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1. 发明授权

US06512020B1 Oxime derivatives and the use thereof as latent acids 有权
标题翻译：肟衍生物及其作为潜伏酸的用途
公开(公告)号：US06512020B1
公开(公告)日：2003-01-28
申请号：US09820115
申请日：2001-03-28
申请人： Toshikage Asakura , Hitoshi Yamato , Masaki Ohwa , Jean-Luc Birbaum , Kurt Dietliker , Junichi Tanabe
发明人： Toshikage Asakura , Hitoshi Yamato , Masaki Ohwa , Jean-Luc Birbaum , Kurt Dietliker , Junichi Tanabe
IPC分类号： C08J328
CPC分类号： G03F7/0045 , B33Y70/00 , C07C251/62 , C07C309/00 , C07C309/65 , C07C317/32 , C07C323/47 , C07C381/00 , C07C2602/42 , C07D319/18 , C07D333/22
摘要： Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g. C2-C6haloalkanoyl, or halobenzoyl, R′3 is for example phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, wherein these radicals are unsubstituted or substituted, X is halogen; are especially suitable as photosensitive acid-donors in chemically amplified resist formulations.
摘要翻译：式I，II和III的化合物，其中R1是例如氢，C1-C12烷基，C3-C30环烷基，C2-C12链烯基，C4-C8环烯基，苯基，未取代或取代的萘基，蒽基或菲基，未取代或取代的，未取代或取代的杂芳基; 其中除氢之外的所有基团R1可以另外被具有在酸作用下切割的-O-C键或-O-Si键的基团取代; R'1是例如亚苯基，亚萘基，亚二苯基或氧联二苯基，其中这些基团是未取代的或被取代的; R2是卤素或C1-C10卤代烷基; R3是例如C1-C18烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽磺酰基或菲基磺酰基，其中基团是未取代的或被取代的，或者R3是例如。 C 2 -C 6卤代烷酰基或卤代苯甲酰基，R'3是例如亚苯基二磺酰基，萘基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基，其中这些基团是未取代的或被取代的，X是卤素; 在化学放大抗蚀剂配方中特别适合用作光敏酸供体。

2. 发明授权

US06485886B1 Oxime derivatives and the use thereof as latent acids 失效
标题翻译：肟衍生物及其作为潜伏酸的用途
公开(公告)号：US06485886B1
公开(公告)日：2002-11-26
申请号：US09830248
申请日：2001-04-24
申请人： Hitoshi Yamato , Toshikage Asakura , Jean-Luc Birbaum , Kurt Dietliker
发明人： Hitoshi Yamato , Toshikage Asakura , Jean-Luc Birbaum , Kurt Dietliker
IPC分类号： G03C173
CPC分类号： C07C255/64 , B33Y70/00 , C07D333/36 , Y10S430/114 , Y10S430/117 , Y10S430/12
摘要： New oxime derivatives of formula (I) or. (II), wherein m is 0 or 1; R1 inter alia is phenyl, naphthyl, anthracyl, phenanthryl or a heteroaryl radical; R′1 is for example C2-C12alkylene, phenylene, naphthylene; R2 is CN; R3 is C2-C6haloalkanoyl, halobenzoyl, a phosphoryl or an organosilyl group; R4, R5, R10 and R11 inter alia are hydrogen, C1-C6alkyl, C1-C6alkoxy; R6 inter alia is hydrogen phenyl, C1-C12alkyl; R7 and R8 inter alia are hydrogen, C1-C12alkyl; or R7 and R8, together with the nitrogen atom to which they are bonded, form a 5-, 6 or 7-membered ring; R9 is for example C1-C12alkyl; and A inter alia is S, O, NR7a; are useful as latent acids, especially in photoresist applications.
摘要翻译：式（I）的新肟衍生物或。（II），其中m为0或1; R1特别是苯基，萘基，蒽基，菲基或杂芳基; R'1例如为C 2 -C 12亚烷基，亚苯基，亚萘基; R2为CN; R3是C2-C6卤代烷酰基，卤代苯甲酰基，磷酰基或有机甲硅烷基; R4，R5，R10和R11尤其是氢，C1-C6烷基，C1-C6烷氧基; R6尤其是氢苯基，C1-C12烷基; R 7和R 8尤其是氢，C 1 -C 12烷基; 或R 7和R 8与它们所键合的氮原子一起形成5-，6-或7-元环; R 9为例如C 1 -C 12烷基; A特别是S，O，NR7a; 可用作潜酸，特别是在光致抗蚀剂中。

3. 发明授权

US06703182B1 Unsaturated oxime derivatives and the use thereof as latent acids 有权
标题翻译：不饱和肟衍生物及其作为潜伏酸的用途
公开(公告)号：US06703182B1
公开(公告)日：2004-03-09
申请号：US09763016
申请日：2001-02-15
申请人： Jean-Luc Birbaum , Toshikage Asakura , Hitoshi Yamato
发明人： Jean-Luc Birbaum , Toshikage Asakura , Hitoshi Yamato
IPC分类号： G03C1492
CPC分类号： C09D11/38 , B33Y70/00 , C07C309/66 , C07C309/73 , C07C381/00 , C09D11/03 , C09D11/101 , G03F7/0045 , Y10S430/12 , Y10S430/122
摘要： Compounds of formulae I, II or III wherein m is zero or 1; n is 1, 2 or 3; R1 inter alia is unsubstituted or substituted phenyl, or naphthyl, anthracyl, phenanthryl, a heteroaryl radical, or C2-C12alkenyl; R′1 inter alia is vinylene, phenylene, naphthylene, diphenylene or oxydiphenylene; R2 inter alia is CN, C1-C4haloalkyl, C2-C6alkoxycarbonyl, phenoxycarbonyl, or benzoyl; R3 inter alia is C1-C18alkylsulfonyl, phenyl-C1-C3alkylsulfonyl, camphorylsulfonyl, or phenylsulfonyl; R′3 inter alia is C2-C12alkylenedisulfonyl, phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl; R4 and R5 inter alia are hydrogen, halogen, C1-C8alkyl, C1-C6alkoxy, C1-C4haloalkyl, CN, NO2, C2-C6alkanoyl, benzoyl, phenyl, —S-phenyl, OR6, SR9, NR7R8, C2-C6alkoxycarbonyl or phenoxycarbonyl; R6 inter alia is hydrogen, phenyl or C1-C12alkyl; R7 and R8 inter alia are hydrogen or C1-C12alkyl; R9 inter alia is C1-C12 alkyl; R10, R11 and R12 inter alia are C1-C6alkyl or phenyl; upon irradiation react as acid generating compounds and thus are suitable in photoresist applications.
摘要翻译：其中m为式I，II或III的化合物为0或1; n为1,2或3; R 1特别是未取代或取代的苯基，或萘基，蒽基，菲基，杂芳基或C 2 -C 12烯基; 尤其是亚乙烯基，亚苯基，亚萘基，二亚苯基或氧联二苯基; R2特别是CN，C 1 -C 4卤代烷基，C 2 -C 6烷氧基羰基，苯氧基羰基或苯甲酰基; R3特别是C 1 -C 18烷基磺酰基，苯基-C 1 -C 3烷基磺酰基，樟脑磺酰基或苯基磺酰基; R'3特别是C 2 -C 12亚烷基二磺酰基，亚苯基二磺酰基，萘基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基; R4和R5特别是氢，卤素，C1-C8烷基，C1-C6烷氧基，C1-C4卤代烷基，CN，NO2，C2-C6烷酰基，苯甲酰基，苯基，-S-苯基，OR6，SR9，NR7R8，C2-C6烷氧基羰基或苯氧基羰基 ; R6尤其是氢，苯基或C 1 -C 12烷基; R 7和R 8尤其是氢或C 1 -C 12烷基; R9尤其是C1-C12烷基; R 10，R 11和R 12特别是C 1 -C 6烷基或苯基; 在照射时作为产生酸的化合物反应，因此适用于光刻胶应用。

4. 发明授权

US6004724A Oxime sulfonates and the use thereof as latent sulfonic acids 失效
标题翻译：肟磺酸盐及其作为潜在磺酸的用途
公开(公告)号：US6004724A
公开(公告)日：1999-12-21
申请号：US104676
申请日：1998-06-25
申请人： Hitoshi Yamato , Hartmut Bleier , Jean-Luc Birbaum , Martin Kunz , Kurt Dietliker , Christoph De Leo , Toshikage Asakura
发明人： Hitoshi Yamato , Hartmut Bleier , Jean-Luc Birbaum , Martin Kunz , Kurt Dietliker , Christoph De Leo , Toshikage Asakura
IPC分类号： C07C309/65 , C07C309/66 , C07C309/73 , C07C323/63 , C07C381/00 , C07D207/44 , C07D213/90 , C07D333/34 , C07D333/36 , C07D333/44 , G03F7/004 , G03C1/725 , C07C249/04 , C07C251/32 , G03C1/72
CPC分类号： C07D207/44 , C07C309/65 , C07C309/66 , C07C309/73 , C07C323/63 , C07C381/00 , C07D213/90 , C07D333/44 , G03F7/0045 , Y10S430/114 , Y10S430/117 , Y10S430/12 , Y10S430/122
摘要： New oximsulfonate compounds of the formulae I or II, ##STR1## wherein m is 0 or 1; x is 1 or 2; R.sub.1 is, for example phenyl, which is unsubstituted or substituted or R.sub.1 is a heteroaryl radical that is unsubstituted or substituted, or, if m is 0, R.sub.1 additionally is C.sub.2 -C.sub.6 alkoxycarbonyl, phenoxycarbonyl or CN; R'.sub.1 is for example C.sub.2 -C.sub.12 alkylene, phenylene; R.sub.2 has for example one of the meanings of R.sub.1 ; n is 1 or 2; R.sub.3 is for example C.sub.1 -C.sub.18 alkyl, R'.sub.3 when x is 1, has one of the meanings given for R.sub.3, or R'.sub.3 in the formula IV and when x is 2 in the formula 1, is for example C.sub.2 -C.sub.12 alkylene, phenylene; R.sub.4 and R.sub.5 are independently of each other for example hydrogen, halogen, C.sub.1 -C.sub.6 alkyl; R.sub.6 is for example hydrogen, phenyl; R.sub.7 and R.sub.8 are independently of each other for example hydrogen or C.sub.1 -C.sub.12 -alkyl; R.sub.9 is for example C.sub.1 -C.sub.12 alkyl; A is S, O, NR.sub.6, or a group of formula A1, A2, A3 or A4 ##STR2## R.sub.10 and R.sub.11 independently of each other have one of the meanings given for R.sub.4 ; R.sub.12, R.sub.13, R.sub.14 and R.sub.15 independently of one another are for example hydrogen, C.sub.1 -C.sub.4 alkyl; Z is CR.sub.11 or N; Z.sub.1 is --CH.sub.2 --, S, O or NR.sub.6, are useful as latent sulfonic acids, especially in photoresist applications.
摘要翻译：式I或II的新的磺酸磺酸酯化合物，其中m为0或1; x为1或2; R1是例如未取代或取代的苯基，或R1是未取代或取代的杂芳基，或者如果m是0，则R1另外是C 2 -C 6烷氧基羰基，苯氧基羰基或CN; R'1例如为C 2 -C 12亚烷基，亚苯基; R2具有例如R1的含义之一; n为1或2; R3为例如C1-C18烷基，当x为1时为R'3，具有R3给出的含义之一，或式Ⅳ中的R'3，当式Ⅺ中x为2时，为例如C 2 -C 12亚烷基，亚苯基; R4和R5彼此独立，例如氢，卤素，C1-C6烷基; R6是例如氢，苯基; R 7和R 8彼此独立地为氢或C 1 -C 12 - 烷基; R 9为例如C 1 -C 12烷基; A是S，O，NR6或式A1，A2，A3或A4的基团，R10和R11彼此独立地具有对R4给出的含义之一; R 12，R 13，R 14和R 15彼此独立地是例如氢，C 1 -C 4烷基; Z为CR11或N; Z1是-CH2-，S，O或NR6，可用作潜在的磺酸，特别是在光刻胶应用中。

5. 发明授权

US06261738B1 Oxime derivatives and the use thereof as latent acids 有权
标题翻译：肟衍生物及其作为潜伏酸的用途
公开(公告)号：US06261738B1
公开(公告)日：2001-07-17
申请号：US09533952
申请日：2000-03-23
申请人： Toshikage Asakura , Hitoshi Yamato , Masaki Ohwa , Jean-Luc Birbaum , Kurt Dietliker , Junichi Tanabe
发明人： Toshikage Asakura , Hitoshi Yamato , Masaki Ohwa , Jean-Luc Birbaum , Kurt Dietliker , Junichi Tanabe
IPC分类号： G03G7004
CPC分类号： G03F7/039 , C07C251/62 , C07C309/00 , C07C309/65 , C07C317/32 , C07C323/47 , C07C381/00 , C07C2602/42 , C07D319/18 , C07D333/22 , G03F7/0045 , Y10S430/12
摘要： Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g. C2-C6haloalkanoyl, or halobenzoyl, R′3 is for example phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, wherein these radicals are unsubstituted or substituted, X is halogen; are especially suitable as phototsensitive acid-donors in chemically amplified resist formulations.
摘要翻译：式I，II和III的化合物，其中R1是例如氢，C1-C12烷基，C3-C30环烷基，C2-C12链烯基，C4-C8环烯基，苯基，未取代或取代的萘基，蒽基或菲基，未取代或取代的，未取代或取代的杂芳基; 其中除氢之外的所有基团R1可以另外被具有在酸作用下切割的-O-C键或-O-Si键的基团取代; R'1是例如亚苯基，亚萘基，亚二苯基或氧联二苯基，其中这些基团是未取代的或被取代的; R2是卤素或C1-C10卤代烷基; R3是例如C1-C18烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽磺酰基或菲基磺酰基，其中基团是未取代的或被取代的，或者R3是例如。 C 2 -C 6卤代烷酰基或卤代苯甲酰基，R'3是例如亚苯基二磺酰基，萘基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基，其中这些基团是未取代的或被取代的，X是卤素; 在化学放大抗蚀剂配方中特别适合作为光敏酸供体。

6. 发明授权

US06306555B1 Iodonium salts as latent acid donors 有权
标题翻译：碘盐作为潜酸供体
公开(公告)号：US06306555B1
公开(公告)日：2001-10-23
申请号：US09740205
申请日：2000-12-18
申请人： Reinhard Schulz , Jean-Luc Birbaum , Jean-Pierre Wolf , Stephan Ilg , Hitoshi Yamato , Toshikage Asakura
发明人： Reinhard Schulz , Jean-Luc Birbaum , Jean-Pierre Wolf , Stephan Ilg , Hitoshi Yamato , Toshikage Asakura
IPC分类号： G03F7004
CPC分类号： G03F7/0382 , B33Y70/00 , C07C17/00 , C07C25/18 , C07C2601/14 , C08G59/68 , C08G65/105 , G03F7/0045 , G03F7/038 , G03F7/0392 , Y10S430/115
摘要： Radiation-sensitive compositions comprising (a1) a cationically or acid-catalytically polymerisable or crosslinkable compound or (a2) a compound that increases its solubility in a developer under the action of acid; and (b) at least one diaryliodonium salt of formula I X is branched C3-C20alkyl or C3-C8cycloalkyl; X1 is hydrogen, linear C1-C20alkyl, branched C3-C20alkyl or C3-C8cycloalkyl; with the proviso that the sum of the carbon atoms in X and X1 is at least 4; Y is linear C1-C10alkyl, branched C3-C10alkyl or C3-C8cycloalkyl; A− is a non-nucleophilic anion, selected from the group (BF4)−, (SbF6)−, (PF6)−, (B(C6F5))4−, C1-C20alkylsulfonate, C2-C20haloalkylsulfonate, unsubstituted C6-C10arylsulfonate, camphorsulfonate, and C6-C10arylsulfonate substituted by halogen, NO2, C1-C12alkyl, C1-C12halo-alkyl, C1-C12alkoxy or by COOR1; and R1 is C1-C20alkyl, phenyl, benzyl; or phenyl mono- or poly-substituted by C1-C12alkyl, C1-C12alkoxy or by halogen; with the proviso that the two phenyl rings on the iodine atom are not identically substituted.
摘要翻译：辐射敏感性组合物，其包含（a1）阳离子或酸可催化聚合或交联的化合物或（a2）在酸的作用下增加其在显影剂中的溶解度的化合物; 和（b）式IX的至少一种二芳基碘鎓盐是支链C 3 -C 20烷基或C 3 -C 8环烷基; X 1是氢，直链C 1 -C 20烷基，支链C 3 -C 20烷基或C 3 -C 8环烷基; 条件是X和X 1中的碳原子总数至少为4; Y为直链C 1 -C 10烷基，支链C 3 -C 10烷基或C 3 -C 8环烷基; A-为非亲核阴离子，选自（BF 4 ） - ，（SbF 6） - ，（PF 6） - ，（B（C 6 F 5））4-，C 1 -C 20烷基磺酸酯，C 2 -C 20卤代烷基磺酸酯，未取代的C 6 -C 10芳基磺酸酯，樟脑磺酸酯和C 6 -C 10芳基磺酸酯，被卤素，，C 1 -C 12卤代烷基，C 1 -C 12烷氧基或COOR 1; 并且R 1是C 1 -C 20烷基，苯基，苄基; 或被C 1 -C 12烷基，C 1 -C 12烷氧基或卤素单取代或多取代的苯基;条件是碘原子上的两个苯环不同等取代。

7. 发明授权

US06458864B1 Photoinitiators having chain transfer groups polymerized to obtain macrophotoinitiators useful to give block copolymers 失效
标题翻译：具有链转移基团的光引发剂被聚合以获得可用于产生嵌段共聚物的大分子引发剂
公开(公告)号：US06458864B1
公开(公告)日：2002-10-01
申请号：US09701457
申请日：2000-11-27
申请人： Toshikage Asakura , Masaki Ohwa , Hitoshi Yamato , Asako Ito
发明人： Toshikage Asakura , Masaki Ohwa , Hitoshi Yamato , Asako Ito
IPC分类号： C08F250
CPC分类号： A61K6/083 , B33Y70/00 , C08F2/38 , C08F2/50 , C08K5/0025 , C09D7/45 , C09D7/65 , G03F7/031 , C08L53/00 , C08L33/00
摘要： Compounds with chain transfer groups of the formula I, II, III and IV wherein a is 1 or 2; Ar and Ar1 inter alia are phenyl; Ar2 inter alia is phenylene, these groups being unsubstituted or substituted; X is a direct bond, —O—, —S— or —N(R6)—; Y inter alia is hydrogen or C1-C12alkyl; M1 is —NR3R4 or —OH, or M1 is Ar when R1 and R2 are alkoxy, or aryloxy; R1 and R2 independently of one another e.g. are C1-C8alkyl; R3 and R4 for example are C1-C12alkyl, or together are C3-C7alkylene; R5 inter alia is C1-C6alkylene or a direct bond; R6 is for example hydrogen; and Z is a divalent radical, provided that at least one of the radicals Ar, Ar1, Ar2, R1, R2, R3, R4, R5 or Y is substituted by SH groups; are suitable for the thermal preparation of macrophotoinitiators which are polymerized photochemically to give block-copolymers.
摘要翻译：具有式I，II，III和IV的链转移基团的化合物是1或2; Ar和Ar1特别是苯基; Ar2特别是亚苯基，这些基团是未取代的或取代的; X是直接键，-O - ， - S-或-N（R6） - ; Y尤其是氢或C 1 -C 12烷基; 当R1和R2为烷氧基时，M1为-NR3R4或-OH，或M1为Ar，或为芳氧基; R1和R2彼此独立地例如。是C 1 -C 8烷基; R 3和R 4例如是C 1 -C 12烷基，或一起是C 3 -C 7亚烷基; R5尤其是C1-C6亚烷基或直接键; R6是例如氢; 并且Z是二价基团，条件是基团Ar，Ar 1，Ar 2，R 1，R 2，R 3，R 4，R 5或Y中的至少一个被SH基取代;适用于光化学聚合的高分子引发剂的热制备得到嵌段共聚物。

8. 发明申请

US20110171569A1 SULFONIUM DERIVATIVES AND THE USE THEROF AS LATENT ACIDS 审中-公开
标题翻译：磺胺衍生物及其作为酸性物质的用途
公开(公告)号：US20110171569A1
公开(公告)日：2011-07-14
申请号：US12996795
申请日：2009-06-02
申请人： Yuichi Nishimae , Toshikage Asakura , Hitoshi Yamato
发明人： Yuichi Nishimae , Toshikage Asakura , Hitoshi Yamato
IPC分类号： G03F7/004 , C07D335/08 , C07D339/08 , C07D413/02 , C07D285/16 , C07D327/08 , C08F228/06 , G03F7/20 , G03F1/00
CPC分类号： C07D339/08 , C07D327/08
摘要： Compounds of the formula (I), wherein R1, R2 and R3 for example are hydrogen, halogen, CN, C1-C18alkyl, C1-C10 haloalkyl, (CO)R8, (CO)OR4, or (CO)NR5R6; Y is O, S or CO; D2, D3 and D4 for example are a direct bond, O, S, NR7, CO, O(CO), (CO)O, S(CO), (CO)S, NR7(CO), (CO)NR7, SO, SO2, or OSO2, C1-C18alkylene, C3-C30cycloalkylene, C2-C12alkenylene, C4-C30cycloalkenylene, Ar1; Ar1, Ar2 and Ar3 are for example phenylene, R4, R5, R6, R7 and R8 are for example hydrogen, C3-C30-cycloalkyl, C1-C18alkyl, C1-C10haloalkyl, C2-C12alkenyl, C4-C30cycloalkenyl, phenyl-C1C3-alkyl; X− is Formulae (IA), (IB) or (IC); R10 is for example C1-C18alkyl, C1-C10haloalkyl, camphoryl, phenyl-C1-C3alkyl, C3-C30cycloalkyl; and R11, R12, R13, R14 and R15 are for example C1-C10haloalkyl; are useful as polymerizable photolatent acids.
摘要翻译：式（I）化合物，其中R1，R2和R3例如是氢，卤素，CN，C1-C18烷基，C1-C10卤代烷基，（CO）R8，（CO）OR4或（CO）NR5R6; Y为O，S或CO; D2，D3和D4例如是直接键合，O，S，NR7，CO，O（CO），（CO）O，S（CO），（CO）S，NR7（CO） SO，SO 2或OSO 2，C 1 -C 18亚烷基，C 3 -C 30亚环烷基，C 2 -C 12亚烯基，C 4 -C 30环亚烯基，Ar 1; Ar 1，Ar 2和Ar 3是例如亚苯基，R 4，R 5，R 6，R 7和R 8是例如氢，C 3 -C 30 - 环烷基，C 1 -C 18烷基，C 1 -C 10卤代烷基，C 2 -C 12烯基，C 4 -C 30环烯基，苯基-C 1 -C 3 - 烷基; X-是式（IA），（IB）或（IC）; R 10例如为C 1 -C 18烷基，C 1 -C 10卤代烷基，樟脑基，苯基-C 1 -C 3烷基，C 3 -C 30环烷基; R 11，R 12，R 13，R 14和R 15例如为C 1 -C 10卤代烷基; 可用作可聚合的光潜酸。

9. 发明申请

US20100297541A1 SULPHONIUM SALT INITIATORS 审中-公开
标题翻译：硫酸钡发射器
公开(公告)号：US20100297541A1
公开(公告)日：2010-11-25
申请号：US12681786
申请日：2008-09-29
申请人： Pascal Hayoz , Hitoshi Yamato , Toshikage Asakura
发明人： Pascal Hayoz , Hitoshi Yamato , Toshikage Asakura
IPC分类号： G03F1/00 , G03F7/004 , G03F7/20 , C07D409/12 , C07D407/12 , C07C255/34 , C07C321/26
CPC分类号： G03F7/0045 , C07C381/12 , C07D307/64 , C07D333/34 , G03F7/0007 , G03F7/038
摘要： Compounds of the formula (I), wherein X is a single bond, CRaRbO, S, NRc or NCORc; Z is formula (II) or C3-C20heteroaryl; L, L1, L2, L3, L4, L5, L6, L7 and L8 for example independently of one another are hydrogen or an organic substituent; Ra, Rb and Rc independently of one another are hydrogen or an organic substituent; R is for example is C5-C20heteroaryl or C6-C14 aryl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.
摘要翻译：式（I）化合物，其中X为单键，CRaRbO，S，NRc或NCORc; Z是式（II）或C 3 -C 20杂芳基; L，L1，L2，L3，L4，L5，L6，L7和L8例如彼此独立地为氢或有机取代基; R a，R b和R c彼此独立地是氢或有机取代基; R是例如C 5 -C 20杂芳基或C 6 -C 14芳基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。

10. 发明申请

US20090042114A1 Halogenated oxime derivatives and the use therof as latent acids 有权
标题翻译：卤代肟衍生物和作为潜伏酸使用
公开(公告)号：US20090042114A1
公开(公告)日：2009-02-12
申请号：US12154333
申请日：2008-05-22
申请人： Hitoshi Yamato , Toshikage Asakura , Akira Matsumoto , Peter Murer , Tobias Hintermann
发明人： Hitoshi Yamato , Toshikage Asakura , Akira Matsumoto , Peter Murer , Tobias Hintermann
IPC分类号： C07D209/82 , C07C317/12 , G03F7/004 , C07D335/04
CPC分类号： C07C251/48 , B33Y70/00 , C07C381/00 , C07C2603/18 , C07C2603/20 , C07C2603/40 , C07D209/86 , C07D307/91 , C07D333/76 , G03F7/0007 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392
摘要： Compounds of the formula I or II wherein R1 is C1-C10haloalkylsulfonyl, halobenzenesulfonyl, C2-C10haloalkanoyl, halobenzoyl; R2 is halogen or C1-C10haloalkyl; Ar1 is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl, all of which are optionally substituted; Ar′1 is for example phenylene, naphthylene, diphenylene, heteroarylene, oxydiphenylene, phenylene-D-D1-D-phenylene or —Ar″1-A1-Y1-A1-Ar″1—; wherein these radicals optionally are substituted; Ar″1 is phenylene, naphthylene, anthracylene, phenanthrylene, or heteroarylene, all optionally substituted; A1 is for example a direct bond, —O—, —S—, or —NR6—; Y1 inter alia is C1-C18alkylene; X is halogen; D is for example —O—, —S— or —NR6—; D1 inter alia is C1-C18alkylene; are particularly suitable as photolatent acids in ArF resist technology.
摘要翻译：式I或II的化合物，其中R 1是C 1 -C 10卤代烷基磺酰基，卤代苯磺酰基，C 2 -C 10卤代烷酰基，卤代苯甲酰基; R2是卤素或C1-C10卤代烷基; Ar1是苯基，联苯基，芴基，萘基，蒽基，菲基或杂芳基，它们都是任选被取代的; Ar'1例如为亚苯基，亚萘基，亚二苯基，亚杂芳基，氧联二苯基，亚苯基-D-D1-D-phenylene或-Ar''1-A1-Y1-A1-Ar'1,1- 其中这些基团任选被取代; Ar 1是亚苯基，亚萘基，亚蒽基，亚菲基或亚杂芳基，全部被取代; A1是例如直接键，-O - ， - S - 或-NR 6 - ; Y1特别是C 1 -C 18亚烷基; X是卤素; D是例如-O - ， - S-或-NR 6 - ; D1特别是C 1 -C 18亚烷基; 在ArF抗蚀剂技术中特别适合作为光潜酸。

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