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1. 发明授权

US07959776B2 Cooled backing plate for a sputtering target, and sputtering target comprising a plurality of backing plates 有权
标题翻译：用于溅射靶的冷却背板，以及包括多个背板的溅射靶
公开(公告)号：US07959776B2
公开(公告)日：2011-06-14
申请号：US12323287
申请日：2008-11-25
申请人： Jörg Krempel-Hesse , Andreas Jischke , Uwe Schüβler , Hans Wolf
发明人： Jörg Krempel-Hesse , Andreas Jischke , Uwe Schüβler , Hans Wolf
IPC分类号： C23C14/34
CPC分类号： C23C14/3407
摘要： Claimed is a sputtering target system comprising a plurality of backing plates to be individually cooled. Each backing plate is provided on its back side with a meandering groove that is closed off by a sealing plate. The sealing plate is welded around its circumference to the backing plate and at the same time is welded to at least one ridge located at a distance from the frame, which separates two grooved sections from one another. The sealing plate thus welded to the backing plate not only closes off the grooves to form a cooling channel, but also is used for reinforcement of the otherwise relatively flat backing plate.
摘要翻译：所要求的是一种溅射靶系统，其包括要单独冷却的多个背板。每个背板在其背侧设置有由密封板封闭的曲折槽。密封板围绕其圆周焊接到背板上，并且同时被焊接到位于与框架相距一定距离的至少一个脊部，其将两个凹槽部分彼此分开。这样焊接到背板上的密封板不仅封闭了凹槽以形成冷却通道，而且还用于加固相对平坦的背板。

2. 发明授权

US08715471B2 Magnetron sputter cathode 有权
标题翻译：磁控溅射阴极
公开(公告)号：US08715471B2
公开(公告)日：2014-05-06
申请号：US11284439
申请日：2005-11-21
申请人： Jörg Krempel-Hesse , Andreas Jischke , Uwe Schüssler , Hans Wolf
发明人： Jörg Krempel-Hesse , Andreas Jischke , Uwe Schüssler , Hans Wolf
IPC分类号： C23C14/35
CPC分类号： H01J37/3497 , C23C14/3407 , H01J37/3408
摘要： To be able to realize a relatively wide magnetron sputter cathode, it is proposed that on the vacuum side of a carrier (2) is disposed the sputter target (4) with a backing plate (3), which maintains a gap (14) from the carrier (2). The backing plate (3) is developed as a cooling plate. In it are located cooling means channels (15), which, via an inlet (16) through the carrier (2), are supplied with cooling fluid, which can flow out again via an outlet (17) through the carrier (2). On the atmospheric side is located a magnet configuration (5).
摘要翻译：为了能够实现相对宽的磁控溅射阴极，提出在载体（2）的真空侧上设置带有背板（3）的溅射靶（4），其将间隙（14）从载体（2）。背板（3）显影为冷却板。在其中设置有冷却装置通道（15），其通过载体（2）的入口（16）被供应冷却流体，冷却流体可以经由出口（17）再次通过载体（2）流出。在大气一侧设有磁铁配置（5）。

3. 发明授权

US07972486B2 Machine for coating a substrate, and module 有权
标题翻译：用于涂覆基材的机器和模块
公开(公告)号：US07972486B2
公开(公告)日：2011-07-05
申请号：US11279047
申请日：2006-04-07
申请人： Hans Buchberger , Andreas Geiss , Jörg Krempel-Hesse , Dieter Haas
发明人： Hans Buchberger , Andreas Geiss , Jörg Krempel-Hesse , Dieter Haas
IPC分类号： C23C14/34
CPC分类号： C23C14/56 , H01J37/32431 , H01J37/32458
摘要： A machine for coating a transparent substrate for the production of display screens comprises a coating chamber that has a modular design. Each of the modules 1 features a chamber section 2, a first support 3 that is arranged removably in or at the chamber section 2, and a second support 4 that is arranged removably at the first support 3. Whereas the first support 3 bears the cathodes, the second support 4 is formed as a cover at which are arranged the pumps for producing a vacuum in the coating chamber. Carriers 3 and 4 can be removed laterally from the chamber section 2 to such an extent that areas 11a, 11b accessible to persons can be formed between the module components. In this way, the components of the machine are readily accessible, for example for maintenance purposes. Work can be done simultaneously on the cathodes and in the chamber interior.
摘要翻译：用于涂覆用于生产显示屏的透明基板的机器包括具有模块化设计的涂布室。每个模块1具有腔室部分2，可移除地布置在腔室部分2中或在腔室部分2中的第一支撑件3，以及可移除地布置在第一支撑件3处的第二支撑件4.而第一支撑件3承载阴极，第二支撑件4形成为盖，在该盖处布置有用于在涂覆室中产生真空的泵。载体3和4可以从腔室部分2侧向移除到可以在模块部件之间形成人员可接近的区域11a，11b。以这种方式，机器的组件容易接近，例如用于维护目的。可以在阴极和室内同时进行工作。

4. 发明授权

US06183612B2 Sputtering cathode 有权
标题翻译：溅射阴极
公开(公告)号：US06183612B2
公开(公告)日：2001-02-06
申请号：US09179398
申请日：1998-10-27
申请人： Rolf Adam , Jörg Krempel-Hesse , Martin Bähr
发明人： Rolf Adam , Jörg Krempel-Hesse , Martin Bähr
IPC分类号： C23C1434
CPC分类号： C23C14/35 , H01J37/3408
摘要： A sputtering cathode with a flat plate-shaped target (8) and a tub-shaped yoke (3) arranged behind the target (8), with center ridge (5) and with magnets (7,7′) for generating an enclosed tunnel of arc-shaped curved field lines (15,15′) in front of the target surface, as well as with three sheet metal cutouts (9,10,11) or groups of partial cutouts inserted into the plane between the target (8) and the end faces (12) of the tub rim of the yoke (3) facing the target (8), all the sheet metal cutouts (9,10,11) together form two gaps (a,b) extending roughly parallel to the end faces (12,13), wherein the magnets (7,7′) are each incorporated or inserted into the yoke bottom and the side surfaces of the magnets (7,7′) facing towards and away from the target (8) run flush with the yoke bottom.
摘要翻译：具有平板状目标（8）的溅射阴极和布置在目标（8）后面的具有中心脊（5）和用于产生封闭隧道的磁体（7,7'）的桶形磁轭（3）在目标表面前面的弧形弯曲场线（15,15'），以及插入到目标（8）之间的平面中的三个金属板切口（9,10,11）或部分切口组，和轭（3）的桶边缘的面（12）相对于靶（8），所有的金属板切口（9,10,11）一起形成两个间隙（a，b）端面（12,13），其中磁体（7,7'）各自被结合或插入到磁轭底部中，并且磁体（7,7'）的朝向和远离目标（8）的侧表面运行与轭底齐平。

5. 发明授权

US06207028B1 Sputtering device with a cathode with permanent magnet system 有权
标题翻译：具有永磁体系统阴极的溅射装置
公开(公告)号：US06207028B1
公开(公告)日：2001-03-27
申请号：US09371605
申请日：1999-08-10
申请人： Dieter Haas , Wolfgang Buschbeck , Jörg Krempel-Hesse
发明人： Dieter Haas , Wolfgang Buschbeck , Jörg Krempel-Hesse
IPC分类号： C23C1400
CPC分类号： H01J37/3423 , H01J37/3402
摘要： In a sputtering device with magnetic amplification, a magnetic field is generated by means of a permanent magnet system, whose lines of force run above and penetrate the sputtering surface, whereby the permanent magnet system is formed of two dosed, coaxial circular or oval rows (7, 8) of individual magnets (5, 5′ . . . , 6, 6′ . . . ) that are connected via a yoke (15), whereby the surface of the target (3) that faces away from the rows of permanent magnets (7, 8) is formed of two partial surfaces (3a, 3b) that form an angle to each other and whereby the edge (3c) that is formed by the two partial surfaces (3a, 3b) runs parallel to the two rows (7, 8) of permanent magnets (5, 5′ . . , 6, 6′ . . . ) and whereby an insert (14) made of ferromagnetic material is inserted between the magnetic yoke (15) and the surface of the target (3) that faces the magnetic yoke (15).
摘要翻译：在具有磁放大的溅射装置中，通过永磁体系统产生磁场，永磁体系线的力线在其上方并穿过溅射表面，由此永磁体系统由两个定量的，同轴的圆形或椭圆形的行（通过轭架（15）连接的单个磁体（5,5'，...，6，6'），从而使目标（3）的远离行永磁体（7,8）由两个彼此成角度的部分表面（3a，3b）形成，由此由两个部分表面（3a，3b）形成的边缘（3c）平行于两个永磁体（5,5'，...，6“）的排（7,8），并且由铁磁材料制成的插入件（14）插入在磁轭（15）和目标（3）面向磁轭（15）。

6. 发明授权

US06187160B1 Apparatus for the coating of substrates in a vacuum chamber 有权
标题翻译：用于在真空室中涂覆基底的装置
公开(公告)号：US06187160B1
公开(公告)日：2001-02-13
申请号：US09334499
申请日：1999-06-17
申请人： Alfred Rick , Helmut Eberhardt , Klaus Michael , Jörg Krempel-Hesse
发明人： Alfred Rick , Helmut Eberhardt , Klaus Michael , Jörg Krempel-Hesse
IPC分类号： C23C1400
CPC分类号： H01J37/3455 , H01J37/3405
摘要： An apparatus is disclosed for the coating of substrates (10) with thin films, having a vacuum chamber (1), a target (6) to be atomized, situated opposite the substrate (10) in the vacuum chamber (1), with magnets (19, 19′, 19″; 20, 20′, 20″) to produce a magnetic tunnel in front of the area of the target (6) to be atomized, an inlet (8) for a process gas into the process space (11), an anode (12), which is electrically insulated with respect to the vacuum chamber (1), and a current-voltage supply to produce a plasma in front of the target (6). The target (6) is shaped as a rotation-symmetrical body, which provides a ring-shaped enclosure around the substrate (10), wherein the magnets (19,19′, . . . ; 20,20′, . . . ) are supported on the side of the hollow cylindrical target (6), facing away from the substrate (10), and can move around the rotational axis (R) of the target (6). The substrate (10) is electrically insulated, with respect to the vacuum chamber (1), and a part of an insulator (13), configuring the anode (12), is supported on the bottom of the process space (1).
摘要翻译：公开了一种用薄膜涂覆衬底（10）的装置，其具有真空室（1），要被雾化的靶（6），与真空室（1）中的衬底（10）相对，具有磁体（19,19'，19“; 20,20'，20”），以在所述目标（6）的要被雾化的区域的前方产生磁通道，用于将工艺气体引入处理空间（11），相对于真空室（1）电绝缘的阳极（12）和用于在靶（6）前方产生等离子体的电流 - 电压供应。目标（6）成形为旋转对称的主体，其在基底（10）周围提供环形外壳，其中磁体（19,19'，... 20,20'，...）被支撑在中空圆柱形目标（6）的背离基板（10）的一侧上，并且可以围绕目标（6）的旋转轴线（R）移动。基板（10）相对于真空室（1）电绝缘，并且构成阳极（12）的绝缘体（13）的一部分被支撑在处理空间（1）的底部。

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