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1. 发明申请

US20080128944A1 Injection molded polymeric stampers/imprinters for fabricating patterned recording media 审中-公开
标题翻译：用于制造图案化记录介质的注塑聚合物压模/打印机
公开(公告)号：US20080128944A1
公开(公告)日：2008-06-05
申请号：US11606992
申请日：2006-12-01
申请人： Hong Ying Wang , Gennady (Gene) Gauzner , Koich Wago , Kim Yang Lee , David S. Kuo
发明人： Hong Ying Wang , Gennady (Gene) Gauzner , Koich Wago , Kim Yang Lee , David S. Kuo
IPC分类号： B28B11/08 , B29C45/00
CPC分类号： G11B5/865 , B29C33/3878 , B29C45/2632 , B82Y10/00 , G11B5/855
摘要： A method of manufacturing a stamper/imprinter for patterning of a recording medium via thermally assisted nano-imprint lithography, comprising steps of: providing a first stamper/imprinter comprising a topographically patterned surface having a correspondence to a selected pattern to be formed in a surface of the medium; injection molding a layer of a polymeric material in conformal contact with the topographically patterned surface of the first stamper/imprinter; and separating the layer of polymeric material from the topographically patterned surface of the first stamper/imprinter to form a second stamper/imprinter comprising a topographically patterned stamping/imprinting surface including a plurality of projections and depressions with dimensions and spacings having a correspondence to the selected pattern to be formed in a surface of the medium.
摘要翻译：一种制造用于通过热辅助纳米压印光刻图案化记录介质的压模/印刷机的方法，包括以下步骤：提供第一压模/打印机，其包括与要形成在表面中的选定图案对应的地形图案表面的介质; 注射成型一层聚合材料，与第一压模/冲压机的地形图形表面保形接触; 以及将所述聚合物材料层与所述第一压模/冲孔机的所述地形图形表面分离以形成第二压模/冲压机，所述第二压模/冲压机包括地形图案化的冲压/压印表面，所述压印/压印表面包括多个具有尺寸和间距的突起和凹陷，形成在介质表面上的图案。

2. 发明申请

US20120058312A1 THERMAL COMPENSATED STAMPERS/IMPRINTERS 有权
标题翻译：热补偿印章/印字机
公开(公告)号：US20120058312A1
公开(公告)日：2012-03-08
申请号：US13043327
申请日：2011-03-08
申请人： Gennady (Gene) Gauzner , Hong Ying Wang
发明人： Gennady (Gene) Gauzner , Hong Ying Wang
IPC分类号： B41M5/00 , B28B7/36
CPC分类号： B29C33/3878 , B29C45/14778 , B29C45/14819 , B29C45/16 , B29C45/2632 , B29L2017/005 , Y10T428/24802
摘要： A method of manufacturing a stamper/imprinter for patterning a recording medium via thermally assisted nano-imprint lithography, comprising steps of: selecting a recording medium for patterning, comprising a substrate with a first coefficient of thermal expasnsion (CTE); providing a first stamper/imprinter comprising a topographically patterned surface having a correspondence to a selected pattern to be formed in a surface of the medium; providing a sheet of a material having a second CTE matching the first CTE; molding a layer of a polymeric material surrounding the sheet of material and having a surface in conformal contact with the topographically patterned surface of the first stamper/imprinter; and separating the layer of polymeric material from the patterned surface of the first stamper/imprinter to form a second stamper/imprinter comprising a topographically patterned stamping/imprinting surface having a correspondence to the selected pattern.
摘要翻译：一种制造用于通过热辅助纳米压印光刻图案化记录介质的压模/打印机的方法，包括以下步骤：选择用于图案化的记录介质，其包括具有第一热分析热值（CTE）的基板; 提供第一压模/打印机，其包括与要在介质的表面中形成的选定图案对应的地形图形表面; 提供具有与第一CTE匹配的第二CTE的材料的片材; 模制围绕所述材料片的聚合材料层，并且具有与所述第一压模/冲压机的所述地形图形表面保形接触的表面; 以及将所述聚合物材料层与所述第一压模/冲压机的所述图案化表面分离以形成第二压模/冲压机，所述第二压模/冲压机包括与所选图案对应的地形图案化的冲压/压印表面。

3. 发明授权

US08323018B2 Thermal compensated stampers/imprinters 有权
标题翻译：热补偿压模/冲压机
公开(公告)号：US08323018B2
公开(公告)日：2012-12-04
申请号：US13043327
申请日：2011-03-08
申请人： Gennady (Gene) Gauzner , Hong Ying Wang
发明人： Gennady (Gene) Gauzner , Hong Ying Wang
IPC分类号： B29C33/38 , B29C59/02
CPC分类号： B29C33/3878 , B29C45/14778 , B29C45/14819 , B29C45/16 , B29C45/2632 , B29L2017/005 , Y10T428/24802
摘要： A method of manufacturing a stamper/imprinter for patterning a recording medium via thermally assisted nano-imprint lithography, comprising steps of: selecting a recording medium for patterning, comprising a substrate with a first coefficient of thermal expasnsion (CTE); providing a first stamper/imprinter comprising a topographically patterned surface having a correspondence to a selected pattern to be formed in a surface of the medium; providing a sheet of a material having a second CTE matching the first CTE; molding a layer of a polymeric material surrounding the sheet of material and having a surface in conformal contact with the topographically patterned surface of the first stamper/imprinter; and separating the layer of polymeric material from the patterned surface of the first stamper/imprinter to form a second stamper/imprinter comprising a topographically patterned stamping/imprinting surface having a correspondence to the selected pattern.
摘要翻译：一种制造用于通过热辅助纳米压印光刻图案化记录介质的压模/打印机的方法，包括以下步骤：选择用于图案化的记录介质，其包括具有第一热分析热值（CTE）的基板; 提供第一压模/打印机，其包括与要在介质的表面中形成的选定图案对应的地形图形表面; 提供具有与第一CTE匹配的第二CTE的材料的片材; 模制围绕所述材料片的聚合材料层，并且具有与所述第一压模/冲压机的所述地形图形表面保形接触的表面; 以及将所述聚合物材料层与所述第一压模/冲压机的所述图案化表面分离以形成第二压模/冲压机，所述第二压模/冲压机包括与所选图案对应的地形图案化的冲压/压印表面。

4. 发明授权

US07919029B2 Thermal compensated stampers/imprinters 失效
标题翻译：热补偿压模/冲压机
公开(公告)号：US07919029B2
公开(公告)日：2011-04-05
申请号：US11606993
申请日：2006-12-01
申请人： Gennady (Gene) Gauzner , Hong Ying Wang
发明人： Gennady (Gene) Gauzner , Hong Ying Wang
IPC分类号： B29C33/38
CPC分类号： B29C33/3878 , B29C45/14778 , B29C45/14819 , B29C45/16 , B29C45/2632 , B29L2017/005 , Y10T428/24802
摘要： A method of manufacturing a stamper/imprinter for patterning a recording medium via thermally assisted nano-imprint lithography, comprising steps of: selecting a recording medium for patterning, comprising a substrate with a first coefficient of thermal expasnsion (CTE); providing a first stamper/imprinter comprising a topographically patterned surface having a correspondence to a selected pattern to be formed in a surface of the medium; providing a sheet of a material having a second CTE matching the first CTE; molding a layer of a polymeric material surrounding the sheet of material and having a surface in conformal contact with the topographically patterned surface of the first stamper/imprinter; and separating the layer of polymeric material from the patterned surface of the first stamper/imprinter to form a second stamper/imprinter comprising a topographically patterned stamping/imprinting surface having a correspondence to the selected pattern.
摘要翻译：一种制造用于通过热辅助纳米压印光刻图案化记录介质的压模/打印机的方法，包括以下步骤：选择用于图案化的记录介质，其包括具有第一热分析热值（CTE）的基板; 提供第一压模/打印机，其包括与要在介质的表面中形成的选定图案对应的地形图形表面; 提供具有与第一CTE匹配的第二CTE的材料的片材; 模制围绕所述材料片的聚合材料层，并且具有与所述第一压模/冲压机的所述地形图形表面保形接触的表面; 以及将所述聚合物材料层与所述第一压模/冲压机的所述图案化表面分离以形成第二压模/冲压机，所述第二压模/冲压机包括与所选图案对应的地形图案化的冲压/压印表面。

5. 发明申请

US20080131548A1 Thermal expansion compensated stampers/imprinters for fabricating patterned recording media 失效
标题翻译：用于制造图案化记录介质的热膨胀补偿印模机/印刷机
公开(公告)号：US20080131548A1
公开(公告)日：2008-06-05
申请号：US11606993
申请日：2006-12-01
申请人： Gennady (Gene) Gauzner , Hong Ying Wang
发明人： Gennady (Gene) Gauzner , Hong Ying Wang
IPC分类号： B29C33/00 , B29C67/00
CPC分类号： B29C33/3878 , B29C45/14778 , B29C45/14819 , B29C45/16 , B29C45/2632 , B29L2017/005 , Y10T428/24802
摘要： A method of manufacturing a stamper/imprinter for patterning a recording medium via thermally assisted nano-imprint lithography, comprising steps of: selecting a recording medium for patterning, comprising a substrate with a first coefficient of thermal expasnsion (CTE); providing a first stamper/imprinter comprising a topographically patterned surface having a correspondence to a selected pattern to be formed in a surface of the medium; providing a sheet of a material having a second CTE matching the first CTE; molding a layer of a polymeric material surrounding the sheet of material and having a surface in conformal contact with the topographically patterned surface of the first stamper/imprinter; and separating the layer of polymeric material from the patterned surface of the first stamper/imprinter to form a second stamper/imprinter comprising a topographically patterned stamping/imprinting surface having a correspondence to the selected pattern.
摘要翻译：一种制造用于通过热辅助纳米压印光刻图案化记录介质的压模/打印机的方法，包括以下步骤：选择用于图案化的记录介质，其包括具有第一热分析热值（CTE）的基板; 提供第一压模/打印机，其包括与要在介质的表面中形成的选定图案对应的地形图形表面; 提供具有与第一CTE匹配的第二CTE的材料的片材; 模制围绕所述材料片的聚合材料层，并且具有与所述第一压模/冲压机的所述地形图形表面保形接触的表面; 以及将所述聚合物材料层与所述第一压模/冲压机的所述图案化表面分离，以形成第二压模/冲压机，所述第二压模/冲压机包括与选定图案对应的地形图案化的冲压/压印表面。

6. 发明申请

US20080093336A1 Process for fabricating patterned magnetic recording media 有权
标题翻译：制造图案化磁记录介质的方法
公开(公告)号：US20080093336A1
公开(公告)日：2008-04-24
申请号：US11583845
申请日：2006-10-20
申请人： Kim Y. Lee , Hong Ying Wang , Nobuo Kurataka , Christopher Formato , David S. Kuo , Dieter K. Weller
发明人： Kim Y. Lee , Hong Ying Wang , Nobuo Kurataka , Christopher Formato , David S. Kuo , Dieter K. Weller
IPC分类号： B44C1/22 , C03C25/68
CPC分类号： G11B5/855 , G11B5/667 , G11B5/732
摘要： A method of fabricating a patterned magnetic recording medium, comprises steps of: (a) providing a layer stack including an uppermost non-magnetic interlayer; (b) forming a resist layer on the interlayer; (c) forming a first pattern comprising a first group of recesses extending through the resist layer and exposing a first group of spaced apart surface portions of the interlayer; (d) filling the first group of recesses with a layer of a hard mask material; (e) selectively removing the resist layer to form a second pattern comprising a second group of recesses extending through the hard mask layer and exposing a second group of spaced apart surface portions of the interlayer; and (f) filling the second group of recesses with a layer of a magnetically hard material forming a magnetic recording layer.
摘要翻译：一种制造图案化磁记录介质的方法，包括以下步骤：（a）提供包括最上面的非磁性中间层的层堆叠; （b）在所述中间层上形成抗蚀剂层; （c）形成第一图案，其包括延伸穿过抗蚀剂层的第一组凹槽，并暴露出中间层的第一组间隔开的表面部分; （d）用一层硬掩模材料填充第一组凹槽; （e）选择性地去除所述抗蚀剂层以形成第二图案，所述第二图案包括延伸穿过所述硬掩模层并暴露所述中间层的第二组间隔开的表面部分的第二组凹部; 和（f）用形成磁记录层的磁性硬质材料层填充第二组凹部。

7. 发明申请

US20100221581A1 PROCESS FOR FABRICATING PATTERNED MAGNETIC RECORDING MEDIA 有权
标题翻译：制作图形磁记录介质的方法
公开(公告)号：US20100221581A1
公开(公告)日：2010-09-02
申请号：US12768616
申请日：2010-04-27
申请人： Kim Y. Lee , Hong Ying Wang , Nobuo Kurataka , Christopher Formato , David S. Kuo , Dieter K. Weller
发明人： Kim Y. Lee , Hong Ying Wang , Nobuo Kurataka , Christopher Formato , David S. Kuo , Dieter K. Weller
IPC分类号： G03F7/20 , G11B5/667
CPC分类号： G11B5/855 , G11B5/667 , G11B5/732
摘要： A method of fabricating a patterned magnetic recording medium, comprises steps of: (a) providing a layer stack including an uppermost non-magnetic interlayer; (b) forming a resist layer on the interlayer; (c) forming a first pattern comprising a first group of recesses extending through the resist layer and exposing a first group of spaced apart surface portions of the interlayer; (d) filling the first group of recesses with a layer of a hard mask material; (e) selectively removing the resist layer to form a second pattern comprising a second group of recesses extending through the hard mask layer and exposing a second group of spaced apart surface portions of the interlayer; and (f) filling the second group of recesses with a layer of a magnetically hard material forming a magnetic recording layer.
摘要翻译：一种制造图案化磁记录介质的方法，包括以下步骤：（a）提供包括最上面的非磁性中间层的层堆叠; （b）在所述中间层上形成抗蚀剂层; （c）形成第一图案，其包括延伸穿过抗蚀剂层的第一组凹槽，并暴露出中间层的第一组间隔开的表面部分; （d）用一层硬掩模材料填充第一组凹槽; （e）选择性地去除所述抗蚀剂层以形成第二图案，所述第二图案包括延伸穿过所述硬掩模层并暴露所述中间层的第二组间隔开的表面部分的第二组凹部; 和（f）用形成磁记录层的磁性硬质材料层填充第二组凹部。

8. 发明授权

US07704614B2 Process for fabricating patterned magnetic recording media 有权
标题翻译：制造图案化磁记录介质的方法
公开(公告)号：US07704614B2
公开(公告)日：2010-04-27
申请号：US11583845
申请日：2006-10-20
申请人： Kim Y. Lee , Hong Ying Wang , Nobuo Kurataka , Christopher Formato , David S. Kuo , Dieter K. Weller
发明人： Kim Y. Lee , Hong Ying Wang , Nobuo Kurataka , Christopher Formato , David S. Kuo , Dieter K. Weller
IPC分类号： G11B5/66
CPC分类号： G11B5/855 , G11B5/667 , G11B5/732
摘要： A method of fabricating a patterned magnetic recording medium, comprises steps of: (a) providing a layer stack including an uppermost non-magnetic interlayer; (b) forming a resist layer on the interlayer; (c) forming a first pattern comprising a first group of recesses extending through the resist layer and exposing a first group of spaced apart surface portions of the interlayer; (d) filling the first group of recesses with a layer of a hard mask material; (e) selectively removing the resist layer to form a second pattern comprising a second group of recesses extending through the hard mask layer and exposing a second group of spaced apart surface portions of the interlayer; and (f) filling the second group of recesses with a layer of a magnetically hard material forming a magnetic recording layer.
摘要翻译：一种制造图案化磁记录介质的方法，包括以下步骤：（a）提供包括最上面的非磁性中间层的层堆叠; （b）在所述中间层上形成抗蚀剂层; （c）形成第一图案，其包括延伸穿过抗蚀剂层的第一组凹槽，并暴露出中间层的第一组间隔开的表面部分; （d）用一层硬掩模材料填充第一组凹槽; （e）选择性地去除所述抗蚀剂层以形成第二图案，所述第二图案包括延伸穿过所述硬掩模层并暴露所述中间层的第二组间隔开的表面部分的第二组凹部; 和（f）用形成磁记录层的磁性硬质材料层填充第二组凹部。

9. 发明申请

US20080113157A1 Method for fabricating master stamper/imprinters for patterned recording media utilizing hybrid resist 审中-公开
标题翻译：使用混合抗蚀剂制造图案化记录介质的主压模/打印机的方法
公开(公告)号：US20080113157A1
公开(公告)日：2008-05-15
申请号：US11595894
申请日：2006-11-13
申请人： Kim Y. Lee , Hong Ying Wang , Shih-Fu Lee , David S. Kuo , Koichi Wago , Dieter K. Weller
发明人： Kim Y. Lee , Hong Ying Wang , Shih-Fu Lee , David S. Kuo , Koichi Wago , Dieter K. Weller
IPC分类号： G03F7/00 , B32B3/00
CPC分类号： G03F7/095 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , Y10T428/24355
摘要： A method of fabricating a master stamper/imprinter for manufacturing a patterned recording medium by nano-imprint lithography comprises steps of: (a) providing a substrate having a surface; (b) forming a layer of a hybrid resist material on the surface, the resist layer having an exposed upper surface; (c) subjecting selected areas of the exposed upper surface of the resist layer to an energy beam to form therein a latent image of a topographical pattern to be formed in the resist layer and having a correspondence to a pattern to be formed in a patterned recording medium; and (d) developing the latent image into the topographical pattern in the resist layer, wherein only those areas of the resist layer which have received an energy beam exposure dose between a positive-tone threshold dose D0p and a negative-tone threshold dose D0n are developed.
摘要翻译：制造用于通过纳米压印光刻制造图案化记录介质的主压模/印刷机的方法包括以下步骤：（a）提供具有表面的基板; （b）在所述表面上形成混合抗蚀剂材料层，所述抗蚀剂层具有暴露的上表面; （c）使抗蚀剂层的暴露的上表面的选定区域能量束在其中形成要在抗蚀剂层中形成的形貌图案的潜像，并且与图案化记录中形成的图案对应中; 并且（d）将潜像显影成抗蚀剂层中的形貌图案，其中只有已经接收了能量束曝光的抗蚀剂层的那些区域剂量在正音阈值剂量D 0 P 0和开发出负色调阈值剂量D 0n 。

10. 发明授权

US08460565B2 Process for fabricating patterned magnetic recording device 有权
标题翻译：制造图案化磁记录装置的方法
公开(公告)号：US08460565B2
公开(公告)日：2013-06-11
申请号：US12768616
申请日：2010-04-27
申请人： Kim Y Lee , Hong Ying Wang , Nobuo Kurataka , Christopher Formato , David S Kuo , Dieter K Weller
发明人： Kim Y Lee , Hong Ying Wang , Nobuo Kurataka , Christopher Formato , David S Kuo , Dieter K Weller
IPC分类号： B44C1/22
CPC分类号： G11B5/855 , G11B5/667 , G11B5/732
摘要： A method of fabricating a patterned magnetic recording medium, comprises steps of: (a) providing a layer stack including an uppermost non-magnetic interlayer; (b) forming a resist layer on the interlayer; (c) forming a first pattern comprising a first group of recesses extending through the resist layer and exposing a first group of spaced apart surface portions of the interlayer; (d) filling the first group of recesses with a layer of a hard mask material; (e) selectively removing the resist layer to form a second pattern comprising a second group of recesses extending through the hard mask layer and exposing a second group of spaced apart surface portions of the interlayer; and (f) filling the second group of recesses with a layer of a magnetically hard material forming a magnetic recording layer.
摘要翻译：一种制造图案化磁记录介质的方法，包括以下步骤：（a）提供包括最上面的非磁性中间层的层堆叠; （b）在所述中间层上形成抗蚀剂层; （c）形成第一图案，其包括延伸穿过抗蚀剂层的第一组凹槽，并暴露出中间层的第一组间隔开的表面部分; （d）用一层硬掩模材料填充第一组凹槽; （e）选择性地去除所述抗蚀剂层以形成第二图案，所述第二图案包括延伸穿过所述硬掩模层并暴露所述中间层的第二组间隔开的表面部分的第二组凹部; 和（f）用形成磁记录层的磁性硬质材料层填充第二组凹部。

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