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1. 发明授权

US07345736B2 Lithographic apparatus and device manufacturing method 失效
公开(公告)号：US07345736B2
公开(公告)日：2008-03-18
申请号：US10927532
申请日：2004-08-27
申请人： Jan Jaap Kuit , Petrus Rutgerus Bartray , Dirk Jan Bijvoet , Jan Frederik Hoogkamp
发明人： Jan Jaap Kuit , Petrus Rutgerus Bartray , Dirk Jan Bijvoet , Jan Frederik Hoogkamp
IPC分类号： G03B27/42 , G03B27/58
CPC分类号： G03F7/70733 , G03F7/7075
摘要： A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.

2. 发明授权

US07408615B2 Lithographic apparatus and device manufacturing method 失效
公开(公告)号：US07408615B2
公开(公告)日：2008-08-05
申请号：US10871528
申请日：2004-06-21
申请人： Jan Jaap Kuit , Petrus Rutgerus Bartray , Dirk Jan Bijvoet , Jan Frederik Hoogkamp
发明人： Jan Jaap Kuit , Petrus Rutgerus Bartray , Dirk Jan Bijvoet , Jan Frederik Hoogkamp
IPC分类号： G03B27/42
CPC分类号： G03F7/70733 , G03F7/7075 , H01L21/67742 , Y10S414/14
摘要： A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.

3. 发明授权

US07349067B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07349067B2
公开(公告)日：2008-03-25
申请号：US10892394
申请日：2004-07-16
申请人： Jan Jaap Kuit , Petrus Rutgerus Bartray , Dirk Jan Bijvoet , Jan Frederik Hoogkamp
发明人： Jan Jaap Kuit , Petrus Rutgerus Bartray , Dirk Jan Bijvoet , Jan Frederik Hoogkamp
IPC分类号： G03B27/42 , G03B27/58
CPC分类号： G03F7/7075 , Y10S414/14
摘要： A lithographic apparatus having an improved transfer unit, is presented. The lithographic apparatus includes a processing unit that performs a lithographic process involving exchangeable objects in which the processing unit includes an illumination system that provides a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a substrate holder configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. The lithographic apparatus also includes a transfer unit comprising a single robot. The single robot is configured to transfer a first exchangeable object from a loading station to the processing unit and to transfer a second exchangeable object from the processing unit to a discharge station.
摘要翻译：提出了一种具有改进的转印单元的光刻设备。光刻设备包括处理单元，该处理单元执行涉及可更换物体的光刻处理，其中处理单元包括提供辐射束的照明系统，支撑结构，其被配置为支撑图案形成装置，所述图案形成装置将期望的图案赋予辐射束，被配置为保持衬底的衬底保持器，以及配置成将所述图案化的光束投影到所述衬底的目标部分上的投影系统。光刻设备还包括包括单个机器人的传送单元。单个机器人被配置为将第一可交换对象从加载站传送到处理单元，并将第二可更换对象从处理单元传送到放电站。

4. 发明授权

US07106420B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US07106420B2
公开(公告)日：2006-09-12
申请号：US11015763
申请日：2004-12-20
申请人： Jan Jaap Kuit , Dirk Jan Bijvoet , Jan Frederik Hoogkamp , Hubert Marie Segers , Raimond Visser , Johannes Maquine
发明人： Jan Jaap Kuit , Dirk Jan Bijvoet , Jan Frederik Hoogkamp , Hubert Marie Segers , Raimond Visser , Johannes Maquine
IPC分类号： G03B27/58
CPC分类号： G03F7/70733
摘要： The present invention relates to a lithographic apparatus including a projection system configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate support, the patterned beam of radiation being patterned with a patterning device held by a patterning device support. The lithographic apparatus includes an exchangeable object handling apparatus for exchanging an exchangeable object with a exchangeable object station and a support, the exchangeable object being one of the substrate and the patterning device and the support being one of the substrate support and the patterning device support, the exchangeable object handling apparatus including an intermediate holding device for holding an exchangeable object, which intermediate holding device can interact with the support to place an exchangeable object on or take an exchangeable object from the support, and a robot which can exchange an exchangeable object with the support, the intermediate holding device and said exchangeable object station.

5. 发明授权

US07372549B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07372549B2
公开(公告)日：2008-05-13
申请号：US11165574
申请日：2005-06-24
申请人： Dirk Jan Bijvoet
发明人： Dirk Jan Bijvoet
IPC分类号： G03B27/62 , G03B27/58
CPC分类号： G03F7/707
摘要： A lithographic apparatus is disclosed that has a support structure constructed to support a patterning object, the patterning object being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, or both, wherein the support structure, the substrate table, or both, has a contact surface with which the patterning object, the substrate, or both, are configured to be in contact, respectively, the contact surface having a plurality of sub-contact surfaces to increase a mutual adhesion between the support structure and the patterning object, the substrate table and the substrate, or both.
摘要翻译：公开了一种光刻设备，其具有构造成支撑图案化物体的支撑结构，所述图案形成物体能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，构造成保持衬底的衬底台或两者，其中所述支撑结构，所述衬底台或两者具有分别与所述图案形成对象，所述衬底或两者相配合的接触表面，所述接触表面具有多个子像素，接触表面以增加支撑结构和图案化物体，衬底台和衬底之间或两者的相互粘合。

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