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1. 发明申请

US20090078198A1 CHAMBER COMPONENTS WITH INCREASED PYROMETRY VISIBILITY 有权
标题翻译：具有增加色素可见性的CHAMBER组件
公开(公告)号：US20090078198A1
公开(公告)日：2009-03-26
申请号：US11859080
申请日：2007-09-21
申请人： JOSEPH YUDOVSKY , Brendan McDougall , Ravi Jallepally , Yi-Chiau Huang , Maitreyee Mahajani , Kevin Griffin , Andrew C. Sherman
发明人： JOSEPH YUDOVSKY , Brendan McDougall , Ravi Jallepally , Yi-Chiau Huang , Maitreyee Mahajani , Kevin Griffin , Andrew C. Sherman
IPC分类号： B05C21/00 , H01L21/66
CPC分类号： H01L21/67248
摘要： The present invention generally provides method and apparatus for non-contact temperature measurement in a semiconductor processing chamber. Particularly, the present invention provides methods and apparatus for non-contact temperature measurement for temperature below 500° C. One embodiment of the present invention provides an apparatus for processing semiconductor substrates. The apparatus comprises a target component comprises a material with higher emissivity than the one or more substrates.
摘要翻译：本发明通常提供了半导体处理室中非接触式温度测量的方法和装置。特别地，本发明提供了在低于500℃的温度下进行非接触式温度测量的方法和装置。本发明的一个实施例提供了一种半导体衬底的处理装置。该装置包括目标部件，其包括比一个或多个基板更高的发射率的材料。

2. 发明申请

US20120210937A1 SUBSTRATE PROCESSING APPARATUS USING A BATCH PROCESSING CHAMBER 审中-公开
标题翻译：使用批处理室的基板处理装置
公开(公告)号：US20120210937A1
公开(公告)日：2012-08-23
申请号：US13458520
申请日：2012-04-27
申请人： RANDHIR THAKUR , STEVE G. GHANAYEM , JOSEPH YUDOVSKY , AARON WEBB , ADAM ALEXANDER BRAILOVE , NIR MERRY , VINAY K. SHAH , ANDREAS G. HEGEDUS
发明人： RANDHIR THAKUR , STEVE G. GHANAYEM , JOSEPH YUDOVSKY , AARON WEBB , ADAM ALEXANDER BRAILOVE , NIR MERRY , VINAY K. SHAH , ANDREAS G. HEGEDUS
IPC分类号： C23C16/46 , C23C16/50 , F28F3/12 , C23C16/44
CPC分类号： H01L21/67109 , C23C16/4412 , C23C16/45546 , C23C16/45593 , C23C16/4584 , C23C16/481 , C23C16/54 , H01L21/67017 , H01L21/67115 , H01L21/67167 , H01L21/6719 , H01L21/67207 , H01L21/67745 , H01L21/67757 , H01L21/67781
摘要： Aspects of the invention include a method and apparatus for processing a substrate using a multi-chamber processing system (e.g., a cluster tool) adapted to process substrates in one or more batch and/or single substrate processing chambers to increase the system throughput.
摘要翻译：本发明的方面包括使用适于在一个或多个批次和/或单个基板处理室中处理基板以增加系统吞吐量的多室处理系统（例如，集群工具）来处理基板的方法和装置。

3. 发明申请

US20100117309A1 SEALING APPARATUS FOR A PROCESS CHAMBER 审中-公开
标题翻译：密封装置用于过程室
公开(公告)号：US20100117309A1
公开(公告)日：2010-05-13
申请号：US12270559
申请日：2008-11-13
申请人： JOSEPH YUDOVSKY
发明人： JOSEPH YUDOVSKY
IPC分类号： F16J15/10
CPC分类号： F16J15/02 , F16J15/025 , F16J15/106 , H01L21/67109 , H01L21/67126
摘要： A sealing apparatus is provided herein. In some embodiments, the sealing apparatus includes an annular body including a first portion having a circular cross-section and a second portion extending radially outward from the first portion, wherein the second portion has a rectangular cross-section. In some embodiments, a sealing apparatus includes a body configured to be retained in a recess of a first surface; an arm extending from the body away from the first surface and configured to provide a force when deflected towards the body by a second surface to form a seal between the first surface and the second surface.
摘要翻译：本文提供一种密封装置。在一些实施例中，密封装置包括环形体，其包括具有圆形横截面的第一部分和从第一部分径向向外延伸的第二部分，其中第二部分具有矩形横截面。在一些实施例中，密封装置包括构造成保持在第一表面的凹部中的主体; 臂从所述主体远离所述第一表面延伸并且构造成当通过第二表面偏转到所述主体时提供力，以在所述第一表面和所述第二表面之间形成密封。

4. 发明申请

US20100021273A1 CONCRETE VACUUM CHAMBER 审中-公开
标题翻译：混凝土真空室
公开(公告)号：US20100021273A1
公开(公告)日：2010-01-28
申请号：US12506575
申请日：2009-07-21
申请人： ALEXANDER S. POLYAK , TOM K. CHO , JOSEPH YUDOVSKY , ANTHONY VESCI
发明人： ALEXANDER S. POLYAK , TOM K. CHO , JOSEPH YUDOVSKY , ANTHONY VESCI
IPC分类号： H01L21/677 , B29C45/14
CPC分类号： C23C14/56 , C23C16/44 , H01J37/32467 , H01L21/67236 , H01L21/67772
摘要： The present invention embodies processing systems and vacuum chambers equipped to process substrates for flat panel displays, solar cells, or other electronic devices. The processing system and/or the vacuum chambers as well as their components and supporting structure are constructed of less costly materials and in a more energy efficient manner than that of current large area substrate processing systems. In one embodiment, the processing system chamber bodies and their supporting structures are constructed of reinforced concrete. In one embodiment, system processing chambers include a vacuum tight lining disposed inside reinforced concrete chamber bodies.
摘要翻译：本发明体现了用于处理平板显示器，太阳能电池或其他电子设备的基板的处理系统和真空室。处理系统和/或真空室以及它们的部件和支撑结构由比当前的大面积基板处理系统的成本较低的材料和更节能的方式构成。在一个实施例中，处理系统室主体及其支撑结构由钢筋混凝土构成。在一个实施例中，系统处理室包括设置在钢筋混凝土室体内的真空密封衬里。

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