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    • 6. 发明授权
    • Method and catalyst for catalytically oxidizing a low concentration of
H.sub.2 S in a gas to give sulphur
    • 用于催化氧化气体中低浓度H 2 S以产生硫的方法和催化剂
    • US6083471A
    • 2000-07-04
    • US875703
    • 1997-11-19
    • Andre PhilippeSabine Savin-PoncetJean NougayredeMarc LedouxCuong Pham HuuClaude Crouzet
    • Andre PhilippeSabine Savin-PoncetJean NougayredeMarc LedouxCuong Pham HuuClaude Crouzet
    • B01D53/52B01D53/86B01J27/224B01J32/00B01J37/20C01B17/04
    • B01D53/8612B01J27/224B01J37/20C01B17/0465Y10S502/517
    • A process for catalytically oxidizing the H.sub.2 S present at low concentration in a gas to sulphur wherein the gas together with a gas containing free oxygen in a quantity to provide and O.sub.2 to H.sub.2 S mole ratio ranging from 0.05 to 10 are contacted with a catalyst for selectively oxidizing H.sub.2 S to sulphur, the catalyst comprising a support based on silicon carbide associated with a catalytic active phase containing at least one transition metal such as Fe, Ni, Cr, Co, Cu, Ag, Mn, Mo, Ti, W or V, in a form of a metal compound and/or in the elemental state. Prior to treating the gas, the oxidation catalyst is subjected to an activation treatment which loads the active phase of the catalyst to provide maximum sulphurization of the metal of the catalyst. In an alternate embodiment, the oxidation of the H.sub.2 S is performed below the dew point of the sulphur. In another embodiment, the oxidation is performed at a temperature above the dew point of sulphur and in particular between 200.degree. C. and 500.degree. C. Also disclosed is a catalyst for selectively oxidizing H.sub.2 S to sulphur which comprises a catalytically active phase based on at least one transition metal such as indicated above in combination with a silicon carbide support.
    • PCT No.PCT / FR95 / 01524 Sec。 371日期:1997年11月19日 102(e)日期1997年11月19日PCT 1995年11月20日PCT PCT。 公开号WO97 / 19019 日期1997年5月29日一种催化氧化气体中硫浓度低的H 2 S的方法,其中气体与含有游离氧气的气体一起提供,O 2与H 2 S摩尔比为0.05至10,与 用于选择性地将H 2 S氧化成硫的催化剂,所述催化剂包括与包含至少一种过渡金属如Fe,Ni,Cr,Co,Cu,Ag,Mn,Mo,Ti,W的催化活性相相关的碳化硅的载体 或V,以金属化合物的形式和/或元素状态。 在处理气体之前,将氧化催化剂进行活化处理,负载催化剂的活性相以提供催化剂金属的最大硫化。 在另一个实施方案中,H2S的氧化在硫的露点之下进行。 在另一个实施方案中,氧化在高于硫的露点,特别是在200℃和500℃之间的温度下进行。还公开了一种用于选择性地将H 2 S氧化成硫的催化剂,其包含基于 至少一种过渡金属,如上所述与碳化硅载体组合。
    • 9. 发明授权
    • Method and catalyst for direct sulphur oxidation of H2S contained in a gas
    • 用于气体中所含的H2S的直接硫氧化的方法和催化剂
    • US06235259B1
    • 2001-05-22
    • US09383153
    • 1999-08-25
    • Marc LedouxNougayrede JeanSavin-Poncet SabinePham Huu CuongKeller NicolasCrouzet Claude
    • Marc LedouxNougayrede JeanSavin-Poncet SabinePham Huu CuongKeller NicolasCrouzet Claude
    • B01D5352
    • C01B17/0465B01D53/8615B01J27/04B01J27/30B01J38/04C01B17/0469Y02P20/584
    • A regenerative process for oxidizing H2S contained in low concentration in a gas directly to sulphur including combining the H2S-containing gas with a gas containing free oxygen in an amount to form an O2/H2S-containing gas with an O2/H2S molar ratio ranging from 0.05 to 15; contacting the O2/H2S-containing gas with a catalyst for the selective oxidation of H2S to sulphur, wherein the catalyst includes a catalytically active phase containing at least one oxysulphide of at least one metal selected from the group consisting of nickel, iron, cobalt, copper, chromium, molybdenum and tungsten combined with a silicon carbide support and including a compound of at least one transition metal, at temperatures below the dew point of the sulphur formed by oxidation of H2S and depositing the sulphur on the catalyst; periodically regenerating by flushing the sulphur-laden catalyst using a non-oxidizing gas at temperatures of between 200° C. and 500° C. to vaporize sulphur retained on the catalyst; and cooling the regenerated catalyst below the dew point of the sulphur to a temperature for H2S oxidation to be carried out again, such cooling being carried out by a gas having a temperature less than 180° C.
    • 将气体中低浓度的H 2 S直接氧化为硫的再生方法,包括将含H 2 S的气体与含有游离氧气的气体组合,形成含有O 2 / H 2 S的气体,其中O 2 / H 2 S摩尔比范围为 0.05〜15; 使含有O 2 / H 2 S的气体与用于选择性氧化H 2 S至硫的催化剂接触,其中所述催化剂包括催化活性相,其含有至少一种选自镍,铁,钴, 铜,铬,钼和钨与碳化硅载体组合并且包括至少一种过渡金属的化合物,在低于通过硫化H 2 S形成的硫的露点的温度和在催化剂上沉积硫; 通过在200℃和500℃之间的温度下使用非氧化气体冲洗载有硫的催化剂来周期性地再生以蒸发保留在催化剂上的硫; 并将再生催化剂冷却至低于硫的露点以再次进行H 2 S氧化的温度,这样的冷却是通过温度低于180℃的气体进行的。