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1. 发明申请

US20080067704A1 Micro-Molding Equipment and Micro-Molding Method 审中-公开
标题翻译：微型成型设备和微型成型方法
公开(公告)号：US20080067704A1
公开(公告)日：2008-03-20
申请号：US11577214
申请日：2005-10-18
申请人： Hitoshi Ohmori , Yoshihiro Uehara , Weimin Lin , Hatsuichi Takeyasu , Masao Washio , Keizo Ikegami , Takeya Shoji , Tomoaki Ando , Yukihiro Shirataki
发明人： Hitoshi Ohmori , Yoshihiro Uehara , Weimin Lin , Hatsuichi Takeyasu , Masao Washio , Keizo Ikegami , Takeya Shoji , Tomoaki Ando , Yukihiro Shirataki
IPC分类号： B29C43/18
CPC分类号： B29C43/08 , B29B11/12 , B29C31/008 , B29C35/0266 , B29C35/16 , B29C43/021 , B29C43/34 , B29C59/022 , B29C2043/3433 , B29C2043/3444 , B29C2043/3618 , B29C2043/3634 , B29C2043/563 , B29C2059/023 , B29C2791/001 , B29K2105/251 , B29L2011/00 , B29L2011/0016
摘要： The micro-molding equipment contains a preform molding equipment 10 taking a single-cavity of a preform material 3 corresponding to a small precision optical component to be molded with a runnerless mold, and a precision compression molding equipment 40 for after molding the preform material 3 by primary compression molding in a vacuum state, cooling the preform material to a temperature near a glass transition point, and then re-softening a surface layer of the preform material and molding the same by secondary compression molding to transfer the small precision optical component thereto.
摘要翻译：微型成型设备包含预成型件成型设备10，该预制件成形设备10采用预成型材料3的单腔，对应于用无浇道模具成型的小型精密光学部件，以及用于模制预成型材料3之后的精密压缩成型设备40 通过在真空状态下的初级压缩成型，将预成型体材料冷却至接近玻璃化转变点的温度，然后对预成型体材料的表面层进行再软化，并通过二次压缩成型将其成型，将小型精密光学部件转印到。

2. 发明授权

US07685733B2 Micro force measurement device, micro force measurement method, and micro surface shape measurement probe 失效
标题翻译：微力测量装置，微力测量方法和微表面形状测量探头
公开(公告)号：US07685733B2
公开(公告)日：2010-03-30
申请号：US11566377
申请日：2006-12-04
申请人： Hitoshi Ohmori , Yutaka Watanabe , Shinya Morita , Yoshihiro Uehara , Weimin Lin , Kazutoshi Katahira
发明人： Hitoshi Ohmori , Yutaka Watanabe , Shinya Morita , Yoshihiro Uehara , Weimin Lin , Kazutoshi Katahira
IPC分类号： G01B7/00
CPC分类号： G01B7/012 , G01B3/008 , G01B5/012 , G01B11/007
摘要： There is disclosed a micro surface shape measurement probe including a probe shaft 4 having at a distant end thereof a probe member 2 for contacting an object 1 to be measured, a probe body 21 provided with support means for movably supporting the probe shaft 4 in a non-contact manner, a pressing device for pressing and moving the probe shaft 4 toward the object 1 to be measured, a piezoelectric sensor 8a incorporated in the probe body 21 so that a reactive force acts to a pressing force applied to the probe shaft by the pressing device, a load detecting device 8b to measure a load acting on the piezoelectric sensor, a control device 9 for adjusting the pressing force applied by the pressing device based on the load detected by the load detecting device, and a displacement amount measuring device for measuring a position of the probe member 2 in contact with the object 1 to be measured by the pressing force adjusted by the control device 9.
摘要翻译：公开了一种微型表面形状测量探针，其包括探针轴4，探针轴4的远端具有用于接触被测量物体1的探针构件2，探针体21，其设置有用于将探针轴4可移动地支撑在一起的支撑装置用于将探针轴4朝向要测量的物体1按压和移动的按压装置，结合在探针主体21中的压电传感器8a，使得反作用力作用于通过施加到探针轴的按压力按压装置，用于测量作用在压电传感器上的负载的负载检测装置8b，用于基于由负载检测装置检测到的负载来调节由加压装置施加的按压力的控制装置9和位移量测量装置用于通过由控制装置9调节的按压力来测量与被测量物体1接触的探针部件2的位置。

3. 发明申请

US20070126314A1 MICRO FORCE MEASUREMENT DEVICE, MICRO FORCE MEASUREMENT METHOD, AND MICRO SURFACE SHAPE MEASUREMENT PROBE 失效
标题翻译：微力测量装置，微力测量方法和微观表面形状测量探针
公开(公告)号：US20070126314A1
公开(公告)日：2007-06-07
申请号：US11566377
申请日：2006-12-04
申请人： Hitoshi Ohmori , Yutaka Watanabe , Shinya Morita , Yoshihiro Uehara , Weimin Lin , Kazutoshi Katahira
发明人： Hitoshi Ohmori , Yutaka Watanabe , Shinya Morita , Yoshihiro Uehara , Weimin Lin , Kazutoshi Katahira
IPC分类号： H01L41/00
CPC分类号： G01B7/012 , G01B3/008 , G01B5/012 , G01B11/007
摘要： There is disclosed a micro surface shape measurement probe including a probe shaft 4 having at a distant end thereof a probe member 2 for contacting an object 1 to be measured, a probe body 21 provided with support means for movably supporting the probe shaft 4 in a non-contact manner, a pressing device for pressing and moving the probe shaft 4 toward the object 1 to be measured, a piezoelectric sensor 8a incorporated in the probe body 21 so that a reactive force acts to a pressing force applied to the probe shaft by the pressing device, a load detecting device 8b to measure a load acting on the piezoelectric sensor, a control device 9 for adjusting the pressing force applied by the pressing device based on the load detected by the load detecting device, and a displacement amount measuring device for measuring a position of the probe member 2 in contact with the object 1 to be measured by the pressing force adjusted by the control device 9.
摘要翻译：公开了一种微型表面形状测量探针，其包括探针轴4，探针轴4的远端具有用于接触被测量物体1的探针构件2，探针体21，其设置有用于将探针轴4可移动地支撑在一起的支撑装置用于将探针轴4朝向待测量物体1按压并移动的按压装置，结合在探针体21中的压电传感器8，使得反作用力作用于施加到探针轴的压力通过按压装置，用于测量作用在压电传感器上的负载的负载检测装置8b，用于基于由负载检测装置检测到的负载来调整由加压装置施加的按压力的控制装置9和位移量测量装置，用于通过由控制装置9调节的按压力来测量与待测量物体1接触的探针构件2的位置。

4. 发明申请

US20050007682A1 METHOD AND APPARATUS FOR MANUFACTURING LARGE DOUBLE-SIDED CURVED FRESNEL LENS 有权
标题翻译：用于制造大型双面弯曲FRESNEL镜头的方法和装置
公开(公告)号：US20050007682A1
公开(公告)日：2005-01-13
申请号：US10496151
申请日：2002-12-03
申请人： Hitoshi Ohmori , Yoshihiro Uehara , Yoshiyuki Ueno , Yukata Yamagata , Shinya Morita
发明人： Hitoshi Ohmori , Yoshihiro Uehara , Yoshiyuki Ueno , Yukata Yamagata , Shinya Morita
IPC分类号： B29C43/02 , B29C43/36 , B29D11/00 , G02B3/08 , G02C5/02
CPC分类号： B29D11/00269 , B29C43/021 , B29C43/36 , B29C2043/5841 , B29L2011/005 , G02B3/08
摘要： A method of manufacturing a large double-sided curved Fresnel lens. The method includes a machining step (A) of performing ultra-precise three-dimensional machining on an upper mold and a lower mold to each have an upper transfer surface and a lower transfer surface engaging an upper surface and a lower surface of a thermoplastic resin plate, respectively. Further, the method includes a hot press molding step (B) of pressing the thermoplastic resin plate between the upper and lower molds by a predetermined pressure with the resin plate being held at a temperature higher than a softening temperature thereof and lower than a melting temperature thereof so that the thermoplastic resin plate is curved, and both lens surfaces for the double-sided Fresnel lens are respectively transferred to an upper surface and a lower surface of the thermoplastic resin plate.
摘要翻译：一种制造大型双面弯曲菲涅耳透镜的方法。该方法包括在上模和下模上执行超精密三维加工的加工步骤（A），每个加工步骤具有与热塑性树脂的上表面和下表面接合的上转印面和下转印面板。此外，该方法包括热塑性树脂板在上模和下模之间以预定压力挤压的热压成型步骤（B），树脂板保持在高于其软化温度的温度并低于熔融温度使得热塑性树脂板弯曲，并且双面菲涅尔透镜的两个透镜表面分别转印到热塑性树脂板的上表面和下表面。

5. 发明授权

US08500988B2 Device and method for ELID honing 有权
标题翻译： ELID珩磨装置及方法
公开(公告)号：US08500988B2
公开(公告)日：2013-08-06
申请号：US12294710
申请日：2006-09-08
申请人： Weimin Lin , Hitoshi Ohmori , Yasutaka Yamamoto , Jiro Maruyama
发明人： Weimin Lin , Hitoshi Ohmori , Yasutaka Yamamoto , Jiro Maruyama
IPC分类号： B23H3/00 , B23H5/00 , B23H7/00 , B23H9/00 , B23H11/00 , C25F3/00 , C25F7/00 , H05K3/07 , B24B1/00 , B24B7/19 , B24B7/30
CPC分类号： B24B53/001 , B24B33/02 , B24B33/083 , B24B53/12
摘要： An ELID honing device includes a honing tool 10 positioned above a workpiece 1 having a hollow cylindrical inner surface, and vertically movable and rotationally drivable about a vertical rotation axis while being rockably suspended from an upper end, and a honing guide 20 positioned in proximity to an upper portion of the workpiece to guide the honing tool to the hollow cylindrical inner surface. The honing tool 10 has a fixed guide 12 having a predetermined radius R from the rotation axis to its outer peripheral surface, and honing stones 14a and 14b having outer peripheral surfaces movable in parallel from a diameter-increased position outside the radius R to a diameter-reduced position inside the radius R and capable of being electrolytically dressed. Further, the honing guide 20 has a hollow cylindrical ELID electrode 22 having an inner surface 22a for guiding an outer peripheral surface of the fixed guide of the honing tool and capable of being subjected to a negative voltage.
摘要翻译： ELID珩磨装置包括一个珩磨工具10，该珩磨工具10位于具有中空圆柱形内表面的工件1上方，并且可垂直移动并围绕垂直旋转轴可旋转地驱动，同时从上端可摆动地悬挂;以及珩磨引导件20，工件的上部，以将珩磨工具引导到中空圆柱形内表面。珩磨工具10具有从旋转轴线到其外周面的具有预定半径R的固定引导件12，以及具有从半径R外侧的直径增加位置平行移动的外周表面的珩磨石14a和14b， - 减小半径R内的位置，并能够进行电解穿戴。此外，珩磨引导件20具有中空的圆柱形ELID电极22，其具有内表面22a，用于引导珩磨工具的固定引导件的外周表面并且能够承受负电压。

6. 发明申请

US20100240284A1 DEVICE AND METHOD FOR ELID HONING 有权
标题翻译： ELID HONING的设备和方法
公开(公告)号：US20100240284A1
公开(公告)日：2010-09-23
申请号：US12294710
申请日：2006-09-08
申请人： Weimin Lin , Hitoshi Ohmori , Yasutaka Yamamoto , Jiro Maruyama
发明人： Weimin Lin , Hitoshi Ohmori , Yasutaka Yamamoto , Jiro Maruyama
IPC分类号： B24B1/00 , B24B33/02
CPC分类号： B24B53/001 , B24B33/02 , B24B33/083 , B24B53/12
摘要： An ELID honing device includes a honing tool 10 positioned above a workpiece 1 having a hollow cylindrical inner surface, and vertically movable and rotationally drivable about a vertical rotation axis while being rockably suspended from an upper end, and a honing guide 20 positioned in proximity to an upper portion of the workpiece to guide the honing tool to the hollow cylindrical inner surface. The honing tool 10 has a fixed guide 12 having a predetermined radius R from the rotation axis to its outer peripheral surface, and honing stones 14a and 14b having outer peripheral surfaces movable in parallel from a diameter-increased position outside the radius R to a diameter-reduced position inside the radius R and capable of being electrolytically dressed. Further, the honing guide 20 has a hollow cylindrical ELID electrode 22 having an inner surface 22a for guiding an outer peripheral surface of the fixed guide of the honing tool and capable of being subjected to a negative voltage.
摘要翻译： ELID珩磨装置包括一个珩磨工具10，该珩磨工具10位于具有中空圆柱形内表面的工件1上方，并且可垂直移动并围绕垂直旋转轴可旋转地驱动，同时从上端可摆动地悬挂;以及珩磨引导件20，工件的上部，以将珩磨工具引导到中空圆柱形内表面。珩磨工具10具有从旋转轴线到其外周面的具有预定半径R的固定引导件12，以及具有从半径R外侧的直径增加位置平行移动的外周表面的珩磨石14a和14b， - 减小半径R内的位置，并且能够被电解。此外，珩磨引导件20具有中空的圆柱形ELID电极22，其具有内表面22a，用于引导珩磨工具的固定引导件的外周表面并且能够承受负电压。

7. 发明授权

US07106528B2 Method and apparatus for manufacturing large double-sided curved Fresnel lens 有权
标题翻译：制造大型双面弯曲菲涅耳透镜的方法和装置
公开(公告)号：US07106528B2
公开(公告)日：2006-09-12
申请号：US10496151
申请日：2002-12-03
申请人： Hitoshi Ohmori , Yoshihiro Uehara , Yoshiyuki Ueno , Yutaka Yamagata , Shinya Morita
发明人： Hitoshi Ohmori , Yoshihiro Uehara , Yoshiyuki Ueno , Yutaka Yamagata , Shinya Morita
IPC分类号： G02B3/08
CPC分类号： B29D11/00269 , B29C43/021 , B29C43/36 , B29C2043/5841 , B29L2011/005 , G02B3/08
摘要： A method of manufacturing a large double-sided curved Fresnel lens. The method includes a machining step (A) of performing ultra-precise three-dimensional machining on an upper mold and a lower mold to each have an upper transfer surface and a lower transfer surface engaging an upper surface and a lower surface of a thermoplastic resin plate, respectively. Further, the method includes a hot press molding step (B) of pressing the thermoplastic resin plate between the upper and lower molds by a predetermined pressure with the resin plate being held at a temperature higher than a softening temperature thereof and lower than a melting temperature thereof so that the thermoplastic resin plate is curved, and both lens surfaces for the double-sided Fresnel lens are respectively transferred to an upper surface and a lower surface of the thermoplastic resin plate.
摘要翻译：一种制造大型双面弯曲菲涅耳透镜的方法。该方法包括在上模和下模上执行超精密三维加工的加工步骤（A），每个加工步骤具有与热塑性树脂的上表面和下表面接合的上转印面和下转印面板。此外，该方法包括热塑性树脂板在上模和下模之间以预定压力挤压的热压成型步骤（B），树脂板保持在高于其软化温度的温度并低于熔融温度使得热塑性树脂板弯曲，并且双面菲涅尔透镜的两个透镜表面分别转印到热塑性树脂板的上表面和下表面。

8. 发明申请

US20070202258A1 Micro-pattern forming apparatus, micro-pattern structure, and method of manufacturing the same 审中-公开
标题翻译：微图案形成装置，微图案结构及其制造方法
公开(公告)号：US20070202258A1
公开(公告)日：2007-08-30
申请号：US11512355
申请日：2006-08-30
申请人： Yutaka Yamagata , Hitoshi Ohmori , Hiroshi Kase , Hiromi Nonaka , Ai Kaneko , Kazuya Nitta
发明人： Yutaka Yamagata , Hitoshi Ohmori , Hiroshi Kase , Hiromi Nonaka , Ai Kaneko , Kazuya Nitta
IPC分类号： B05D1/32 , C25D5/00 , B05C5/00
CPC分类号： B01L3/0268 , B01J2219/0036 , B01J2219/00371 , B01J2219/00378 , B01J2219/00527 , B01J2219/00585 , B01J2219/00596 , B01J2219/00659 , B01J2219/00725 , B01L2300/0819 , B01L2300/0838 , B01L2400/027 , B05B5/025 , B05B5/087 , G03F1/20 , G03F7/12
摘要： There is provided a micro-pattern forming apparatus including an electrospraying part for applying a voltage to a solution containing a sample to electrostatically atomizing the solution; a supporting part (30) for supporting a chip (26), on which the sample in the solution electrostatically atomized by the electrospraying part, is to be deposited; and a fine mask part (24) disposed between the electrospraying part and the supporting part, having a mask pattern for being passed through by the electrostatically atomized solution in order to form a micro-pattern of the sample upon the chip, wherein the mask pattern is made from a photoresist material with concavity and convexity on the side of the supporting part.
摘要翻译：提供一种微图形形成装置，其包括用于向含有样品的溶液施加电压的电喷雾部件以静电雾化溶液; 用于支撑芯片（26）的支撑部分（30），在其上沉积由电喷雾部分静电雾化的溶液中的样品; 以及设置在电喷雾部分和支撑部分之间的精细掩模部分（24），具有通过静电雾化溶液通过的掩模图案，以便在芯片上形成样品的微图案，其中掩模图案由在支撑部分的侧面上具有凹凸的光致抗蚀剂材料制成。

9. 发明授权

US06531037B2 Removable electrode 失效
标题翻译：可拆卸电极
公开(公告)号：US06531037B2
公开(公告)日：2003-03-11
申请号：US09796629
申请日：2001-03-02
申请人： Hitoshi Ohmori
发明人： Hitoshi Ohmori
IPC分类号： C25F700
CPC分类号： B24B53/001 , B24B53/12
摘要： There is disclosed a removable electrode for electrolytic dressing grinding in which the electrode is disposed opposite to a processing surface of a conductive grinding wheel via a gap, a conductive liquid is passed through between the electrode and the conductive grinding wheel to apply a voltage thereto, the grinding wheel is dressed by electrolysis and a workpiece is simultaneously ground, the electrode comprising: an electrode support member 12 having a surface 12a disposed opposite to the processing surface of the grinding wheel via a constant gap; a conductive foil 14 detachably attached to and along the opposite surface of the electrode support member; and a conductive terminal 16 for contacting the conductive foil to apply the voltage to the conductive foil. Even when a deposit is built up on a cathode surface, the cathode surface can be cleaned in a short time. Even after repeated use, an electrode shape does not change. Therefore, an ELID grinding apparatus can steadily be operated in an unmanned manner for a long time.
摘要翻译：公开了一种用于电解修整研磨的可移除电极，其中电极经由间隙与导电研磨轮的处理表面相对地布置，导电液体通过电极和导电研磨轮之间以向其施加电压，通过电解修整砂轮并同时研磨工件，电极包括：电极支撑构件12，其具有经由恒定间隙与砂轮的处理表面相对设置的表面12a; 可拆卸地附接到电极支撑构件的相对表面并且沿着电极支撑构件的相对表面的导电箔14; 以及用于接触导电箔以将电压施加到导电箔的导电端子16。即使在阴极表面上形成沉积物，也可以在短时间内清洁阴极表面。即使重复使用，电极形状也不会改变。因此，ELID研磨装置可以长时间无人操作地稳定地操作。

10. 发明授权

US06478661B2 Apparatus and method for processing micro-V grooves 失效
标题翻译：微V槽加工装置及方法
公开(公告)号：US06478661B2
公开(公告)日：2002-11-12
申请号：US09794909
申请日：2001-02-28
申请人： Hitoshi Ohmori , Noboru Ebizuka , Yutaka Yamagata , Shinya Morita , Sei Moriyasu , Muneaki Asami
发明人： Hitoshi Ohmori , Noboru Ebizuka , Yutaka Yamagata , Shinya Morita , Sei Moriyasu , Muneaki Asami
IPC分类号： B24B100
CPC分类号： B24B53/001 , B24B13/015 , B24B19/028 , B24B53/02
摘要： A voltage is applied between a cylindrical cutting grindstone 2 that rotates about a vertical axis Y and a cylindrical truing grindstone 6 that rotates about a horizontal axis X. The vertical outer surface 2a and the horizontal lower surface 2b of the cutting grindstone are trued by a plasma discharge. Then without applying the voltage, the cutting grindstone 2 is trued mechanically by the truing grindstone 6, and while the outer periphery and lower surface of the cutting grindstone are dressed electrolytically, the outer periphery and lower surface are made to contact a workpiece 1 and process a micro-V groove. This method makes it possible to produce an immersion grating with a high resolution using hard, brittle materials such as germanium, gallium arsenide and lithium niobate.
摘要翻译：在围绕垂直轴线Y旋转的圆筒形磨石2和围绕水平轴线X旋转的圆柱形修整磨石6之间施加电压。切割磨石的垂直外表面2a和水平下表面2b由等离子体放电。然后在不施加电压的情况下，通过修整磨石6机械地修整切割磨石2，并且当切割磨石的外周和下表面被电解时，使外周和下表面接触工件1和工艺一个微V槽。该方法使得可以使用诸如锗，砷化镓和铌酸锂的硬的脆性材料来生产具有高分辨率的浸没光栅。

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