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1. 发明授权

US07446061B2 Method of forming insulating film, method of manufacturing semiconductor device and their controlling computer program 有权
标题翻译：形成绝缘膜的方法，制造半导体器件的方法及其控制计算机程序
公开(公告)号：US07446061B2
公开(公告)日：2008-11-04
申请号：US11633484
申请日：2006-12-05
申请人： Hiroshi Sato , Rempei Nakata , Yukio Nishiyama , Taketo Matsuda
发明人： Hiroshi Sato , Rempei Nakata , Yukio Nishiyama , Taketo Matsuda
IPC分类号： H01L21/44 , H01L21/31
CPC分类号： H01L21/31612 , H01J37/321 , H01L21/02164 , H01L21/02274 , H01L21/31625 , H01L21/76224 , H01L21/76837
摘要： A semiconductor substrate with a groove is placed in a plasma generating reaction chamber. Silicon, oxygen and hydrogen containing gases are introduced into the reaction chamber as process gases. A ratio of a gas flow of the hydrogen containing gas except the silicon containing gas to a total gas flow of the silicon containing gas and the oxygen containing gas defines a first gas-flow ratio. A ratio of a gas flow of the oxygen containing gas to that of the silicon containing gas defines a second gas-flow ratio. The first and second gas-flow ratios establish a linear function for a critical condition. A cluster formation condition is set up by relatively increasing the first gas-flow ratio while relatively decreasing the second gas-flow ratio with respect to the critical condition. A cluster suppression condition is also set up by relatively decreasing the first gas-flow ratio while relatively increasing the second gas-flow ratio with respect to the critical condition. The process gases are supplied to the reaction chamber under the cluster formation condition and under the cluster suppression condition, alternately, to form an insulating film buried in the groove.
摘要翻译：将具有凹槽的半导体衬底放置在等离子体产生反应室中。硅，氧和含氢气体作为工艺气体被引入到反应室中。含硅气体以外的含氢气体的气体流量与含硅气体和含氧气体的总气体流量的比率定义为第一气体流量比。含氧气体的气体流量与含硅气体的气体流量的比定义第二气体流量比。第一和第二气体流量比建立了关键条件的线性函数。通过相对增加第一气体流量比来建立簇形成条件，同时相对于临界条件相对降低第二气体流量比。通过相对地降低第一气体流量比同时相对于临界条件相对增加第二气体流量比也建立了集束抑制条件。处理气体在簇形成条件下并在簇抑制条件下交替地供给到反应室，以形成埋在槽中的绝缘膜。

2. 发明申请

US20070128865A1 Method of forming insulating film, method of manufacturing semiconductor device and their controlling computer program 有权
标题翻译：形成绝缘膜的方法，制造半导体器件的方法及其控制计算机程序
公开(公告)号：US20070128865A1
公开(公告)日：2007-06-07
申请号：US11633484
申请日：2006-12-05
申请人： Hiroshi Sato , Rempei Nakata , Yukio Nishiyama , Taketo Matsuda
发明人： Hiroshi Sato , Rempei Nakata , Yukio Nishiyama , Taketo Matsuda
IPC分类号： H05H1/24 , H01L21/44 , H01L21/31
CPC分类号： H01L21/31612 , H01J37/321 , H01L21/02164 , H01L21/02274 , H01L21/31625 , H01L21/76224 , H01L21/76837
摘要： A semiconductor substrate with a groove is placed in a plasma generating reaction chamber. Silicon, oxygen and hydrogen containing gases are introduced into the reaction chamber as process gases. A ratio of a gas flow of the hydrogen containing gas except the silicon containing gas to a total gas flow of the silicon containing gas and the oxygen containing gas defines a first gas-flow ratio. A ratio of a gas flow of the oxygen containing gas to that of the silicon containing gas defines a second gas-flow ratio. The first and second gas-flow ratios establish a linear function for a critical condition. A cluster formation condition is set up by relatively increasing the first gas-flow ratio while relatively decreasing the second gas-flow ratio with respect to the critical condition. A cluster suppression condition is also set up by relatively decreasing the first gas-flow ratio while relatively increasing the second gas-flow ratio with respect to the critical condition. The process gases are supplied to the reaction chamber under the cluster formation condition and under the cluster suppression condition, alternately, to form an insulating film buried in the groove.
摘要翻译：将具有凹槽的半导体衬底放置在等离子体产生反应室中。硅，氧和含氢气体作为工艺气体被引入到反应室中。含硅气体以外的含氢气体的气体流量与含硅气体和含氧气体的总气体流量的比率定义为第一气体流量比。含氧气体的气体流量与含硅气体的气体流量的比定义第二气体流量比。第一和第二气体流量比建立了关键条件的线性函数。通过相对增加第一气体流量比来建立簇形成条件，同时相对于临界条件相对降低第二气体流量比。通过相对地降低第一气体流量比同时相对于临界条件相对增加第二气体流量比也建立了集束抑制条件。处理气体在簇形成条件下并在簇抑制条件下交替地供给到反应室，以形成埋在槽中的绝缘膜。

3. 发明申请

US20160331470A1 Location control system 审中-公开
标题翻译：位置控制系统
公开(公告)号：US20160331470A1
公开(公告)日：2016-11-17
申请号：US15111814
申请日：2015-01-09
申请人： Hiroshi Sato
发明人： Hiroshi Sato
IPC分类号： A61B34/20 , A61M1/00 , A61B90/11 , A61M5/158 , A61B17/3209 , A61B34/00
CPC分类号： A61B34/20 , A61B5/062 , A61B17/32093 , A61B34/30 , A61B34/35 , A61B34/73 , A61B90/11 , A61B2017/320052 , A61B2034/2051 , A61B2034/2059 , A61B2034/2065 , A61B2034/2072 , A61B2034/732 , A61B2090/061 , A61B2090/062 , A61B2090/374 , A61B2090/376 , A61B2090/3762 , A61B2090/378 , A61B2090/392 , A61B2090/3954 , A61B2090/3966 , A61B2218/002 , A61B2218/007 , A61M1/008 , A61M5/158 , A61M2005/1585 , G01B15/00
摘要： The embodiment of the present invention provides a position control system having a movement apparatus including an electromagnet capable of applying a magnetic field to a head and a movement control unit; and a position detection apparatus being capable of determining a position of a mark existing on the head or in a tip end side position of a pipe which is attached to the head with a tip end thereof open and through which a liquid can be injected or suctioned via an opening portion in the tip end, the position detection apparatus being capable of detecting a position of the head on the basis of the position of the mark, the movement control unit of the movement apparatus is capable of controlling an advancement direction of the head so that the pipe is inserted substantially linearly into a target position.
摘要翻译：本发明的实施例提供了一种位置控制系统，其具有包括能够向磁头施加磁场的电磁体和移动控制单元的移动装置; 以及位置检测装置，其能够确定存在于头部的标记的位置或附接到头部的管的前端侧位置，其顶端开口，并且可以通过该顶端喷射或吸引液体通过前端的开口部，位置检测装置能够根据标记的位置检测头部的位置，移动装置的移动控制单元能够控制头部的前进方向使得管道基本线性地插入目标位置。

4. 发明授权

US09244342B2 Imprint apparatus and pattern transfer method 有权
标题翻译：印刷装置和图案转印方法
公开(公告)号：US09244342B2
公开(公告)日：2016-01-26
申请号：US12963009
申请日：2010-12-08
申请人： Hiroshi Sato
发明人： Hiroshi Sato
IPC分类号： B29C59/02 , G03F7/00 , B82Y10/00 , B82Y40/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint apparatus comprises a scope which observes a mark formed in each shot of a substrate and a mark formed on a mold and a controller. The controller performs observation by the scope, detects an amount of displacement of the shot with respect to the mold based on the observation result, and, if the detected displacement amount falls outside an allowable range, executes at least one of remeasuring a baseline amount and reexecuting a global alignment process.
摘要翻译：压印装置包括观察在基板的每个镜头中形成的标记的范围和形成在模具上的标记和控制器。控制器通过该范围进行观察，基于观察结果检测射出相对于模具的位移量，并且如果检测到的位移量超出允许范围，则执行重新测量基线量和重新执行全局对齐过程。

5. 发明授权

US09239946B2 Method and apparatus for detecting and processing specific pattern from image 有权
标题翻译：用于从图像中检测和处理特定图案的方法和装置
公开(公告)号：US09239946B2
公开(公告)日：2016-01-19
申请号：US13546355
申请日：2012-07-11
申请人： Kan Torii , Masakazu Matsugu , Katsuhiko Mori , Hiroshi Sato , Yusuke Mitarai
发明人： Kan Torii , Masakazu Matsugu , Katsuhiko Mori , Hiroshi Sato , Yusuke Mitarai
IPC分类号： G06K9/00 , H04N5/232
CPC分类号： G06K9/00234 , G06K2209/011 , H04N5/23219
摘要： In an image within which a face pattern is detected, when a ratio of a skin color pixel is equal to or smaller than a first threshold value in a first region and a ratio of a skin color pixel is equal to or greater than a second threshold value in a second r region, the vicinity of the first region is determined to be a face candidate position at which the face pattern can exist. Face detection is carried out on the face candidate position. The second region is arranged in a predetermined position relative to the first region.
摘要翻译：在其中检测到面部图案的图像中，当皮肤颜色像素的比例在第一区域中等于或小于第一阈值并且皮肤颜色像素的比率等于或大于第二阈值时在第二r区域中，第一区域附近被确定为可以存在脸部图案的面部候选位置。脸部检测在脸部候选位置进行。第二区域相对于第一区域布置在预定位置。

6. 发明授权

US08953175B2 Mark position detector, imprint apparatus, and article manufacturing method 有权
标题翻译：标记位置检测器，压印装置和制品制造方法
公开(公告)号：US08953175B2
公开(公告)日：2015-02-10
申请号：US12966237
申请日：2010-12-13
申请人： Hiroshi Sato
发明人： Hiroshi Sato
IPC分类号： G01B11/14 , G01B11/02 , G03F9/00 , G03F7/00
CPC分类号： G01B11/14 , B29C59/002 , B29C59/026 , B29K2101/00 , B29L2009/005 , B82Y10/00 , B82Y40/00 , G01B11/02 , G03F7/0002 , G03F9/7038 , G03F9/7042 , G03F9/7049 , G03F9/7088
摘要： A detector for detecting a position of a mark comprises: an image sensing device; an optical system which projects the mark onto an image sensing surface of the image sensing device; a pattern located in a position between the image sensing surface and an optical element located closest to a plane on which the mark is to be located, among optical elements forming the optical system, the position being optically conjugated with the plane; and a processor which calculates a position of the mark with respect to one of a position of the pattern and a position already known from the position of the pattern, based on a moire pattern formed on the image sensing surface by the mark and the pattern.
摘要翻译：用于检测标记位置的检测器包括：图像感测装置; 光学系统，其将标记投射到图像感测装置的图像感测表面上; 在形成光学系统的光学元件中位于图像感测表面和位于最靠近标记所在的平面的光学元件之间的位置的图案，该位置与该平面光学共轭; 以及处理器，其基于通过标记和图案形成在图像感测表面上的莫尔图案，计算相对于图案的位置和从图案的位置已知的位置之一的标记的位置。

7. 发明授权

US08861803B2 Image recognition apparatus, image recognition method, and program 有权
标题翻译：图像识别装置，图像识别方法和程序
公开(公告)号：US08861803B2
公开(公告)日：2014-10-14
申请号：US13436585
申请日：2012-03-30
申请人： Kotaro Yano , Hiroshi Sato , Shunsuke Nakano
发明人： Kotaro Yano , Hiroshi Sato , Shunsuke Nakano
IPC分类号： G06K9/46 , G06K9/00
CPC分类号： G06K9/00281
摘要： An image recognition apparatus includes an extraction unit configured to extract a feature quantity for each local area from an input image, a conversion unit configured to convert the feature quantity extracted by the extraction unit into a feature quantity indicating a degree with respect to an attribute for each local area, a verification unit configured to verify the feature quantity converted by the conversion unit against a feature quantity of a registered image, and an identification unit configured to identify whether the input image is identical to the registered image by integrating the verification result for each local area acquired by the verification unit.
摘要翻译：图像识别装置包括：提取单元，被配置为从输入图像中提取每个局部区域的特征量;转换单元，被配置为将由提取单元提取的特征量转换为指示相对于属性的属性的度数的特征量每个局部区域，验证单元，被配置为验证由转换单元转换的特征量相对于注册图像的特征量;以及识别单元，被配置为通过将输入图像与登记图像相一致来识别，验证单位获取的每个局部区域。

8. 发明授权

US08842880B2 Information processing apparatus, method of controlling information processing apparatus, and storage medium 有权
标题翻译：信息处理装置，信息处理装置的控制方法以及存储介质
公开(公告)号：US08842880B2
公开(公告)日：2014-09-23
申请号：US13444738
申请日：2012-04-11
申请人： Shunsuke Nakano , Hiroshi Sato , Yuji Kaneda , Takashi Suzuki
发明人： Shunsuke Nakano , Hiroshi Sato , Yuji Kaneda , Takashi Suzuki
IPC分类号： G06K9/00 , G06F3/00
CPC分类号： G06K9/00288
摘要： An information processing apparatus comprising: an obtaining unit configured to obtain image data; a detection unit configured to detect an object from the image data; an attribute determination unit configured to determine an attribute indicating a characteristic of the object detected by the detection unit; a registration unit configured to register the image data in at least one of a plurality of dictionaries based on the attribute determined by the attribute determination unit; and an adding unit configured to add, when the image data is registered in not less than two dictionaries, link information concerning the image data registered in the other dictionary to the image data registered in one dictionary.
摘要翻译：一种信息处理设备，包括：获取单元，被配置为获得图像数据; 检测单元，被配置为从所述图像数据检测对象; 属性确定单元，被配置为确定指示由所述检测单元检测到的所述对象的特征的属性; 注册单元，被配置为基于由属性确定单元确定的属性将多个字典中的至少一个注册图像数据; 以及添加单元，被配置为当图像数据在不少于两个字典中登记时，将登记在其他字典中的图像数据的链接信息添加到登记在一个字典中的图像数据。

9. 发明授权

US08766079B2 Playback apparatus, playback method, and playback program 有权
标题翻译：播放装置，播放方法和播放程序
公开(公告)号：US08766079B2
公开(公告)日：2014-07-01
申请号：US12587022
申请日：2009-10-01
申请人： Shingo Utsuki , Manabu Fujiki , Hiroshi Sato , Junichi Nagahara
发明人： Shingo Utsuki , Manabu Fujiki , Hiroshi Sato , Junichi Nagahara
IPC分类号： G10H1/00 , G10H1/18
CPC分类号： G06F3/16 , G06F17/30772 , G06F17/30778 , G11B27/105 , G11B27/34
摘要： A playback apparatus includes: a storage unit storing music data and group identification information for identifying groups in which the music data are arranged in a predetermined unit; a selection unit selecting the group identification information stored in the storage unit; a notification unit notifying the group identification information selected by the selection unit with a sound; and a playback unit playing back the notification of the group identification information in the notification unit and the music data belonging to the group identified by the group identification information selected by the selection unit.
摘要翻译：播放装置包括：存储单元，存储用于识别音乐数据以预定单元排列的组的音乐数据和组识别信息; 选择单元，选择存储在存储单元中的组识别信息; 通知单元，通知用选择单元选择的组识别信息; 以及播放单元，回放通知单元中的组标识信息的通知和属于由选择单元选择的组标识信息所标识的组的音乐数据。

10. 发明授权

US08740604B2 Imprint apparatus and article manufacturing method 有权
标题翻译：印刷装置及制品制造方法
公开(公告)号：US08740604B2
公开(公告)日：2014-06-03
申请号：US13008377
申请日：2011-01-18
申请人： Hiroshi Sato
发明人： Hiroshi Sato
IPC分类号： B05D3/12 , B05C9/12
CPC分类号： H01L21/6715 , H01L21/681
摘要： An imprint apparatus for coating a substrate with a resin by a coating mechanism, and curing the resin while pressing at least one of the substrate and a mold against the other, includes a measurement device configured to detect a position of the coating mechanism, a substrate stage configured to hold a substrate, a positioning system configured to position the substrate stage, and a controller configured to control positioning of the substrate stage by the positioning system, based on the measurement result.
摘要翻译：一种用于通过涂覆机构用树脂涂覆基底并在将所述基底和模具中的至少一个按压至另一个的同时固化所述树脂的压印装置包括：测量装置，其被配置为检测所述涂覆机构的位置，配置成保持基板的台阶，配置为定位基板台的定位系统，以及被配置为基于测量结果来控制由定位系统定位基板台的控制器。

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