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    • 1. 发明授权
    • Machine for coating a substrate, and module
    • 用于涂覆基材的机器和模块
    • US07972486B2
    • 2011-07-05
    • US11279047
    • 2006-04-07
    • Hans BuchbergerAndreas GeissJörg Krempel-HesseDieter Haas
    • Hans BuchbergerAndreas GeissJörg Krempel-HesseDieter Haas
    • C23C14/34
    • C23C14/56H01J37/32431H01J37/32458
    • A machine for coating a transparent substrate for the production of display screens comprises a coating chamber that has a modular design. Each of the modules 1 features a chamber section 2, a first support 3 that is arranged removably in or at the chamber section 2, and a second support 4 that is arranged removably at the first support 3. Whereas the first support 3 bears the cathodes, the second support 4 is formed as a cover at which are arranged the pumps for producing a vacuum in the coating chamber. Carriers 3 and 4 can be removed laterally from the chamber section 2 to such an extent that areas 11a, 11b accessible to persons can be formed between the module components. In this way, the components of the machine are readily accessible, for example for maintenance purposes. Work can be done simultaneously on the cathodes and in the chamber interior.
    • 用于涂覆用于生产显示屏的透明基板的机器包括具有模块化设计的涂布室。 每个模块1具有腔室部分2,可移除地布置在腔室部分2中或在腔室部分2中的第一支撑件3,以及可移除地布置在第一支撑件3处的第二支撑件4.而第一支撑件3承载阴极 ,第二支撑件4形成为盖,在该盖处布置有用于在涂覆室中产生真空的泵。 载体3和4可以从腔室部分2侧向移除到可以在模块部件之间形成人员可接近的区域11a,11b。 以这种方式,机器的组件容易接近,例如用于维护目的。 可以在阴极和室内同时进行工作。
    • 2. 发明授权
    • Sputtering device with a cathode with permanent magnet system
    • 具有永磁体系统阴极的溅射装置
    • US06207028B1
    • 2001-03-27
    • US09371605
    • 1999-08-10
    • Dieter HaasWolfgang BuschbeckJörg Krempel-Hesse
    • Dieter HaasWolfgang BuschbeckJörg Krempel-Hesse
    • C23C1400
    • H01J37/3423H01J37/3402
    • In a sputtering device with magnetic amplification, a magnetic field is generated by means of a permanent magnet system, whose lines of force run above and penetrate the sputtering surface, whereby the permanent magnet system is formed of two dosed, coaxial circular or oval rows (7, 8) of individual magnets (5, 5′ . . . , 6, 6′ . . . ) that are connected via a yoke (15), whereby the surface of the target (3) that faces away from the rows of permanent magnets (7, 8) is formed of two partial surfaces (3a, 3b) that form an angle to each other and whereby the edge (3c) that is formed by the two partial surfaces (3a, 3b) runs parallel to the two rows (7, 8) of permanent magnets (5, 5′ . . , 6, 6′ . . . ) and whereby an insert (14) made of ferromagnetic material is inserted between the magnetic yoke (15) and the surface of the target (3) that faces the magnetic yoke (15).
    • 在具有磁放大的溅射装置中,通过永磁体系统产生磁场,永磁体系线的力线在其上方并穿过溅射表面,由此永磁体系统由两个定量的,同轴的圆形或椭圆形的行( 通过轭架(15)连接的单个磁体(5,5',...,6,6'),从而使目标(3)的远离行 永磁体(7,8)由两个彼此成角度的部分表面(3a,3b)形成,由此由两个部分表面(3a,3b)形成的边缘(3c)平行于两个 永磁体(5,5',...,6“)的排(7,8),并且由铁磁材料制成的插入件(14)插入在磁轭(15)和 目标(3)面向磁轭(15)。
    • 5. 发明授权
    • Hot wire chemical vapor deposition (CVD) inline coating tool
    • 热线化学气相沉积(CVD)在线涂层工具
    • US08117987B2
    • 2012-02-21
    • US12873299
    • 2010-08-31
    • Dieter HaasPravin K. NarwankarRandhir P. S. Thakur
    • Dieter HaasPravin K. NarwankarRandhir P. S. Thakur
    • A61D3/00
    • C23C16/24C23C16/54H01L21/02532H01L21/0262
    • Methods and apparatus for hot wire chemical vapor deposition (HWCVD) are provided herein. In some embodiments, an inline HWCVD tool may include a linear conveyor for moving a substrate through the linear process tool; and a multiplicity of HWCVD sources, the multiplicity of HWCVD sources being positioned parallel to and spaced apart from the linear conveyor and configured to deposit material on the surface of the substrate as the substrate moves along the linear conveyor; wherein the substrate is coated by the multiplicity of HWCVD sources without breaking vacuum. In some embodiments, methods of coating substrates may include depositing a first material from an HWCVD source on a substrate moving through a first deposition chamber; moving the substrate from the first deposition chamber to a second deposition chamber; and depositing a second material from a second HWCVD source on the substrate moving through the second deposition chamber.
    • 本文提供了热线化学气相沉积(HWCVD)的方法和装置。 在一些实施例中,在线HWCVD工具可以包括用于通过线性处理工具移动衬底的线性输送机; 和多个HWCVD源,多个HWCVD源被定位成与线性传送器平行并与其间隔开,并且被配置为当衬底沿着线性传送器移动时将材料沉积在衬底的表面上; 其中所述基底被多个HWCVD源涂覆而不破坏真空。 在一些实施例中,涂覆基底的方法可以包括在移动通过第一沉积室的基底上沉积来自HWCVD源的第一材料; 将衬底从第一沉积室移动到第二沉积室; 以及将第二材料从第二HWCVD源沉积在移动通过第二沉积室的衬底上。