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1. 发明授权

US08227267B2 Template inspection method and manufacturing method for semiconductor device 有权
标题翻译：半导体器件的模板检查方法和制造方法
公开(公告)号：US08227267B2
公开(公告)日：2012-07-24
申请号：US12553906
申请日：2009-09-03
申请人： Ikuo Yoneda , Tetsuro Nakasugi , Masamitsu Itoh , Ryoichi Inanami
发明人： Ikuo Yoneda , Tetsuro Nakasugi , Masamitsu Itoh , Ryoichi Inanami
IPC分类号： H01L21/66
CPC分类号： G01N21/956 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A template inspection method for performing defect inspection of a template, by bringing a pattern formation surface of a template used to form a pattern close to a first fluid coated on a flat substrate, filling the first fluid into a pattern of the template, and by performing optical observation of the template in a state that the first fluid is sandwiched between the template and the substrate, wherein a difference between an optical constant of the first fluid and an optical constant of the template is larger than a difference between an optical constant of air and the optical constant of the template.
摘要翻译：一种用于对模板进行缺陷检查的模板检查方法，通过将用于形成图案的模板的图案形成表面靠近涂覆在平坦基板上的第一流体，将第一流体填充到模板的图案中，以及通过在第一流体夹在模板和基板之间的状态下进行模板的光学观察，其中第一流体的光学常数与模板的光学常数之间的差异大于模板的光学常数之间的差异空气和模板的光学常数。

2. 发明申请

US20100075443A1 TEMPLATE INSPECTION METHOD AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE 有权
标题翻译：用于半导体器件的模板检测方法和制造方法
公开(公告)号：US20100075443A1
公开(公告)日：2010-03-25
申请号：US12553906
申请日：2009-09-03
申请人： Ikuo YONEDA , Tetsuro Nakasugi , Masamitsu Itoh , Ryoichi Inanami
发明人： Ikuo YONEDA , Tetsuro Nakasugi , Masamitsu Itoh , Ryoichi Inanami
IPC分类号： H01L21/66 , G06K9/00
CPC分类号： G01N21/956 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A template inspection method for performing defect inspection of a template, by bringing a pattern formation surface of a template used to form a pattern close to a first fluid coated on a flat substrate, filling the first fluid into a pattern of the template, and by performing optical observation of the template in a state that the first fluid is sandwiched between the template and the substrate, wherein a difference between an optical constant of the first fluid and an optical constant of the template is larger than a difference between an optical constant of air and the optical constant of the template.
摘要翻译：一种用于对模板进行缺陷检查的模板检查方法，通过将用于形成图案的模板的图案形成表面靠近涂覆在平坦基板上的第一流体，将第一流体填充到模板的图案中，以及通过在第一流体夹在模板和基板之间的状态下进行模板的光学观察，其中第一流体的光学常数与模板的光学常数之间的差异大于模板的光学常数之间的差异空气和模板的光学常数。

3. 发明申请

US20100264113A1 TEMPLATE, METHOD OF MANUFACTURING THE SAME, AND METHOD OF FORMING PATTERN 审中-公开
标题翻译：模板，其制造方法和形成图案的方法
公开(公告)号：US20100264113A1
公开(公告)日：2010-10-21
申请号：US12724819
申请日：2010-03-16
申请人： Ikuo YONEDA , Takuya Kono , Tetsuro Nakasugi , Ryoichi Inanami
发明人： Ikuo YONEDA , Takuya Kono , Tetsuro Nakasugi , Ryoichi Inanami
IPC分类号： B44C1/22 , B29C35/08 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： There is provided a template in which a gap region of a substrate to be processed can be covered with an imprint resist, a method of manufacturing the same, and a method of forming a pattern.A template used in an optical imprint method includes a substrate, a pattern forming region that is provided on the substrate and includes an imprint pattern, a first step portion that is provided outside the pattern forming region and is disposed below the pattern forming region, a first side portion that connects the pattern forming region and the first step portion, a second step portion that is provided outside the first step portion and is disposed below the first step portion, and a second side portion that connects the first step portion and the second step portion and has a surface roughness more than that of the first side portion.
摘要翻译：提供了一种模板，其中待加工的基板的间隙区域可以用抗蚀刻剂覆盖，其制造方法和形成图案的方法。在光学印记法中使用的模板包括基板，设置在基板上的图案形成区域，并且包括印模图案，设置在图案形成区域的外侧并设置在图案形成区域下方的第一台阶部，连接图案形成区域和第一台阶部的第一侧面部分，设置在第一台阶部分的外侧并设置在第一台阶部下方的第二台阶部，以及将第一台阶部和第二台阶部并且具有比第一侧部的表面粗糙度更多的表面粗糙度。

4. 发明申请

US20130077066A1 PATTERN FORMING APPARATUS 审中-公开
标题翻译：图案形成装置
公开(公告)号：US20130077066A1
公开(公告)日：2013-03-28
申请号：US13428519
申请日：2012-03-23
申请人： Ryoichi INANAMI , Tetsuro Nakasugi
发明人： Ryoichi INANAMI , Tetsuro Nakasugi
IPC分类号： G03B27/74
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： According to one embodiment, a pattern forming apparatus includes a stage provided under a lower surface of a substrate, a probe provided above an upper surface of the substrate, a drive unit which drives at least one of the stage and the probe, a monitor/lithography unit connected to the probe, and a control unit which controls the drive unit and the monitor/lithography unit. The control unit is configured to change a relative position between the probe and the substrate, and form a first pattern in an area direct above a second pattern after detecting the first pattern in the substrate by the probe.
摘要翻译：根据一个实施例，图案形成装置包括设置在基板的下表面下方的台，设置在基板的上表面上方的探针，驱动台和探针中的至少一个的驱动单元，监视器/ 连接到探针的光刻单元，以及控制驱动单元和监视器/光刻单元的控制单元。控制单元被配置为改变探针和衬底之间的相对位置，并且在通过探针检测到衬底中的第一图案之后，在直接在第二图案之上的区域中形成第一图案。

5. 发明申请

US20130222782A1 SUBSTRATE HOLDING APPARATUS, PATTERN TRANSFER APPARATUS, AND PATTERN TRANSFER METHOD 有权
标题翻译：基板保持装置，图案转印装置和图案转印方法
公开(公告)号：US20130222782A1
公开(公告)日：2013-08-29
申请号：US13600123
申请日：2012-08-30
申请人： Kentaro KASA , Manabu Takakuwa , Ryoichi Inanami , Kazuto Matsuki , Tetsuro Nakasugi , Hiroshi Koizumi , Minoru Inomoto
发明人： Kentaro KASA , Manabu Takakuwa , Ryoichi Inanami , Kazuto Matsuki , Tetsuro Nakasugi , Hiroshi Koizumi , Minoru Inomoto
IPC分类号： G03B27/58
CPC分类号： G03F7/70783 , G03F7/707
摘要： According to one embodiment, a substrate holding apparatus includes a main unit and a plurality of first support units. The main unit has a major surface. The main unit has a plate configuration. The first support units are disposed on the major surface. Each of the first support units includes a suction-holding unit capable of holding a substrate by suction. The suction-holding unit is movable along a first direction perpendicular to the major surface and a second direction parallel to the major surface.
摘要翻译：根据一个实施例，一种基板保持装置包括主单元和多个第一支撑单元。主机具有主要表面。主机具有板配置。第一支撑单元设置在主表面上。每个第一支撑单元包括能够通过抽吸来保持基板的吸持保持单元。抽吸保持单元可沿垂直于主表面的第一方向和平行于主表面的第二方向移动。

6. 发明授权

US07368737B2 Electron beam writing method, electron beam writing apparatus and semiconductor device manufacturing method 失效
标题翻译：电子束写入方法，电子束写入装置和半导体器件的制造方法
公开(公告)号：US07368737B2
公开(公告)日：2008-05-06
申请号：US11409987
申请日：2006-04-25
申请人： Ryoichi Inanami , Tetsuro Nakasugi
发明人： Ryoichi Inanami , Tetsuro Nakasugi
IPC分类号： H01J37/08
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00
摘要： An electron beam writing method is disclosed, which includes preparing electron beam writing data structured from writing pattern data expressed by both data of VSB shots which are units of shaping beams at the time of carrying out writing a pattern and data of CP shots serving as bases of a repeating pattern, and CP aperture data into which identification numbers IDs and opening positions of respective openings of a CP aperture having openings for VSB shots and openings for CP shots are described, inputting the electron beam writing data to an electron beam writing apparatus, and expanding the electron beam writing data into data of the respective shots defined in the electron beam writing data, determining irradiation times of the respective expanded shots while correcting shot positions, and outputting control signals corresponding to shot data to repeat a shot of a desired pattern, by the electron beam writing apparatus.
摘要翻译：公开了一种电子束写入方法，其中包括准备电子束写入数据，该电子束写入数据由写入模式数据构成，该模式数据由作为执行写入模式时的整形波束的单元的VSB镜头的数据和用作基础的CP镜头的数据表示描述了CP电子束写入数据到电子束写入装置的CP孔径数据，CP孔径数据ID和具有用于VSB镜头的开口的CP孔的各个开口的打开位置和CP镜头的开口位置，并且将电子束写入数据扩展为在电子束写入数据中定义的各个镜头的数据，同时在校正镜头位置的同时确定各个扩展镜头的照射时间，并且输出对应于镜头数据的控制信号以重复所需图案的镜头，由电子束写入装置。

7. 发明授权

US09188879B2 Substrate holding apparatus, pattern transfer apparatus, and pattern transfer method 有权
标题翻译：基板保持装置，图案转印装置和图案转印方法
公开(公告)号：US09188879B2
公开(公告)日：2015-11-17
申请号：US13600123
申请日：2012-08-30
申请人： Kentaro Kasa , Manabu Takakuwa , Ryoichi Inanami , Kazuto Matsuki , Tetsuro Nakasugi , Hiroshi Koizumi , Minoru Inomoto
发明人： Kentaro Kasa , Manabu Takakuwa , Ryoichi Inanami , Kazuto Matsuki , Tetsuro Nakasugi , Hiroshi Koizumi , Minoru Inomoto
IPC分类号： G03B27/58 , G03F7/20
CPC分类号： G03F7/70783 , G03F7/707
摘要： According to one embodiment, a substrate holding apparatus includes a main unit and a plurality of first support units. The main unit has a major surface. The main unit has a plate configuration. The first support units are disposed on the major surface. Each of the first support units includes a suction-holding unit capable of holding a substrate by suction. The suction-holding unit is movable along a first direction perpendicular to the major surface and a second direction parallel to the major surface.
摘要翻译：根据一个实施例，一种基板保持装置包括主单元和多个第一支撑单元。主机具有主要表面。主机具有板配置。第一支撑单元设置在主表面上。每个第一支撑单元包括能够通过抽吸来保持基板的吸持保持单元。抽吸保持单元可沿垂直于主表面的第一方向和平行于主表面的第二方向移动。

8. 发明申请

US20060289797A1 Electron beam writing method, electron beam writing apparatus and semiconductor device manufacturing method 失效
标题翻译：电子束写入方法，电子束写入装置和半导体器件的制造方法
公开(公告)号：US20060289797A1
公开(公告)日：2006-12-28
申请号：US11409987
申请日：2006-04-25
申请人： Ryoichi Inanami , Tetsuro Nakasugi
发明人： Ryoichi Inanami , Tetsuro Nakasugi
IPC分类号： A61N5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00
摘要： An electron beam writing method is disclosed, which includes preparing electron beam writing data structured from writing pattern data expressed by both data of VSB shots which are units of shaping beams at the time of carrying out writing a pattern and data of CP shots serving as bases of a repeating pattern, and CP aperture data into which identification numbers IDs and opening positions of respective openings of a CP aperture having openings for VSB shots and openings for CP shots are described, inputting the electron beam writing data to an electron beam writing apparatus, and expanding the electron beam writing data into data of the respective shots defined in the electron beam writing data, determining irradiation times of the respective expanded shots while correcting shot positions, and outputting control signals corresponding to shot data to repeat a shot of a desired pattern, by the electron beam writing apparatus.
摘要翻译：公开了一种电子束写入方法，其中包括准备电子束写入数据，该电子束写入数据由写入模式数据构成，该模式数据由作为执行写入模式时的整形波束的单元的VSB镜头的数据和用作基础的CP镜头的数据表示描述了CP电子束写入数据到电子束写入装置的CP孔径数据，CP孔径数据ID和具有用于VSB镜头的开口的CP孔的各个开口的打开位置和CP镜头的开口位置，并且将电子束写入数据扩展为在电子束写入数据中定义的各个镜头的数据，同时在校正镜头位置的同时确定各个扩展镜头的照射时间，并且输出对应于镜头数据的控制信号以重复所需图案的镜头，由电子束写入装置。

9. 发明授权

US07459705B2 Charged particle beam exposure method of character projection system, charged particle beam exposure device of character projection system, program for use in charged particle beam exposure device, and manufacturing method of semiconductor device 失效
标题翻译：字符投影系统的带电粒子束曝光方法，字符投影系统的带电粒子束曝光装置，带电粒子束曝光装置中的使用程序和半导体装置的制造方法
公开(公告)号：US07459705B2
公开(公告)日：2008-12-02
申请号：US11583114
申请日：2006-10-19
申请人： Tetsuro Nakasugi , Ryoichi Inanami , Takumi Ota , Takeshi Koshiba
发明人： Tetsuro Nakasugi , Ryoichi Inanami , Takumi Ota , Takeshi Koshiba
IPC分类号： G03F9/00 , G21K5/10 , H01J37/20
CPC分类号： G03F1/20 , B82Y10/00 , B82Y40/00 , H01J37/3174
摘要： A charged particle beam exposure method is disclosed, which includes preparing an aperture mask having character apertures, correcting dimensions of designed patterns in design data in consideration of at least one of factors such as a forward scattering distance of a charged particle, a rearward scattering distance of the charged particle, a blurring of a beam of the charged particle, a dimension conversion difference of the designed patterns due to a denseness/coarseness difference of the designed patterns caused when the underlayer is processed while using the resist as a mask, and the like, allocating at least a part of a specified character aperture of the plurality of character apertures of the aperture mask to the corrected designed patterns to produce writing data, and exposing the resist to the beams of the charged particle passed through the at least a part of the specified character aperture based on the writing data.
摘要翻译：公开了一种带电粒子束曝光方法，其包括制备具有字符孔的孔径掩模，考虑至少一个因素，校正设计数据中设计图案的尺寸，例如带电粒子的前向散射距离，向后散射距离带电粒子的模糊，带电粒子束的模糊，由于当使用抗蚀剂作为掩模时在底层被处理时引起的设计图案的致密度/粗糙度差造成的设计图案的尺寸转换差，以及类似地，将孔径掩模的多个字符孔径的指定字符孔径的至少一部分分配给经校正的设计图案以产生写入数据，并将抗蚀剂暴露于穿过至少一部分的带电粒子的束基于写入数据的指定字符孔径。

10. 发明申请

US20070114463A1 Charged particle beam exposure method of character projection system, charged particle beam exposure device of character projection system, program for use in charged particle beam exposure device, and manufacturing method of semiconductor device 失效
标题翻译：字符投影系统的带电粒子束曝光方法，字符投影系统的带电粒子束曝光装置，带电粒子束曝光装置中的使用程序和半导体装置的制造方法
公开(公告)号：US20070114463A1
公开(公告)日：2007-05-24
申请号：US11583114
申请日：2006-10-19
申请人： Tetsuro Nakasugi , Ryoichi Inanami , Takumi Ota , Takeshi Koshiba
发明人： Tetsuro Nakasugi , Ryoichi Inanami , Takumi Ota , Takeshi Koshiba
IPC分类号： G21K5/10
CPC分类号： G03F1/20 , B82Y10/00 , B82Y40/00 , H01J37/3174
摘要： A charged particle beam exposure method is disclosed, which includes preparing an aperture mask having character apertures, correcting dimensions of designed patterns in design data in consideration of at least one of factors such as a forward scattering distance of a charged particle, a rearward scattering distance of the charged particle, a blurring of a beam of the charged particle, a dimension conversion difference of the designed patterns due to a denseness/coarseness difference of the designed patterns caused when the underlayer is processed while using the resist as a mask, and the like, allocating at least a part of a specified character aperture of the plurality of character apertures of the aperture mask to the corrected designed patterns to produce writing data, and exposing the resist to the beams of the charged particle passed through the at least a part of the specified character aperture based on the writing data.
摘要翻译：公开了一种带电粒子束曝光方法，其包括制备具有字符孔的孔径掩模，考虑至少一个因素，校正设计数据中设计图案的尺寸，例如带电粒子的前向散射距离，向后散射距离带电粒子的模糊，带电粒子束的模糊，由于当使用抗蚀剂作为掩模时在底层被处理时引起的设计图案的致密度/粗糙度差造成的设计图案的尺寸转换差，以及类似地，将孔径掩模的多个字符孔径的指定字符孔径的至少一部分分配给经校正的设计图案以产生写入数据，并将抗蚀剂暴露于穿过至少一部分的带电粒子的束基于写入数据的指定字符孔径。

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