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1. 发明申请

US20050282316A1 Method of manufacturing an electronic device comprising a thin film transistor 有权
标题翻译：制造包括薄膜晶体管的电子器件的方法
公开(公告)号：US20050282316A1
公开(公告)日：2005-12-22
申请号：US10529117
申请日：2003-09-12
申请人： Nigel Young , Soo Yoon , Ian French , David McCulloch
发明人： Nigel Young , Soo Yoon , Ian French , David McCulloch
IPC分类号： H01L21/336 , H01L29/786 , H01L21/00
CPC分类号： H01L29/66757 , H01L29/66765 , H01L29/78675 , H01L29/78678
摘要： A method of manufacturing an electronic device comprising a thin film transistor (42), comprises forming a hydrogen-containing layer (22) over a semiconductor layer (10; 20), irradiating the hydrogen-containing layer so as to hydrogenate the semiconductor layer, and then forming electrodes (24; 26, 28) over the semiconductor layer. A short diffusion length and direct path is provided for the hydrogen thus allowing rapid hydrogenation of the semiconductor layer using relatively few, high-fluence laser pulses. The supporting substrate (12) is not heated significantly making the method particularly useful for TFFs on polymer substrates. Crystallisation and hydrogenation of the semiconductor layer can be executed in the same irradiation step.
摘要翻译：一种制造包括薄膜晶体管（42）的电子器件的方法，包括在半导体层（10; 20）上形成含氢层（22），照射含氢层以氢化半导体层，然后在半导体层上形成电极（24; 26,28）。为氢提供了一个短的扩散长度和直接路径，从而允许使用相对较少的高通量激光脉冲来快速氢化半导体层。支撑衬底（12）不被显着加热，使得该方法对聚合物衬底上的TFF特别有用。可以在相同的照射步骤中执行半导体层的结晶和氢化。

2. 发明申请

US20070091062A1 Active matrix displays and other electronic devices having plastic substrates 有权
标题翻译：有源矩阵显示器和其他具有塑料基板的电子设备
公开(公告)号：US20070091062A1
公开(公告)日：2007-04-26
申请号：US10579309
申请日：2004-11-17
申请人： Ian French , David McCulloch
发明人： Ian French , David McCulloch
IPC分类号： G09G3/34
CPC分类号： H01L27/1266 , G02F1/133305 , G02F1/167 , G02F2001/13415 , H01L21/6835 , H01L27/1214 , H01L27/3244 , H01L29/78603 , H01L51/524 , H01L51/56 , H01L2221/6835 , H01L2227/326 , H01L2251/5338
摘要： A method of manufacturing an active matrix display device involves manufacturing a first substrate arrangement comprising a rigid glass substrate and an overlying plastic substrate. Pixel circuits are formed over the plastic substrate. The rigid glass substrate (12) is only removed from the plastic substrate after the mounting of the active and passive plates of the display into display modules (10). This method enables substantially conventional substrate handling, processing and cell making to be employed, for example in standard AMLCD factories, with only minimal extra equipment needed. A more general manufacturing method is also disclosed for fabricating TFTs on a spin-on plastic layer.
摘要翻译：制造有源矩阵显示装置的方法包括制造包括刚性玻璃基板和上覆塑料基板的第一基板装置。像素电路形成在塑料基板上。在将显示器的主动和被动板安装到显示模块（10）之后，刚刚从塑料基板移除刚性玻璃基板（12）。该方法能够实现基本上常规的基板处理，处理和电池制造，例如在标准AMLCD工厂中，仅需要最少的额外设备。还公开了在旋涂塑料层上制造TFT的更一般的制造方法。

3. 发明授权

US08663547B2 High pressure heat treatment system 有权
标题翻译：高压热处理系统
公开(公告)号：US08663547B2
公开(公告)日：2014-03-04
申请号：US13462076
申请日：2012-05-02
申请人： Scott P. Crafton , Paul M. Crafton , Ian French , Shanker Subramanian
发明人： Scott P. Crafton , Paul M. Crafton , Ian French , Shanker Subramanian
IPC分类号： B22D25/06
CPC分类号： C21D9/67 , B22D29/006 , C21D1/34 , C21D1/53 , C21D1/767 , C21D9/00 , C21D9/0037 , C21D9/0062 , C21D9/673 , C21D2241/01 , F27B9/024 , F27B9/025 , F27B9/10 , F27B9/16 , F27B9/20 , F27B9/3005 , F27B9/36
摘要： A furnace for heat treating a metal workpiece is provided. A method and system for processing a workpiece also are provided.
摘要翻译：提供了一种用于热处理金属工件的炉子。还提供了一种用于处理工件的方法和系统。

4. 发明申请

US20120211191A1 High Pressure Heat Treatment System 有权
标题翻译：高压热处理系统
公开(公告)号：US20120211191A1
公开(公告)日：2012-08-23
申请号：US13462076
申请日：2012-05-02
申请人： Scott P. Crafton , Paul M. Crafton , Ian French , Shanker Subramanian
发明人： Scott P. Crafton , Paul M. Crafton , Ian French , Shanker Subramanian
IPC分类号： B22D25/06 , C21D1/62 , C21D9/00 , C21D11/00
CPC分类号： C21D9/67 , B22D29/006 , C21D1/34 , C21D1/53 , C21D1/767 , C21D9/00 , C21D9/0037 , C21D9/0062 , C21D9/673 , C21D2241/01 , F27B9/024 , F27B9/025 , F27B9/10 , F27B9/16 , F27B9/20 , F27B9/3005 , F27B9/36
摘要： A furnace for heat treating a metal workpiece is provided. A method and system for processing a workpiece also are provided.
摘要翻译：提供了一种用于热处理金属工件的炉子。还提供了一种用于加工工件的方法和系统。

5. 发明申请

US20090250630A1 PHOTODIODE FOR DETECTION WITHIN MOLECULAR DIAGNOSTICS 失效
标题翻译：用于在分子诊断中检测的光致抗体
公开(公告)号：US20090250630A1
公开(公告)日：2009-10-08
申请号：US12374000
申请日：2007-07-05
申请人： Pieter Jan Van Der Zaag , Ian French , Nigel David Young
发明人： Pieter Jan Van Der Zaag , Ian French , Nigel David Young
IPC分类号： G01N21/64 , G01J1/58 , H01L31/105
CPC分类号： H01L31/1055 , G01N21/6428 , H01L31/103
摘要： A photodiode (200), for instance a PN or a PIN photodiode, is disclosed. The photodiode receives incident radiation having first and second spectral distributions, where the first spectral distribution is spectrally shifted from the second spectral distribution. The photodiode has a first semiconductor layer (211) capable of absorbing incident radiation (231) having a first spectral distribution without generating a photocurrent, while simultaneously transmitting incident radiation having a second spectral distribution to the intrinsic layer (212) for generating a photocurrent (213). The photodiode may be used in connection with detecting the presence of target molecules that has been labeled with labeling agents, such as fluorophores or quantum dots. The labeling agents are characterized by the Stokes shift and, therefore, they emit fluorescent radiation having the second spectral distribution that is spectrally shifted from the illumination radiation having the first spectral distribution.
摘要翻译：公开了一种光电二极管（200），例如PN或PIN光电二极管。光电二极管接收具有第一和第二光谱分布的入射辐射，其中第一光谱分布从第二光谱分布光谱偏移。光电二极管具有能够吸收具有第一光谱分布而不产生光电流的入射辐射（231）的第一半导体层（211），同时将具有第二光谱分布的入射辐射传输到本征层（212）以产生光电流 213）。光电二极管可用于检测已经用标记试剂如荧光团或量子点标记的靶分子的存在。标记试剂的特征在于斯托克斯位移，因此，它们发射具有与具有第一光谱分布的照射辐射光谱偏移的第二光谱分布的荧光辐射。

6. 发明申请

US20080264527A1 INTEGRATED METAL PROCESSING FACILITY 有权
标题翻译：综合金属加工设备
公开(公告)号：US20080264527A1
公开(公告)日：2008-10-30
申请号：US11837793
申请日：2007-08-13
申请人： Scott P. Crafton , Paul M. Crafton , James L. Lewis , Ian French
发明人： Scott P. Crafton , Paul M. Crafton , James L. Lewis , Ian French
IPC分类号： B22D27/20 , C21D1/00
CPC分类号： C21D11/00 , B22D29/00 , B22D29/003 , B22D47/00 , C21D1/52 , C21D1/53 , C21D9/0068 , C22F1/00
摘要： An integrated metal processing facility in which molten metal is poured into a series of molds at a pouring station to form metal castings, which are then transferred to a heat treatment line. Prior to introduction of the castings into a heat treatment station of the heat treatment line, the castings are subjected to heating sufficient to arrest cooling of the castings at or above a process control temperature for the metal thereof.
摘要翻译：一种金属加工设备，其中在浇注站将熔融金属注入一系列模具中以形成金属铸件，然后将其转移到热处理管线。在将铸件引入热处理线的热处理站之前，对铸件进行加热以足以在等于或高于其金属的工艺控制温度下阻止铸件的冷却。

7. 发明授权

US07331374B2 Method and apparatus for assisting removal of sand moldings from castings 失效
标题翻译：用于协助从铸件中去除砂型的方法和装置
公开(公告)号：US07331374B2
公开(公告)日：2008-02-19
申请号：US10616750
申请日：2003-07-10
申请人： James L. Lewis, Jr. , Ian French , Volker R. Knobloch , Scott P. Crafton , Paul M. Crafton , James R. Garrett , John W. Dalton
发明人： James L. Lewis, Jr. , Ian French , Volker R. Knobloch , Scott P. Crafton , Paul M. Crafton , James R. Garrett , John W. Dalton
IPC分类号： B22D39/00
CPC分类号： B22D29/003 , B22D29/00 , B22D29/006 , B22D29/007
摘要： Disclosed is a method for dislodging a mold from a casting formed within the mold. The mold may be removed from the casting by scoring the mold and applying a force sufficient to cause the mold to fracture and break into pieces. Additionally, the mold may be fractured by either explosive charges placed in the mold pack or by high energy pulsations directed at the mold. Once the mold is fractured and broken into various pieces it may then be dislodged from the casting.
摘要翻译：公开了一种从模具内形成的铸件中移出模具的方法。可以通过对模具进行刻划并施加足以使模具断裂并分解成碎片的力来从模具中移除模具。此外，模具可能通过放置在模具包装中的爆炸装置或通过指向模具的高能量脉动而断裂。一旦模具断裂并破碎成各种碎片，它可能会从铸件中脱落。

8. 发明申请

US20060051974A1 Mask and manufacturing method using mask 审中-公开
标题翻译：面膜和制作方法使用面膜
公开(公告)号：US20060051974A1
公开(公告)日：2006-03-09
申请号：US10519650
申请日：2003-06-13
申请人： Ian French , James Hewett
发明人： Ian French , James Hewett
IPC分类号： H01L21/31
CPC分类号： G03F1/32 , G03F1/54
摘要： A mask 12 includes half-tone layer 16 and light blocking layer 20. The half-tone layer 16 is of silicon rich silicon nitride SiNx:H. x may be in the range 0 to 1, preferably 0.2 to 0.6, so that the optical band gap can be in the range 2.1 eV to 2.5 eV. It has been discovered that photoresist removal when the mask 12 is used is very dependent on the band gap, and not too dependent on the thickness, so good control of TFT manufacture can be obtained.
摘要翻译：掩模12包括半色调层16和遮光层20.半色调层16是富硅氮化硅SiN x：H。 x可以在0至1的范围内，优选为0.2至0.6，使得光学带隙可以在2.1eV至2.5eV的范围内。已经发现，当使用掩模12时光致抗蚀剂的去除非常依赖于带隙，并且不太依赖于厚度，因此可以获得TFT制造的良好控制。

9. 发明申请

US20050205228A1 System for heat treating castings and reclaiming sand 有权
标题翻译：用于热处理铸件和回收砂的系统
公开(公告)号：US20050205228A1
公开(公告)日：2005-09-22
申请号：US11084321
申请日：2005-03-18
申请人： Paul Crafton , James Lewis , Ian French , Shanker Subramanian , James Garrett
发明人： Paul Crafton , James Lewis , Ian French , Shanker Subramanian , James Garrett
IPC分类号： B22C5/00 , B22C5/08 , B22D29/00
CPC分类号： B22C5/085 , B22D29/003
摘要： A system for reclaiming sand from a casting process includes a chamber having an inlet, an outlet, and a plurality of baffles defining a circuitous path for the sand therebetween, a heating element for providing heat to the chamber, and a fluidizing distributor for directing the sand through the chamber. A method of reclaiming waste sand also is provided.
摘要翻译：用于从铸造工艺回收砂的系统包括具有入口，出口和多个挡板的室，其限定用于其间的砂的迂回路径，用于向室提供热量的加热元件，以及流化分配器，用于引导沙子通过房间。还提供了回收废砂的方法。

10. 发明申请

US20080236779A1 VERTICAL HEAT TREATMENT SYSTEM 审中-公开
标题翻译：垂直热处理系统
公开(公告)号：US20080236779A1
公开(公告)日：2008-10-02
申请号：US12056359
申请日：2008-03-27
申请人： Scott P. Crafton , Paul M. Crafton , Ian French , Volker Knobloch
发明人： Scott P. Crafton , Paul M. Crafton , Ian French , Volker Knobloch
IPC分类号： B22D45/00 , B22D19/00
CPC分类号： B22D47/00 , B22D45/00 , B22D47/02 , C21D9/0006 , C21D9/005 , F27B9/16 , F27B9/243
摘要： A system and method for forming and heat treating metal castings is provided with a vertical heat treatment unit positioned adjacent and downstream from a pouring station at which a series of molds are filled with a molten metal to form the castings. The vertical heat treatment unit includes a vertically oriented furnace chamber in which the castings are received, and which has a reduced footprint to reduce the manufacturing floor space required for the vertical heat treatment unit, and to enable the vertical heat treatment unit to be positioned in close proximity to the pouring station.
摘要翻译：一种用于形成和热处理金属铸件的系统和方法设置有垂直热处理单元，其位于浇注站的邻近和下游，在该浇注站处，一系列模具填充有熔融金属以形成铸件。垂直热处理单元包括垂直定向的炉室，其中容纳有铸件，并且其具有减小的占地面积以减少垂直热处理单元所需的制造占地空间，并且使垂直热处理单元能够定位在靠近浇注站。

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