会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Bandwidth control device
    • 带宽控制装置
    • US08259764B2
    • 2012-09-04
    • US11472088
    • 2006-06-21
    • Igor V. FomenkovWilliam N. PartloDaniel J. ReileyJames K. HoweyStanley C. Aguilar
    • Igor V. FomenkovWilliam N. PartloDaniel J. ReileyJames K. HoweyStanley C. Aguilar
    • H01S3/136
    • H01S3/225H01S3/03H01S3/034H01S3/08009H01S3/137H01S3/2256
    • A method and apparatus is disclosed for operating a laser output light beam pulse line narrowing mechanism that may comprise a nominal center wavelength and bandwidth selection optic; a static wavefront compensation mechanism shaping the curvature of the selection optic; an active wavefront compensation mechanism shaping the curvature of the selection optic and operating independently of the static wavefront compensation mechanism. The method and apparatus may comprise the nominal center wavelength and bandwidth selection optic comprises a grating; the static wavefront compensation mechanism applies a pre-selected bending moment to the grating; the active wavefront compensation mechanism applies a separate selected bending moment to the grating responsive to the control of a bending moment controller based on bandwidth feedback from a bandwidth monitor monitoring the bandwidth of the laser output light beam pulses. The active wavefront compensation mechanism may comprise a pneumatic drive mechanism.
    • 公开了用于操作可以包括标称中心波长和带宽选择光学器件的激光输出光束脉冲线窄化机构的方法和装置; 静态波前补偿机构整形选择光学元件的曲率; 主动波前补偿机构整形选择光学元件的曲率并独立于静态波前补偿机制工作。 该方法和装置可以包括标称中心波长和带宽选择光学器件包括光栅; 静态波前补偿机构将预选的弯矩应用于光栅; 主动波前补偿机构响应于基于来自监视激光输出光束脉冲的带宽的带宽监视器的带宽反馈的弯矩控制器的控制,向光栅施加单独的选定弯矩。 主动波前补偿机构可以包括气动驱动机构。
    • 2. 发明申请
    • Bandwidth control device
    • 带宽控制装置
    • US20070297467A1
    • 2007-12-27
    • US11472088
    • 2006-06-21
    • Igor V. FomenkovWilliam N. PartloDaniel J. ReileyJames K. HoweyStanley C. Aguilar
    • Igor V. FomenkovWilliam N. PartloDaniel J. ReileyJames K. HoweyStanley C. Aguilar
    • H01S3/10
    • H01S3/225H01S3/03H01S3/034H01S3/08009H01S3/137H01S3/2256
    • A method and apparatus is disclosed for operating a laser output light beam pulse line narrowing mechanism that may comprise a nominal center wavelength and bandwidth selection optic; a static wavefront compensation mechanism shaping the curvature of the selection optic; an active wavefront compensation mechanism shaping the curvature of the selection optic and operating independently of the static wavefront compensation mechanism. The method and apparatus may comprise the nominal center wavelength and bandwidth selection optic comprises a grating; the static wavefront compensation mechanism applies a pre-selected bending moment to the grating; the active wavefront compensation mechanism applies a separate selected bending moment to the grating responsive to the control of a bending moment controller based on bandwidth feedback from a bandwidth monitor monitoring the bandwidth of the laser output light beam pulses. The active wavefront compensation mechanism may comprise a pneumatic drive mechanism.
    • 公开了用于操作可以包括标称中心波长和带宽选择光学器件的激光输出光束脉冲线窄化机构的方法和装置; 静态波前补偿机构整形选择光学元件的曲率; 主动波前补偿机构整形选择光学元件的曲率并独立于静态波前补偿机制工作。 该方法和装置可以包括标称中心波长和带宽选择光学器件包括光栅; 静态波前补偿机构将预选的弯矩应用于光栅; 主动波前补偿机构响应于基于来自监视激光输出光束脉冲的带宽的带宽监视器的带宽反馈的弯矩控制器的控制,向光栅施加单独的选定弯矩。 主动波前补偿机构可以包括气动驱动机构。
    • 6. 发明授权
    • EUV collector debris management
    • EUV收集器碎片管理
    • US08075732B2
    • 2011-12-13
    • US10979945
    • 2004-11-01
    • William N. PartloRichard L. SandstromIgor V. FomenkovAlexander I. ErshovWilliam OldhamWilliam F. MarxOscar Hemberg
    • William N. PartloRichard L. SandstromIgor V. FomenkovAlexander I. ErshovWilliam OldhamWilliam F. MarxOscar Hemberg
    • C23F1/00
    • B08B7/00
    • A method and apparatus that may comprise an EUV light producing mechanism utilizing an EUV plasma source material comprising a material that will form an etching compound, which plasma source material produces EUV light in a band around a selected center wavelength comprising: an EUV plasma generation chamber; an EUV light collector contained within the chamber having a reflective surface containing at least one layer comprising a material that does not form an etching compound and/or forms a compound layer that does not significantly reduce the reflectivity of the reflective surface in the band; an etchant source gas contained within the chamber comprising an etchant source material with which the plasma source material forms an etching compound, which etching compound has a vapor pressure that will allow etching of the etching compound from the reflective surface. The etchant source material may comprises a halogen or halogen compound. The etchant source material may be selected based upon the etching being stimulated in the presence of photons of EUV light and/or DUV light and/or any excited energetic photons with sufficient energy to stimulate the etching of the plasma source material. The apparatus may further comprise an etching stimulation plasma generator providing an etching stimulation plasma in the working vicinity of the reflective surface; and the etchant source material may be selected based upon the etching being stimulated by an etching stimulation plasma. There may also be an ion accelerator accelerating ions toward the reflective surface. The ions may comprise etchant source material. The apparatus and method may comprise a part of an EUV production subsystem with an optical element to be etched of plasma source material.
    • 可以包括使用EUV等离子体源材料的EUV发光机构的方法和装置,所述EUV等离子体源材料包括将形成蚀刻化合物的材料,所述等离子体源材料在所选择的中心波长周围的带内产生EUV光,包括:EUV等离子体产生室 ; 包含在室内的EUV光收集器具有反射表面,该反射表面包含至少一层,该层包含不形成蚀刻化合物的材料和/或形成不显着降低该带中的反射表面的反射率的化合物层; 包含在腔室内的蚀刻剂源气体包括蚀刻剂源材料,等离子体源材料与蚀刻剂源材料形成蚀刻化合物,该蚀刻化合物具有允许从反射表面蚀刻蚀刻化合物的蒸气压。 蚀刻剂源材料可以包含卤素或卤素化合物。 蚀刻剂源材料可以基于在存在EUV光和/或DUV光的光子和/或具有足够能量以激发等离子体源材料的蚀刻的任何激发能量光子的情况下被激发的蚀刻来选择。 该装置还可以包括在反射表面的工作附近提供蚀刻刺激等离子体的蚀刻刺激等离子体发生器; 并且蚀刻剂源材料可以基于通过蚀刻刺激等离子体刺激的蚀刻来选择。 还可以存在离子加速剂将离子朝向反射表面加速。 离子可以包括蚀刻剂源材料。 该装置和方法可以包括具有待蚀刻的等离子体源材料的光学元件的EUV生产子系统的一部分。