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    • 2. 发明授权
    • Semiconductor device with current mirror circuit having two transistors of identical characteristics
    • 具有电流镜电路的半导体器件具有两个相同特性的晶体管
    • US07723796B2
    • 2010-05-25
    • US11902568
    • 2007-09-24
    • Hiroyoshi Tomita
    • Hiroyoshi Tomita
    • H01L23/62
    • G05F3/262H01L29/4238
    • A semiconductor device includes a current-mirror circuit including a first ring-shape gate, a second ring-shape gate, a first diffusion layer formed around the first ring-shape gate and the second ring-shape gate, a second diffusion layer formed inside the first ring-shape gate, a third diffusion layer formed inside the second ring-shape gate, an interconnect line electrically connecting the first ring-shape gate and the second ring-shape gate to a same potential, and an STI area formed around the first diffusion layer, wherein a first transistor corresponding to the first ring-shape gate and a second transistor corresponding to the second ring-shape gate constitute the current-mirror circuit, wherein gates of dummy transistors that do not function as transistors are situated between the STI area and the first and second ring-shape gates, and are arranged both in a first direction and in a second direction substantially perpendicular to the first direction.
    • 一种半导体器件包括:电流镜电路,包括第一环形栅极,第二环形栅极,形成在第一环状栅极和第二环形栅极周围的第一扩散层,第二扩散层, 第一环形栅极,形成在第二环形栅极内部的第三扩散层,将第一环形栅极和第二环形栅极电连接到相同电位的互连线,以及形成在第二环形栅极周围的STI区域 第一扩散层,其中对应于第一环形栅极的第一晶体管和对应于第二环形栅极的第二晶体管构成电流镜电路,其中不用作晶体管的虚拟晶体管的栅极位于 STI区域和第​​一和第二环形门,并且布置在基本上垂直于第一方向的第一方向和第二方向上。
    • 3. 发明授权
    • Semiconductor device and fabrication method thereof
    • 半导体器件及其制造方法
    • US07539042B2
    • 2009-05-26
    • US11783318
    • 2007-04-09
    • Hiroyoshi Tomita
    • Hiroyoshi Tomita
    • G11C11/24G11C7/00G11C8/00
    • G11C11/4074G11C11/401G11C29/50G11C2029/0403G11C2207/2254H01L27/0207H01L27/10829
    • The present invention suppresses the refresh failure of a DRAM due to the dispersion of a threshold of a MOSFET. The DRAM has a first unit for recording a set value of a back bias potential to be applied to a back gate of a cell transistor and a second unit for generating a back bias potential based on the set value of the back bias potential recorded in the first unit and supplying the generated back bias potential to the back gate, wherein when a threshold of a MOSFET which has a structure identical to the cell transistor and which has been fabricated in the same process as the cell transistor is greater than a target value which the cell transistor should have, a value shallower than the back bias potential for the target value is recorded in the second unit.
    • 本发明抑制由于MOSFET的阈值的偏差引起的DRAM的刷新故障。 DRAM具有第一单元,用于记录要施加到单元晶体管的背栅的背偏置电位的设定值,以及用于产生背偏电位的第二单元,其基于记录在所述单元晶体管中的背偏电位的设定值 第一单元并将所产生的反向偏置电位提供给所述后栅极,其中当具有与所述单元晶体管相同的并且已经以与所述单元晶体管相同的工艺制造的结构的MOSFET的阈值大于目标值时, 单元晶体管应当具有比目标值的背偏电位浅的值被记录在第二单元中。
    • 9. 发明授权
    • Semiconductor integrated circuit, and method of controlling same
    • 半导体集成电路及其控制方法
    • US06252804B1
    • 2001-06-26
    • US09629619
    • 2000-07-31
    • Hiroyoshi Tomita
    • Hiroyoshi Tomita
    • G11C1140
    • G11C7/109G11C7/1006G11C7/1072G11C7/1078
    • A semiconductor integrated circuit comprising memory cells and a holding unit. The holding unit holds write data to the memory cell and mask information for masking a predetermined bit or bits of the write data, both supplied corresponding to a write command, as held write data and held mask information. On receiving a next write command, the semiconductor integrated circuit masks held write data in accordance with held mask information and writes the resultant to the memory cell. The holding unit holds next write data and next mask information supplied corresponding to this write command as held write data and held mask information. That is, the held write data and the held mask information are rewritten. Thereby, the semiconductor integrated circuit which writes write data previously accepted upon the reception of a next write command can mask the write data.
    • 一种包括存储单元和保持单元的半导体集成电路。 保持单元将写入数据保存到存储单元,并且掩蔽信息,用于屏蔽对应于写入命令的写入数据的预定位或位,作为保持写入数据和保持的掩码信息。 在接收到下一个写入命令时,半导体集成电路根据所保持的掩码信息掩蔽保持写入数据,并将结果写入存储单元。 保持单元保持与该写入命令相对应的下一个写入数据和下一个掩模信息作为保持的写入数据和保持的掩码信息。 也就是说,保持的写入数据和保持的掩码信息被重写。 由此,在接收下一个写入命令时写入预先接受的写入数据的半导体集成电路可以掩蔽写入数据。
    • 10. 发明授权
    • Semiconductor memory device having a short write time
    • 具有短写入时间的半导体存储器件
    • US06064625A
    • 2000-05-16
    • US1460
    • 1997-12-31
    • Hiroyoshi Tomita
    • Hiroyoshi Tomita
    • G11C11/407G11C7/10G11C7/22G11C11/401G11C11/408G11C8/00
    • G11C29/84G11C7/1039G11C7/22G11C2207/229
    • The present invention internally latches a write data signal applied in synchronous with an external data strobe signal in response to an internal data strobe signal which is generated in response to this external data strobe signal, and furthermore, supplies the write data signal to a memory cell array from a write circuit such as a write amplifier in response to a write signal generated from this external data strobe signal. Meanwhile, an address signal is introduced internally in accordance with an external clock. Therefore, since the driving of the data bus connected to a memory cell array from a write amplifier, which constitutes a write operation internal to memory, commences in accordance with an external data strobe signal, a write operation can be ended in the shortest possible time from write data signal input. The above-described invention is especially effective when memory comprises a 2-bit pre-fetch. That is, a 2-bit write data signal is supplied time-sequentially in synchronous with an external data strobe signal. Since an internal write operation can commence after receiving for the input of that second write data signal, it enables the shortest write operation.
    • 本发明响应于响应于该外部数据选通信号而产生的内部数据选通信号,内部锁存与外部数据选通信号同步施加的写入数据信号,此外,将写入数据信号提供给存储单元 响应于从该外部数据选通信号产生的写入信号,写入诸如写放大器的写入电路的阵列。 同时,根据外部时钟在内部引入地址信号。 因此,由于构成存储器内部的写操作的写放大器连接到存储单元阵列的数据总线的驱动根据外部数据选通信号开始,所以可以在最短的时间内结束写入操作 从写数据信号输入。 当存储器包括2位预取时,上述发明特别有效。 也就是说,与外部数据选通信号同步地按时间顺序地提供2位写入数据信号。 由于在接收到该第二写入数据信号的输入之后可以开始内部写入操作,所以能够进行最短的写入操作。