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1. 发明申请

US20080089574A1 Data flow management in generating different signal formats used in optical metrology 失效
标题翻译：生成用于光学计量学的不同信号格式的数据流管理
公开(公告)号：US20080089574A1
公开(公告)日：2008-04-17
申请号：US11580716
申请日：2006-10-12
申请人： Hong Qiu , Junwei Bao , Wei Liu , Jeffrey A. Chard , Miao Liu , Gang He , Hemalatha Erva , Vi Vuong
发明人： Hong Qiu , Junwei Bao , Wei Liu , Jeffrey A. Chard , Miao Liu , Gang He , Hemalatha Erva , Vi Vuong
IPC分类号： G06K9/00
CPC分类号： G01N21/4788 , G01B11/24 , Y10S707/953
摘要： To manage data flow in generating different signal formats for use in optical metrology, a project data object is created. A first option data object is created. The first option data object has a set of signal parameters. Different settings of the set of signal parameters correspond to different signal formats for diffraction signals. A version number is associated with the first option data object. The first option data object is linked with the project data object. At least a second option data object is created. The second option data object has a set of signal parameters. Different settings of the set of signal parameters correspond to different signal formats for diffraction signals. The set of signal parameters of the first option data object and the set of signal parameters of the second option data object are set differently. Another version number is associated with the second option data object. The second option data object is linked with the project data object. The project data object, the first option data object, and the second option data object are stored. The version numbers associated with the first option data object and the second option data object are stored. The link between the first option data object and the project data object is stored. The link between the second option data object and the project data object is stored.
摘要翻译：为了管理生成用于光学测量的不同信号格式的数据流，创建了一个项目数据对象。创建第一个选项数据对象。第一个选项数据对象具有一组信号参数。信号参数组的不同设置对应于衍射信号的不同信号格式。版本号与第一选项数据对象相关联。第一个选项数据对象与项目数据对象链接。至少创建第二个选项数据对象。第二个选项数据对象具有一组信号参数。信号参数组的不同设置对应于衍射信号的不同信号格式。第一选项数据对象的信号参数集合和第二选项数据对象的信号参数集合设置不同。另一个版本号与第二个选项数据对象相关联。第二个选项数据对象与项目数据对象链接。存储项目数据对象，第一选项数据对象和第二选项数据对象。存储与第一选项数据对象和第二选项数据对象相关联的版本号。存储第一个选项数据对象和项目数据对象之间的链接。存储第二选项数据对象与项目数据对象之间的链接。

2. 发明申请

US20080091724A1 Data flow management in generating profile models used in optical metrology 有权
标题翻译：生成光学计量学中使用的轮廓模型的数据流管理
公开(公告)号：US20080091724A1
公开(公告)日：2008-04-17
申请号：US11580570
申请日：2006-10-12
申请人： Hong Qiu , Junwei Bao , Wei Liu , Jeffrey A. Chard , Miao Liu , Gang He , Hemalatha Erva , Vi Vuong
发明人： Hong Qiu , Junwei Bao , Wei Liu , Jeffrey A. Chard , Miao Liu , Gang He , Hemalatha Erva , Vi Vuong
IPC分类号： G06F17/00
CPC分类号： G01B11/24 , Y10S707/953
摘要： To manage data flow in generating profile models for use in optical metrology, a project data object is created. A first profile model data object is created. The first profile model data object corresponds to a first profile model defined using profile parameters. A version number is associated with the first profile model data object. The first profile model data object is linked with the project data object. At least a second profile model data object is created. The second profile model data object corresponds to a second profile model defined using profile parameters. The first and second profile models are different. Another version number is associated with the second profile model data object. The second profile model data object is linked with the project data object. The project data object, the first profile model data object, and the second profile model data object are stored. The version numbers associated with the first profile model data object and the second profile model data object are stored. The link between the first profile model data object and the project data object is stored. The link between the second profile model data object and the project data object is stored.
摘要翻译：为了管理生成用于光学测量的轮廓模型中的数据流，创建了一个项目数据对象。创建第一个配置文件模型数据对象。第一个轮廓模型数据对象对应于使用轮廓参数定义的第一轮廓模型。版本号与第一个轮廓模型数据对象相关联。第一个配置文件模型数据对象与项目数据对象链接。至少创建一个第二个轮廓模型数据对象。第二轮廓模型数据对象对应于使用轮廓参数定义的第二轮廓模型。第一个和第二个轮廓模型是不同的。另一个版本号与第二个配置文件模型数据对象相关联。第二个配置文件模型数据对象与项目数据对象链接。存储项目数据对象，第一个轮廓模型数据对象和第二个轮廓模型数据对象。存储与第一轮廓模型数据对象和第二轮廓模型数据对象相关联的版本号。存储第一轮廓模型数据对象与项目数据对象之间的链接。存储第二轮廓模型数据对象与项目数据对象之间的链接。

3. 发明授权

US07783669B2 Data flow management in generating profile models used in optical metrology 有权
标题翻译：生成光学计量学中使用的轮廓模型的数据流管理
公开(公告)号：US07783669B2
公开(公告)日：2010-08-24
申请号：US11580570
申请日：2006-10-12
申请人： Hong Qiu , Junwei Bao , Wei Liu , Jeffrey Alexander Chard , Miao Liu , Gang He , Hemalatha Erva , Vi Vuong
发明人： Hong Qiu , Junwei Bao , Wei Liu , Jeffrey Alexander Chard , Miao Liu , Gang He , Hemalatha Erva , Vi Vuong
IPC分类号： G06Q50/00
CPC分类号： G01B11/24 , Y10S707/953
摘要： To manage data flow in generating profile models for use in optical metrology, a project data object is created. A first profile model data object is created. The first profile model data object corresponds to a first profile model defined using profile parameters. A version number is associated with the first profile model data object. The first profile model data object is linked with the project data object. At least a second profile model data object is created. The second profile model data object corresponds to a second profile model defined using profile parameters. The first and second profile models are different. Another version number is associated with the second profile model data object. The second profile model data object is linked with the project data object. The project data object, the first profile model data object, and the second profile model data object are stored. The version numbers associated with the first profile model data object and the second profile model data object are stored. The link between the first profile model data object and the project data object is stored. The link between the second profile model data object and the project data object is stored.
摘要翻译：为了管理生成用于光学测量的轮廓模型中的数据流，创建了一个项目数据对象。创建第一个配置文件模型数据对象。第一个轮廓模型数据对象对应于使用轮廓参数定义的第一轮廓模型。版本号与第一个轮廓模型数据对象相关联。第一个配置文件模型数据对象与项目数据对象链接。至少创建一个第二个轮廓模型数据对象。第二轮廓模型数据对象对应于使用轮廓参数定义的第二轮廓模型。第一个和第二个轮廓模型是不同的。另一个版本号与第二个配置文件模型数据对象相关联。第二个配置文件模型数据对象与项目数据对象链接。存储项目数据对象，第一个轮廓模型数据对象和第二个轮廓模型数据对象。存储与第一轮廓模型数据对象和第二轮廓模型数据对象相关联的版本号。存储第一轮廓模型数据对象与项目数据对象之间的链接。存储第二轮廓模型数据对象与项目数据对象之间的链接。

4. 发明授权

US07765234B2 Data flow management in generating different signal formats used in optical metrology 失效
标题翻译：生成用于光学计量学的不同信号格式的数据流管理
公开(公告)号：US07765234B2
公开(公告)日：2010-07-27
申请号：US11580716
申请日：2006-10-12
申请人： Hong Qiu , Junwei Bao , Wei Liu , Jeffrey Alexander Chard , Miao Liu , Gang He , Hemalatha Erva , Vi Vuong
发明人： Hong Qiu , Junwei Bao , Wei Liu , Jeffrey Alexander Chard , Miao Liu , Gang He , Hemalatha Erva , Vi Vuong
IPC分类号： G06Q50/00
CPC分类号： G01N21/4788 , G01B11/24 , Y10S707/953
摘要： To manage data flow in generating different signal formats for use in optical metrology, a project data object is created. A first option data object is created. The first option data object has a set of signal parameters. Different settings of the set of signal parameters correspond to different signal formats for diffraction signals. A version number is associated with the first option data object. The first option data object is linked with the project data object. At least a second option data object is created. The second option data object has a set of signal parameters. Different settings of the set of signal parameters correspond to different signal formats for diffraction signals. The set of signal parameters of the first option data object and the set of signal parameters of the second option data object are set differently. Another version number is associated with the second option data object. The second option data object is linked with the project data object. The project data object, the first option data object, and the second option data object are stored. The version numbers associated with the first option data object and the second option data object are stored. The link between the first option data object and the project data object is stored. The link between the second option data object and the project data object is stored.
摘要翻译：为了管理生成用于光学测量的不同信号格式的数据流，创建了一个项目数据对象。创建第一个选项数据对象。第一个选项数据对象具有一组信号参数。信号参数组的不同设置对应于衍射信号的不同信号格式。版本号与第一选项数据对象相关联。第一个选项数据对象与项目数据对象链接。至少创建第二个选项数据对象。第二个选项数据对象具有一组信号参数。信号参数组的不同设置对应于衍射信号的不同信号格式。第一选项数据对象的信号参数集合和第二选项数据对象的信号参数集合设置不同。另一个版本号与第二个选项数据对象相关联。第二个选项数据对象与项目数据对象链接。存储项目数据对象，第一选项数据对象和第二选项数据对象。存储与第一选项数据对象和第二选项数据对象相关联的版本号。存储第一个选项数据对象和项目数据对象之间的链接。存储第二选项数据对象与项目数据对象之间的链接。

5. 发明申请

US20080013107A1 Generating a profile model to characterize a structure to be examined using optical metrology 审中-公开
标题翻译：使用光学计量产生轮廓模型来表征要检查的结构
公开(公告)号：US20080013107A1
公开(公告)日：2008-01-17
申请号：US11484974
申请日：2006-07-11
申请人： Jeffrey A. Chard , Junwei Bao , Joerg Bischoff , Shifang Li , Wei Liu , Hong Qiu , Sylvio Rabello , Vi Vuong
发明人： Jeffrey A. Chard , Junwei Bao , Joerg Bischoff , Shifang Li , Wei Liu , Hong Qiu , Sylvio Rabello , Vi Vuong
IPC分类号： G01B11/14
CPC分类号： G01B11/24 , G01N21/4788 , G01N21/95607 , G01N2021/8883 , G01N2021/95615
摘要： In generating a profile model to characterize a structure to be examined using optical metrology, a view canvas is displayed, with the profile model being generated displayed in the view canvas. A profile shape palette is displayed adjacent to the view canvas. A plurality of different profile shape primitives is displayed in the profile shape palette. Each profile shape primitive in the profile shape palette is defined by a set of profile parameters. When a user selects a profile shape primitive from the profile shape palette, drags the selected profile shape primitive from the profile shape palette, and drops the selected profile shape primitive into the view canvas, the selected profile shape primitive is incorporated into the profile model being generated and displayed in the view canvas.
摘要翻译：在生成轮廓模型以使用光学计量学来表征要检查的结构时，显示视图画布，其中生成的轮廓模型显示在视图画布中。在视图画布附近显示一个轮廓形状调色板。在轮廓形状调色板中显示多个不同的轮廓形状基元。轮廓形状调色板中的每个轮廓形状基元由一组轮廓参数定义。当用户从轮廓形状调色板中选择轮廓形状基元时，从轮廓形状调色板中拖动所选择的轮廓形状基元，并将所选择的轮廓形状基元拖放到视图画布中，将所选择的轮廓形状原语合并到轮廓模型中生成并显示在视图画布中。

6. 发明申请

US20080027565A1 Allocating processing units to generate simulated diffraction signals used in optical metrology 失效
$Allocating processing units to generate simulated diffraction signals used in optical metrology$
标题翻译：分配处理单元以产生光学计量学中使用的模拟衍射信号
公开(公告)号：US20080027565A1
公开(公告)日：2008-01-31
申请号：US11493290
申请日：2006-07-25
申请人： Hemalatha Erva , Hong Qiu , Junwei Bao , Vi Vuong
发明人： Hemalatha Erva , Hong Qiu , Junwei Bao , Vi Vuong
IPC分类号： G05B15/00
CPC分类号： G01B11/24 , G01N21/4788
摘要： In allocating processing units of a computer system to generate simulated diffraction signals used in optical metrology, a request for a job to generate simulated diffraction signals using multiple processing units is obtained. A number of processing units requested for the job to generate simulated diffraction signals is then determined. A number of available processing units is determined. When the number of processing units requested is greater than the number of available processing units, a number of processing units is assigned to generate the simulated diffraction signals that is less than the number of processing units requested.
摘要翻译：在分配计算机系统的处理单元以产生光学测量中使用的模拟衍射信号时，获得使用多个处理单元产生模拟衍射信号的工作请求。然后确定要求工作产生模拟衍射信号的多个处理单元。确定了许多可用的处理单元。当所请求的处理单元的数量大于可用处理单元的数量时，分配多个处理单元以产生小于所请求的处理单元的数量的模拟衍射信号。

7. 发明授权

US07742888B2 Allocating processing units to generate simulated diffraction signals used in optical metrology 失效
$Allocating processing units to generate simulated diffraction signals used in optical metrology$
标题翻译：分配处理单元以产生光学计量学中使用的模拟衍射信号
公开(公告)号：US07742888B2
公开(公告)日：2010-06-22
申请号：US11493290
申请日：2006-07-25
申请人： Hemalatha Erva , Hong Qiu , Junwei Bao , Vi Vuong
发明人： Hemalatha Erva , Hong Qiu , Junwei Bao , Vi Vuong
IPC分类号： G01N37/00
CPC分类号： G01B11/24 , G01N21/4788
摘要： In allocating processing units of a computer system to generate simulated diffraction signals used in optical metrology, a request for a job to generate simulated diffraction signals using multiple processing units is obtained. A number of processing units requested for the job to generate simulated diffraction signals is then determined. A number of available processing units is determined. When the number of processing units requested is greater than the number of available processing units, a number of processing units is assigned to generate the simulated diffraction signals that is less than the number of processing units requested.
摘要翻译：在分配计算机系统的处理单元以产生光学测量中使用的模拟衍射信号时，获得使用多个处理单元产生模拟衍射信号的工作请求。然后确定要求工作产生模拟衍射信号的多个处理单元。确定了许多可用的处理单元。当所请求的处理单元的数量大于可用处理单元的数量时，分配多个处理单元以产生小于所请求的处理单元的数量的模拟衍射信号。

8. 发明申请

US20080115140A1 Allocating processing units to processing clusters to generate simulated diffraction signals 失效
$Allocating processing units to processing clusters to generate simulated diffraction signals$
标题翻译：将处理单元分配到处理簇以产生模拟衍射信号
公开(公告)号：US20080115140A1
公开(公告)日：2008-05-15
申请号：US11525793
申请日：2006-09-22
申请人： Hemalatha Erva , Hong Qiu , Junwei Bao , Vi Vuong
发明人： Hemalatha Erva , Hong Qiu , Junwei Bao , Vi Vuong
IPC分类号： G06F9/50
CPC分类号： G06F9/505
摘要： In allocating processing units, first and second requests for jobs are obtained. First and second numbers of processing units requested are determined. First and second numbers of available processing units are determined. When the first number of available processing units is non-zero, the first number of available number of processing units or the first number of processing units requested is assigned to a first processing cluster. A first processing unit in the first processing cluster is designated as a master node. When the second number of available processing units is non-zero, the second number of available number of processing units or the second number of processing units requested is assigned to a second processing cluster. The first processing unit in the second processing cluster is designated as a slave node. The first and second jobs are assigned to the first and second processing clusters, respectively.
摘要翻译：在分配处理单元时，获得第一和第二个作业请求。确定请求的第一和第二数量的处理单元。确定可用处理单元的第一和第二数量。当第一数量的可用处理单元不为零时，将第一数量的可用处理单元数量或所请求的第一数量的处理单元分配给第一处理簇。第一处理簇中的第一处理单元被指定为主节点。当第二数量的可用处理单元是非零时，将第二数量的可用数量的处理单元或第二数量的处理单元分配给第二处理簇。第二处理簇中的第一处理单元被指定为从节点。第一和第二作业分别分配给第一和第二处理簇。

9. 发明授权

US07765076B2 Allocating processing units to processing clusters to generate simulated diffraction signals 失效
$Allocating processing units to processing clusters to generate simulated diffraction signals$
标题翻译：将处理单元分配到处理簇以产生模拟衍射信号
公开(公告)号：US07765076B2
公开(公告)日：2010-07-27
申请号：US11525793
申请日：2006-09-22
申请人： Hemalatha Erva , Hong Qiu , Junwei Bao , Vi Vuong
发明人： Hemalatha Erva , Hong Qiu , Junwei Bao , Vi Vuong
IPC分类号： G01N37/00
CPC分类号： G06F9/505
摘要： In allocating processing units, first and second requests for jobs are obtained. First and second numbers of processing units requested are determined. First and second numbers of available processing units are determined. When the first number of available processing units is non-zero, the first number of available number of processing units or the first number of processing units requested is assigned to a first processing cluster. A first processing unit in the first processing cluster is designated as a master node. When the second number of available processing units is non-zero, the second number of available number of processing units or the second number of processing units requested is assigned to a second processing cluster. The first processing unit in the second processing cluster is designated as a slave node. The first and second jobs are assigned to the first and second processing clusters, respectively.
摘要翻译：在分配处理单元时，获得第一和第二个作业请求。确定请求的第一和第二数量的处理单元。确定可用处理单元的第一和第二数量。当第一数量的可用处理单元不为零时，将第一数量的可用处理单元数量或所请求的第一数量的处理单元分配给第一处理簇。第一处理簇中的第一处理单元被指定为主节点。当第二数量的可用处理单元是非零时，将第二数量的可用数量的处理单元或第二数量的处理单元分配给第二处理簇。第二处理簇中的第一处理单元被指定为从节点。第一和第二作业分别分配给第一和第二处理簇。

10. 发明申请

US20080013108A1 Parallel profile determination in optical metrology 失效
标题翻译：光学计量学中的平行轮廓确定
公开(公告)号：US20080013108A1
公开(公告)日：2008-01-17
申请号：US11485048
申请日：2006-07-11
申请人： Tri Thanh Khuong , Junwei Bao , Jeffrey A. Chard , Wei Liu , Ying Zhu , Sachin Deshpande , Pranav Sheth , Hong Qiu
发明人： Tri Thanh Khuong , Junwei Bao , Jeffrey A. Chard , Wei Liu , Ying Zhu , Sachin Deshpande , Pranav Sheth , Hong Qiu
IPC分类号： G01B11/14
CPC分类号： G01B11/24 , G01N21/4788 , G01N21/95607 , G01N2021/95615 , G03F7/70625
摘要： In processing requests for wafer structure profile determination from optical metrology measurements, a plurality of measured diffraction signal of a plurality of structures formed on one or more wafers is obtained. The plurality of measured diffraction signals is distributed to a plurality of instances of a profile search module. The plurality of instances of the profile search model is activated in one or more processing threads of one or more computer systems. The plurality of measured diffraction signals is processed in parallel using the plurality of instances of the profile search module to determine profiles of the plurality of structures corresponding to the plurality of measured diffraction signals.
摘要翻译：在从光学测量测量处理对晶片结构轮廓确定的请求中，获得了形成在一个或多个晶片上的多个结构的多个测量的衍射信号。多个测量的衍射信号被分配到简档搜索模块的多个实例。简档搜索模型的多个实例在一个或多个计算机系统的一个或多个处理线程中被激活。使用轮廓搜索模块的多个实例来并行处理多个测量的衍射信号，以确定对应于多个测量的衍射信号的多个结构的轮廓。

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