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    • 2. 发明申请
    • PROCESS FOR PRODUCING A SUBSTRATE FOR A LIQUID EJECTION HEAD
    • 生产液体喷射头基材的方法
    • US20120231565A1
    • 2012-09-13
    • US13411896
    • 2012-03-05
    • Toshiyasu Sakai
    • Toshiyasu Sakai
    • H01L21/308
    • B41J2/1604B41J2/1628B41J2/1629B41J2/1631
    • Provided is a process for producing a substrate for a liquid ejection head, including forming a liquid supply port in a silicon substrate, the process including the steps of (a) forming an etch stop layer at a portion of a front surface of the silicon substrate at which portion the liquid supply port is to be formed; (b) performing dry etching using a Bosch process from a rear surface side of the silicon substrate up to the etch stop layer with use of an etching mask formed on a rear surface of the silicon substrate to thereby form the liquid supply port; and (c) simultaneously removing the etch stop layer and a deposition film formed inside the liquid supply port.
    • 本发明提供一种制造液体喷射头用基板的方法,包括在硅基板上形成液体供给口,该方法包括以下步骤:(a)在硅基板的前表面部分形成蚀刻停止层 在该部分将形成液体供应​​口; (b)使用Bosch工艺从硅衬底的背面侧直到蚀刻停止层使用形成在硅衬底的后表面上的蚀刻掩模进行干蚀刻从而形成液体供给口; 和(c)同时去除蚀刻停止层和形成在液体供给口内部的沉积膜。