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1. 发明申请

US20170153543A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING METALLIC PATTERN 审中-公开
公开(公告)号：US20170153543A1
公开(公告)日：2017-06-01
申请号：US15361010
申请日：2016-11-24
申请人： JSR CORPORATION
发明人： Hisanori AKIMARU , Kenji OKAMOTO , Hirokazu SAKAKIBARA , Makoto KATSURAYAMA
IPC分类号： G03F7/031 , G03F7/40 , G03F7/20 , G03F7/32 , G03F7/038 , G03F7/16
CPC分类号： G03F7/031 , G03F7/027 , G03F7/033 , G03F7/30 , G03F7/322
摘要： The present invention provides a photosensitive resin composition including: an alkali-soluble resin (A) having more than 30% by mass and less than 70% by mass of a structural unit represented by the Formula (1) below; a compound (B) having at least one ethylenically unsaturated double bond per molecule; and a photo radical polymerization initiator (C) having an oxime ester structure; wherein a content of the photo radical polymerization initiator (C) with respect to 100 parts by mass of the alkali-soluble resin (A) is 3 to 20 parts by mass. In Formula (1), R1 represents a hydrogen atom or a C1-4 alkyl group. R2 represents a single bond or a divalent organic group. R3 each independently represent a hydrogen atom, a hydroxyl group, or an optionally substituted alkyl group.

2. 发明申请

US20210311391A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR MANUFACTURING PLATED FORMED BODY, AND SEMICONDUCTOR DEVICE 有权
公开(公告)号：US20210311391A1
公开(公告)日：2021-10-07
申请号：US17268998
申请日：2019-07-01
申请人： JSR CORPORATION
发明人： Takuhiro TANIGUCHI , Naoki NISHIGUCHI , Tomoyuki MATSUMOTO , Hirokazu SAKAKIBARA , Akito HIRO , Hisanori AKIMARU
IPC分类号： G03F7/039 , G03F7/004 , C08F220/30
摘要： The present photosensitive resin composition includes a polymer (A) having a structural unit (a1) represented by a formula (a1), a structural unit (a2) represented by a formula (a2), and a structural unit (a3) represented by a formula (a3) and a photoacid generator (B). In the formulae (a1) to (a3), R11, R21, and R31 each independently represent a hydrogen atom, a substituted or non-substituted alkyl group having 1 to 10 carbon atom or a halogen atom; R12 and R32 each independently represent a divalent organic group; R22 represents a substituted or non-substituted alkanediyl group having 2 to 10 carbon atoms; R13 represents an acid dissociable group having an alicyclic structure; R23 represents an alkyl group having 1 to 10 carbon atoms; R33 represents a hydroxyaryl group; and 1, m and n each independently represent an integer from 0 to 10.

3. 发明申请

US20150185604A1 PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
标题翻译：光敏树脂组合物及其制造方法
公开(公告)号：US20150185604A1
公开(公告)日：2015-07-02
申请号：US14580902
申请日：2014-12-23
申请人： JSR Corporation
发明人： Hisanori AKIMARU , Hirokazu Sakakibara , Hidefumi Ishikawa , Shingo Naruse
IPC分类号： G03F7/027 , G03F7/30 , G03F7/038
CPC分类号： G03F7/031 , G03F7/027 , G03F7/0388 , G03F7/30
摘要： The present invention provides a photosensitive resin composition comprising: an alkali-soluble resin (A); a compound having at least one ethylenically unsaturated double bond per molecule (B); a photo radical polymerization initiator having a keto oxime ester structure (C); and a compound represented by the Formula (1) or (2) below (D); wherein the content of the photo radical polymerization initiator (C) is 0.5 to 5 times the content of the compound (D), and the content of the photo radical polymerization initiator (C) with respect to 100 parts by mass of the compound (B) is 3 to 20 parts by mass. In Formula (1), the six R1s each independently represent a hydrogen atom or an electron-donating group, and n represents 0 or 1. In Formula (2), the six R2s each independently represent a hydrogen atom or an electron-donating group, and m represents 0 or 1. By use of the photosensitive resin composition of the present invention, formation of a resist pattern having excellent resolution is possible even without using an oxygen inhibition layer. By the method for producing a resist pattern of the present invention, formation of a resist pattern having excellent resolution is possible even without using an oxygen inhibition layer.
摘要翻译：本发明提供一种感光性树脂组合物，其含有：碱溶性树脂（A）每分子具有至少一个烯属不饱和双键的化合物（B）; 具有酮肟酯结构（C）的光自由基聚合引发剂; 和由下式（1）或（2）表示的化合物（D）表示的化合物。其中光自由基聚合引发剂（C）的含量为化合物（D）的含量的0.5〜5倍，光自由基聚合引发剂（C）的含量相对于化合物（B）100质量份）为3〜20质量份。在式（1）中，六个R 1各自独立地表示氢原子或给电子基团，n表示0或1.在式（2）中，六个R 2各自独立地表示氢原子或给电子基团 m表示0或1.通过使用本发明的感光性树脂组合物，即使不使用氧抑制层，也可以形成具有优异的分辨率的抗蚀剂图案。通过本发明的抗蚀剂图案的制造方法，即使不使用氧抑制层，也可以形成具有优异的分辨率的抗蚀剂图案。

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