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1. 发明申请

US20070146657A1 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US20070146657A1
公开(公告)日：2007-06-28
申请号：US11317243
申请日：2005-12-27
申请人： Hubert Mierlo , Gert-Jan Heerens , Hans Meiling , Antonius Theodorus Maria Bastein , Jacques Donck , Hedser Brug
发明人： Hubert Mierlo , Gert-Jan Heerens , Hans Meiling , Antonius Theodorus Maria Bastein , Jacques Donck , Hedser Brug
IPC分类号： G03B27/52
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G01N21/94 , G01N21/956 , G01N2021/8822 , G01N2021/95676 , G03F1/82 , G03F1/84 , G03F7/7085 , G03F7/70916
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition an extreme ultraviolet radiation beam, a patterning device configured to impart the extreme ultraviolet radiation beam with a pattern in its cross-section to form a patterned extreme ultraviolet radiation beam, a substrate table constructed to hold a substrate, a projection system provided with reflective optics configured to project the patterned extreme ultraviolet radiation beam onto a target portion of the substrate, a vacuum chamber constructed to create a vacuum environment, and a detection unit arranged within the vacuum chamber to detect contamination on the patterning device.
摘要翻译：公开了一种光刻设备。该装置包括被配置为调节极紫外线辐射束的照明系统，配置成在其横截面中赋予极紫外辐射束图案以形成图案化的极紫外辐射束的图案形成装置，基板，设置有反射光学器件的投影系统，其被配置为将图案化的极紫外辐射束投影到基板的目标部分上，构造成产生真空环境的真空室和布置在真空室内的检测单元，图案形成装置。

2. 发明申请

US20050286041A1 Lithographic apparatus and patterning device transport 有权
标题翻译：平版印刷设备和图案形成装置运输
公开(公告)号：US20050286041A1
公开(公告)日：2005-12-29
申请号：US10874690
申请日：2004-06-24
申请人： Erik Ham , Robert Gabriel Lansbergen , Ellart Meijer , Hendricus Johannes Meijer , Hans Meiling , Bastiaan Mertens , Johannes Hubertus Moors , Gert-Jan Heerens
发明人： Erik Ham , Robert Gabriel Lansbergen , Ellart Meijer , Hendricus Johannes Meijer , Hans Meiling , Bastiaan Mertens , Johannes Hubertus Moors , Gert-Jan Heerens
IPC分类号： G03B27/52 , G03B27/62
CPC分类号： G03B27/52 , G03F7/70741
摘要： The invention relates to a box for transporting lithographic patterning device, the box being arranged to cooperate with a lithographic apparatus. The transport box is provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. The box also comprises a closure part for closing the opening, and a channel system for evacuating and/or feeding gasses from/to the inner space the box. The invention also relates to a lithographic apparatus configured to cooperate with the transport box.
摘要翻译：本发明涉及一种用于输送平版印刷图案形成装置的盒子，该盒子被布置为与光刻设备配合。输送箱设置有具有用于存储图案形成装置的存储位置的内部空间和用于传送图案形成装置的开口的容器部分。该箱还包括用于封闭开口的封闭部分，以及用于将气体从盒子内部空间排出和/或送入箱体的内部空间的通道系统。本发明还涉及一种被配置为与传送箱配合的光刻设备。

3. 发明申请

US20070146658A1 Lithographic apparatus and method 审中-公开
标题翻译：平版印刷设备和方法
公开(公告)号：US20070146658A1
公开(公告)日：2007-06-28
申请号：US11318055
申请日：2005-12-27
申请人： Hubert Van Mierlo , Gert-Jan Heerens , Hans Meiling , Antonius Gerardus Maria Bastein , Jacques Cor Der Donck
发明人： Hubert Van Mierlo , Gert-Jan Heerens , Hans Meiling , Antonius Gerardus Maria Bastein , Jacques Cor Der Donck
IPC分类号： G03B27/52
CPC分类号： G03F7/70925 , G01N21/94 , G03F7/7085 , G03F7/70866 , G03F7/70916
摘要： A lithographic apparatus is disclosed. The apparatus includes a patterning device that is capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a cleaning unit arranged to clean the patterning device in-situ, and/or a detection unit arranged to detect contamination of the patterning device in-situ.
摘要翻译：公开了一种光刻设备。该装置包括能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束的图案形成装置。该设备还包括布置成原位清洁图案形成装置的清洁单元和/或被布置成现场检测图案形成装置的污染物的检测单元。

4. 发明申请

US20050286029A1 Lithographic apparatus and patterning device transport 有权
标题翻译：平版印刷设备和图案形成装置运输
公开(公告)号：US20050286029A1
公开(公告)日：2005-12-29
申请号：US10972755
申请日：2004-10-26
申请人： Erik Ham , Gert-Jan Heerens , Robert Lansbergen , Ellard Meijer , Hendricus Meijer , Hans Meiling , Bastiaan Mertens , Johannes Moors
发明人： Erik Ham , Gert-Jan Heerens , Robert Lansbergen , Ellard Meijer , Hendricus Meijer , Hans Meiling , Bastiaan Mertens , Johannes Moors
IPC分类号： G03B27/52 , G03B27/62
CPC分类号： G03B27/52 , G03F7/70741
摘要： According to an embodiment, a box for transporting a lithographic patterning device is arranged to cooperate with a lithographic apparatus. The transport box may be provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. Prior to transfer of the patterning device from the inner space to the apparatus, the inner space is pressurized. The box may also comprise a closure part for closing the opening, and/or a channel system for evacuating and/or feeding gasses from/to the inner space of the box. Other embodiments include a lithographic apparatus comprising and/or configured to cooperate with such a box.
摘要翻译：根据实施例，用于传送平版印刷图案形成装置的盒被布置成与光刻设备配合。运输箱可以设置有具有内部空间的容器部分，该内部空间具有用于存储图案形成装置的存储位置和用于图案形成装置的传送的开口。在将图案形成装置从内部空间传送到装置之前，内部空间被加压。箱子还可以包括用于关闭开口的封闭部分和/或用于将气体从箱体的内部空间排出和/或进气的通道系统。其他实施例包括包括和/或配置为与这种盒配合的光刻设备。

5. 发明授权

US07522263B2 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US07522263B2
公开(公告)日：2009-04-21
申请号：US11317243
申请日：2005-12-27
申请人： Hubert Adriaan Van Mierlo , Gert-Jan Heerens , Hans Meiling , Antonius Gerardus Theodorus Maria Bastein , Jacques Cor Johan Van der Donck , Hedser Van Brug
发明人： Hubert Adriaan Van Mierlo , Gert-Jan Heerens , Hans Meiling , Antonius Gerardus Theodorus Maria Bastein , Jacques Cor Johan Van der Donck , Hedser Van Brug
IPC分类号： G03B53/42 , G03B27/52 , G03B27/54 , G03F9/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G01N21/94 , G01N21/956 , G01N2021/8822 , G01N2021/95676 , G03F1/82 , G03F1/84 , G03F7/7085 , G03F7/70916
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition an extreme ultraviolet radiation beam, a patterning device configured to impart the extreme ultraviolet radiation beam with a pattern in its cross-section to form a patterned extreme ultraviolet radiation beam, a substrate table constructed to hold a substrate, a projection system provided with reflective optics configured to project the patterned extreme ultraviolet radiation beam onto a target portion of the substrate, a vacuum chamber constructed to create a vacuum environment, and a detection unit arranged within the vacuum chamber to detect contamination on the patterning device.
摘要翻译：公开了一种光刻设备。该装置包括被配置为调节极紫外线辐射束的照明系统，配置成在其横截面中赋予极紫外辐射束图案以形成图案化的极紫外辐射束的图案形成装置，基板，设置有反射光学器件的投影系统，其被配置为将图案化的极紫外辐射束投影到基板的目标部分上，构造成产生真空环境的真空室和布置在真空室内的检测单元，图案形成装置。

6. 发明授权

US07248340B2 Lithographic apparatus and patterning device transport 有权
标题翻译：平版印刷设备和图案形成装置运输
公开(公告)号：US07248340B2
公开(公告)日：2007-07-24
申请号：US10874690
申请日：2004-06-24
申请人： Erik Leonardus Ham , Robert Gabriël Maria Lansbergen , Ellart Alexander Meijer , Hendricus Johannes Maria Meijer , Hans Meiling , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors , Gert-Jan Heerens
发明人： Erik Leonardus Ham , Robert Gabriël Maria Lansbergen , Ellart Alexander Meijer , Hendricus Johannes Maria Meijer , Hans Meiling , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors , Gert-Jan Heerens
IPC分类号： G03B27/42 , G03B27/62
CPC分类号： G03B27/52 , G03F7/70741
摘要： A transport box for transporting a lithographic patterning device and a lithographic apparatus adapted to cooperate with the transport box are presented. The transport box is provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. The box also includes a closure part for closing the opening, and a channel system for evacuating and/or feeding gasses from/to the inner space the box.
摘要翻译：提出了用于传送平版印刷图案形成装置的传送箱和适于与传送箱配合的光刻设备。输送箱设置有具有用于存储图案形成装置的存储位置的内部空间和用于传送图案形成装置的开口的容器部分。该箱还包括用于封闭开口的封闭部分，以及用于将气体从箱体内部空间排出和/或送入箱体的内部空间的通道系统。

7. 发明授权

US07151589B2 Lithographic apparatus and patterning device transport 有权
标题翻译：平版印刷设备和图案形成装置运输
公开(公告)号：US07151589B2
公开(公告)日：2006-12-19
申请号：US10972755
申请日：2004-10-26
申请人： Erik Leonardus Ham , Gert-Jan Heerens , Robert Gabriël Maria Lansbergen , Ellard Alexander Meijer , Hendricus Johannes Maria Meijer , Hans Meiling , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors
发明人： Erik Leonardus Ham , Gert-Jan Heerens , Robert Gabriël Maria Lansbergen , Ellard Alexander Meijer , Hendricus Johannes Maria Meijer , Hans Meiling , Bastiaan Matthias Mertens , Johannes Hubertus Josephina Moors
IPC分类号： G03B27/32 , G03B27/52
CPC分类号： G03B27/52 , G03F7/70741
摘要： According to an embodiment, a box for transporting a lithographic patterning device is arranged to cooperate with a lithographic apparatus. The transport box may be provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. Prior to transfer of the patterning device from the inner space to the apparatus, the inner space is pressurized. The box may also comprise a closure part for closing the opening, and/or a channel system for evacuating and/or feeding gasses from/to the inner space of the box. Other embodiments include a lithographic apparatus comprising and/or configured to cooperate with such a box.
摘要翻译：根据实施例，用于传送平版印刷图案形成装置的盒被布置成与光刻设备配合。运输箱可以设置有具有内部空间的容器部分，该内部空间具有用于存储图案形成装置的存储位置和用于图案形成装置的传送的开口。在将图案形成装置从内部空间传送到装置之前，内部空间被加压。箱子还可以包括用于关闭开口的封闭部分和/或用于将气体从箱体的内部空间排出和/或进气的通道系统。其他实施例包括包括和/或配置为与这种盒配合的光刻设备。

8. 发明授权

US08235212B2 Mask transport system configured to transport a mask into and out of a lithographic apparatus 有权
标题翻译：掩模传送系统被配置为将掩模传送到光刻设备中和从光刻设备传出
公开(公告)号：US08235212B2
公开(公告)日：2012-08-07
申请号：US12483940
申请日：2009-06-12
申请人： Gert-Jan Heerens
发明人： Gert-Jan Heerens
IPC分类号： B65D85/00 , B65D85/48
CPC分类号： G03F1/66 , G03F7/707 , G03F7/70741 , G03F7/70808 , G03F7/70916 , G03F7/70983
摘要： A mask transport system is configured to transport a mask into and out of a lithographic apparatus. The mask transport system includes a first container configured to shield a top side and a bottom side of the mask. At least a portion of the container is at least partially translucent for radiation having a predetermined wavelength used to detect contamination on the top side or the bottom side of the mask when the mask is shielded by the first container. The mask transport system also includes a second container configured to enclose the first container. The second container includes a first part defining a first opening and an openable cover that covers the first opening. The cover is configured to open and release the first container within the lithographic apparatus or at an interface with the lithographic apparatus.
摘要翻译：掩模传送系统被配置为将掩模传送到光刻设备中和从光刻设备传出。掩模传送系统包括被配置为屏蔽掩模的顶侧和底侧的第一容器。当掩模被第一容器遮蔽时，用于具有预定波长的辐射的至少一部分至少部分是半透明的，用于检测掩模的顶侧或底侧上的污染物。掩模传送系统还包括构造成封闭第一容器的第二容器。第二容器包括限定第一开口的第一部分和覆盖第一开口的可打开盖。盖被配置为打开和释放光刻设备内的第一容器或与光刻设备的界面处。

9. 发明授权

US07423733B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby with docking system for positioning a patterning device 失效
标题翻译：平版印刷设备，器件制造方法和由此制造的器件具有用于定位图案形成装置的对接系统
公开(公告)号：US07423733B2
公开(公告)日：2008-09-09
申请号：US10894367
申请日：2004-07-20
申请人： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Gert-Jan Heerens , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra
发明人： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Gert-Jan Heerens , Robert Gabriël Maria Lansbergen , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra
IPC分类号： G03B27/62
CPC分类号： G03F7/707 , G03F7/70716 , G03F7/70741 , G03F7/70783 , G03F7/70825 , G03F7/709
摘要： The invention pertains to a lithographic apparatus that includes a docking system for positioning a patterning device, such as a reticle, relative to the reticle stage. The lithographic projection apparatus has an operational cycle that includes a projection phase, in which the reticle stage carries the patterning device and an exchange phase, in which the patterning device is exchanged and the docking system positions the patterning device relative to the reticle stage. The docking system is configured to be spaced from the patterning device during the projection phase in order to ensure that a higher accuracy of the projected image is obtained.
摘要翻译：本发明涉及一种光刻设备，其包括用于相对于标线片台定位图案形成装置（例如掩模版）的对接系统。光刻投影设备具有包括投影相的操作周期，其中标线片载物台承载图案形成装置和交换相，其中图案形成装置被更换，并且对接系统相对于掩模版台定位图案形成装置。对接系统被配置为在投影阶段与图案形成装置间隔开，以便确保获得更高的投影图像精度。

10. 发明申请

US20070247609A1 Assembly of a reticle holder and a reticle 有权
标题翻译：一个标线架和一个掩模版
公开(公告)号：US20070247609A1
公开(公告)日：2007-10-25
申请号：US11812166
申请日：2007-06-15
申请人： Gert-Jan Heerens , Bastiaan Lambertus Van De Ven
发明人： Gert-Jan Heerens , Bastiaan Lambertus Van De Ven
IPC分类号： G03B27/42 , G03B27/62
CPC分类号： G03B27/42 , G03B27/62 , G03F7/707 , G03F7/70741 , G03F9/7003 , G03F9/7011 , G03F9/7088 , G03F9/7096
摘要： A system for use in a lithographic apparatus includes an assembly of a reticle and a reticle holder. The reticle includes a marker. The system also includes a position detector arranged to detect the reticle marker to position the reticle with respect to the reticle holder, and a storage container constructed and arranged to store the assembly during the positioning of the reticle with respect to the reticle holder. The reticle holder and the detector are arranged to be kinematically aligned with respect to each other.
摘要翻译：用于光刻设备的系统包括光罩和光罩保持器的组件。标线包括标记。该系统还包括位置检测器，其布置成检测掩模版标记物以相对于光罩保持器定位光罩;以及存储容器，其被构造和布置成在掩模版相对于光罩保持器定位期间存储组件。掩模版保持器和检测器被布置成相对于彼此以运动方式对准。

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