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1. 发明申请

US20110079737A1 EUV ILLUMINATION SYSTEM WITH A SYSTEM FOR MEASURING FLUCTUATIONS OF THE LIGHT SOURCE 有权
标题翻译：具有用于测量光源的波动的系统的EUV照明系统
公开(公告)号：US20110079737A1
公开(公告)日：2011-04-07
申请号：US12969115
申请日：2010-12-15
申请人： Axel Scholz , Markus Weiss , Manfred Maul , Philipp Bosselmann
发明人： Axel Scholz , Markus Weiss , Manfred Maul , Philipp Bosselmann
IPC分类号： G01J3/10
CPC分类号： G01J1/42 , B82Y10/00 , G03F7/70033 , G03F7/70141 , G03F7/70558 , H05G2/00
摘要： The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.
摘要翻译：本公开涉及EUV（极紫外）照明系统。该系统可以包括至少一个EUV光源，以及用于测量EUV光源的强度波动和/或位置变化的孔径光阑和传感器装置，特别是在有效使用的波长的范围内，或者 EUV光源的中间图像。孔径光阑和传感器装置可以包括孔径光阑和EUV位置传感器。孔径光阑和传感器装置可以以这样的方式布置，使得孔径光阑允许源自EUV光源或其中间图像之一的辐射的特定立体角范围落在EUV位置传感器上。

2. 发明授权

US07875865B2 EUV illumination system with a system for measuring fluctuations of the light source 有权
标题翻译： EUV照明系统具有用于测量光源波动的系统
公开(公告)号：US07875865B2
公开(公告)日：2011-01-25
申请号：US12098739
申请日：2008-04-07
申请人： Axel Scholz , Markus Weiss , Manfred Maul , Philipp Bosselmann
发明人： Axel Scholz , Markus Weiss , Manfred Maul , Philipp Bosselmann
IPC分类号： G03B27/42
CPC分类号： G01J1/42 , B82Y10/00 , G03F7/70033 , G03F7/70141 , G03F7/70558 , H05G2/00
摘要： The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.
摘要翻译：本公开涉及EUV（极紫外）照明系统。该系统可以包括至少一个EUV光源，以及用于测量EUV光源的强度波动和/或位置变化的孔径光阑和传感器装置，特别是在有效使用的波长的范围内，或者 EUV光源的中间图像。孔径光阑和传感器装置可以包括孔径光阑和EUV位置传感器。孔径光阑和传感器装置可以以这样的方式布置，使得孔径光阑允许源自EUV光源或其中间图像之一的辐射的特定立体角范围落在EUV位置传感器上。

3. 发明申请

US20080258070A1 EUV ILLUMINATION SYSTEM WITH A SYSTEM FOR MEASURING FLUCTUATIONS OF THE LIGHT SOURCE 有权
标题翻译：具有用于测量光源的波动的系统的EUV照明系统
公开(公告)号：US20080258070A1
公开(公告)日：2008-10-23
申请号：US12098739
申请日：2008-04-07
申请人： Axel Scholz , Markus Weiss , Manfred Maul , Philipp Bosselmann
发明人： Axel Scholz , Markus Weiss , Manfred Maul , Philipp Bosselmann
IPC分类号： G01J1/42
CPC分类号： G01J1/42 , B82Y10/00 , G03F7/70033 , G03F7/70141 , G03F7/70558 , H05G2/00
摘要： The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.
摘要翻译：本公开涉及EUV（极紫外）照明系统。该系统可以包括至少一个EUV光源，以及用于测量EUV光源的强度波动和/或位置变化的孔径光阑和传感器装置，特别是在有效使用的波长的范围内，或者 EUV光源的中间图像。孔径光阑和传感器装置可以包括孔径光阑和EUV位置传感器。孔径光阑和传感器装置可以以这样的方式布置，使得孔径光阑允许源自EUV光源或其中间图像之一的辐射的特定立体角范围落在EUV位置传感器上。

4. 发明授权

US08513628B2 EUV illumination system with a system for measuring fluctuations of the light source 有权
标题翻译： EUV照明系统具有用于测量光源波动的系统
公开(公告)号：US08513628B2
公开(公告)日：2013-08-20
申请号：US12969115
申请日：2010-12-15
申请人： Axel Scholz , Markus Weiss , Manfred Maul , Philipp Bosselmann
发明人： Axel Scholz , Markus Weiss , Manfred Maul , Philipp Bosselmann
IPC分类号： G01J1/42
CPC分类号： G01J1/42 , B82Y10/00 , G03F7/70033 , G03F7/70141 , G03F7/70558 , H05G2/00
摘要： The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.
摘要翻译：本公开涉及EUV（极紫外）照明系统。该系统可以包括至少一个EUV光源，以及用于测量EUV光源的强度波动和/或位置变化的孔径光阑和传感器装置，特别是在有效使用的波长的范围内，或者 EUV光源的中间图像。孔径光阑和传感器装置可以包括孔径光阑和EUV位置传感器。孔径光阑和传感器装置可以以这样的方式布置，使得孔径光阑允许源自EUV光源或其中间图像之一的辐射的特定立体角范围落在EUV位置传感器上。

5. 发明授权

US08873023B2 Illumination system for microlithography 有权
标题翻译：微光刻照明系统
公开(公告)号：US08873023B2
公开(公告)日：2014-10-28
申请号：US13186068
申请日：2011-07-19
申请人： Axel Scholz , Frank Schlesener , Nils Haverkamp , Vladimir Davydenko , Michael Gerhard , Gerhard-Wilhelm Ziegler , Mirco Kern , Thomas Bischoff , Thomas Stammler , Stephan Kellner , Manfred Maul , Daniel Walldorf , Igor Hurevich , Markus Deguenther
发明人： Axel Scholz , Frank Schlesener , Nils Haverkamp , Vladimir Davydenko , Michael Gerhard , Gerhard-Wilhelm Ziegler , Mirco Kern , Thomas Bischoff , Thomas Stammler , Stephan Kellner , Manfred Maul , Daniel Walldorf , Igor Hurevich , Markus Deguenther
IPC分类号： G03B27/54 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70191 , G02B3/0043 , G03F7/70058 , G03F7/70075 , G03F7/70083
摘要： An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects. The raster elements of the two raster arrangements are arranged relative to one another in such a way that to each raster element type (I to III) is allocated at least one individual distance (ΔI, ΔII, ΔIII) between the first raster element of this type (I to III) and the allocated second raster element of the second raster arrangement. As a result, an illumination system is obtained which allows particular illumination parameters to be influenced in such a way that undesirable influences on other illumination parameters are avoided to the greatest extent possible.
摘要翻译：用于微光刻的照明系统用于利用一次光源的照明光照射照明场。第一光栅布置具有束形成的第一光栅元件，其布置在照明系统的第一平面中或与该平面相邻。第一光栅布置用于产生二次光源的光栅布置。传输光学器件用于将次级光源的照明光的叠加传输到照明场中。传输光学器件具有第二光栅装置，其具有束形成第二光栅元件。在每种情况下，第一光栅装置的一个光栅元件被分配给第二光栅布置的光栅元件之一，用于引导整束照明光的部分束。例如，第一光栅布置具有至少两种具有不同束影响效果的第一光栅元件（I，II，III）。两个光栅装置的光栅元件相对于彼此布置成使得每个光栅元素类型（I至III）被分配至少一个单独距离（＆Dgr; I，＆Dgr; II，＆Dgr; III）这种类型的第一光栅元素（I至III）和第二光栅布置的分配的第二光栅元素。结果，获得允许特定照明参数受到影响的照明系统，使得最大程度地避免对其他照明参数的不期望的影响。

6. 发明授权

US08730455B2 Illumination system for a microlithographic projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的照明系统
公开(公告)号：US08730455B2
公开(公告)日：2014-05-20
申请号：US13181033
申请日：2011-07-12
申请人： Damian Fiolka , Manfred Maul , Axel Scholz , Markus Deguenther , Johannes Wangler , Vladimir Davydenko
发明人： Damian Fiolka , Manfred Maul , Axel Scholz , Markus Deguenther , Johannes Wangler , Vladimir Davydenko
IPC分类号： G03B27/54 , G03B27/72 , G03F7/20 , G03B27/68 , G03B27/42 , G03B27/52
CPC分类号： G03F7/7015 , G03B27/54 , G03F7/70075 , G03F7/70108
摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.
摘要翻译：用于微光刻投影曝光步进扫描装置的照明系统具有光源，第一光栅元件和第二光栅元件。第一光栅元件在照明系统的第一光瞳平面中延伸，并且被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。第二光栅元件在照明系统的第二光瞳平面中延伸，其不一定与第一光瞳平面不同，并且被设计成使得系统的几何光通量在扫描方向上和垂直于其上增加。这使得可以提高掩模版平面中的辐照度均匀性。

7. 发明申请

US20090021716A1 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置照明系统
公开(公告)号：US20090021716A1
公开(公告)日：2009-01-22
申请号：US12190308
申请日：2008-08-12
申请人： Johannes Wangler , Heiko Siekmann , Kenneth Weible , Ralf Scharnweber , Manfred Maul , Markus Deguenther , Michael Layh , Axel Scholz , Uwe Spengler , Reinhard Voelkel
发明人： Johannes Wangler , Heiko Siekmann , Kenneth Weible , Ralf Scharnweber , Manfred Maul , Markus Deguenther , Michael Layh , Axel Scholz , Uwe Spengler , Reinhard Voelkel
IPC分类号： G03B27/54
CPC分类号： G03F7/70191 , G02B3/0056 , G02B27/0911 , G03F7/70058 , G03F7/70075 , G03F7/70083 , G03F7/70158
摘要： Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.
摘要翻译：公开了用于微光刻投影曝光装置的照明系统，以及相关系统，组件和方法。在一些实施例中，照明系统包括一个或多个散射结构和产生多个次级光源的光学积分器。

8. 发明授权

US07408622B2 Illumination system and polarizer for a microlithographic projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的照明系统和偏振器
公开(公告)号：US07408622B2
公开(公告)日：2008-08-05
申请号：US10994141
申请日：2004-11-19
申请人： Damian Fiolka , Axel Scholz , Manfred Maul
发明人： Damian Fiolka , Axel Scholz , Manfred Maul
IPC分类号： G03B27/72 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70058 , G03F7/70566
摘要： An illumination system for a microlithographic projection exposure apparatus includes a light source (1) for generating projection light, a masking arrangement (5) for masking a reticle (R) and a masking objective (6) for imaging the masking arrangement (5) on the reticle (R). A polarizer (10) for generating linearly polarized light is arranged in the masking objective (6). The polarizer (10) may comprise, for example, polarization-selective beam splitting layers (54, 56; 154, 156; 292, 294) arranged at an angle to one another, which are transparent to light in a first polarisation state (68) and reflect light in different second polarisation state (70).
摘要翻译：一种用于微光刻投影曝光装置的照明系统，包括用于产生投影光的光源（1），用于掩蔽掩模版（R）的掩模装置（5）和用于使掩蔽装置（5）成像成像的掩蔽物镜标线（R）。用于产生线性偏振光的偏振器（10）布置在掩蔽物镜（6）中。偏振器（10）可以包括例如以彼此成角度布置的偏振选择性分束层（54,56; 154,156; 292,294），其对于第一偏振状态的光（68 ）并且以不同的第二偏振状态（70）反射光。

9. 发明申请

US20070206171A1 Illumination system for a microlithographic projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的照明系统
公开(公告)号：US20070206171A1
公开(公告)日：2007-09-06
申请号：US11505408
申请日：2006-08-17
申请人： Damian Fiolka , Manfred Maul , Vladimir Davydenko , Axel Scholz , Markus Deguenther , Johannes Wangler
发明人： Damian Fiolka , Manfred Maul , Vladimir Davydenko , Axel Scholz , Markus Deguenther , Johannes Wangler
IPC分类号： G03B27/54
CPC分类号： G03F7/7015 , G03B27/54 , G03F7/70075 , G03F7/70108
摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.
摘要翻译：用于微光刻投影曝光步进扫描装置的照明系统具有光源，第一光栅元件和第二光栅元件。第一光栅元件在照明系统的第一光瞳平面中延伸，并且被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。第二光栅元件在照明系统的第二光瞳平面中延伸，其不一定与第一光瞳平面不同，并且被设计成使得系统的几何光通量在扫描方向上和垂直于其上增加。这使得可以提高掩模版平面中的辐照度均匀性。

10. 发明申请

US20050140958A1 Illumination system and polarizer for a microlithographic projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的照明系统和偏振器
公开(公告)号：US20050140958A1
公开(公告)日：2005-06-30
申请号：US10994141
申请日：2004-11-19
申请人： Damian Fiolka , Axel Scholz , Manfred Maul
发明人： Damian Fiolka , Axel Scholz , Manfred Maul
IPC分类号： G03F7/20 , G03B27/72
CPC分类号： G03F7/70058 , G03F7/70566
摘要： An illumination system for a microlithographic projection exposure apparatus includes a light source (1) for generating projection light, a masking arrangement (5) for masking a reticle (R) and a masking objective (6) for imaging the masking arrangement (5) on the reticle (R). A polarizer (10) for generating linearly polarized light is arranged in the masking objective (6). The polarizer (10) may comprise, for example, polarization-selective beam splitting layers (54, 56; 154, 156; 292, 294) arranged at an angle to one another, which are transparent to light in a first polarisation state (68) and reflect light in different second polarisation state (70).
摘要翻译：一种用于微光刻投影曝光装置的照明系统，包括用于产生投影光的光源（1），用于掩蔽掩模版（R）的掩模装置（5）和用于使掩蔽装置（5）成像成像的掩蔽物镜标线（R）。用于产生线性偏振光的偏振器（10）布置在掩蔽物镜（6）中。偏振器（10）可以包括例如以彼此成角度布置的偏振选择性分束层（54,56; 154,156; 292,294），其对于第一偏振状态的光（68 ）并且以不同的第二偏振状态（70）反射光。

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