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1. 发明授权

US07343922B2 Wafer drying apparatus 失效
标题翻译：晶圆烘干设备
公开(公告)号：US07343922B2
公开(公告)日：2008-03-18
申请号：US11103802
申请日：2005-04-12
申请人： Jae-Hyung Jung , Young-Min Kwon , Jong-Jae Lee , Dong-Hoon Jung
发明人： Jae-Hyung Jung , Young-Min Kwon , Jong-Jae Lee , Dong-Hoon Jung
IPC分类号： B08B5/00 , F26B19/00
CPC分类号： H01L21/67034 , Y10S134/902
摘要： A wafer drying method includes submerging a wafer in a cleaning solution in a dry chamber. An organic liquid vapor from an organic liquid is supplied into the dry chamber at a first volumetric supply rate to form an organic liquid layer on a surface of the cleaning solution, the organic liquid layer having at least a prescribed concentration of the organic liquid. The organic liquid vapor is supplied into the dry chamber at a second volumetric supply rate that is lower than the first volumetric supply rate. During and/or following the supplying of the organic liquid vapor into the dry chamber, at least a portion of the wafer is removed from the cleaning solution through the organic liquid layer.
摘要翻译：晶片干燥方法包括将晶片浸没在干燥室中的清洁溶液中。来自有机液体的有机液体蒸气以第一体积供应速率供应到干燥室中，以在清洁溶液的表面上形成有机液体层，有机液体层至少具有规定浓度的有机液体。有机液体蒸气以低于第一体积供应速率的第二体积供应速率供应到干燥室中。在将有机液体蒸气供应到干燥室中和/或之后，晶片的至少一部分通过有机液体层从清洗溶液中除去。

2. 发明申请

US20050211266A1 Wafer drying apparatus 失效
标题翻译：晶圆烘干设备
公开(公告)号：US20050211266A1
公开(公告)日：2005-09-29
申请号：US11103802
申请日：2005-04-12
申请人： Jae-Hyung Jung , Young-Min Kwon , Jong-Jae Lee , Dong-Hoon Jung
发明人： Jae-Hyung Jung , Young-Min Kwon , Jong-Jae Lee , Dong-Hoon Jung
IPC分类号： H01L21/304 , H01L21/00 , B08B3/04
CPC分类号： H01L21/67034 , Y10S134/902
摘要： A wafer drying method includes submerging a wafer in a cleaning solution in a dry chamber. An organic liquid vapor from an organic liquid is supplied into the dry chamber at a first volumetric supply rate to form an organic liquid layer on a surface of the cleaning solution, the organic liquid layer having at least a prescribed concentration of the organic liquid. The organic liquid vapor is supplied into the dry chamber at a second volumetric supply rate that is lower than the first volumetric supply rate. During and/or following the supplying of the organic liquid vapor into the dry chamber, at least a portion of the wafer is removed from the cleaning solution through the organic liquid layer.
摘要翻译：晶片干燥方法包括将晶片浸没在干燥室中的清洁溶液中。来自有机液体的有机液体蒸气以第一体积供应速率供应到干燥室中，以在清洁溶液的表面上形成有机液体层，有机液体层至少具有规定浓度的有机液体。有机液体蒸气以低于第一体积供应速率的第二体积供应速率供应到干燥室中。在将有机液体蒸气供应到干燥室中和/或之后，晶片的至少一部分通过有机液体层从清洗溶液中除去。

3. 发明授权

US06896743B2 Wafer drying methods of Marangoni type and apparatus suitable therefor 失效
标题翻译： Marangoni型晶圆烘干方法及适用的设备
公开(公告)号：US06896743B2
公开(公告)日：2005-05-24
申请号：US10041227
申请日：2002-01-08
申请人： Jae-Hyung Jung , Young-Min Kwon , Jong-Jae Lee , Dong-Hoon Jung
发明人： Jae-Hyung Jung , Young-Min Kwon , Jong-Jae Lee , Dong-Hoon Jung
IPC分类号： H01L21/304 , H01L21/00 , B08B3/00 , F26B3/06
CPC分类号： H01L21/67034 , Y10S134/902
摘要： A wafer drying method includes submerging a wafer in a cleaning solution in a dry chamber. An organic liquid vapor from an organic liquid is supplied into the dry chamber at a first volumetric supply rate to form an organic liquid layer on a surface of the cleaning solution, the organic liquid layer having at least a prescribed concentration of the organic liquid. The organic liquid vapor is supplied into the dry chamber at a second volumetric supply rate that is lower than the first volumetric supply rate. During and/or following the supplying of the organic liquid vapor into the dry chamber, at least a portion of the wafer is removed from the cleaning solution through the organic liquid layer.
摘要翻译：晶片干燥方法包括将晶片浸没在干燥室中的清洁溶液中。来自有机液体的有机液体蒸气以第一体积供应速率供应到干燥室中，以在清洁溶液的表面上形成有机液体层，有机液体层至少具有规定浓度的有机液体。有机液体蒸气以低于第一体积供应速率的第二体积供应速率供应到干燥室中。在将有机液体蒸气供应到干燥室中和/或之后，晶片的至少一部分通过有机液体层从清洗溶液中除去。

4. 发明授权

US07793671B2 Apparatus for and method of cleaning substrates 有权
标题翻译：清洗基材的设备及方法
公开(公告)号：US07793671B2
公开(公告)日：2010-09-14
申请号：US11646540
申请日：2006-12-28
申请人： Jae-Hyung Jung
发明人： Jae-Hyung Jung
IPC分类号： B08B3/00 , B08B3/02 , B08B3/04
CPC分类号： H01L21/67051 , Y10S134/902
摘要： An apparatus for cleaning substrates includes a substrate support that is configured to support a plurality of substrates horizontally as spaced regularly one above the other, a rotating device for rotating the substrate support and a liquid supply system for dispensing cleaning liquid onto the substrates. The substrate support has a base plate and support rods extending upright on the base plate. The support rods include fixed rods and at least one movable rod. The movable rods is movable between an open position to provide a passage that allows the substrates to be placed between the support rods, and a closed position at which the substrates are held by and between the support rods. Once the substrates are supported in this way, the substrates are rotated. Then, the cleaning liquid, such as a chemical solution(s) followed by a rinsing liquid, is dispensed onto all of the substrates as the substrates are being rotated.
摘要翻译：一种用于清洁基板的设备包括：基板支撑件，其被配置为水平地支撑多个基板，一个彼此间隔规则地间隔开，用于旋转基板支撑件的旋转装置和用于将清洁液体分配到基板上的液体供应系统。基板支撑件具有基板和在基板上直立延伸的支撑杆。支撑杆包括固定杆和至少一个活动杆。可动杆可以在打开位置之间移动，以提供允许基板放置在支撑杆之间的通道，以及基板由支撑杆之间和之间保持的关闭位置。一旦以这种方式支撑基板，则旋转基板。然后，随着基板旋转，诸如化学溶液之后的清洗液体被清洗液分配到所有的基板上。

5. 发明授权

US07398801B2 Apparatus and method for processing wafers 有权
标题翻译：用于处理晶片的装置和方法
公开(公告)号：US07398801B2
公开(公告)日：2008-07-15
申请号：US11292674
申请日：2005-12-02
申请人： Kun-Hyung Lee , Soo-Woong Lee , Hyun-Ho Cho , Hee-Sun Chae , Jae-Hyung Jung , Sun-Yong Lee
发明人： Kun-Hyung Lee , Soo-Woong Lee , Hyun-Ho Cho , Hee-Sun Chae , Jae-Hyung Jung , Sun-Yong Lee
IPC分类号： B65B1/20
CPC分类号： H01L21/67017 , H01L21/67772 , Y10S414/14
摘要： An apparatus and method for manufacturing semiconductor devices are disclosed. In accordance with the invention, a wafer transfer device for transferring wafers from wafer storage containers to wafer processing equipment includes a flow chamber designed to reduce the amount of contaminants that can enter the wafer container. The wafer transfer apparatus provide two gas inlets for allowing two gases to flow through the flow chamber of the transfer apparatus. This results in a reduced amount of contaminants able to enter the wafer container, which in turn results in manufacture of devices with more reliable performance characteristics as well as high manufacturing yield.
摘要翻译：公开了一种用于制造半导体器件的设备和方法。根据本发明，用于将晶片从晶片储存容器转移到晶片加工设备的晶片转移装置包括设计成减少可进入晶片容器的污染物量的流动室。晶片传送装置提供两个气体入口，用于允许两种气体流过传送装置的流动室。这导致能够进入晶片容器的污染物量减少，这进而导致具有更可靠的性能特征以及高制造产量的装置的制造。

6. 发明申请

US20070181164A1 Apparatus for and method of cleaning substrates 有权
标题翻译：清洗基材的设备及方法
公开(公告)号：US20070181164A1
公开(公告)日：2007-08-09
申请号：US11646540
申请日：2006-12-28
申请人： Jae-Hyung Jung
发明人： Jae-Hyung Jung
IPC分类号： C23G1/00 , B08B3/00 , B08B7/00
CPC分类号： H01L21/67051 , Y10S134/902
摘要： An apparatus for cleaning substrates includes a substrate support that is configured to support a plurality of substrates horizontally as spaced regularly one above the other, a rotating device for rotating the substrate support and a liquid supply system for dispensing cleaning liquid onto the substrates. The substrate support has a base plate and support rods extending upright on the base plate. The support rods include fixed rods and at least one movable rod. The movable rods is movable between an open position to provide a passage that allows the substrates to be placed between the support rods, and a closed position at which the substrates are held by and between the support rods. Once the substrates are supported in this way, the substrates are rotated. Then, the cleaning liquid, such as a chemical solution(s) followed by a rinsing liquid, is dispensed onto all of the substrates as the substrates are being rotated.
摘要翻译：一种用于清洁基板的设备包括：基板支撑件，其被配置为水平地支撑多个基板，一个彼此间隔规则地间隔开，用于旋转基板支撑件的旋转装置和用于将清洁液体分配到基板上的液体供应系统。基板支撑件具有基板和在基板上直立延伸的支撑杆。支撑杆包括固定杆和至少一个活动杆。可动杆可以在打开位置之间移动，以提供允许基板放置在支撑杆之间的通道，以及基板由支撑杆之间和之间保持的关闭位置。一旦以这种方式支撑基板，则旋转基板。然后，随着基板旋转，诸如化学溶液之后的清洗液体被清洗液分配到所有的基板上。

7. 发明申请

US20060104750A1 Apparatus and method for processing wafers 有权
标题翻译：用于处理晶片的装置和方法
公开(公告)号：US20060104750A1
公开(公告)日：2006-05-18
申请号：US11292674
申请日：2005-12-02
申请人： Kun-Hyung Lee , Soo-Woong Lee , Hyun-Ho Cho , Hee-Sun Chae , Jae-Hyung Jung , Sun-Yong Lee
发明人： Kun-Hyung Lee , Soo-Woong Lee , Hyun-Ho Cho , Hee-Sun Chae , Jae-Hyung Jung , Sun-Yong Lee
IPC分类号： H01L21/677
CPC分类号： H01L21/67017 , H01L21/67772 , Y10S414/14
摘要： An apparatus and method for manufacturing semiconductor devices are disclosed. In accordance with the invention, a wafer transfer device for transferring wafers from wafer storage containers to wafer processing equipment includes a flow chamber designed to reduce the amount of contaminants that can enter the wafer container. The wafer transfer apparatus provide two gas inlets for allowing two gases to flow through the flow chamber of the transfer apparatus. This results in a reduced amount of contaminants able to enter the wafer container, which in turn results in manufacture of devices with more reliable performance characteristics as well as high manufacturing yield.
摘要翻译：公开了一种用于制造半导体器件的设备和方法。根据本发明，用于将晶片从晶片储存容器转移到晶片加工设备的晶片转移装置包括设计成减少可进入晶片容器的污染物量的流动室。晶片传送装置提供两个气体入口，用于允许两种气体流过传送装置的流动室。这导致能够进入晶片容器的污染物量减少，这进而导致具有更可靠的性能特征以及高制造产量的装置的制造。

8. 发明申请

US20070181148A1 Wafer cleaning apparatus and related method 审中-公开
标题翻译：晶圆清洗装置及相关方法
公开(公告)号：US20070181148A1
公开(公告)日：2007-08-09
申请号：US11642893
申请日：2006-12-21
申请人： Min-Sang Yun , Kwon Son , Jae-Hyung Jung , Hee-Chan Jung , Ki-Ryong Choi , Byung-Joo Park , Kang-Young Kim
发明人： Min-Sang Yun , Kwon Son , Jae-Hyung Jung , Hee-Chan Jung , Ki-Ryong Choi , Byung-Joo Park , Kang-Young Kim
IPC分类号： C23G1/00 , B08B3/00 , B08B7/00
CPC分类号： H01L21/67051 , H01L21/02052
摘要： Embodiments of the invention provide a semiconductor wafer cleaning apparatus and a related method. In one embodiment, the invention provides a semiconductor wafer cleaning apparatus comprising a wafer stage adapted to support a wafer; a first cleaning unit adapted to spray a first cleaning solution onto the wafer to remove particles from the wafer, wherein the first cleaning solution prevents static electricity from being generated on the surface of the wafer; and a second cleaning unit adapted to provide a second cleaning solution onto the wafer and oscillate a quartz rod to remove particles from the wafer, wherein the second cleaning solution makes a surface of the wafer hydrophilic.
摘要翻译：本发明的实施例提供一种半导体晶片清洗装置及相关方法。在一个实施例中，本发明提供一种半导体晶片清洁设备，其包括适于支撑晶片的晶片台; 第一清洁单元，其适于将第一清洁溶液喷射到所述晶片上以从所述晶片去除颗粒，其中所述第一清洁溶液防止在所述晶片的表面上产生静电; 以及第二清洁单元，其适于将第二清洁溶液提供到所述晶片上并振荡石英棒以从所述晶片去除颗粒，其中所述第二清洁溶液使所述晶片的表面具有亲水性。

9. 发明授权

US06430840B1 Method of and apparatus for drying a wafer using isopropyl alcohol 有权
标题翻译：使用异丙醇干燥晶片的方法和设备
公开(公告)号：US06430840B1
公开(公告)日：2002-08-13
申请号：US09801636
申请日：2001-03-09
申请人： Jae-Hyung Jung
发明人： Jae-Hyung Jung
IPC分类号： F26B300
CPC分类号： H01L21/67028 , H01L21/02063 , Y10S134/902
摘要： A method of and an apparatus for drying a wafer using the Marangoni effect quickly forms an isopropyl alcohol layer on a cleaning liquid in which the wafer is submerged. The isopropyl alcohol is first heated and then supplied in a fluid state onto the cleaning liquid. The isopropyl alcohol liquid thus diffuses rapidly to form the isopropyl alcohol layer. The wafer is thoroughly dried by removing it from the cleaning liquid through the isopropyl alcohol while only supplying more of the heated nitrogen gas into the ambient above the cleaning liquid.
摘要翻译：使用Marangoni效应干燥晶片的方法和装置在其中浸没晶片的清洗液上快速形成异丙醇层。首先将异丙醇加热，然后以流体状态供给到清洗液上。异丙醇液体迅速扩散形成异丙醇层。通过异丙醇从清洗液中除去晶片，彻底干燥晶片，同时仅将更多的加热氮气供应到清洁液体上方的环境中。

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