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1. 发明授权

US08623773B2 Etchant for metal layer including copper or a copper alloy, method of manufacturing a display substrate using the same and display substrate 有权
标题翻译：包括铜或铜合金的金属层的蚀刻剂，使用其的显示基板的制造方法和显示基板
公开(公告)号：US08623773B2
公开(公告)日：2014-01-07
申请号：US13438405
申请日：2012-04-03
申请人： Hong-Sick Park , Wang-Woo Lee
发明人： Hong-Sick Park , Wang-Woo Lee
IPC分类号： H01L21/302
CPC分类号： C09K13/08 , C23F1/02 , C23F1/18 , H01L21/32134 , H01L27/124
摘要： An etchant includes about 50% by weight to about 70% by weight of phosphoric acid, about 1% by weight to about 5% by weight of nitric acid, about 10% by weight to about 20% by weight of acetic acid, about 0.1% by weight to about 2% by weight of a corrosion inhibition agent including an azole-based compound and a remainder of water.
摘要翻译：蚀刻剂包括约50重量％至约70重量％的磷酸，约1重量％至约5重量％的硝酸，约10重量％至约20重量％的乙酸，约0.1 约2重量％的包含唑类化合物和其余水的腐蚀抑制剂。

2. 发明授权

US09062244B2 Etching composition and method of manufacturing a display substrate using the system 有权
标题翻译：蚀刻组合物及其制造方法
公开(公告)号：US09062244B2
公开(公告)日：2015-06-23
申请号：US13534502
申请日：2012-06-27
申请人： Hong-Sick Park , Wang-Woo Lee , Bong-Kyun Kim , O-Byoung Kwon , Kyung-Bo Shim , Sang-Hoon Jang
发明人： Hong-Sick Park , Wang-Woo Lee , Bong-Kyun Kim , O-Byoung Kwon , Kyung-Bo Shim , Sang-Hoon Jang
IPC分类号： H01L21/302 , H01L21/461 , C09K13/04 , C23F1/18 , C23F1/02 , C23F1/38 , C23F1/44 , C09K13/08 , H01L21/3213 , H01L27/12
CPC分类号： C09K13/04 , C09K13/08 , C23F1/02 , C23F1/18 , C23F1/38 , C23F1/44 , H01L21/32134 , H01L27/124 , H01L27/1288
摘要： An etching composition and a method of manufacturing a display substrate using the etching composition are disclosed. The etching composition includes phosphoric acid (H3PO4) of about 40% by weight to about 70% by weight, nitric acid (HNO3) of about 5% by weight to about 15% by weight, acetic acid (CH3COOH) of about 5% by weight to about 20% by weight, and a remainder of water. Thus, a metal layer including copper may be stably etched.
摘要翻译：公开了一种蚀刻组合物和使用该蚀刻组合物制造显示衬底的方法。蚀刻组合物包括约40重量％至约70重量％的磷酸（H 3 PO 4），约5重量％至约15重量％的硝酸（HNO 3），约5重量％至约15重量％的乙酸（CH 3 COOH）重量至约20％重量，余量为水。因此，可以稳定地蚀刻包括铜的金属层。

3. 发明授权

US08785935B2 Etchant, display device and method for manufacturing display device using the same 有权
标题翻译：蚀刻剂，显示装置及使用其的显示装置的制造方法
公开(公告)号：US08785935B2
公开(公告)日：2014-07-22
申请号：US13168408
申请日：2011-06-24
申请人： Hong-Sick Park , Wang-Woo Lee , Sang-Tae Kim , Joon-Woo Lee , Young-Chul Park , Young-Jun Jin , Kyong-Min Kang , Young-Jin Yoon , Suck-Jun Lee , O-Byoung Kwon , In-Ho Yu , Sang-Hoon Jang , Min-Ki Lim , Dong-Ki Kim
发明人： Hong-Sick Park , Wang-Woo Lee , Sang-Tae Kim , Joon-Woo Lee , Young-Chul Park , Young-Jun Jin , Kyong-Min Kang , Young-Jin Yoon , Suck-Jun Lee , O-Byoung Kwon , In-Ho Yu , Sang-Hoon Jang , Min-Ki Lim , Dong-Ki Kim
IPC分类号： H01L29/04 , H01L27/12
CPC分类号： H01L27/127 , H01L21/32134 , H01L27/124 , H01L27/1259 , H01L29/41733
摘要： An etchant includes: 5 to 20 wt % of persulfate, 1 to 10 wt % of at least one compound of an inorganic acid, an inorganic acid salt, or a mixture thereof, 0.3 to 5 wt % of a cyclic amine compound, 1 to 10 wt % of at least one compound of an organic acid, an organic acid salt, or a mixture thereof, 0.1 to 5 wt % of p-toluenesulfonic acid, and water, based on the total weight of the etchant. A copper-titanium etchant further includes 0.01 to 2 wt % of a fluoride-containing compound. A method of forming a display device using the etchant, and a display device, are also disclosed.
摘要翻译：蚀刻剂包括：5〜20重量％的过硫酸盐，1〜10重量％的至少一种无机酸化合物，无机酸盐或其混合物，0.3〜5重量％的环状胺化合物，1〜 10重量％的至少一种有机酸化合物，有机酸盐或其混合物，0.1至5重量％的对甲苯磺酸和水，基于蚀刻剂的总重量。另外，铜 - 钛蚀刻剂还含有0.01〜2重量％的含氟化合物。还公开了使用蚀刻剂形成显示装置的方法和显示装置。

4. 发明授权

US08603867B2 Composition for removing a photoresist and method of manufacturing a thin-film transistor substrate using the composition 有权
标题翻译：用于除去光致抗蚀剂的组合物和使用该组合物制造薄膜晶体管基板的方法
公开(公告)号：US08603867B2
公开(公告)日：2013-12-10
申请号：US13439418
申请日：2012-04-04
申请人： Bong-Kyun Kim , Shin-Il Choi , Hong-Sick Park , Wang-Woo Lee , Seok-Jun Jang , Byung-Uk Kim , Sun-Joo Park , Suk-Il Yoon , Jong-Hyun Jeong , Soon-Beom Hur
发明人： Bong-Kyun Kim , Shin-Il Choi , Hong-Sick Park , Wang-Woo Lee , Seok-Jun Jang , Byung-Uk Kim , Sun-Joo Park , Suk-Il Yoon , Jong-Hyun Jeong , Soon-Beom Hur
IPC分类号： H01L21/312
CPC分类号： G03F7/425 , H01L21/31133 , H01L27/1288 , H01L29/66765
摘要： A composition for removing a photoresist, the composition including about 1% by weight to about 10% by weight of tetramethyl ammonium hydroxide (“TMAH”), about 1% by weight to about 10% by weight of an alkanol amine, about 50% by weight to about 70% by weight of a glycol ether compound, about 0.01% by weight to about 1% by weight of a triazole compound, about 20% by weight to about 40% by weight of a polar solvent, and water, each based on a total weight of the composition.
摘要翻译：用于除去光致抗蚀剂的组合物，该组合物包含约1重量％至约10重量％的四甲基氢氧化铵（“TMAH”），约1重量％至约10重量％的烷醇胺，约50重量％约70重量％的二醇醚化合物，约0.01重量％至约1重量％的三唑化合物，约20重量％至约40重量％的极性溶剂和水，各自基于组合物的总重量。

5. 发明申请

US20130115727A1 ETCHING COMPOSITION AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SYSTEM 有权
标题翻译：蚀刻组合物和使用该系统制造显示基板的方法
公开(公告)号：US20130115727A1
公开(公告)日：2013-05-09
申请号：US13534502
申请日：2012-06-27
申请人： Hong-Sick Park , Wang-Woo Lee , Bong-Kyun Kim , O-Byoung Kwon , Kyung-Bo Shim , Sang-Hoon Jang
发明人： Hong-Sick Park , Wang-Woo Lee , Bong-Kyun Kim , O-Byoung Kwon , Kyung-Bo Shim , Sang-Hoon Jang
IPC分类号： C09K13/06 , H01L33/34 , H01L33/26 , C23F1/18
CPC分类号： C09K13/04 , C09K13/08 , C23F1/02 , C23F1/18 , C23F1/38 , C23F1/44 , H01L21/32134 , H01L27/124 , H01L27/1288
摘要： An etching composition and a method of manufacturing a display substrate using the etching composition are disclosed. The etching composition includes phosphoric acid (H3PO4) of about 40% by weight to about 70% by weight, nitric acid (HNO3) of about 5% by weight to about 15% by weight, acetic acid (CH3COOH) of about 5% by weight to about 20% by weight, and a remainder of water. Thus, a metal layer including copper may be stably etched.
摘要翻译：公开了一种蚀刻组合物和使用该蚀刻组合物制造显示衬底的方法。蚀刻组合物包括约40重量％至约70重量％的磷酸（H 3 PO 4），约5重量％至约15重量％的硝酸（HNO 3），约5重量％至约15重量％的乙酸（CH 3 COOH）重量至约20％重量，余量为水。因此，可以稳定地蚀刻包括铜的金属层。

6. 发明授权

US08377325B2 Etchant for metal wiring and method for manufacturing metal wiring using the same 有权
标题翻译：金属布线用蚀刻剂及使用其的金属布线的制造方法
公开(公告)号：US08377325B2
公开(公告)日：2013-02-19
申请号：US13032563
申请日：2011-02-22
申请人： Nam-Seok Suh , Sun-Young Hong , Jong-Hyun Choung , Bong-Kyun Kim , Hong-Sick Park , Jean-Ho Song , Wang-Woo Lee , Do-Won Kim , Sang-Woo Kim , Won-Guk Seo , Hyun-Cheol Shin , Ki-Beom Lee , Sam-Young Cho
发明人： Nam-Seok Suh , Sun-Young Hong , Jong-Hyun Choung , Bong-Kyun Kim , Hong-Sick Park , Jean-Ho Song , Wang-Woo Lee , Do-Won Kim , Sang-Woo Kim , Won-Guk Seo , Hyun-Cheol Shin , Ki-Beom Lee , Sam-Young Cho
IPC分类号： B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00 , C25F3/00
CPC分类号： C09K13/08 , C23F1/18 , C23F1/26 , C23F1/44 , H01L21/28088 , H01L21/32134 , H01L27/1214 , H01L27/124 , H05K3/067
摘要： Exemplary embodiments of the present invention provide a metal wiring etchant. A metal wiring etchant according to an exemplary embodiment of the present invention includes ammonium persulfate, an organic acid, an ammonium salt, a fluorine-containing compound, a glycol-based compound, and an azole-based compound.
摘要翻译：本发明的示例性实施方案提供金属线路蚀刻剂。根据本发明的示例性实施方式的金属线蚀刻剂包括过硫酸铵，有机酸，铵盐，含氟化合物，二醇类化合物和唑类化合物。

7. 发明授权

US08357554B2 Display substrate and method of manufacturing the same 有权
标题翻译：显示基板及其制造方法
公开(公告)号：US08357554B2
公开(公告)日：2013-01-22
申请号：US13156986
申请日：2011-06-09
申请人： Wang-Woo Lee , Hong-Sick Park
发明人： Wang-Woo Lee , Hong-Sick Park
IPC分类号： H01L21/00
CPC分类号： H01L33/0041 , H01L27/1218 , H01L27/1225 , H01L27/124 , H01L27/1292
摘要： A display substrate having a low resistance signal line and a method of manufacturing the display substrate are provided. The display substrate includes an insulation substrate, a gate line, a data line and a pixel electrode. The gate line gate line is formed through a sub-trench and an opening portion. The sub-trench is formed in the insulation substrate and the opening portion is formed through a planarization layer on the insulation substrate at a position corresponding to the position of the sub-trench. The data line crosses the gate line. The pixel electrode is electrically connected to the gate line and the data line through a switching element. Thus, a signal line is formed through a trench formed by using a planarization layer and an insulation substrate, so that a resistance of the signal line may be reduced.
摘要翻译：提供具有低电阻信号线的显示基板和制造显示基板的方法。显示基板包括绝缘基板，栅极线，数据线和像素电极。栅极线栅极线通过子沟槽和开口部分形成。子沟槽形成在绝缘衬底中，并且开口部分通过绝缘衬底上的与子沟槽位置对应的位置处的平坦化层形成。数据线穿过栅极线。像素电极通过开关元件电连接到栅极线和数据线。因此，通过使用平坦化层和绝缘基板形成的沟槽形成信号线，使得信号线的电阻可能降低。

8. 发明申请

US20130015471A1 ETCHANT FOR METAL LAYER INCLUDING COPPER OR A COPPER ALLOY, METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME AND DISPLAY SUBSTRATE 有权
标题翻译：用于包括铜或铜合金的金属层的蚀刻剂，使用其的显示基板的制造方法和显示基板
公开(公告)号：US20130015471A1
公开(公告)日：2013-01-17
申请号：US13438405
申请日：2012-04-03
申请人： Hong-Sick PARK , Wang-Woo Lee
发明人： Hong-Sick PARK , Wang-Woo Lee
IPC分类号： H01L27/15 , C09K13/08 , H01L33/08 , C09K13/06
CPC分类号： C09K13/08 , C23F1/02 , C23F1/18 , H01L21/32134 , H01L27/124
摘要： An etchant includes about 50% by weight to about 70% by weight of phosphoric acid, about 1% by weight to about 5% by weight of nitric acid, about 10% by weight to about 20% by weight of acetic acid, about 0.1% by weight to about 2% by weight of a corrosion inhibition agent including an azole-based compound and a remainder of water.
摘要翻译：蚀刻剂包括约50重量％至约70重量％的磷酸，约1重量％至约5重量％的硝酸，约10重量％至约20重量％的乙酸，约0.1 约2重量％的包含唑类化合物和其余水的腐蚀抑制剂。

9. 发明授权

US08637399B2 Etching composition, method of forming a metal pattern and method of manufacturing a display substrate 有权
标题翻译：蚀刻组合物，形成金属图案的方法和制造显示基板的方法
公开(公告)号：US08637399B2
公开(公告)日：2014-01-28
申请号：US13600392
申请日：2012-08-31
申请人： Hong-Sick Park , Bong-Kyun Kim , Wang-Woo Lee , Ki-Beom Lee , Sam-Young Cho , Won-Guk Seo , Gyu-Po Kim
发明人： Hong-Sick Park , Bong-Kyun Kim , Wang-Woo Lee , Ki-Beom Lee , Sam-Young Cho , Won-Guk Seo , Gyu-Po Kim
IPC分类号： H01L21/311
CPC分类号： C09K13/06 , C23F1/18 , C23F1/34 , H01L21/32134
摘要： An etching composition for a copper-containing layer includes about 0.1% to about 30% by weight of ammonium persulfate, about 0.1% to about 10% by weight of a sulfate, about 0.01% to about 5% by weight of an acetate and about 55% to about 99.79% by weight of water. The etching composition having improved stability during storage and an increased capacity for etching.
摘要翻译：含铜层的蚀刻组合物包含约0.1％至约30％重量的过硫酸铵，约0.1％至约10％重量的硫酸盐，约0.01％至约5％重量的乙酸盐和约 55％至约99.79％的水。蚀刻组合物在储存期间具有改进的稳定性和增加的蚀刻能力。

10. 发明申请

US20130178010A1 METHOD OF FORMING A METAL PATTERN AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE 审中-公开
标题翻译：形成金属图案的方法和制造显示基板的方法
公开(公告)号：US20130178010A1
公开(公告)日：2013-07-11
申请号：US13585255
申请日：2012-08-14
申请人： Bong-Kyun KIM , Wang-Woo Lee , Shin Il Choi , Hong-Sick Park , Young-Woo Park
发明人： Bong-Kyun KIM , Wang-Woo Lee , Shin Il Choi , Hong-Sick Park , Young-Woo Park
IPC分类号： C23F1/14 , B05D3/00 , H01L33/08
CPC分类号： H01L27/1288 , C23F1/18 , C23F1/26 , H01L21/02071 , H01L21/32134 , H01L27/124
摘要： A method of forming a metal pattern is provided. In the method, a first titanium layer, a copper layer and a second titanium layer are sequentially formed on a substrate. A photo pattern is formed on the second titanium layer. The first titanium layer, the copper layer and the second titanium layer are patterned using the photo pattern to form a first titanium pattern, a copper pattern formed on the first titanium pattern and a second titanium pattern formed on the copper pattern. Therefore, a fine metal pattern may be formed.
摘要翻译：提供了形成金属图案的方法。在该方法中，在基板上依次形成第一钛层，铜层和第二钛层。在第二钛层上形成照片图案。使用照片图案对第一钛层，铜层和第二钛层进行图案化，以形成第一钛图案，形成在第一钛图案上的铜图案和形成在铜图案上的第二钛图案。因此，可以形成精细的金属图案。

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