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1. 发明授权

US06048764A Method for producing semiconductor device with capacitor stacked 失效
标题翻译：制造具有电容器的半导体器件的方法
公开(公告)号：US06048764A
公开(公告)日：2000-04-11
申请号：US800121
申请日：1997-02-13
申请人： Hiroshi Suzuki , Akira Kubo
发明人： Hiroshi Suzuki , Akira Kubo
IPC分类号： H01L27/04 , H01L21/822 , H01L21/8242 , H01L27/108
CPC分类号： H01L27/10852
摘要： In forming a storage node with sidewalls on interlayer dielectric layer of a semiconductor device, the interlayer dielectric layer having an uppermost silicon oxide film, a silicon nitride film is formed as a protective film on the storage node of poly-silicon formed on the interlayer dielectric layer, and thereafter a poly-silicon layer is deposited and then subjected to an anisotropic etching to partially remove the polysilicon layer to remain, as the side walls, portions of the poly-silicon layer on side surfaces of the storage node, with protecting the storage node by the protective film from the etching and without etching the uppermost silicon oxide film. Alternatively, the uppermost silicon oxide film is subjected to a nitrogen plasma treatment before forming the storage node, and a silicon oxide film can be used as the protective film. The storage node with the side walls can be used as a lower electrode of a stack type capacitor in the semiconductor device after removing the protective film.
摘要翻译：在形成具有半导体器件的层间电介质层上的侧壁的存储节点的情况下，在层间电介质上形成的多晶硅的存储节点上形成具有最上层氧化硅膜的层间绝缘层，氮化硅膜作为保护膜然后沉积多晶硅层，然后进行各向异性蚀刻以部分去除多晶硅层，以保留作为侧壁的存储节点的侧表面上的多晶硅层的部分，同时保护存储节点由保护膜从蚀刻而不蚀刻最上面的氧化硅膜。或者，在形成存储节点之前，对最上面的氧化硅膜进行氮等离子体处理，可以使用氧化硅膜作为保护膜。在去除保护膜之后，具有侧壁的存储节点可用作半导体器件中的堆叠型电容器的下电极。

2. 发明授权

US4645688A Composition for protective coating material 失效
标题翻译：保护涂层材料的组成
公开(公告)号：US4645688A
公开(公告)日：1987-02-24
申请号：US679460
申请日：1984-12-07
申请人： Daisuke Makino , Hidetaka Sato , Hiroshi Suzuki , Shun-ichiro Uchimura , Hiroshi Suzuki
发明人： Daisuke Makino , Hidetaka Sato , Hiroshi Suzuki , Shun-ichiro Uchimura , Hiroshi Suzuki
IPC分类号： C08G73/10 , C08G77/54 , H01B3/30 , H01B3/46 , H01L23/29 , B05D5/12
CPC分类号： C08G77/54 , C08G73/1042 , C08G73/106 , H01B3/303 , H01B3/46 , H01L23/296 , H01L2924/0002
摘要： There are disclosed a composition for protective coating material, preferably for a protective coating material of a semiconductor device which is constituted of principal elements of a semiconductor memory element, an encapsulating layer containing an inorganic material for encapsulating said element and a layer of a cured protective coating material arranged between said memory element and said encapsulating layer, which is composed of a polyamide acid obtained by the reaction of a diaminosiloxane, an organic diamine containing no silicon and an organic tetrabasic acid dianhydride, and a semiconductor device having a layer of a cured protective coating material composed of a polyimide-silicone copolymer obtained by dehydrating ring closure of the above-mentioned polyamide acid.
摘要翻译：公开了一种用于保护涂层材料的组合物，优选用于半导体器件的保护涂层材料，其由半导体存储元件的主要元件，包含用于封装所述元件的无机材料的封装层和固化保护层布置在所述存储元件和所述封装层之间的涂料，其由通过二氨基硅氧烷，不含硅的有机二胺和有机四元酸二酐反应获得的聚酰胺酸和具有固化的层的半导体器件由通过上述聚酰胺酸脱水闭环得到的聚酰亚胺 - 硅氧烷共聚物构成的保护涂料。

3. 发明授权

US4511705A Composition for protective coating material 失效
公开(公告)号：US4511705A
公开(公告)日：1985-04-16
申请号：US568284
申请日：1984-01-05
申请人： Daisuke Makino , Hidetaka Sato , Hiroshi Suzuki , Shun-ichiro Uchimura , Hiroshi Suzuki
发明人： Daisuke Makino , Hidetaka Sato , Hiroshi Suzuki , Shun-ichiro Uchimura , Hiroshi Suzuki
IPC分类号： C08G73/10 , C08G77/54 , H01B3/30 , H01B3/46 , H01L23/29 , C08G77/04
CPC分类号： C08G77/54 , C08G73/1042 , C08G73/106 , H01B3/303 , H01B3/46 , H01L23/296 , H01L2924/0002
摘要： There are disclosed a composition for protective coating material, preferably for a protective coating material of a semiconductor device which is constituted of principal elements of a semiconductor memory element, an encapsulating layer containing an inorganic material for encapsulating said element and a layer of a cured protective coating material arranged between said memory element and said encapsulating layer, which is composed of a polyamide acid obtained by the reaction of a diaminosiloxane, an organic diamine containing no silicon and an organic tetrabasic acid dianhydride, and a semiconductor device having a layer of a cured protective coating material composed of a polyimide-silicone copolymer obtained by dehydrating ring closure of the above-mentioned polyamide acid.

4. 发明授权

US09871933B2 Information processing apparatus and image processing system for generating image data for a preview image by using print data described in page description language 有权
公开(公告)号：US09871933B2
公开(公告)日：2018-01-16
申请号：US15370061
申请日：2016-12-06
申请人： Hiroshi Suzuki , Takao Suzuki
发明人： Hiroshi Suzuki , Takao Suzuki
IPC分类号： H04N1/00 , G06F3/12 , G06K15/02
CPC分类号： H04N1/0044 , G06F3/1208 , G06F3/1256 , G06F3/1294 , G06K15/1813 , G06K15/1822 , H04N1/00204 , H04N1/00344 , H04N2201/0039 , H04N2201/0094
摘要： An information processing apparatus is for generating image data by using drawing information for drawing an image. The information processing apparatus includes a print data acquirer configured to acquire print data including the drawing information from outside; a request acceptor configured to accept a request to display the image data of any page in the print data; a reader configured to read specific drawing information of pages in the print data up to a page before the any page accepted by the request acceptor, from a drawing information storage storing the specific drawing information, which is the drawing information that may be applied to the image data of pages after a page in which the drawing information is described, among the drawing information included in the print data; and a generator configured to generate the image data of the any page by applying the read specific drawing information.

5. 发明授权

US09870185B2 Print manager server, print management method, and storage medium for predictive print preview of print jobs 有权
公开(公告)号：US09870185B2
公开(公告)日：2018-01-16
申请号：US15237560
申请日：2016-08-15
申请人： Hiroshi Suzuki , Toshiyuki Haginoya
发明人： Hiroshi Suzuki , Toshiyuki Haginoya
IPC分类号： G06F3/12
CPC分类号： G06F3/1288 , G06F3/1211 , G06F3/1219 , G06F3/1256 , G06F3/1286
摘要： A disclosed print manager server includes one or more processors and a memory configured to store a print management program. The processors execute the print management program to perform a process including analyzing an attribute of print data introduced, predicting a page of a preview image to be generated based on the analyzed attribute, a preview history of previous print jobs, and a preview prediction condition, generating the preview image of the predicted page, and providing the generated preview image in response to a request to display a preview.

6. 发明授权

US09850913B2 Centrifugal compressor 有权
公开(公告)号：US09850913B2
公开(公告)日：2017-12-26
申请号：US14414856
申请日：2012-08-24
申请人： Byeongil An , Hiroshi Suzuki
发明人： Byeongil An , Hiroshi Suzuki
IPC分类号： F04D27/02 , F04D29/44 , F04D29/42 , F04D29/68 , F04D17/10 , F02M35/10
CPC分类号： F04D29/441 , F02M35/10157 , F02M35/10262 , F04D17/10 , F04D29/4213 , F04D29/444 , F04D29/685 , F05D2220/40 , F05D2250/51 , Y02T10/144 , Y02T10/146
摘要： An object is to position a plurality of guide vanes for generating swirl flow at a housing inner circumferential side in front of an impeller wheel to improve a surge margin and to restrict the decrease in a choke flow rate, thereby increasing an operation range of a compressor. A compressor 19 includes a compressor housing 15, an impeller wheel 7 which compresses intake gas flowing in from an intake-air inlet 23, a swirl-flow generating part including a plurality of guide vanes 55 disposed circumferentially along an inner circumferential wall of the intake-air channel 21 between the intake-air inlet 23 and the impeller wheel 7 and which swirls the intake gas from the intake-air inlet 23 around the rotational axis, and a central intake-air flow path 59 formed inside the guide vanes 55 to allow intake gas to flow to the impeller wheel 7 without passing through the guide vanes 55.

7. 发明授权

US09581046B2 Scroll structure of centrifugal compressor 有权
标题翻译：离心压缩机的涡旋结构
公开(公告)号：US09581046B2
公开(公告)日：2017-02-28
申请号：US13813172
申请日：2011-12-22
申请人： Toru Hoshi , Isao Tomita , Motoki Ebisu , Hiroshi Suzuki , Takashi Shiraishi
发明人： Toru Hoshi , Isao Tomita , Motoki Ebisu , Hiroshi Suzuki , Takashi Shiraishi
IPC分类号： F01D25/24 , F04D29/44 , F04D29/68
CPC分类号： F01D25/24 , F04D29/441 , F04D29/681 , F05D2250/52
摘要： In a scroll structure of a centrifugal compressor, there are provided a radius increase arc portion E in which a radius from the center of a scroll 12 to a scroll centroid P of the cross section of the scroll 12 is gradually increased in any range in a circumferential direction from the start of winding of the scroll, and a radius decrease arc portion F in which the radius is gradually decreased toward a scroll end point Z.
摘要翻译：在离心式压缩机的涡旋结构中，设置有半径增大圆弧部E，其中，涡旋件12的横截面的涡旋件12的中心部与涡形重心P的半径在从涡卷的卷绕开始的圆周方向，半径减小圆弧部F朝向涡旋端点Z逐渐减小。

8. 发明授权

US09174667B2 Electric power steering 有权
标题翻译：电动助力转向
公开(公告)号：US09174667B2
公开(公告)日：2015-11-03
申请号：US13879834
申请日：2011-10-17
申请人： Hiroshi Suzuki
发明人： Hiroshi Suzuki
IPC分类号： B62D5/04 , H02P25/22 , H02P29/02 , H02P5/747
CPC分类号： B62D5/04 , B62D5/0403 , B62D5/046 , B62D5/0484 , H02P5/747 , H02P25/22 , H02P29/032
摘要： A steering force assisting device that includes an electric motor and includes independent two sets of motor driving circuit and control unit, and the electric motor includes coils having the same polarity and different motor characteristics, the coils being wound around each of teeth of a stator of the electric motor. The motor characteristics are a high speed/low torque characteristic and a low speed/high torque characteristic, and may be selected on the basis of the running condition of a vehicle.
摘要翻译：一种包括电动机并且包括独立的两组电动机驱动电路和控制单元的转向力辅助装置，并且所述电动机包括具有相同极性和不同电动机特性的线圈，所述线圈缠绕在电动机。马达特性是高速/低扭矩特性和低速/高扭矩特性，并且可以基于车辆的运行状态来选择。

9. 发明授权

US09003889B2 Resonant pressure sensor and method of manufacturing the same 有权
标题翻译：共振压力传感器及其制造方法
公开(公告)号：US09003889B2
公开(公告)日：2015-04-14
申请号：US13593311
申请日：2012-08-23
申请人： Yuusaku Yoshida , Takashi Yoshida , Hiroshi Suzuki , Shuhei Yoshita , Hisashi Terashita
发明人： Yuusaku Yoshida , Takashi Yoshida , Hiroshi Suzuki , Shuhei Yoshita , Hisashi Terashita
IPC分类号： G01L11/00 , G01L9/00
CPC分类号： G01L9/0016 , G01L9/0045
摘要： A resonant pressure sensor including one or more resonant-type strain gauges arranged on a diaphragm may include a sensor substrate made of silicon and including one surface on which one or more resonant-type strain gauge elements are arranged and the other surface which is polished to have a thickness corresponding to the diaphragm, a base substrate made of silicon and including one surface directly bonded with the other surface of the sensor substrate, a concave portion formed in a portion of the base substrate bonding with the sensor substrate, substantially forming the diaphragm in the sensor substrate, and including a predetermined gap that does not restrict a movable range of the diaphragm due to foreign substances and suppresses vibration of the diaphragm excited by vibration of the resonant-type strain gauge elements, one or more conducting holes, and a fluid.
摘要翻译：包括设置在隔膜上的一个或多个谐振型应变计的共振压力传感器可以包括由硅制成的传感器基板，并且包括一个表面，一个表面上布置有一个或多个谐振型应变计元件，另一个表面抛光到具有对应于隔膜的厚度，由硅制成的基底基板，其包括与传感器基板的另一表面直接接合的一个表面;凹部，形成在与传感器基板接合的基底部分的一部分中，基本上形成隔膜并且包括预定的间隙，其不会由于异物而限制隔膜的可移动范围，并且抑制由共振型应变计元件的振动激励的隔膜的振动，一个或多个导电孔和流体。

10. 发明授权

US08952117B2 Process for producing solvent-soluble reactive polysiloxanes 有权
标题翻译：制备溶剂可溶性活性聚硅氧烷的方法
公开(公告)号：US08952117B2
公开(公告)日：2015-02-10
申请号：US13996828
申请日：2011-12-14
申请人： Akinori Kitamura , Naomasa Furuta , Hiroshi Suzuki
发明人： Akinori Kitamura , Naomasa Furuta , Hiroshi Suzuki
IPC分类号： C08G77/06 , C08G77/20 , C08K5/103
CPC分类号： C08K5/103 , C08G77/06 , C08G77/20
摘要： The present invention is a method for producing solvent-soluble polysiloxanes which includes a condensation process of subjecting a raw material having siloxane-bond-forming groups to hydrolytic copolycondensation in the presence of a catalyst to synthesize a reactive polysiloxane represented by general formula (1), the raw material containing both an organosilicon compound (S1) having a (meth)acryloyl group and siloxane-bond-forming groups and at least one silicon compound (S2) selected from among tetraalkoxysilanes and tetrahalogenosilanes, wherein in the condensation process, the organosilicon compound (S1) and silicon compound (S2) are used at a (S2)/(S1) molar ratio of 1.8 or less, and the condensation process is conducted by adding gradually a mixture of the silicon compound (S2) and the catalyst to a raw material liquid containing the organosilicon compound (S1) and water, while keeping the molar ratio of the amount of the silicon compound (S2) to the amount of the organosilicon compound (S1) within the range of 0.001/min to 0.3/min.
摘要翻译：本发明是一种溶剂可溶性聚硅氧烷的制造方法，其包括在催化剂存在下使具有硅氧烷键形成基团的原料进行水解共缩聚的缩合方法，合成由通式（1）表示的反应性聚硅氧烷，，含有具有（甲基）丙烯酰基的有机硅化合物（S1）和硅氧烷键形成基团的原料和选自四烷氧基硅烷和四卤代硅烷中的至少一种硅化合物（S2），其中在缩合过程中，将有机硅化合物（S1）和硅化合物（S2）以（S2）/（S1）摩尔比为1.8以下使用，缩合工序通过将硅化合物（S2）和催化剂的混合物逐渐加入到含有有机硅化合物（S1）和水的原料液体，同时保持硅化合物（S2）的量与有机硅的量化合物（S1）在0.001 / min至0.3 / min的范围内。

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