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    • 2. 发明授权
    • Electrophotographic process and apparatus
    • 电子照相法和仪器
    • US4298669A
    • 1981-11-03
    • US063431
    • 1979-08-03
    • Giichi MarushimaHiroshi TanakaUmi TosakaShinkichi TakahashiTakao Komiyu
    • Giichi MarushimaHiroshi TanakaUmi TosakaShinkichi TakahashiTakao Komiyu
    • G03G5/087G03G15/045G03G15/22G03G21/00G03G13/24G03G13/04
    • G03G15/226G03G15/045G03G15/22G03G5/087
    • A process and apparatus for forming an electrostatic image on a photosensitive plate having a conductive base, a photoconductive layer overlying the base and exhibiting p-type or n-type semiconductivity, and an insulative layer overlying the photoconductive layer. The photosensitive plate is characterized in having carrier charge of a polarity corresponding to the conductivity type of the photoconductive layer injectable from the conductive base into the photoconductive layer and bound in the region of the interface between the insulative and photoconductive layers. The conductive base is transparent to activating light and the insulative layer is opaque to the activating light. A first charge of a polarity opposite to the conductivity type of the photoconductive layer is applied onto the insulative layer to inject and bind carrier charge in the region of the interface between the insulative and photoconductive layers. Then, the photoconductive layer is exposed to a pattern of activating image light by projecting the image light through the transparent conductive base while a corona discharge is applied onto the insulative layer. Thereafter, the photoconductive layer is exposed to activating light through the transparent conductive base to discharge bound carrier charge remaining in the region of the interface and form a high constrast electrostatic image.
    • 一种用于在具有导电基底,覆盖在基底上并具有p型或n型半导电性的光电导层和覆盖在光电导层上的绝缘层的感光板上形成静电图像的方法和装置。 感光板的特征在于具有对应于从导电基底注入到光电导层中的光电导层的导电类型的极性的载流子电荷并且在绝缘和光电导层之间的界面区域中结合。 导电基体对于激活光是透明的,并且绝缘层对于激活光是不透明的。 将与光电导层的导电类型相反的极性的第一电荷施加到绝缘层上,以在绝缘层和光电导层之间的界面区域注入和结合载流子电荷。 然后,通过在将绝缘层上施加电晕放电的同时将图像光投影穿过透明导电基体,使感光层暴露于激活图像光的图案。 此后,光电导层通过透明导电基底暴露于活化光,以排出残留在界面区域中的结合载体电荷并形成高约束静电图像。
    • 8. 发明授权
    • Substrate processing apparatus and substrate processing method
    • 基板加工装置及基板处理方法
    • US09070549B2
    • 2015-06-30
    • US12680799
    • 2008-09-22
    • Hiroshi TanakaToshiyuki ShiokawaTakao Inada
    • Hiroshi TanakaToshiyuki ShiokawaTakao Inada
    • B08B5/02H01L21/02H01L21/67
    • H01L21/02052H01L21/67028
    • A drying gas is supplied into a drying chamber in a substantially horizontal direction, an obliquely downward direction descendent from the substantially horizontal direction, or a vertically downward direction under a state where a wafer is immersed in a cleaning liquid in a cleaning tank. The wafer is moved from the cleaning tank into the drying chamber, with the drying gas being supplied into the drying chamber. At this time, the supply of the drying gas into the drying chamber is stopped, under a condition where a part of the wafer is immersed in the cleaning liquid stored in the cleaning tank. After the movement of the wafer into the drying chamber has been finished, a drying gas is supplied into the drying chamber in an obliquely upward direction ascendant from the substantially horizontal direction or a vertically upward direction.
    • 在将晶片浸入清洗槽中的清洗液体的状态下,将干燥气体从大致水平方向或垂直向下方向向大致水平方向,倾斜向下方向供给到干燥室。 将晶片从清洁槽移动到干燥室中,其中干燥气体被供应到干燥室中。 此时,在将晶片的一部分浸渍在存储在清洗槽中的清洗液中的状态下,将干燥气体供给到干燥室内停止。 在将晶片移动到干燥室中之后,干燥气体从大致水平方向或垂直向上方向上升的斜上方向供给干燥室。