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1. 发明授权

US06183159B2 Automotive soil treating machine 失效
标题翻译：汽车土壤处理机
公开(公告)号：US06183159B2
公开(公告)日：2001-02-06
申请号：US09358417
申请日：1999-07-22
申请人： Hisayoshi Hashimoto , Fujio Sato , Yasuharu Yamamoto , Toshikazu Murai , Tetsushiro Miura , Fumiki Nakagiri , Takami Kusaki , Satoshi Sekino , Kiyonobu Hirose , Yoshio Mizuno , Nobuo Ito , Hideki Fukuzawa
发明人： Hisayoshi Hashimoto , Fujio Sato , Yasuharu Yamamoto , Toshikazu Murai , Tetsushiro Miura , Fumiki Nakagiri , Takami Kusaki , Satoshi Sekino , Kiyonobu Hirose , Yoshio Mizuno , Nobuo Ito , Hideki Fukuzawa
IPC分类号： E01C2308
CPC分类号： E02F7/06 , E02F5/226 , E02F7/02
摘要： A vehicular automotive soil treating machine having a main frame structure provided on an automotive drive means to support thereon a soil feeding stage including at least a soil hopper and an additive hopper for feeding soil and an additive soil improving material, a soil processing stage including a soil processing trough which is internally provided with a mixing device for mixing soil and additive material while being transferred from one to the other end of the soil processing trough, and a processed soil discharging stage including a soil discharging conveyer for transferring processed soil of improved quality in a predetermined direction. The soil processing trough is provided with an inlet opening on the upper side of its fore end portion to receive soil and additive material therethrough, and an outlet opening on the bottom side of its rear end portion to discharge processed soil of improved quality toward the discharging conveyer.
摘要翻译：一种车辆用汽车土壤处理机，其具有设置在汽车驱动装置上的主框架结构，用于在其上支撑包括至少一个土壤料斗和一个用于输送土壤的添加剂料斗和一种添加剂土壤改良材料的土壤进料段，土壤处理阶段包括土壤处理槽内部设置有用于在土壤处理槽的一端传递到另一端的同时将土壤和添加剂材料混合的混合装置，以及包括用于输送改进质量的处理土壤的排污输送机的处理污水排放阶段沿预定方向。土壤处理槽在其前端部的上侧设置有入口，以接收通过其的土壤和添加剂材料，以及在其后端部的底侧上的出口，以将处理后的土壤排出，以提高质量朝向排出输送机

2. 发明授权

US06171030B2 Soil improving machine with excavating means 失效
标题翻译：土壤改良机采用挖掘装置
公开(公告)号：US06171030B2
公开(公告)日：2001-01-09
申请号：US09147565
申请日：1999-01-21
申请人： Shigehiko Miyake , Hisayoshi Hashimoto , Toshikazu Murai , Takami Kusaki , Tetsushiro Miura , Hiroyosi Itaya , Fumiki Nakagiri , Satoshi Sekino
发明人： Shigehiko Miyake , Hisayoshi Hashimoto , Toshikazu Murai , Takami Kusaki , Tetsushiro Miura , Hiroyosi Itaya , Fumiki Nakagiri , Satoshi Sekino
IPC分类号： C09K1700
CPC分类号： E02F7/04 , E02D3/005 , E02D3/12 , E02F5/12 , E02F5/226 , E02F7/026 , E02F7/06 , E02F9/2292 , E02F9/2296
摘要： A vehicular soil treating machine having a base carrier with a crawler type vehicle drive, an upper rotary body rotatably mounted on the base carrier, and an excavation means mounted on the upper rotary body and equipped with a soil excavating bucket. Provided on the base carrier is an elongated continuous soil processing trough having a predetermined length in the longitudinal direction of the base carrier and internally provided with a tumbling/mixing means for uniformly mixing additive soil improving material into sand and soil which is fed from the excavation means. A soil hopper is provided over one end of the continuous processing trough, and an additive feed means is located behind the soil hopper to feed additive soil improving material to the continuous processing trough.
摘要翻译：一种车辆用土壤处理机，具有履带式车辆驱动器的基座架，可旋转地安装在基座上的上部旋转体，以及安装在上部旋转体上并装有挖土铲斗的挖掘装置。在基座上设置有细长的连续的土壤处理槽，其在基座的纵向方向上具有预定长度，并且内部设置有用于将添加的土壤改良材料均匀地混合到砂土中的翻转混合装置，手段。在连续加工槽的一端设置污泥漏斗，并且在土壤料斗的后面设置添加剂进料装置，以将附加土壤改良材料输送到连续加工槽。

3. 发明授权

US06991996B2 Manufacturing method of semiconductor device and semiconductor chip using SOI substrate, facilitating cleaving 失效
标题翻译：使用SOI衬底的半导体器件和半导体芯片的制造方法，便于切割
公开(公告)号：US06991996B2
公开(公告)日：2006-01-31
申请号：US10634839
申请日：2003-08-06
申请人： Shinji Sugatani , Satoshi Sekino
发明人： Shinji Sugatani , Satoshi Sekino
IPC分类号： H01L21/301 , H01L21/46 , H01L21/78
CPC分类号： H01L21/76254 , H01L2924/0002 , H01L2924/00
摘要： A laminated substrate is formed by laminating a device formation layer made of single crystalline semiconductor on a supporting substrate made of single crystalline semiconductor via an insulating layer with making one direction of a crystallographic axis of the device formation layer be shifted from a corresponding direction of a crystallographic axis of the supporting substrate. Semiconductor devices are formed in the device formation layer within a plurality of areas divided by scribe lines extending to a direction being parallel to a direction of a crystallographic axis where the supporting substrate is easy to be cleaved. The laminated substrate is split into a plurality of chips by cleaving the supporting substrate along the scribe lines. A semiconductor device can easily be split into chips even if a moving direction of carrier and an extending direction of wiring are shifted from an easy-cleaved direction of a crystallographic axis.
摘要翻译：层叠基板通过将由单晶半导体构成的器件形成层通过绝缘层层叠在由单晶半导体构成的支撑基板上而使器件形成层的结晶轴的一个方向从支撑衬底的晶轴。半导体器件形成在多个区域中的器件形成层中，划分为划线延伸到平行于晶体轴方向的方向，其中支撑衬底易于被切割。通过沿着划线切断支撑基板，将层叠基板分割为多个芯片。即使载体的移动方向和布线的延伸方向从结晶轴的易于切割的方向偏移，半导体器件也可以容易地分成芯片。

4. 发明授权

US06936520B2 Method for fabricating semiconductor device having gate electrode together with resistance element 有权
标题翻译：制造具有栅电极和电阻元件的半导体器件的方法
公开(公告)号：US06936520B2
公开(公告)日：2005-08-30
申请号：US10673354
申请日：2003-09-30
申请人： Akira Yamanoue , Satoshi Sekino
发明人： Akira Yamanoue , Satoshi Sekino
IPC分类号： H01L21/28 , H01L21/02 , H01L21/266 , H01L21/822 , H01L21/8234 , H01L27/04 , H01L27/06 , H01L29/423 , H01L29/49 , H01L21/20
CPC分类号： H01L28/20 , H01L27/0629
摘要： A method for fabricating a semiconductor device comprises the steps of forming a polysilicon film 32 on a silicon substrate 10, implanting a dopant into a region of the polysilicon film 32 for a resistance element to be formed in, patterning the polysilicon film 32 to from the resistance element 46 of the polysilicon film 32 with the dopant inplanted in and gate electrodes 44a, 44b of the polysilicon film 32 with the dopant not implanted in. Accordingly, resistance element can be formed while suppressing influences on characteristics of the transistor formed on one and the same substrate concurrently with forming the resistance element.
摘要翻译：一种用于制造半导体器件的方法包括以下步骤：在硅衬底10上形成多晶硅膜32，将掺杂剂注入用于形成电阻元件的多晶硅膜32的区域中，使多晶硅膜32从多晶硅膜32的电阻元件46与掺杂剂注入的掺杂剂和多晶硅膜32的栅电极44a，44b，掺杂剂不被注入。因此，可以形成电阻元件，同时抑制对形成的晶体管的特性的影响同一基板同时形成电阻元件。

5. 发明授权

US08692962B2 Diffusion sheet and method of manufacturing the same, backlight, and liquid crystal display device 有权
标题翻译：扩散片及其制造方法，背光源和液晶显示装置
公开(公告)号：US08692962B2
公开(公告)日：2014-04-08
申请号：US12785641
申请日：2010-05-24
申请人： Akihiro Shibata , Jun Sasaki , Hirofumi Tsuiki , Akihiro Horii , Noriyuki Hirai , Hiroshi Mizuno , Satoko Asaoka , Kanako Hashimoto , Yasuyuki Kudo , Saori Hayashi , Teiichi Miyauchi , Satoshi Sekino , Makoto Aoki
发明人： Akihiro Shibata , Jun Sasaki , Hirofumi Tsuiki , Akihiro Horii , Noriyuki Hirai , Hiroshi Mizuno , Satoko Asaoka , Kanako Hashimoto , Yasuyuki Kudo , Saori Hayashi , Teiichi Miyauchi , Satoshi Sekino , Makoto Aoki
IPC分类号： G02F1/1335 , G02B5/04
CPC分类号： G02B5/02 , B29D11/00798 , G02B3/0031 , G02B3/0043 , G02B3/0056 , G02B3/0062 , G02F1/133606 , G02F1/13362 , G02F2001/133607
摘要： A diffusion sheet includes: a substrate having a first principal surface and a second principal surface; and structures each in a convex shape formed randomly on the first principal surface or the second principal surface of the substrate. The structures have an identical or almost identical height. The structures have an aspect ratio h/r, where r denotes an average radius of the structures and h denotes an average height of the structures, of more than 0.85 and not more than 1.50. The structures have a filling factor of not less than 60% and not more than 80%.
摘要翻译：漫射片包括：具有第一主表面和第二主表面的衬底; 以及在基板的第一主表面或第二主表面上随机形成为凸形的结构。这些结构具有相同或几乎相同的高度。该结构具有纵横比h / r，其中r表示结构的平均半径，h表示结构的平均高度，大于0.85且不大于1.50。该结构的填充系数不小于60％且不大于80％。

6. 发明授权

US08228462B2 Optical element laminate, backlight, and liquid crystal display apparatus 失效
标题翻译：光学元件叠层，背光源和液晶显示装置
公开(公告)号：US08228462B2
公开(公告)日：2012-07-24
申请号：US12538541
申请日：2009-08-10
申请人： Jun Sasaki , Satoshi Sekino , Akihiro Horii , Noriyuki Hirai , Katsuhiro Doi , Makoto Aoki
发明人： Jun Sasaki , Satoshi Sekino , Akihiro Horii , Noriyuki Hirai , Katsuhiro Doi , Makoto Aoki
IPC分类号： G02F1/1335
CPC分类号： G02B5/02 , G02B6/0088 , G02F1/133608
摘要： An optical element laminate is provided and includes a first optical element and a second optical element superimposed with the first optical element. The first optical element and the second optical element are each a rectangular film or sheet. The first optical element has at least two side walls at two opposing sides among four sides of the first optical element and the second optical element has at least two side walls at two opposing sides among four sides of the second optical element.
摘要翻译：提供一种光学元件叠层体，包括第一光学元件和与第一光学元件重叠的第二光学元件。第一光学元件和第二光学元件各自为矩形膜或片。第一光学元件在第一光学元件的四个侧面中的两个相对侧具有至少两个侧壁，并且第二光学元件在第二光学元件的四个侧面中的两个相对侧具有至少两个侧壁。

7. 发明授权

US08018557B2 Retardation compensating plate to compensate residual retardation of a liquid crystal panel, a compensator, a liquid crystal display device, and a projection image display apparatus having the same 有权
标题翻译：用于补偿液晶面板，补偿器，液晶显示装置的残余延迟的延迟补偿板和具有该延迟补偿板的投影图像显示装置
公开(公告)号：US08018557B2
公开(公告)日：2011-09-13
申请号：US11375000
申请日：2006-03-15
申请人： Yutaka Muramoto , Satoshi Sekino , Hideki Terashima , Tatsuya Harima , Sachie Shoji , Noriaki Doi , Tokuhiro Morioka
发明人： Yutaka Muramoto , Satoshi Sekino , Hideki Terashima , Tatsuya Harima , Sachie Shoji , Noriaki Doi , Tokuhiro Morioka
IPC分类号： G02F1/1335
CPC分类号： G02F1/133634 , G02B5/3083
摘要： A retardation compensator 40 for compensating for residual retardation of a liquid crystal panel 11 includes a retardation compensating plate 50 having birefringence. An in-plane retardation R0c of the retardation compensating plate 50 and an in-plane retardation R0p of the liquid crystal panel 11 satisfy a relationship of 1
摘要翻译：用于补偿液晶面板11的残余延迟的延迟补偿器40包括具有双折射的延迟补偿板50。延迟补偿板50的面内延迟R0c和液晶面板11的面内相位差R0p满足1

8. 发明申请

US20070051887A1 Cantilever and inspecting apparatus 审中-公开
标题翻译：悬臂和检查仪器
公开(公告)号：US20070051887A1
公开(公告)日：2007-03-08
申请号：US11513411
申请日：2006-08-31
申请人： Kishio Hidaka , Motoyuki Hirooka , Mitsuo Hayashibara , Tadashi Fujieda , Hiroki Tanaka , Noriaki Takeshi , Takafumi Morimoto , Satoshi Sekino , Masato Takashina , Yuki Uozumi
发明人： Kishio Hidaka , Motoyuki Hirooka , Mitsuo Hayashibara , Tadashi Fujieda , Hiroki Tanaka , Noriaki Takeshi , Takafumi Morimoto , Satoshi Sekino , Masato Takashina , Yuki Uozumi
IPC分类号： G21K7/00
CPC分类号： G01Q60/38 , G01Q70/12
摘要： The present invention provides a cantilever having a base fixed to an inspecting apparatus, a beam protruding from the base, and a probe fixed to an end of the beam, wherein: the probe is formed by use of a carbon nanotube; and the probe is fixed by metal layers from at least two directions when the cantilever is operated, the probe protrudes in a direction in which a sample is fixed. It is possible to prevent the probe from warping and suppress image failures during observation of a sample.
摘要翻译：本发明提供了一种悬臂，其具有固定在检查装置上的基座，从基座突出的梁和固定在梁的端部的探针，其中：通过使用碳纳米管形成探针; 并且当悬臂被操作时，探针从至少两个方向由金属层固定，探针沿固定样品的方向突出。可以在观察样品期间防止探头翘曲并抑制图像故障。

9. 发明申请

US20100043108A1 PROBE FOR SCANNING PROBE MICROSCOPE 审中-公开
标题翻译：扫描探针显微镜探针
公开(公告)号：US20100043108A1
公开(公告)日：2010-02-18
申请号：US12262208
申请日：2008-10-31
申请人： Motoyuki Hirooka , Makoto Okai , Takafumi Morimoto , Satoshi Sekino , Hiroki Tanaka , Masato Takashina , Yuuki Uozumi
发明人： Motoyuki Hirooka , Makoto Okai , Takafumi Morimoto , Satoshi Sekino , Hiroki Tanaka , Masato Takashina , Yuuki Uozumi
IPC分类号： G01B5/28
CPC分类号： G01Q70/12
摘要： In a tip having a carbon nanotube tip used to a scanning probe microscope, its length of the tip is adjusted in a several order of 10 nm and the tip maintains cylindrical shape up to the extremity portion.
摘要翻译：在具有用于扫描探针显微镜的碳纳米管尖端的尖端中，其尖端的长度被调节为几个数量级的10nm，并且尖端保持圆柱形直到末端部分。

10. 发明授权

US06999278B2 Cleaning tape with surface protrusions formed by particles of predetermined size/density and non-magnetic metal evaporated film of predetermined thickness 失效
标题翻译：具有由预定尺寸/密度的颗粒形成的表面突起和具有预定厚度的非磁性金属蒸镀膜的清洁带
公开(公告)号：US06999278B2
公开(公告)日：2006-02-14
申请号：US10463370
申请日：2003-06-17
申请人： Hidetoshi Honda , Takashi Kanou , Hitoshi Wako , Satoshi Sekino , Ryoichi Hiratsuka
发明人： Hidetoshi Honda , Takashi Kanou , Hitoshi Wako , Satoshi Sekino , Ryoichi Hiratsuka
IPC分类号： G11B5/41
CPC分类号： G11B5/41 , Y10S15/12
摘要： There is provided a cleaning tape capable of attaining sufficient cleaning effects while preventing electrostatic discharge damage to magnetoresistive heads or changes in reproduced output due to excessive head wear. The cleaning tape includes a non-magnetic substrate 1, surface protrusions 6 formed on the non-magnetic substrate 1 with particles 2 having a particle diameter of 10 to 40 nm at a density of 300×104 to 5000×104 mm2, a metal evaporated film 3 (preferably an electrically conductive layer such as an alloy layer containing Co as a primary component, an Al layer or the like) having a thickness of 10 to 200 nm and an inorganic protection film 4 having a thickness of 3 to 50 nm formed on the metal evaporated film 3.
摘要翻译：提供了能够获得足够的清洁效果的清洁带，同时防止由于头部磨损过大而导致的磁阻头的静电放电损坏或再现输出的变化。清洁带包括非磁性基板1，形成在非磁性基板1上的表面突起6，颗粒2的粒径为10至40nm，密度为300×10 4至5000×10 5，金属蒸镀膜3（优选为含有Co作为主要成分的合金层的导电层，Al层等），具有厚度在金属蒸镀膜3上形成厚度为3〜50nm的无机保护膜4。

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