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1. 发明授权

US06408930B1 Adjustable plate mold 失效
标题翻译：可调板模
公开(公告)号：US06408930B1
公开(公告)日：2002-06-25
申请号：US09392051
申请日：1999-09-08
申请人： Horst von Wyl , Hans Siemer , Axel Scholz
发明人： Horst von Wyl , Hans Siemer , Axel Scholz
IPC分类号： B22D1104
CPC分类号： B22D11/05
摘要： An adjustable plate mold includes two broad-side walls and first and second narrow-side walls clampable between the two broad-side walls to define a size if a slab formable by the plate mold. A frame work includes cassette holders corresponding to the narrow-side walls. Actuating elements are inserted in the cassette holders and connected to the first and second narrow-side walls for moving the first and second side walls to change the size of the slab formable by the plate mold. The framework also includes a holding part for maintaining the narrow-side walls at a constant horizontal level relative to the cassette holders.
摘要翻译：可调板模具包括两个宽侧壁和可夹紧在两个宽侧壁之间的第一和第二窄侧壁，以限定如果板模具可形成的板坯的尺寸。框架工作包括对应于窄侧壁的盒座。驱动元件插入盒座中并连接到第一和第二窄侧壁，用于移动第一和第二侧壁以改变由板模可成形的板坯的尺寸。框架还包括用于将窄侧壁相对于盒座保持在恒定水平位置的保持部件。

2. 发明授权

US07875865B2 EUV illumination system with a system for measuring fluctuations of the light source 有权
标题翻译： EUV照明系统具有用于测量光源波动的系统
公开(公告)号：US07875865B2
公开(公告)日：2011-01-25
申请号：US12098739
申请日：2008-04-07
申请人： Axel Scholz , Markus Weiss , Manfred Maul , Philipp Bosselmann
发明人： Axel Scholz , Markus Weiss , Manfred Maul , Philipp Bosselmann
IPC分类号： G03B27/42
CPC分类号： G01J1/42 , B82Y10/00 , G03F7/70033 , G03F7/70141 , G03F7/70558 , H05G2/00
摘要： The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.
摘要翻译：本公开涉及EUV（极紫外）照明系统。该系统可以包括至少一个EUV光源，以及用于测量EUV光源的强度波动和/或位置变化的孔径光阑和传感器装置，特别是在有效使用的波长的范围内，或者 EUV光源的中间图像。孔径光阑和传感器装置可以包括孔径光阑和EUV位置传感器。孔径光阑和传感器装置可以以这样的方式布置，使得孔径光阑允许源自EUV光源或其中间图像之一的辐射的特定立体角范围落在EUV位置传感器上。

3. 发明申请

US20080258070A1 EUV ILLUMINATION SYSTEM WITH A SYSTEM FOR MEASURING FLUCTUATIONS OF THE LIGHT SOURCE 有权
标题翻译：具有用于测量光源的波动的系统的EUV照明系统
公开(公告)号：US20080258070A1
公开(公告)日：2008-10-23
申请号：US12098739
申请日：2008-04-07
申请人： Axel Scholz , Markus Weiss , Manfred Maul , Philipp Bosselmann
发明人： Axel Scholz , Markus Weiss , Manfred Maul , Philipp Bosselmann
IPC分类号： G01J1/42
CPC分类号： G01J1/42 , B82Y10/00 , G03F7/70033 , G03F7/70141 , G03F7/70558 , H05G2/00
摘要： The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.
摘要翻译：本公开涉及EUV（极紫外）照明系统。该系统可以包括至少一个EUV光源，以及用于测量EUV光源的强度波动和/或位置变化的孔径光阑和传感器装置，特别是在有效使用的波长的范围内，或者 EUV光源的中间图像。孔径光阑和传感器装置可以包括孔径光阑和EUV位置传感器。孔径光阑和传感器装置可以以这样的方式布置，使得孔径光阑允许源自EUV光源或其中间图像之一的辐射的特定立体角范围落在EUV位置传感器上。

4. 发明授权

US08513628B2 EUV illumination system with a system for measuring fluctuations of the light source 有权
标题翻译： EUV照明系统具有用于测量光源波动的系统
公开(公告)号：US08513628B2
公开(公告)日：2013-08-20
申请号：US12969115
申请日：2010-12-15
申请人： Axel Scholz , Markus Weiss , Manfred Maul , Philipp Bosselmann
发明人： Axel Scholz , Markus Weiss , Manfred Maul , Philipp Bosselmann
IPC分类号： G01J1/42
CPC分类号： G01J1/42 , B82Y10/00 , G03F7/70033 , G03F7/70141 , G03F7/70558 , H05G2/00
摘要： The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.
摘要翻译：本公开涉及EUV（极紫外）照明系统。该系统可以包括至少一个EUV光源，以及用于测量EUV光源的强度波动和/或位置变化的孔径光阑和传感器装置，特别是在有效使用的波长的范围内，或者 EUV光源的中间图像。孔径光阑和传感器装置可以包括孔径光阑和EUV位置传感器。孔径光阑和传感器装置可以以这样的方式布置，使得孔径光阑允许源自EUV光源或其中间图像之一的辐射的特定立体角范围落在EUV位置传感器上。

5. 发明申请

US20130148092A1 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
公开(公告)号：US20130148092A1
公开(公告)日：2013-06-13
申请号：US13760268
申请日：2013-02-06
申请人： Johannes Wangler , Heiko Siekmann , Kenneth Weible , Ralf Scharnweber , Manfred Maul , Markus Deguenther , Michael Layh , Axel Scholz , Uwe Spengler , Reinhard Voelkel
发明人： Johannes Wangler , Heiko Siekmann , Kenneth Weible , Ralf Scharnweber , Manfred Maul , Markus Deguenther , Michael Layh , Axel Scholz , Uwe Spengler , Reinhard Voelkel
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G02B3/0056 , G02B27/0911 , G03F7/70058 , G03F7/70075 , G03F7/70083 , G03F7/70158
摘要： Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.

6. 发明申请

US20120019796A1 ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY 有权
标题翻译：微观照明系统
公开(公告)号：US20120019796A1
公开(公告)日：2012-01-26
申请号：US13186068
申请日：2011-07-19
申请人： Axel Scholz , Frank Schlesener , Nils Haverkamp , Vladimir Davydenko , Michael Gerhard , Gerhard-Wilhelm Ziegler , Mirco Kern , Thomas Bischoff , Thomas Stammler , Stephan Kellner , Manfred Maul , Daniel Walldorf , Igor Hurevich , Markus Deguenther
发明人： Axel Scholz , Frank Schlesener , Nils Haverkamp , Vladimir Davydenko , Michael Gerhard , Gerhard-Wilhelm Ziegler , Mirco Kern , Thomas Bischoff , Thomas Stammler , Stephan Kellner , Manfred Maul , Daniel Walldorf , Igor Hurevich , Markus Deguenther
IPC分类号： G03B27/54
CPC分类号： G03F7/70191 , G02B3/0043 , G03F7/70058 , G03F7/70075 , G03F7/70083
摘要： An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects. The raster elements of the two raster arrangements are arranged relative to one another in such a way that to each raster element type (I to III) is allocated at least one individual distance (ΔI, ΔII, ΔIII) between the first raster element of this type (I to III) and the allocated second raster element of the second raster arrangement. As a result, an illumination system is obtained which allows particular illumination parameters to be influenced in such a way that undesirable influences on other illumination parameters are avoided to the greatest extent possible.
摘要翻译：用于微光刻的照明系统用于利用一次光源的照明光照射照明场。第一光栅布置具有束形成的第一光栅元件，其布置在照明系统的第一平面中或与该平面相邻。第一光栅布置用于产生二次光源的光栅布置。传输光学器件用于将次级光源的照明光的叠加传输到照明场中。传输光学器件具有第二光栅装置，其具有束形成第二光栅元件。在每种情况下，第一光栅装置的一个光栅元件被分配给第二光栅布置的光栅元件之一，用于引导整束照明光的部分束。例如，第一光栅布置具有至少两种具有不同束影响效果的第一光栅元件（I，II，III）。两个光栅装置的光栅元件相对于彼此布置成使得每个光栅元素类型（I至III）被分配至少一个单独距离（＆Dgr; I，＆Dgr; II，＆Dgr; III）这种类型的第一光栅元素（I至III）和第二光栅布置的分配的第二光栅元素。结果，获得允许特定照明参数受到影响的照明系统，使得最大程度地避免对其他照明参数的不期望的影响。

7. 发明申请

US20110083542A1 OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微电子投影曝光装置照明系统的光学积分器
公开(公告)号：US20110083542A1
公开(公告)日：2011-04-14
申请号：US12973234
申请日：2010-12-20
申请人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
发明人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
IPC分类号： B26D3/06 , B26D7/27
CPC分类号： G03F7/70958 , G03F7/70075 , Y10T83/0304 , Y10T83/04
摘要： The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.
摘要翻译：本发明涉及一种被配置为在微光刻投影曝光设备的照明系统中产生多个次级光源的光学积分器。本公开还涉及制造用于这种照明系统的细长微透镜阵列的方法。细长微透镜的数组经常被包含在这种照明系统的光学积分器或散射板中。

8. 发明申请

US20050274897A1 Illumination system for a wavelength of less than or equal to 193 nm, with sensors for determining an illumination 有权
标题翻译：波长小于或等于193nm的照明系统，具有用于确定照明的传感器
公开(公告)号：US20050274897A1
公开(公告)日：2005-12-15
申请号：US11091238
申请日：2005-03-28
申请人： Wolfgang Singer , Martin Antoni , Johannes Wangler , Markus Weiss , Vadim Banine , Marcel Dierichs , Roel Moors , Karl Schuster , Axel Scholz , Philipp Bosselmann , Bernd Warm
发明人： Wolfgang Singer , Martin Antoni , Johannes Wangler , Markus Weiss , Vadim Banine , Marcel Dierichs , Roel Moors , Karl Schuster , Axel Scholz , Philipp Bosselmann , Bernd Warm
IPC分类号： G03F7/20 , G01J1/42
CPC分类号： G03F7/7085 , G03F7/70141 , G03F7/70558
摘要： There is provided an illumination system that includes (a) a light source that emits light having a wavelength ≦193 nm, where the light provides a predetermined illumination in a plane distant from the light source and defines a used area in the plane, and (b) a sensor, situated in or near the plane, for detecting light outside the used area.
摘要翻译：提供了一种照明系统，其包括（a）发射波长<= 193nm的光的光源，其中所述光在远离光源的平面中提供预定照明并且在平面中限定使用区域，以及（b）位于或靠近平面的传感器，用于检测使用区域外的光。

9. 发明授权

US08395756B2 Illumination system for a microlithographic projection exposure apparatus 有权
公开(公告)号：US08395756B2
公开(公告)日：2013-03-12
申请号：US12190308
申请日：2008-08-12
申请人： Johannes Wangler , Heiko Siekmann , Kenneth Weible , Ralf Scharnweber , Manfred Maul , Markus Deguenther , Michael Layh , Axel Scholz , Uwe Spengler , Reinhard Voelkel
发明人： Johannes Wangler , Heiko Siekmann , Kenneth Weible , Ralf Scharnweber , Manfred Maul , Markus Deguenther , Michael Layh , Axel Scholz , Uwe Spengler , Reinhard Voelkel
IPC分类号： G03B27/32 , G03B27/42 , G03B27/54 , G03B27/72
CPC分类号： G03F7/70191 , G02B3/0056 , G02B27/0911 , G03F7/70058 , G03F7/70075 , G03F7/70083 , G03F7/70158
摘要： Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.

10. 发明授权

US07880969B2 Optical integrator for an illumination system of a microlithographic projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的照明系统的光学积分器
公开(公告)号：US07880969B2
公开(公告)日：2011-02-01
申请号：US12186365
申请日：2008-08-05
申请人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
发明人： Oliver Wolf , Heiko Siekmann , Eva Kalchbrenner , Siegfried Rennon , Johannes Wangler , Andre Bresan , Michael Gerhard , Nils Haverkamp , Axel Scholz , Ralf Scharnweber , Michael Layh , Stefan Burkart
IPC分类号： G02B27/10
CPC分类号： G03F7/70958 , G03F7/70075 , Y10T83/0304 , Y10T83/04
摘要： The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.
摘要翻译：本发明涉及一种被配置为在微光刻投影曝光装置的照明系统中产生多个次级光源的光学积分器。本公开还涉及制造用于这种照明系统的细长微透镜阵列的方法。细长微透镜的数组经常被包含在这种照明系统的光学积分器或散射板中。

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