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    • 1. 发明授权
    • Locking structure
    • 锁定结构
    • US07802831B2
    • 2010-09-28
    • US12243157
    • 2008-10-01
    • Hiroyuki IsayamaHajime Seino
    • Hiroyuki IsayamaHajime Seino
    • B60R7/04
    • B60R13/0262Y10T70/5889
    • Locking structures each include a locking claw portion formed on a desired object, and a locking clamp mechanism formed on at least one of left and right wall portions of a console device. The clamp mechanism has a fitting hole portion formed in the wall portion for fitting therein of the locking claw portion, a locking support portion for lockingly supporting the claw portion fitted in the fitting hole portion, and a pair of opposed movement-preventing projecting portions formed on opposite ends of the support portion for preventing movement of the object between the opposite ends. The clamp mechanism also having a resiliently-deformable elastic portion formed integrally with the wall portion to extend into the hole portion for resiliently pressing the claw portion against the support portion.
    • 锁定结构各自包括形成在所需物体上的锁定爪部分和形成在控制台装置的左壁和右壁部分中的至少一个上的锁定夹紧机构。 夹紧机构具有形成在壁部中的嵌合孔部,用于嵌合锁定爪部,用于锁定地支撑装配在装配孔部中的爪部的锁定支撑部和形成为一对相对的防止移动的突出部 在支撑部分的相对端上,用于防止物体在相对端之间移动。 夹紧机构还具有与壁部一体形成的可弹性变形的弹性部分,以延伸到孔部分中,以将爪部弹性地压靠在支撑部分上。
    • 2. 发明申请
    • LOCKING STRUCTURE
    • 锁定结构
    • US20090090147A1
    • 2009-04-09
    • US12243157
    • 2008-10-01
    • Hiroyuki IsayamaHajime Seino
    • Hiroyuki IsayamaHajime Seino
    • E05B65/12
    • B60R13/0262Y10T70/5889
    • Locking structures each include a locking claw portion formed on a desired object, and a locking clamp mechanism formed on at least one of left and right wall portions of a console device. The clamp mechanism hash a fitting hole portion formed in the wall portion for fitting therein of the locking claw portion, a locking support portion for lockingly supporting the claw portion fitted in the fitting hole portion, and a pair of opposed movement-preventing projecting portions formed on opposite ends of the support portion for preventing movement of the object between the opposite ends. The clamp mechanism also having a resiliently-deformable elastic portion formed integrally with the wall portion to extend into the hole portion for resiliently pressing the claw portion against the support portion.
    • 锁定结构各自包括形成在所需物体上的锁定爪部分和形成在控制台装置的左壁和右壁部分中的至少一个上的锁定夹紧机构。 夹紧机构将形成在壁部上的嵌合孔部分嵌入锁定爪部,嵌合在嵌合孔部中的爪部的锁定支承部和形成在该嵌合孔部的一对相对的防止移动突出部 在支撑部分的相对端上,用于防止物体在相对端之间移动。 夹紧机构还具有与壁部一体形成的可弹性变形的弹性部分,以延伸到孔部分中,以将爪部弹性地压靠在支撑部分上。
    • 3. 发明申请
    • Interpolation device
    • 插值装置
    • US20080056618A1
    • 2008-03-06
    • US11891207
    • 2007-08-09
    • Kyouji YoshinoMotonobu TonomuraHajime Seino
    • Kyouji YoshinoMotonobu TonomuraHajime Seino
    • G06K9/32
    • H04N9/045G06T3/4015G09G5/02G09G2340/0428G09G2340/06G09G2340/14G09G2360/16H04N2209/046
    • An interpolation process for scaling is performed directly on raw data from an image pickup apparatus. Raw data, constituted of Bayer pattern array pixels input by a pixel value input unit 110 are stored in a pixel value storage unit 120 as a set of pixels positioned on respective lattice points on a square lattice. An interpolation point designating unit 170 designates a position of an interpolation point Q by an upper address that indicates a lattice point near the upper left and a lower address that indicates a position inside a lattice frame, and a calculation target color designating unit 160 designates a specific color for which a pixel value is to be determined. An interpolation reference frame determining unit 150 determines an interpolation reference frame, formed of a smallest square, which contains the interpolation point Q and with which the four vertices are formed by lattice points of the designated color, and an interpolation origin, constituted of the upper left lattice point of the interpolation reference frame, and an interpolation proportion determining unit 140 determines interpolation proportions d* and e* based on distances between the interpolation origin and the interpolation point Q. An interpolation calculation unit 130 performs an interpolation calculation using pixel values of the surroundings of the interpolation reference frame and the interpolation proportions d* and e*.
    • 直接对来自图像拾取装置的原始数据执行缩放的插值处理。 由像素值输入单元110输入的拜耳图案阵列像素构成的原始数据作为位于正方格子上的各个格点上的一组像素存储在像素值存储单元120中。 内插点指定单元170将内插点Q的位置指定指示靠近左上角的格点的上部地址和指示格子框内的位置的下部地址,并且计算对象颜色指定单元160指定 要确定像素值的特定颜色。 内插基准帧确定单元150确定包含内插点Q并且由指定颜色的格点形成四个顶点的最小平方形的内插参考帧,以及由上部 插值比例确定单元140基于插值原点和内插点Q之间的距离来确定内插比例d *和e *。插值计算单元130使用插值原点和内插点Q的像素值进行插值计算 插值参考帧的周围和插值比例d *和e *。
    • 4. 发明授权
    • Substrate selector
    • 基板选择器
    • US06801824B2
    • 2004-10-05
    • US10049051
    • 2002-05-10
    • Kouji IshidaKiyoshi YamazakiHideyuki NaraHajime Seino
    • Kouji IshidaKiyoshi YamazakiHideyuki NaraHajime Seino
    • G06F1900
    • G05B19/41875G03F1/84G05B2219/32186G05B2219/32201Y02P90/22
    • Substrate-selecting equipment selects substrates used for objective products from among a group of substrates with photosensitive material layers used for the production of photomask. The substrate-selecting equipment comprises one or more of the defect-registering part(s) for registering the results of the inspection of defects of substrates with photosensitive material layers in database, the photosensitive material layer lot check result-registering part for registering the results of check of lots of photosensitive material layers in database and the substrate-selecting part for selecting substrates used for the production of objective products from among a group of substrates with photosensitive material layers, on the basis of the results of inspection of defects and the results of check of lots of photosensitive materials registered in database.
    • 基板选择设备从用于制造光掩模的感光材料层的一组基板中选择用于目标产品的基板。 基板选择设备包括一个或多个缺陷配准部分,用于在数据库中记录具有感光材料层的基板的缺陷的检查结果,用于注册结果的感光材料层批次检查结果注册部分 根据缺陷检查结果和结果,从数据库中的许多感光材料层的检查和用于从具有感光材料层的一组基板中选择用于生产目标产品的基板的基板选择部分 检查在数据库中注册的许多感光材料。
    • 7. 发明授权
    • Interpolation device
    • 插值装置
    • US08000563B2
    • 2011-08-16
    • US11891207
    • 2007-08-09
    • Kyouji YoshinoMotonobu TonomuraHajime Seino
    • Kyouji YoshinoMotonobu TonomuraHajime Seino
    • G06K9/00G06K9/40G06K9/32G06F7/38
    • H04N9/045G06T3/4015G09G5/02G09G2340/0428G09G2340/06G09G2340/14G09G2360/16H04N2209/046
    • An interpolation process for scaling is performed directly on raw data from an image pickup apparatus. Raw data, constituted by inputted Bayer pattern array are as a set of pixels positioned on respective lattice points on a square lattice. A position of an interpolation point Q is designated by an upper address that indicates a lattice point near the upper left and a lower address that indicates a position inside a lattice frame, a specific color is designated for which a pixel value is to be determined. An interpolation reference frame is determined, formed of a smallest square, which contains the interpolation point Q and with which the four vertices are formed by lattice points of the designated color, and an interpolation origin, constituted by the upper left lattice point of the interpolation reference frame, interpolation proportions d* and e* are determined. An interpolation calculation is performed.
    • 直接对来自图像拾取装置的原始数据执行缩放的插值处理。 由输入的拜耳图案阵列构成的原始数据是位于正方形格子上的相应格子点上的一组像素。 内插点Q的位置由指示靠近左上角的格点的上部地址和表示格子框内的位置的下部地址指定,指定要确定像素值的特定颜色。 确定由包含内插点Q并且由指定颜色的格点形成四个顶点的最小平方形的内插参考帧,以及由插值的左上方格点构成的插值原点 参考帧,插值比例d *和e *被确定。 执行插值计算。