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    • 6. 发明授权
    • Objective lens alignment in optical pickup unit assembly
    • 光学拾音单元组件中的物镜对准
    • US06873580B2
    • 2005-03-29
    • US09846052
    • 2001-05-01
    • Erik J. ZimmerScott D. WilsonIan R. RedmondBernard W. BellDaniel G. Bergeson
    • Erik J. ZimmerScott D. WilsonIan R. RedmondBernard W. BellDaniel G. Bergeson
    • G11B7/22G11B7/00
    • G11B7/22
    • Disclosed is a method of attaching components of an optical head. In one embodiment, first and second optical assemblies of the optical head are positioned adjacent to each other. The first optical assembly may include a first optical element, and the second optical assembly may include a second optical element. Both of the first and second optical elements are configured to transmit light for reading or writing data to an optical data storage media. The position of a first optical assembly is adjusted with respect to the second optical assembly until the first optical element and second optical elements are in optical communication with each other. Thereafter, the first and second optical assemblies are rigidly connected while the first and second optical elements are in optical communication with each other.
    • 公开了一种安装光学头的部件的方法。 在一个实施例中,光学头的第一和第二光学组件被定位成彼此相邻。 第一光学组件可以包括第一光学元件,并且第二光学组件可以包括第二光学元件。 第一和第二光学元件都被配置为发送用于将数据读取或写入光学数据存储介质的光。 相对于第二光学组件调节第一光学组件的位置,直到第一光学元件和第二光学元件彼此光学连通。 此后,第一和第二光学组件刚性连接,同时第一和第二光学元件彼此光学连通。
    • 10. 发明授权
    • Micro lens and method and apparatus for fabricating
    • 微透镜及其制造方法和装置
    • US06914724B2
    • 2005-07-05
    • US10278719
    • 2002-10-22
    • Ian R. Redmond
    • Ian R. Redmond
    • G02B3/00G11B7/135G11B7/22G02B27/10B29D11/00
    • G11B7/1353G02B3/00G11B7/1374G11B7/13922G11B7/22
    • Micro lenses are fabricated using processes which operate on multiple lenses at a time. In one embodiment, wafer-scale processing includes employing photolithography for defining gray-scale masks which permit relatively smooth or continuous curvatures of lens surfaces to be formed by, e.g., reactive ion etching. Processes and materials are used which achieve desired etching at a sufficiently rapid rate such as etching to a depth of about 200 micrometers in less than about 10 hours. Wafer-scale molding processes can also be used. Diffractive features can be formed on or adjacent lens surfaces to provide functions such as dispersion correction. Also, sub-wavelength scale features may be etched to provide quarter-wave plate functionality, birefringence, anti-reflective functions and the like. Structures such as mounting rings and/or crash stops can be formed integrally with the lens body, eliminating the need to glue or otherwise couple separate components.
    • 微透镜使用一次在多个透镜上操作的工艺来制造。 在一个实施例中,晶片级处理包括采用光刻法定义灰度掩模,其允许通过例如反应离子蚀刻形成透镜表面的相对平滑或连续的曲率。 使用以足够快的速率实现期望的蚀刻的工艺和材料,例如在小于约10小时内蚀刻到约200微米的深度。 也可以使用晶片级成型工艺。 衍射特征可以形成在透镜表面上或附近,以提供诸如色散校正的功能。 此外,亚波长尺度特征可以被蚀刻以提供四分之一波片的功能,双折射,抗反射功能等。 诸如安装环和/或碰撞止挡件的结构可以与镜体整体形成,从而不需要胶合或以其它方式耦合分开的部件。