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    • 2. 发明授权
    • Method for making bump disks
    • 制造碰撞盘的方法
    • US5951880A
    • 1999-09-14
    • US877100
    • 1997-05-26
    • Chun-Jen ChenMing-Hung SuJoseph C-C HungJames Hsi-Tang Lee
    • Chun-Jen ChenMing-Hung SuJoseph C-C HungJames Hsi-Tang Lee
    • G11B5/60G11B23/00G11B33/10B44C1/22
    • G11B5/6005G11B23/0021G11B33/10
    • A wet etching method for making calibration bump disks for use in providing quality control of production run magnetic hard disks is disclosed. It includes the steps of: (a) coating a layer of bump material on a substrate; (b) coating a photoresist layer on the layer of bump material; (c) exposing the photoresist layer to a light source under a photomask; (d) developing the photoresist layer using a developer solution to form an undeveloped photoresist layer; (e) etching the substrate containing the layer of bump material and the undeveloped photoresist layer to remove portions of the layer of bump material not covered by the undeveloped photoresist layer; and (f) stripping the undeveloped photoresist layer to leave at least a bump on the substrate which was originally covered by the undeveloped photoresist layer. The wet etching method eliminates many of the problems observed from the conventional metal mask method, including the elimination of the convex-shaped bump surface.
    • 公开了一种用于制造用于提供生产运行磁性硬盘的质量控制的校准凸块的湿式蚀刻方法。 它包括以下步骤:(a)在衬底上涂覆一层凸块材料; (b)在凸块材料层上涂覆光致抗蚀剂层; (c)在光掩模下将光致抗蚀剂层曝光于光源; (d)使用显影剂溶液显影光致抗蚀剂层以形成未显影的光致抗蚀剂层; (e)蚀刻含有凸起材料层和未显影光致抗蚀剂层的基板以去除未被未显影光致抗蚀剂层覆盖的凸起材料层的部分; 和(f)剥离未显影的光致抗蚀剂层,以至少留下最初被未显影的光致抗蚀剂层覆盖的基底上的凸块。 湿蚀刻方法消除了从传统的金属掩模方法观察到的许多问题,包括消除凸形凸起表面。