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1. 发明授权

US08460565B2 Process for fabricating patterned magnetic recording device 有权
标题翻译：制造图案化磁记录装置的方法
公开(公告)号：US08460565B2
公开(公告)日：2013-06-11
申请号：US12768616
申请日：2010-04-27
申请人： Kim Y Lee , Hong Ying Wang , Nobuo Kurataka , Christopher Formato , David S Kuo , Dieter K Weller
发明人： Kim Y Lee , Hong Ying Wang , Nobuo Kurataka , Christopher Formato , David S Kuo , Dieter K Weller
IPC分类号： B44C1/22
CPC分类号： G11B5/855 , G11B5/667 , G11B5/732
摘要： A method of fabricating a patterned magnetic recording medium, comprises steps of: (a) providing a layer stack including an uppermost non-magnetic interlayer; (b) forming a resist layer on the interlayer; (c) forming a first pattern comprising a first group of recesses extending through the resist layer and exposing a first group of spaced apart surface portions of the interlayer; (d) filling the first group of recesses with a layer of a hard mask material; (e) selectively removing the resist layer to form a second pattern comprising a second group of recesses extending through the hard mask layer and exposing a second group of spaced apart surface portions of the interlayer; and (f) filling the second group of recesses with a layer of a magnetically hard material forming a magnetic recording layer.
摘要翻译：一种制造图案化磁记录介质的方法，包括以下步骤：（a）提供包括最上面的非磁性中间层的层堆叠; （b）在所述中间层上形成抗蚀剂层; （c）形成第一图案，其包括延伸穿过抗蚀剂层的第一组凹槽，并暴露出中间层的第一组间隔开的表面部分; （d）用一层硬掩模材料填充第一组凹槽; （e）选择性地去除所述抗蚀剂层以形成第二图案，所述第二图案包括延伸穿过所述硬掩模层并暴露所述中间层的第二组间隔开的表面部分的第二组凹部; 和（f）用形成磁记录层的磁性硬质材料层填充第二组凹部。

2. 发明授权

US08230582B2 Methods of making magnetic write heads with use of a resist channel shrinking solution having corrosion inhibitors 失效
标题翻译：使用具有腐蚀抑制剂的抗蚀剂通道收缩溶液制造磁性写入头的方法
公开(公告)号：US08230582B2
公开(公告)日：2012-07-31
申请号：US12685455
申请日：2010-01-11
申请人： Christian Rene Bonhote , Jila Tabib , Dennis Richard Mckean , Daniel Wayne Bedell , Jyh-Shuey Lo , Heiu Lam , Kim Y Lee
发明人： Christian Rene Bonhote , Jila Tabib , Dennis Richard Mckean , Daniel Wayne Bedell , Jyh-Shuey Lo , Heiu Lam , Kim Y Lee
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3116 , G11B5/3163 , Y10T29/49032 , Y10T29/49039 , Y10T29/49043 , Y10T29/49044 , Y10T29/49048 , Y10T29/49052
摘要： One preferred method for use in making a device structure with use of the resist channel shrinking solution includes the steps of forming a first pedestal portion within a channel of a patterned resist; applying a resist channel shrinking solution comprising a resist channel shrinking film and corrosion inhibitors within the channel of the patterned resist; baking the resist channel shrinking solution over the patterned resist to thereby reduce a width of the channel of the patterned resist; removing the resist channel shrinking solution; and forming a second pedestal portion within the reduced-width channel of the patterned resist. Advantageously, the oxide layer and the corrosion inhibitors of the resist channel shrinking solution reduce corrosion in the pedestal during the act of baking the resist channel shrinking solution.
摘要翻译：用于制造使用抗蚀剂通道收缩溶液的器件结构的一种优选方法包括在图案化抗蚀剂的通道内形成第一基座部分的步骤; 在图案化的抗蚀剂的通道内施加包含抗蚀剂通道收缩膜和腐蚀抑制剂的抗蚀剂通道收缩溶液; 在图案化的抗蚀剂上烘烤抗蚀剂通道收缩溶液，从而减小图案化抗蚀剂的通道的宽度; 去除抗蚀剂通道收缩溶液; 以及在所述图案化抗蚀剂的所述减小宽度的通道内形成第二基座部分。有利地，抗蚀剂通道收缩溶液的氧化物层和腐蚀抑制剂在烘烤抗蚀剂通道收缩溶液的作用下降低了基座中的腐蚀。

3. 发明授权

US06288401B1 Electrostatic alignment of a charged particle beam 失效
标题翻译：带电粒子束的静电排列
公开(公告)号：US06288401B1
公开(公告)日：2001-09-11
申请号：US09364777
申请日：1999-07-30
申请人： Tai-Hon P Chang , Marian Mankos , Lawrence P Muray , Ho-Seob Kim , Kim Y Lee
发明人： Tai-Hon P Chang , Marian Mankos , Lawrence P Muray , Ho-Seob Kim , Kim Y Lee
IPC分类号： G21K108
CPC分类号： H01J29/54 , H01J37/073 , H01J2237/06316 , H01J2237/06341 , H01J2237/1501
摘要： A field emission source produces a charged particle beam that can be electrostatically aligned with the optical axis. Quadrupole (or higher multipole) centering electrodes approximately centered on the optical axis are placed between the emitter and the extraction electrode. By applying centering potentials of equal amplitude and opposite polarity on opposing elements of the centering electrodes, an electrostatic deflection field is created near the optical axis. The electrostatic deflection field aligns the charged particle beam with the optical axis thereby obviating the need to mechanically align the emitter with the optical axis. A second set of centering electrodes may be used to deflect the charged particle beam back and to ensure that the charged particle beam is parallel with the optical axis. Further, the extraction electrode may be split into a quadrupole arrangement with the extraction and centering potentials superimposed.
摘要翻译：场发射源产生可以与光轴静电对准的带电粒子束。大约以光轴为中心的四极（或更高的多极）定心电极放置在发射极和引出电极之间。通过在定心电极的相对元件上施加相等振幅和相反极性的定心电位，在光轴附近产生静电偏转场。静电偏转磁场将带电粒子束与光轴对准，从而避免了将发射器与光轴机械对准的需要。可以使用第二组定心电极将带电粒子束偏转回来并确保带电粒子束与光轴平行。此外，提取电极可以被分成四极排列，其中提取和对中电位叠加。

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