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1. 发明授权

US11635660B2 Liquid crystal display device and manufacturing method therefor 有权
公开(公告)号：US11635660B2
公开(公告)日：2023-04-25
申请号：US17518576
申请日：2021-11-03
申请人： JSR CORPORATION
发明人： Koichi Miyachi , Yoshihiko Kuroda , Ryuzo Ono , Syunsuke Kawamata
IPC分类号： G02F1/1337 , G02F1/1343
摘要： This liquid crystal display device has a plurality of pixels. Each pixel in the plurality of pixels includes first to fourth alignment regions; these first to fourth alignment regions are arranged in the longitudinal direction of the pixels, and the difference between any two alignment orientations in the first to fourth alignment regions is approximately equal to an integer multiple of 90 degrees. Of the pre-tilt angles defined by a first alignment film and a second alignment film in each of the first to fourth alignment regions, one pre-tilt angle is less than 90 degrees and the other pre-tilt angle is substantially 90 degrees. The optical alignment film is formed using a polymer having an optical alignment group in the side chain, and the content of the optical alignment group in the side chain of the polymer is less than 1.1 mmol/g.

2. 发明授权

US11609495B2 Radiation-sensitive resin composition and resist pattern-forming method 有权
公开(公告)号：US11609495B2
公开(公告)日：2023-03-21
申请号：US17081000
申请日：2020-10-27
申请人： JSR CORPORATION
发明人： Katsuaki Nishikori , Kazuya Kiriyama , Takuhiro Taniguchi , Ken Maruyama
IPC分类号： G03F7/004 , G03F7/039 , C08F220/18 , C07D317/70 , C07C381/12 , C07C309/17 , C07D327/04 , C07C309/12 , C07C65/10 , C07C59/115 , C07C69/63 , C07C65/05
摘要： A radiation-sensitive resin composition includes a polymer including a phenolic hydroxyl group, a compound represented by formula (1-1) or formula (1-2), and a compound represented by formula (2). In the formula (1-1), a sum of a, b, and c is no less than 1; at least one of R1, R2, and R3 represents a fluorine atom or the like; and R4 and R5 each independently represent a hydrogen atom, a fluorine atom, or the like. In the formula (1-2), in a case in which d is 1, R6 represents a fluorine atom or the like, and in a case in which d is no less than 2, at least one of the plurality of R6s represents a fluorine atom or the like; and R8 represents a single bond or a divalent organic group having 1 to 20 carbon atoms.

3. 发明申请

US20230036031A1 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, METHOD FOR PRODUCING PLATED FORMED PRODUCT, AND METHOD FOR PRODUCING TIN-SILVER PLATED-FORMED PRODUCT 有权
公开(公告)号：US20230036031A1
公开(公告)日：2023-02-02
申请号：US17435408
申请日：2020-03-19
申请人： JSR CORPORATION
发明人： Naoki NISHIGUCHI , Tomoyuki MATSUMOTO , Ayako ENDO
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20 , G03F7/40 , G03F7/32
摘要： A photosensitive resin composition contains polymer (A) having an acid dissociative group, photoacid generator (B), and solvent (C), the solvent (C) containing 80 to 95% by mass of propylene glycol monomethyl ether acetate (C1) and 5 to 18% by mass of 3-methoxybutyl acetate (C2), a content ratio of other solvent (C3) in the solvent (C) being 0 to 10% by mass, and a content ratio of the solvent (C) contained in the photosensitive resin composition being less than 60% by mass.

4. 发明申请

US20230002724A1 PRODUCTION METHOD FOR ORGANOID 有权
公开(公告)号：US20230002724A1
公开(公告)日：2023-01-05
申请号：US17783598
申请日：2020-12-15
申请人： JSR Corporation , KEIO UNIVERSITY
发明人： Kentaro SHOJI , Toshiro SATO
IPC分类号： C12N5/07 , C07K14/50 , C07K14/485 , C07K14/47
摘要： A production method for an organoid, the production method including a step of culturing adult stem cells or a cell tissue piece including adult stem cells in a medium containing a chimeric Fibroblast Growth Factor (FGF) that includes a partial region of FGF1 and a partial region of FGF2; an organoid produced by the production method; a medium including a chimeric FGF and having a content of chimeric FGF of 50 ng/mL or less; and an evaluation method for a test substance are provided, and according to the chimeric FGF, a content of growth factors included in a medium can be reduced.

5. 发明授权

US11525067B2 Modification method of substrate surface, and composition and polymer 有权
公开(公告)号：US11525067B2
公开(公告)日：2022-12-13
申请号：US16528151
申请日：2019-07-31
申请人： JSR CORPORATION
发明人： Hiroyuki Komatsu , Miki Tamada , Hitoshi Osaki , Tomoki Nagai
IPC分类号： C09D125/04 , C09D7/40 , C09D7/20
摘要： A modification method of a surface of a substrate includes: applying a composition on a surface of a metal substrate, and heating a coating film formed by the applying, wherein the composition contains: a polymer having a first structural unit that includes an aromatic ring, and a second structural unit that includes an ethylenic double bond; a thermal acid generating agent; and a solvent, wherein the polymer has a functional group capable of bonding to a metal atom in the metal substrate.

6. 发明授权

US11421102B2 Method for manufacturing porous particles, porous particles, carrier, column, and method for separating target substance 有权
公开(公告)号：US11421102B2
公开(公告)日：2022-08-23
申请号：US15778436
申请日：2016-11-24
申请人： JSR CORPORATION , JSR LIFE SCIENCES, LLC , JSR MICRO N.V.
发明人： Kunihiko Kobayashi , Masaaki Kanahara
IPC分类号： C08L29/04 , C08J9/28 , C08J3/16 , G01N30/88 , B01J20/32 , B01J20/28 , B01J20/26 , B01J20/286 , B01D15/38 , C07K16/18 , C08F210/02 , C08F216/06
摘要： To provide a porous particle with which non-specific adsorption is hardly generated although the porous particle is a synthetic polymer-based particle, the mechanical strength is high, and the dynamic binding capacity is high in a case where a ligand is bound to the porous particle; and a method for producing the same. A method for producing a porous particle, including the following steps 1 and 2; (step 1) dissolving at least one or more of polymers selected from the group consisting of a vinyl alcohol polymer and an ethylene-vinyl alcohol copolymer in an aqueous solvent to prepare a polymer solution; and (step 2) dispersing the polymer solution in a non-aqueous solvent to form a W/O emulsion.

7. 发明申请

US20220260908A9 RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD 有权
公开(公告)号：US20220260908A9
公开(公告)日：2022-08-18
申请号：US17458783
申请日：2021-08-27
申请人： JSR CORPORATION
发明人： Tetsurou KANEKO , Hiromitsu NAKASHIMA , Yuushi MATSUMURA , Junya SUZUKI , Shuto MORI , Hiroyuki ISHII
IPC分类号： G03F7/038 , G03F7/20 , G03F7/004 , G03F7/32 , G03F7/38 , G03F7/40
摘要： A radiation-sensitive resin composition includes: a first polymer having a first structural unit which includes a phenolic hydroxyl group, and a second structural unit which includes an acid-labile group and a carboxy group which is protected by the acid-labile group; a second polymer having a third structural unit represented by the following formula (S-1), and a fourth structural unit which is a structural unit other than the third structural unit and is represented by the following formula (S-2); and a radiation-sensitive acid generator, wherein the acid-labile group includes a monocyclic or polycyclic ring structure having no fewer than 3 and no more than 20 ring atoms.

8. 发明申请

US20220229367A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMER, AND COMPOUND 有权
公开(公告)号：US20220229367A1
公开(公告)日：2022-07-21
申请号：US17713278
申请日：2022-04-05
申请人： JSR CORPORATION
发明人： Ryuichi NEMOTO , Satoshi OKAZAKI , Taiichi FURUKAWA
IPC分类号： G03F7/039 , G03F7/004 , G03F7/20 , G03F7/32
摘要： A radiation-sensitive resin composition includes: a first polymer including a structural unit which includes an acid-labile group; a second polymer including a structural unit represented by formula (1); and a radiation-sensitive acid generator. R1 represents a monovalent organic group having 1 to 20 carbon atoms; R2 represents a monovalent organic group having 1 to 20 carbon atoms; X represents a divalent organic group having 1 to 20 carbon atoms; and Y represents a divalent hydrocarbon group having 1 to 20 carbon atoms. The divalent organic group represented by X, the monovalent organic group represented by R2, or both has a fluorine atom.

9. 发明申请

US20220215801A1 METHOD OF COMPENSATING BRIGHTNESS OF DISPLAY AND DISPLAY 有权
公开(公告)号：US20220215801A1
公开(公告)日：2022-07-07
申请号：US17606660
申请日：2020-04-23
申请人： JSR CORPORATION , Mattrix Technologies, Inc
发明人： Hiromitsu KATSUI , Bo LIU , Maxime LEMAITRE
IPC分类号： G09G3/3233
摘要： Provided is a method of compensating brightness of a display using a vertical organic light emitting transistor that suppresses variations in brightness over a long period of time and a display. This method is a method of compensating brightness of a display including a plurality of vertical organic light emitting transistors and a memory that stores characteristic information of the vertical organic light emitting transistor. This method includes a step (A) of applying a voltage for brightness inspection to a gate electrode of the vertical organic light emitting transistor to be corrected, a step (B) of measuring a current flowing through a current supply line through which the current is supplied to a source electrode of the vertical organic light emitting transistor by the application of the voltage for brightness inspection to the gate electrode of the vertical organic light emitting transistor to be corrected, and a step (C) of determining a corrected value of the voltage to be applied to the gate electrode of the vertical organic light emitting transistor based on a value of the current measured in the step (B) and the characteristic information of the vertical organic light emitting transistor stored in the memory.

10. 发明申请

US20220215800A1 METHOD OF DRIVING A LIGHT EMITTING DISPLAY AND DISPLAY 有权
公开(公告)号：US20220215800A1
公开(公告)日：2022-07-07
申请号：US17606651
申请日：2020-04-23
申请人： JSR CORPORATION , Mattrix Technologies, Inc
发明人： Hiromitsu KATSUI , Bo LIU , Maxime LEMAITRE
IPC分类号： G09G3/3233
摘要： Provided is a method of driving a light emitting a display in which variations in image quality and brightness are suppressed despite long-term use, without adding a complicated circuit configuration. The driving a light emitting method includes a step (A) of applying a voltage based on image data to be displayed to a gate electrode of a vertical organic light emitting transistor and a step (B) of, after the step (A), applying a voltage, having a polarity opposite to that of the voltage applied to the gate electrode of the vertical organic light emitting transistor in the step (A), to the gate electrode of the vertical organic light emitting transistor based on a value of a voltage being applied to a source electrode of the vertical organic light emitting transistor.

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