

US06723174B2 Automated semiconductor processing system 失效
标题翻译：自动半导体处理系统
公开(公告)号：US06723174B2
公开(公告)日：2004-04-20
申请号：US10163837
申请日：2002-06-05
申请人： Gordon Ray Nelson , Daniel P. Bexten , Jeffry A. Davis
发明人： Gordon Ray Nelson , Daniel P. Bexten , Jeffry A. Davis
IPC分类号： B08B302
CPC分类号： H01L21/68707 , H01L21/67742 , H01L21/67754 , H01L21/67769 , H01L21/67772 , H01L21/67775 , H01L21/67778 , H01L21/67781 , Y10S414/137
摘要： An automated semiconductor processing system has an indexer bay perpendicularly aligned with a process bay within a clean air enclosure. An indexer in the indexer bay provides stocking or storage for work in progress semiconductor wafers. Process chambers are located in the process bay: A process robot moves between the indexer bay and process bay to carry semi-conductor wafers to and from the process chambers. The process robot has a robot arm vertically moveable along a lift rail. Semiconductor wafers are carried offset from the robot arm, to better avoid contamination. The automated system is compact and requires less clean room floor space.
摘要翻译：自动半导体处理系统具有与清洁空气封闭体内的工艺间隔垂直对准的分度器托架。索引器托架中的索引器为进行中的半导体晶片提供放样或存储。过程室位于过程室中：过程机器人在分度器托架和过程间隔之间移动，以将半导体晶片运送到过程室和从处理室运送。过程机器人具有可沿着升降轨道垂直移动的机器人手臂。半导体晶片从机器人手臂偏移，以更好地避免污染。自动化系统紧凑，需要较少的洁净室空间。

10. 发明授权

US06942738B1 Automated semiconductor processing system 失效
标题翻译：自动半导体处理系统
公开(公告)号：US06942738B1
公开(公告)日：2005-09-13
申请号：US09612009
申请日：2000-07-07
申请人： Gordon Ray Nelson , Daniel P. Bexten , Jeffry A. Davis
发明人： Gordon Ray Nelson , Daniel P. Bexten , Jeffry A. Davis
IPC分类号： H01L21/677 , H01L21/687 , B08B3/02
CPC分类号： H01L21/68707 , H01L21/67754 , H01L21/67757 , H01L21/67769 , H01L21/67772 , H01L21/67775 , H01L21/67778 , H01L21/67781 , Y10S414/137
摘要： An automated semiconductor processing system has an indexer bay perpendicularly aligned with a process bay within a clean air enclosure. An indexer in the indexer bay provides stocking or storage for work in progress semiconductor wafers. Process chambers are located in the process bay. A process robot moves between the indexer bay and process bay to carry semi-conductor wafers to and from the process chambers. The process robot has a robot arm vertically moveable along a lift rail. Semiconductor wafers are carried offset from the robot arm, to better avoid contamination. The automated system is compact and requires less clean room floor space.
摘要翻译：自动半导体处理系统具有与清洁空气封闭体内的工艺间隔垂直对准的分度器托架。索引器托架中的索引器为进行中的半导体晶片提供放样或存储。过程室位于过程托架中。过程机器人在分度器托架和过程间隔之间移动，以将半导体晶片运送到处理室和从处理室运送。过程机器人具有可沿着升降轨道垂直移动的机器人手臂。半导体晶片从机器人手臂偏移，以更好地避免污染。自动化系统紧凑，需要较少的洁净室空间。

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