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1. 发明授权

US10345700B2 Negative-tone resist compositions and multifunctional polymers therein 有权
公开(公告)号：US10345700B2
公开(公告)日：2019-07-09
申请号：US14479378
申请日：2014-09-08
申请人： International Business Machines Corporation , Shin-Etsu Chemical Co., Ltd.
发明人： Luisa D. Bozano , Daisuke Domon , Yoshio Kawai , Keiichi Masunaga , Martha I. Sanchez , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda K. Sundberg , Satoshi Watanabe
IPC分类号： G03F7/20 , G03F7/038 , G03F7/32 , C08F220/18 , C08F220/30 , C08F220/24 , G03F7/004
摘要： A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.

2. 发明申请

US20200278607A1 MULTIFUNCTIONAL POLYMERS 审中-公开
公开(公告)号：US20200278607A1
公开(公告)日：2020-09-03
申请号：US16158103
申请日：2018-10-11
申请人： International Business Machines Corporation , Shin-Etsu Chemical Co., Ltd.
发明人： Luisa D. Bozano , Daisuke Domon , Yoshio Kawai , Keiichi Masunaga , Martha I. Sanchez , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda K. Sundberg , Satoshi Watanabe
IPC分类号： G03F7/004 , G03F7/20 , C08F220/18 , C08F220/30 , G03F7/038 , G03F7/32
摘要： A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.

3. 发明申请

US20160070169A1 NEGATIVE-TONE RESIST COMPOSITIONS AND MULTIFUNCTIONAL POLYMERS THEREIN 审中-公开
标题翻译：负极性组合物和多功能聚合物
公开(公告)号：US20160070169A1
公开(公告)日：2016-03-10
申请号：US14479378
申请日：2014-09-08
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , SHIN-ETSU CHEMICAL CO., LTD.
发明人： Luisa D. Bozano , Daisuke Domon , Yoshio Kawai , Keiichi Masunaga , Martha I. Sanchez , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda K. Sundberg , Satoshi Watanabe
IPC分类号： G03F7/038 , C08F22/10 , G03F7/38
CPC分类号： G03F7/0045 , C08F220/18 , C08F220/30 , G03F7/0046 , G03F7/0382 , G03F7/20 , G03F7/322 , C08F212/14 , C08F2220/382
摘要： A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.
摘要翻译：提供了一种负色调抗蚀剂组合物，其包含游离的光致酸产生剂和与产生光致酸的部分共价结合的多官能聚合物，其中组合物基本上不含交联剂。还提供了与抗蚀剂组合物结合使用的多官能聚合物，以及使用本发明组合物和聚合物在基材上产生抗蚀剂图像的方法。

4. 发明授权

US11500285B2 Multifunctional polymers 有权
公开(公告)号：US11500285B2
公开(公告)日：2022-11-15
申请号：US16158103
申请日：2018-10-11
申请人： International Business Machines Corporation , Shin-Etsu Chemical Co., Ltd.
发明人： Luisa D. Bozano , Daisuke Domon , Yoshio Kawai , Keiichi Masunaga , Martha I. Sanchez , Daniel P. Sanders , Ratnam Sooriyakumaran , Linda K. Sundberg , Satoshi Watanabe
IPC分类号： G03F7/20 , G03F7/038 , G03F7/32 , G03F7/004 , C08F220/18 , C08F220/30 , C08F220/24 , C08F212/14
摘要： A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.

5. 发明申请

US20140242526A1 POSITIVE TONE ORGANIC SOLVENT DEVELOPED CHEMICALLY AMPLIFIED RESIST 有权
标题翻译：积极的有机溶剂开发化学放大电阻
公开(公告)号：US20140242526A1
公开(公告)日：2014-08-28
申请号：US13775122
申请日：2013-02-23
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , JSR CORPORATION
发明人： Robert D. Allen , Ramakrishnan Ayothi , Luisa D. Bozano , William D. Hinsberg , Linda K. Sundberg , Sally A. Swanson , Hoa D. Truong , Gregory M. Wallraff
IPC分类号： G03F7/32
CPC分类号： G03F7/325 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： Provided is a method for developing positive-tone chemically amplified resists with an organic developer solvent having at least one polyhydric alcohol, such as ethylene glycol and/or glycerol, alone or in combination with an additional organic solvent, such as isopropyl alcohol, and/or water. The organic solvent developed positive tone resists described herein are useful for lithography pattern forming processes; for producing semiconductor devices, such as integrated circuits (IC); and for applications where basic solvents are not suitable, such as the fabrication of chips patterned with arrays of biomolecules or deprotection applications that do not require the presence of acid moieties.
摘要翻译：提供了一种用具有至少一种多元醇如乙二醇和/或甘油的有机显影剂溶剂单独或与另外的有机溶剂如异丙醇和/或其混合物形成的正性化学放大抗蚀剂的方法，和/ 或水。本文所述的有机溶剂显影的正色调抗蚀剂可用于光刻图案形成工艺; 用于制造诸如集成电路（IC）的半导体器件; 并且对于不适合碱性溶剂的应用，例如用不需要存在酸部分的生物分子或去保护应用阵列图案化的芯片的制造。

6. 发明申请

US20140220495A1 Resist Performance for the Negative Tone Develop Organic Development Process 有权
标题翻译：抵制阴性的性能发展有机发展过程
公开(公告)号：US20140220495A1
公开(公告)日：2014-08-07
申请号：US13831570
申请日：2013-03-14
申请人： International Business Machines Corporation
发明人： Luisa D. Bozano , Dario L. Goldfarb , Linda K. Sundberg , Hoa D. Truong , Hsinyu Tsai , Gregory M. Wallraff
IPC分类号： G03F7/32 , G03F7/20
CPC分类号： G03F7/422 , G03F7/039 , G03F7/0392 , G03F7/20 , G03F7/325 , G03F7/38
摘要： A process and composition for negative tone development comprises providing a photoresist film that generates acidic sites. Irradiating the photoresist film patternwise provides an irradiated film having exposed and unexposed regions where the exposed regions comprise imaged sites. Baking the irradiated film at elevated temperatures produces a baked-irradiated film comprising the imaged sites which after irradiating, baking, or both irradiating and baking comprise acidic imaged sites. Treating the baked-irradiated film with a liquid, gaseous or vaporous weakly basic compound converts the acidic imaged sites to a base treated film having chemically modified acidic imaged sites. Applying a solvent developer substantially dissolves regions of the film that have not been exposed to the radiant energy, where the solvent developer comprises a substantial non-solvent for the chemically modified acidic imaged sites. One-step simultaneous base treatment and solvent development employs a composition comprising a mix of the basic compound and solvent developer.
摘要翻译：用于负色调发展的方法和组合物包括提供产生酸性位点的光致抗蚀剂膜。以图形方式照射光致抗蚀剂膜提供具有暴露区域和未曝光区域的照射膜，其中曝光区域包括成像位置。在升高的温度下烘烤照射的膜产生包含成像部位的焙烤辐射膜，其在照射，烘烤或照射和烘烤之后均包含酸性成像部位。用液体，气态或气态的弱碱性化合物处理烘烤过的薄膜将酸性成像部位转化为具有化学改性的酸性成像部位的碱处理膜。施加溶剂显影剂基本上溶解未暴露于辐射能的膜的区域，其中溶剂显影剂包含用于化学改性的酸性成像位点的基本非溶剂。一步同步碱处理和溶剂开发采用包含碱性化合物和溶剂显影剂混合物的组合物。

7. 发明授权

US10020199B1 Porous tin oxide films 有权
公开(公告)号：US10020199B1
公开(公告)日：2018-07-10
申请号：US15595124
申请日：2017-05-15
申请人： International Business Machines Corporation
发明人： Amy N. Bowers , Luisa D. Bozano , Andrea Fasoli , Krystelle Lionti , Elizabeth M. Lofano , Robert D. Miller , Linda K. Sundberg
IPC分类号： H01L21/30 , H01L21/02 , C03C17/25 , H01L31/046 , B01F1/00
CPC分类号： H01L21/30 , B01F2001/0044 , C03C17/253 , C03C2217/211 , C03C2217/231 , C03C2217/425 , C03C2218/113 , C03C2218/116 , H01L21/02203 , H01L21/02255 , H01L21/02282 , H01L21/02381 , H01L21/02565 , H01L21/0259 , H01L21/02623 , H01L21/02628 , H01L31/046
摘要： Initial film layers prepared from tin(II) chloride spontaneously generate open cavities when the initial film layers are thermally cured to about 400° C. using a temperature ramp of 1° C./minute to 10° C./minute while exposed to air. The openings of the bowl-shaped cavities have characteristic dimensions whose lengths are in a range of 30 nm to 300 nm in the plane of the top surfaces of the cured film layers. The cured film layers comprise tin oxide and have utility in gas sensors, electrodes, photocells, and solar cells.

8. 发明授权

US09057960B2 Resist performance for the negative tone develop organic development process 有权
标题翻译：抵消色调的表现，发展有机发展过程
公开(公告)号：US09057960B2
公开(公告)日：2015-06-16
申请号：US13831570
申请日：2013-03-14
申请人： International Business Machines Corporation
发明人： Luisa D. Bozano , Dario L. Goldfarb , Linda K. Sundberg , Hoa D. Truong , Hsinyu Tsai , Gregory M. Wallraff
IPC分类号： G03F7/26 , G03F7/32 , G03F7/20
CPC分类号： G03F7/422 , G03F7/039 , G03F7/0392 , G03F7/20 , G03F7/325 , G03F7/38
摘要： A process and composition for negative tone development comprises providing a photoresist film that generates acidic sites. Irradiating the photoresist film patternwise provides an irradiated film having exposed and unexposed regions where the exposed regions comprise imaged sites. Baking the irradiated film at elevated temperatures produces a baked-irradiated film comprising the imaged sites which after irradiating, baking, or both irradiating and baking comprise acidic imaged sites. Treating the baked-irradiated film with a liquid, gaseous or vaporous weakly basic compound converts the acidic imaged sites to a base treated film having chemically modified acidic imaged sites. Applying a solvent developer substantially dissolves regions of the film that have not been exposed to the radiant energy, where the solvent developer comprises a substantial non-solvent for the chemically modified acidic imaged sites. One-step simultaneous base treatment and solvent development employs a composition comprising a mix of the basic compound and solvent developer.
摘要翻译：用于负色调发展的方法和组合物包括提供产生酸性位点的光致抗蚀剂膜。以图形方式照射光致抗蚀剂膜提供具有暴露区域和未曝光区域的照射膜，其中曝光区域包括成像位置。在升高的温度下烘烤照射的膜产生包含成像部位的焙烤辐射膜，其在照射，烘烤或照射和烘烤之后均包含酸性成像部位。用液体，气态或气态的弱碱性化合物处理烘烤过的薄膜将酸性成像部位转化为具有化学改性的酸性成像部位的碱处理膜。施加溶剂显影剂基本上溶解未暴露于辐射能的膜的区域，其中溶剂显影剂包含用于化学改性的酸性成像位点的基本非溶剂。一步同步碱处理和溶剂开发采用包含碱性化合物和溶剂显影剂混合物的组合物。

9. 发明申请

US20180330955A1 POROUS TIN OXIDE FILMS 审中-公开
公开(公告)号：US20180330955A1
公开(公告)日：2018-11-15
申请号：US15991003
申请日：2018-05-29
申请人： International Business Machines Corporation
发明人： Amy N. Bowers , Luisa D. Bozano , Andrea Fasoli , Krystelle Lionti , Elizabeth M. Lofano , Robert D. Miller , Linda K. Sundberg
IPC分类号： H01L21/30 , H01L21/02 , C03C17/25 , H01L31/046 , B01F1/00
CPC分类号： H01L21/30 , B01F2001/0044 , C03C17/253 , C03C2217/211 , C03C2217/231 , C03C2217/425 , C03C2218/113 , C03C2218/116 , H01L21/02203 , H01L21/02255 , H01L21/02282 , H01L21/02623 , H01L31/046
摘要： Initial film layers prepared from tin(II) chloride spontaneously generate open cavities when the initial film layers are thermally cured to about 400° C. using a temperature ramp of 1° C./minute to 10° C./minute while exposed to air. The openings of the bowl-shaped cavities have characteristic dimensions whose lengths are in a range of 30 nm to 300 nm in the plane of the top surfaces of the cured film layers. The cured film layers comprise tin oxide and have utility in gas sensors, electrodes, photocells, and solar cells.

10. 发明授权

US09389516B2 Resist performance for the negative tone develop organic development process 有权
公开(公告)号：US09389516B2
公开(公告)日：2016-07-12
申请号：US14636237
申请日：2015-03-03
申请人： International Business Machines Corporation
发明人： Luisa D. Bozano , Dario L. Goldfarb , Linda K. Sundberg , Hoa D. Truong , Hsinyu Tsai , Gregory M. Walraff
IPC分类号： G03F7/42 , G03F7/38 , G03F7/039 , G03F7/20 , G03F7/32
CPC分类号： G03F7/422 , G03F7/039 , G03F7/0392 , G03F7/20 , G03F7/325 , G03F7/38
摘要： A process and composition for negative tone development comprises providing a photoresist film that generates acidic sites. Irradiating the photoresist film patternwise provides an irradiated film having exposed and unexposed regions where the exposed regions comprise imaged sites. Baking the irradiated film at elevated temperatures produces a baked-irradiated film comprising the imaged sites which after irradiating, baking, or both irradiating and baking comprise acidic imaged sites. Treating the baked-irradiated film with a liquid, gaseous or vaporous weakly basic compound converts the acidic imaged sites to a base treated film having chemically modified acidic imaged sites. Applying a solvent developer substantially dissolves regions of the film that have not been exposed to the radiant energy, where the solvent developer comprises a substantial non-solvent for the chemically modified acidic imaged sites. One-step simultaneous base treatment and solvent development employs a composition comprising a mix of the basic compound and solvent developer.

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