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1. 发明申请

US20120105566A1 PRINTER, PRINT SYSTEM AND PRINTING METHOD 审中-公开
标题翻译：打印机，打印系统和打印方法
公开(公告)号：US20120105566A1
公开(公告)日：2012-05-03
申请号：US13270326
申请日：2011-10-11
申请人： Hiroyasu Ishii , Chikahiro Saegusa , Kiyoshi Morino , Hajime Yamamoto , Shuji Koyama , Koji Tomita
发明人： Hiroyasu Ishii , Chikahiro Saegusa , Kiyoshi Morino , Hajime Yamamoto , Shuji Koyama , Koji Tomita
IPC分类号： B41J2/325
CPC分类号： B41J2/32
摘要： According to one embodiment, a printer includes a conveying mechanism, a first image forming unit and a coloring conversion mechanism. The conveying mechanism conveys a medium. The first image forming unit forms an image on the medium with a temperature-sensitive ink whose color changes depending on temperature. The coloring conversion mechanism converts a coloring state of the image with the temperature-sensitive ink by heating or cooling the image with the temperature-sensitive ink.
摘要翻译：根据一个实施例，打印机包括输送机构，第一图像形成单元和着色转换机构。传送机构传送介质。第一图像形成单元在介质上形成具有随着温度变化的温度敏感油墨的图像。着色转换机构通过用温度敏感油墨加热或冷却图像来转换图像的着色状态。

2. 发明授权

US08951815B2 Method for producing liquid-discharge-head substrate 有权
标题翻译：液体排出头基板的制造方法
公开(公告)号：US08951815B2
公开(公告)日：2015-02-10
申请号：US13526958
申请日：2012-06-19
申请人： Ryotaro Murakami , Shuji Koyama , Keisuke Kishimoto , Kenta Furusawa
发明人： Ryotaro Murakami , Shuji Koyama , Keisuke Kishimoto , Kenta Furusawa
IPC分类号： H01L21/00 , B41J2/16
CPC分类号： B41J2/1603 , B41J2/1629 , B41J2/1634 , B41J2/1639
摘要： A method for producing a liquid-discharge-head substrate includes a step of preparing a silicon substrate including, at a front-surface side of the silicon substrate, an energy generating element; a step of forming a first etchant introduction hole on the front-surface side of the silicon substrate; a step of supplying a first etchant into the first etchant introduction hole formed on the front-surface side of the silicon substrate, and supplying a second etchant to a back-surface side of the silicon substrate; a step of stopping the supply of the second etchant; and a step of, after the supply of the second etchant has been stopped, forming a liquid supply port extending through front and back surfaces of the silicon substrate by the supply of the first etchant.
摘要翻译：一种液体排出头基板的制造方法，其特征在于，包括在所述硅基板的表面侧具有能量产生元件的硅基板的制造工序。在所述硅基板的表面侧形成第一蚀刻剂导入孔的工序; 向在硅衬底的前表面侧形成的第一蚀刻剂引入孔中提供第一蚀刻剂并将第二蚀刻剂供应到硅衬底的背表面的步骤; 停止供应第二蚀刻剂的步骤; 以及在第二蚀刻液的供应已经停止之后，通过供给第一蚀刻剂形成延伸穿过硅衬底的前表面和后表面的液体供给口的步骤。

3. 发明申请

US20130017496A1 METHOD FOR MANUFACTURING RECORDING HEAD 有权
标题翻译：制造记录头的方法
公开(公告)号：US20130017496A1
公开(公告)日：2013-01-17
申请号：US13540960
申请日：2012-07-03
申请人： Keiji Matsumoto , Kazuhiro Asai , Tetsuro Honda , Kunihito Uohashi , Shuji Koyama , Masaki Ohsumi
发明人： Keiji Matsumoto , Kazuhiro Asai , Tetsuro Honda , Kunihito Uohashi , Shuji Koyama , Masaki Ohsumi
IPC分类号： G03F7/20
CPC分类号： G03F7/095 , B41J2/1603 , B41J2/1628 , B41J2/1631 , B41J2/1632 , G03F7/0035 , G03F7/038 , G03F7/094 , G03F7/38
摘要： A method for manufacturing a recording head including forming a flow-channel side-wall forming layer which contains a photosensitive resin, on a substrate having ejection energy generating elements and wiring thereon; exposing the flow-channel side-wall forming layer to light, and optically determining a flow channel; forming a shape stabilizing layer which contains a photosensitive resin; forming an ejection orifice forming layer which contains a photopolymerization initiator and a negative photosensitive resin; exposing the ejection orifice forming layer to light, and optically determining an ejection orifice; and developing the ejection orifice forming layer, shape stabilizing layer, and flow-channel side-wall forming layer, in the order named. The photosensitive resin in the shape stabilizing layer is a material to be cured by a component that is produced upon the exposure of the ejection orifice forming layer and derives from the photopolymerization initiator.
摘要翻译：一种用于制造记录头的方法，包括在具有喷射能量产生元件的基板和其上布线的基板上形成包含感光性树脂的流路侧壁形成层; 将流路侧壁形成层暴露于光，并光学地确定流路; 形成含有感光性树脂的形状稳定层; 形成含有光聚合引发剂和负性感光性树脂的喷射孔形成层; 将喷射孔形成层暴露于光，并且光学地确定喷射孔; 并按顺序显影喷射孔形成层，形状稳定层和流动通道侧壁形成层。形状稳定层中的感光性树脂是通过喷射孔形成层的曝光而产生并从光聚合引发剂得到的成分固化的材料。

4. 发明授权

US08286350B2 Method of manufacturing a liquid discharge head 有权
标题翻译：液体排出头的制造方法
公开(公告)号：US08286350B2
公开(公告)日：2012-10-16
申请号：US12699995
申请日：2010-02-04
申请人： Tsuyoshi Takahashi , Shuji Koyama , Masaki Ohsumi , Masahisa Watanabe
发明人： Tsuyoshi Takahashi , Shuji Koyama , Masaki Ohsumi , Masahisa Watanabe
IPC分类号： B21D53/76
CPC分类号： B41J2/1635 , B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1639 , B41J2/1642 , B41J2/1645 , Y10T29/49083 , Y10T29/49128 , Y10T29/4913 , Y10T29/49165 , Y10T29/49401
摘要： An object of the invention is to provide a method of manufacturing a liquid discharge head in which a distance between a discharge opening and an energy generating element is uniform, simply and with good precision.
摘要翻译：本发明的目的是提供一种制造排液头的方法，其中排放口和能量产生元件之间的距离是简单且精确的。

5. 发明申请

US20120088317A1 PROCESSING METHOD OF SILICON SUBSTRATE AND PROCESS FOR PRODUCING LIQUID EJECTION HEAD 审中-公开
标题翻译：硅基板的加工方法和生产液体喷射头的方法
公开(公告)号：US20120088317A1
公开(公告)日：2012-04-12
申请号：US13226113
申请日：2011-09-06
申请人： Keisuke Kishimoto , Shuji Koyama , Hiroyuki Abo , Taichi Yonemoto
发明人： Keisuke Kishimoto , Shuji Koyama , Hiroyuki Abo , Taichi Yonemoto
IPC分类号： H01L21/308
CPC分类号： B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1634 , B41J2/1639
摘要： A processing method of a silicon substrate, including forming on a back surface of a silicon substrate an etching mask layer having an opening portion, measuring a thickness of the silicon substrate, irradiating the opening portion in the etching mask layer with laser from the back surface of the silicon substrate to form in the silicon substrate a modified layer with a thickness that is varied according to the measured thickness of the silicon substrate, carrying out anisotropic etching with regard to the silicon substrate having the modified layer formed therein to form in the back surface a depressed portion which does not pass through the silicon substrate and which has a bottom surface in the silicon substrate, and carrying out dry etching in the depressed portion to form a through-hole passing from the bottom surface of the depressed portion to a front surface of the silicon substrate.
摘要翻译：一种硅衬底的处理方法，包括在硅衬底的背表面上形成具有开口部分的蚀刻掩模层，测量硅衬底的厚度，用激光从背面照射蚀刻掩模层中的开口部分的硅衬底，以在硅衬底中形成具有根据测量的硅衬底的厚度而变化的厚度的改性层，相对于其中形成有改性层的硅衬底进行各向异性蚀刻以在背面形成表面没有通过硅衬底并且在硅衬底中具有底表面的凹陷部分，并且在凹陷部分中进行干蚀刻以形成从凹陷部分的底表面到前面的通孔硅衬底的表面。

6. 发明授权

US07824560B2 Manufacturing method for ink jet recording head chip, and manufacturing method for ink jet recording head 有权
标题翻译：喷墨记录头芯片的制造方法和喷墨记录头的制造方法
公开(公告)号：US07824560B2
公开(公告)日：2010-11-02
申请号：US11679656
申请日：2007-02-27
申请人： Toshiyasu Sakai , Shuji Koyama , Kenji Ono , Jun Yamamuro
发明人： Toshiyasu Sakai , Shuji Koyama , Kenji Ono , Jun Yamamuro
IPC分类号： B41J2/16
CPC分类号： B41J2/1603 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1635 , B41J2/1639 , B41J2/1645 , H01L21/76898
摘要： A manufacturing method for a substrate for an ink jet head, including formation of an ink supply port in a silicon substrate, the method includes a step of forming, on one side of the substrate, an etching mask layer having an opening at a position corresponding ink supply port; a step of forming unpenetrated holes through the opening of the etching mask layer in at least two rows in a longitudinal direction of the opening; and a step of forming the ink supply port by crystal anisotropic etching of the substrate in the opening.
摘要翻译：一种用于喷墨头的基板的制造方法，包括在硅基板中形成供墨口，该方法包括以下步骤：在基板的一侧上形成在相应位置具有开口的蚀刻掩模层供墨口; 通过蚀刻掩模层的开口沿开口的纵向至少两行形成未穿透孔的步骤; 以及通过在开口中的基板的晶体各向异性蚀刻形成供墨口的步骤。

7. 发明申请

US20100147793A1 METHOD FOR PRODUCING LIQUID DISCHARGE HEAD 有权
标题翻译：生产液体排放头的方法
公开(公告)号：US20100147793A1
公开(公告)日：2010-06-17
申请号：US12635083
申请日：2009-12-10
申请人： Tadanobu Nagami , Junichi Kobayashi , Takeshi Terada , Makoto Watanabe , Hiroyuki Abo , Mitsunori Toshishige , Yoshinori Tagawa , Shuji Koyama , Kenji Fujii , Masaki Ohsumi , Jun Yamamuro , Hiroyuki Murayama , Yoshinobu Urayama , Taichi Yonemoto
发明人： Tadanobu Nagami , Junichi Kobayashi , Takeshi Terada , Makoto Watanabe , Hiroyuki Abo , Mitsunori Toshishige , Yoshinori Tagawa , Shuji Koyama , Kenji Fujii , Masaki Ohsumi , Jun Yamamuro , Hiroyuki Murayama , Yoshinobu Urayama , Taichi Yonemoto
IPC分类号： G11B5/127
CPC分类号： B41J2/1603 , B41J2/1629 , B41J2/1631 , B41J2/1639 , Y10T29/49401
摘要： The present invention provides a method for producing a liquid discharge head including a silicon substrate having, on a first surface, energy generating elements, and a supply port penetrating the substrate from the first surface to a second surface, which is a rear surface of the first surface of the substrate. The method includes the steps of: preparing the silicon substrate having a sacrifice layer at a portion on the first surface where the ink supply port is to be formed and an etching mask layer having a plurality of openings on the second surface, the volume of a portion of the sacrifice layer at a position corresponding to a portion between two adjacent said openings being smaller than the volume of a portion of the sacrifice layer at a position corresponding to the opening; etching the silicon substrate from the plurality of openings and etching the sacrifice layer.
摘要翻译：本发明提供了一种液体排出头的制造方法，该液体排出头包括硅基板，该第一表面在第一表面上具有能量产生元件和从第一表面穿过该基板的供给口，基片的第一表面。该方法包括以下步骤：在要形成供墨口的第一表面上的一部分制备具有牺牲层的硅衬底和在第二表面上具有多个开口的蚀刻掩模层，牺牲层的与相邻的两个开口之间的部分相对应的位置处的部分比对应于开口的位置处的牺牲层的一部分的体积小; 从多个开口蚀刻硅衬底并蚀刻牺牲层。

8. 发明申请

US20100102473A1 METHOD OF MANUFACTURING LIQUID DISCHARGE HEAD 有权
标题翻译：制造液体放电头的方法
公开(公告)号：US20100102473A1
公开(公告)日：2010-04-29
申请号：US12574352
申请日：2009-10-06
申请人： Masahisa Watanabe , Shuji Koyama , Kenji Ono , Kenji Fujii , Shuhei Oya , Seiko Minami
发明人： Masahisa Watanabe , Shuji Koyama , Kenji Ono , Kenji Fujii , Shuhei Oya , Seiko Minami
IPC分类号： B29C41/50 , B29C41/38
CPC分类号： B29C41/36 , B29C41/38 , B29C41/50 , B29L2031/756 , B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1639 , B41J2/1645
摘要： A method of manufacturing a liquid discharge head including a flow path member for forming a flow path communicating with a discharge port discharging a liquid forms a mold of the flow path made of a positive photosensitive resin on a substrate; applies a coated layer on the mold for forming the flow path member, which coated layer includes a solvent, an epoxy resin, and a curing agent of the epoxy resin; removes the solvent from the coated layer at a normal temperature under substantially 1 atm. so that the weight of the coated layer may become 93% or less of that of the coated layer at a time of the applying of the coated layer, and then further removes the solvent from the coated layer under a depressurized condition; cures the coated layer; and removes the mold to form the flow path.
摘要翻译：一种液体排出头的制造方法，其特征在于，具有形成与排出液体的排出口连通的流路的流路部件，在基板上形成由正性感光性树脂构成的流路的模具，在模具上涂覆涂层以形成流路构件，该涂层包括溶剂，环氧树脂和环氧树脂的固化剂; 在常温下在大约1atm下从涂层中除去溶剂。使得在涂布涂层时涂层的重量可以变得比涂层的重量的93％以下，然后在减压条件下进一步从涂层中除去溶剂; 固化涂层; 并移除模具以形成流路。

9. 发明申请

US20080094454A1 INK JET RECORDING HEAD AND MANUFACTURING METHOD THEREFOR 有权
标题翻译：喷墨记录头及其制造方法
公开(公告)号：US20080094454A1
公开(公告)日：2008-04-24
申请号：US11872383
申请日：2007-10-15
申请人： Shuji Koyama , Yoshiaki Suzuki , Satoshi Ibe , Hiroto Komiyama
发明人： Shuji Koyama , Yoshiaki Suzuki , Satoshi Ibe , Hiroto Komiyama
IPC分类号： B41J2/05 , B21D53/76
CPC分类号： B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1632 , B41J2/1635 , B41J2/1639 , B41J2/1643 , B41J2/1645 , Y10T29/49401
摘要： A manufacturing method for an ink jet recording head including an energy generating element for generating energy for ejecting ink, wiring and electrode pad for supplying electric power to the energy generating element, and a flow path formation member in which an ink flow path is formed in fluid communication with an ink ejection outlet, the manufacturing method includes a step of preparing a substrate on which the energy generating element, the wiring and the electrode pad have been formed; a step of forming a protection layer covering edges of and around generating element and the electrode pad; a step of forming, with patterning, an adhesion layer for adhering the flow path formation member to a surface of the substrate through the protection layer, on a portion of the protection layer where the flow path formation member is formed and a portion surrounding the electrode pad; a step forming through an electroless plating, a nickel layer covering the electrode pad and a gold layer covering the nickel layer to provide a bump.
摘要翻译：一种喷墨记录头的制造方法，包括：用于产生用于喷射油墨的能量的能量产生元件，用于向能量产生元件供应电力的布线和电极焊盘;以及流路形成部件，其中形成有墨水流路与喷墨口流体连通，该制造方法包括制备其上形成有能量产生元件，布线和电极垫的基板的步骤; 形成覆盖发电元件和电极焊盘周围的周围的保护层的工序; 通过图案化形成用于通过保护层将流路形成部件粘附到基板的表面的粘合层的步骤，在形成有流路形成部件的保护层的一部分和围绕电极的部分垫; 通过无电解电镀形成步骤，覆盖电极焊盘的镍层和覆盖镍层的金层以提供凸块。

10. 发明授权

US07300596B2 Method of manufacturing liquid discharge head 有权
标题翻译：液体排放头的制造方法
公开(公告)号：US07300596B2
公开(公告)日：2007-11-27
申请号：US11481796
申请日：2006-07-07
申请人： Hiroyuki Murayama , Shuji Koyama , Yoshinori Tagawa , Kenji Fujii , Masaki Ohsumi , Yoshinobu Urayama , Jun Yamamuro , Tsuyoshi Takahashi , Masahisa Watanabe
发明人： Hiroyuki Murayama , Shuji Koyama , Yoshinori Tagawa , Kenji Fujii , Masaki Ohsumi , Yoshinobu Urayama , Jun Yamamuro , Tsuyoshi Takahashi , Masahisa Watanabe
IPC分类号： B41J2/05 , H01L21/00
CPC分类号： B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1635 , B41J2/1639 , B41J2/164 , B41J2/1645
摘要： The method of manufacturing a recording head has a flow path wall forming step of forming flow path walls on a substrate having energy generating elements formed thereon, an imbedded material depositing step of depositing an imbedded material between the flow path walls and on a top of each flow path wall, a flattening step of polishing a top of the deposited imbedded material, until the top of the flow path wall is exposed, and a step of forming an orifice plate on the tops of the polished imbedded material and the exposed flow path wall. In the step of forming the flow path walls, patterning of a close contact property improvement layer is simultaneously performed to improve a close contact property between the flow path wall and the substrate.
摘要翻译：制造记录头的方法具有流路壁形成步骤，在其上形成有能量产生元件的基板上形成流路壁，嵌入材料沉积步骤，在流路壁之间和每个顶部上沉积嵌入材料流动路径壁，抛光沉积的嵌入材料的顶部的平坦化步骤，直到流动路径壁的顶部被暴露，以及在抛光的嵌入材料的顶部上形成孔板的步骤和暴露的流动路径壁。在形成流路壁的步骤中，同时进行紧密接触性改善层的图案化，以改善流路壁和基板之间的紧密接触性。

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