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    • 8. 发明授权
    • Image display method and liquid crystal display device employing same
    • 图像显示方法和采用该方法的液晶显示装置
    • US09330613B2
    • 2016-05-03
    • US13885109
    • 2011-06-13
    • Hiroshi Ito
    • Hiroshi Ito
    • G09G5/10G09G3/36H04N13/00H04N13/04G09G3/00
    • G09G3/3607G09G3/003G09G3/3648G09G2310/0224G09G2310/061H04N13/144H04N13/315H04N13/341
    • Uniformize afterimages caused by black insertion to each image when two types of images are alternately displayed. There are provided a left and right image alternate output unit, a mask pattern storage unit, a mask pattern selection counter, and a mask synthesizing unit. The left and right image alternate output unit alternately outputs two types of video frames. The mask pattern storage unit stores m mask patterns, wherein basic regions are defined in a pixel region of a liquid crystal panel, the pixel region has m pixels arrayed in a matrix, m is an even number equal to or greater than 4, the in mask patterns have different arrangements of mask pixels in the basic region, and the number of the mask pixels is an even number smaller than m and equal to or greater than 2.
    • 当交替显示两种类型的图像时,均匀化由黑色插入引起的每个图像所造成的余像。 提供了左右图像交替输出单元,掩模图案存储单元,掩模图案选择计数器和掩码合成单元。 左右图像交替输出单元交替输出两种类型的视频帧。 掩模图案存储单元存储m个掩模图案,其中基本区域被限定在液晶面板的像素区域中,像素区域具有以矩阵排列的m个像素,m为等于或大于4的偶数, 掩模图案在基本区域中具有不同的掩模像素布置,并且掩模像素的数量是小于m且等于或大于2的偶数。
    • 9. 发明授权
    • Manufacturing method of a piezoelectric element and a liquid ejecting head
    • 压电元件和液体喷射头的制造方法
    • US08819903B2
    • 2014-09-02
    • US13197464
    • 2011-08-03
    • Toshihiro ShimizuJiro KatoEiju HiraiHiroshi Ito
    • Toshihiro ShimizuJiro KatoEiju HiraiHiroshi Ito
    • H04R17/00H01L41/29B41J2/16H01L41/314B41J2/14
    • H01L41/29B41J2/161B41J2/1628B41J2/1631B41J2002/14491H01L41/314Y10T29/42Y10T29/49002Y10T29/49401
    • A manufacturing method of a piezoelectric element includes: forming a first conductive layer upon a substrate; forming a piezoelectric layer upon the first conductive layer; forming a second conductive layer upon the piezoelectric layer; forming a third conductive layer upon the second conductive layer; forming a first portion, a second portion, and an opening portion provided between the first portion and the second portion by patterning the third conductive layer; forming a resist layer that covers the opening portion and covers the edges of the first portion and the second portion that face the opening portion side; and forming a first conductive portion and a second conductive portion configured from the first portion and the second portion, and forming a third conductive portion configured from the second conductive layer, by dry-etching the second conductive layer using the first portion, the second portion, and the resist layer as a mask.
    • 压电元件的制造方法包括:在基板上形成第一导电层; 在所述第一导电层上形成压电层; 在所述压电层上形成第二导电层; 在所述第二导电层上形成第三导电层; 通过对第三导电层进行构图而形成第一部分,第二部分和设置在第一部分和第二部分之间的开口部分; 形成覆盖所述开口部并且覆盖所述第一部分和面向所述开口部侧的所述第二部分的边缘的抗蚀剂层; 以及形成由所述第一部分和所述第二部分构成的第一导电部分和第二导电部分,以及通过使用所述第一部分干蚀刻所述第二导电层,形成由所述第二导电层构成的第三导电部分,所述第二部分 ,抗蚀剂层作为掩模。
    • 10. 发明授权
    • Method for using a topcoat composition
    • 使用面漆组合物的方法
    • US08802357B2
    • 2014-08-12
    • US13326404
    • 2011-12-15
    • Hiroshi ItoLinda Karin Sundberg
    • Hiroshi ItoLinda Karin Sundberg
    • G03F7/095
    • G03F7/2041G03F7/0046G03F7/11
    • A method of forming an image on a photoresist. The method includes: forming a photoresist over a substrate; applying a topcoat composition, the topcoat composition comprising at least one fluorine-containing polymer and a casting solvent, onto the photoresist; removing the casting solvent of the topcoat composition resulting in the formation of a topcoat material over the photoresist; exposing the photoresist to radiation, the radiation changing a chemical composition of the regions of the photoresist exposed to the radiation, forming exposed and unexposed regions in the photoresist; and removing i) the topcoat material and ii) the exposed regions of the photoresist or the unexposed regions of the photoresist.
    • 在光致抗蚀剂上形成图像的方法。 该方法包括:在衬底上形成光致抗蚀剂; 将面漆组合物,包含至少一种含氟聚合物和浇铸溶剂的面漆组合物涂覆到光致抗蚀剂上; 除去顶涂层组合物的浇铸溶剂,导致在光致抗蚀剂上形成顶涂层材料; 将光致抗蚀剂暴露于辐射,辐射改变暴露于辐射的光刻胶的区域的化学组成,在光致抗蚀剂中形成暴露和未曝光的区域; 并去除i)面漆材料和ii)光致抗蚀剂的曝光区域或光致抗蚀剂的未曝光区域。