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1. 发明授权

US06777159B1 Method for forming polyimide pattern using photosensitive polyimide and composition for use therein 有权
标题翻译：使用光敏聚酰亚胺形成聚酰亚胺图案的方法及其中使用的组合物
公开(公告)号：US06777159B1
公开(公告)日：2004-08-17
申请号：US09980212
申请日：2002-03-18
申请人： Hiroshi Itatani , Shunichi Matsumoto , Tarou Itatani , Tsunenori Sakamoto , Sucheta Gorwadkar , Masanori Komuro
发明人： Hiroshi Itatani , Shunichi Matsumoto , Tarou Itatani , Tsunenori Sakamoto , Sucheta Gorwadkar , Masanori Komuro
IPC分类号： G03F7004
CPC分类号： C08L79/08 , G03F7/0045 , G03F7/0233 , G03F7/0387 , G03F7/039 , G03F7/0392 , G03F7/0757 , Y10S430/106
摘要： This invention relates to a photosensitive polyimide material having positive-type or negative-type photosensitivity, which may be developed with a high resolution with an irradiation energy having short wavelength such as ultraviolet light or electron beam. The positive-type photosensitive polyimide composition comprising a solvent-soluble polyimide which shows positive-type photosensitivity in the presence of a photoacid generator, which is obtained by polycondensation of at least one aliphatic tetracarboxylic dianhydride and/or alicyclic tetracarboxylic dianhydride and at least one aliphatic diamine and/or alicyclic diamine and/or diaminosiloxane; and the photoacid generator. Since the polyimide has negative-type photosensitivity when irradiated with electron beam in the absence of a photoacid generator, a method for forming negative-type polyimide pattern using the polyimide is also provided.
摘要翻译：本发明涉及具有正型或负型光敏性的光敏聚酰亚胺材料，其可以用具有短波长的照射能量如紫外光或电子束以高分辨率显影。正型感光性聚酰亚胺组合物，其含有在光酸产生剂存在下显示正型感光性的溶剂可溶性聚酰亚胺，其通过至少一种脂肪族四羧酸二酐和/或脂环族四羧酸二酐与至少一种脂肪族四羧酸二酐的缩聚而得到二胺和/或脂环族二胺和/或二氨基硅氧烷; 和光酸发生器。由于在不存在光致酸发生剂的情况下，当用电子束照射聚酰亚胺时具有负型光敏性，因此也提供了使用该聚酰亚胺形成负型聚酰亚胺图案的方法。

2. 发明授权

US06630064B1 Composition for electrodeposition of polyimides and method for producing patterned polyimide membranes using the same 有权
标题翻译：用于聚酰亚胺电沉积的组合物和使用其制备图案化聚酰亚胺膜的方法
公开(公告)号：US06630064B1
公开(公告)日：2003-10-07
申请号：US09806450
申请日：2001-03-30
申请人： Hiroshi Itatani , Shunichi Matsumoto
发明人： Hiroshi Itatani , Shunichi Matsumoto
IPC分类号： C25D1304
CPC分类号： C09D179/08 , G03F7/0045 , G03F7/0387 , G03F7/039 , G03F7/164
摘要： A composition for electro-depositing polyimide membranes which can be patterned by photolithography, which are excellent in heat resistance, insulation performance and in chemical resistance. The composition for electrodeposition of polyimides according to the present invention comprises a composition for electrodeposition of polyimides comprising a photoacid generator, a positive-type photosensitive polyimide having oxycarbonyl groups in side chains, a polar solvent which dissolves said polyimide, water, a dispersing agent, and an alkaline neutralizer.
摘要翻译：用于电沉积聚酰亚胺膜的组合物，其可通过光刻图案化，其耐热性，绝缘性能和耐化学性优异。根据本发明的聚酰亚胺的电沉积用组合物包括用于电沉积聚酰亚胺的组合物，其包含光酸产生剂，在侧链中具有氧羰基的正型感光性聚酰亚胺，溶解所述聚酰亚胺的极性溶剂，水，分散剂，和碱性中和剂。

3. 发明授权

US06589662B1 Composite film 有权
标题翻译：复合膜
公开(公告)号：US06589662B1
公开(公告)日：2003-07-08
申请号：US09806452
申请日：2001-03-30
申请人： Hiroshi Itatani , Shunichi Matsumoto
发明人： Hiroshi Itatani , Shunichi Matsumoto
IPC分类号： B32B2700
CPC分类号： C08J7/047 , C08G73/10 , C08J2479/00 , H05K1/0346 , H05K3/022 , H05K2201/0154 , Y10T428/24917 , Y10T428/31504 , Y10T428/31511 , Y10T428/31522 , Y10T428/31529 , Y10T428/31721
摘要： A composite film having an excellent heat resistance is disclosed. The composite film according to the present invention comprises a substrate film and polyimide membrane(s) formed on at least one surface of the substrate film, which polyimide membrane(s) is(are) prepared by applying a solution of a solvent-soluble polyimide whose main chain is formed by polycondensation of one or more tetracarboxylic dianhydrides and one or more diamines and by drying the solution. The solvent-soluble polyimide comprises bicyclo(2,2,2)oct-7-ene-2,3,5,6-tetracarboxylic dianhydride as at least a part of the tetracarboxylic dianhydride(s) and/or at least one of 3,5-diaminobenzoic acid and a diaminosiloxane derivative as at least a part the diamine(s).
摘要翻译：公开了具有优异耐热性的复合膜。根据本发明的复合膜包括基材膜和形成在基材膜的至少一个表面上的聚酰亚胺膜，所述聚酰亚胺膜通过将溶剂可溶性聚酰亚胺其主链通过一种或多种四羧酸二酐和一种或多种二胺的缩聚形成，并通过干燥该溶液。溶剂可溶性聚酰亚胺包含二环（2,2,2）辛-7-烯-2,3,5,6-四羧酸二酐作为至少一部分四羧酸二酐和/或至少一种3 ，5-二氨基苯甲酸和作为二胺的至少一部分的二氨基硅氧烷衍生物。

4. 发明授权

US06627377B1 Positive photosensitive poliymide composition 有权
标题翻译：正光敏式组合物
公开(公告)号：US06627377B1
公开(公告)日：2003-09-30
申请号：US09529382
申请日：2000-06-26
申请人： Hiroshi Itatani , Shunichi Matsumoto
发明人： Hiroshi Itatani , Shunichi Matsumoto
IPC分类号： G03F7004
CPC分类号： C08G73/10 , G03F7/0045 , G03F7/039 , Y10S430/106
摘要： A photosensitive polyimide composition which is soluble in an organic solvent, which is excellent in adhesiveness, heat resistance, mechanical properties and flexibility, which shows the property of highly sensitive positive-type photoresist that is soluble in alkali upon irradiation with light is disclosed. The polyimide composition of the present invention contains a photoacid generator and a solvent-soluble polyimide which shows positive-type photosensitivity in the presence of said photoacid generator.
摘要翻译：公开了一种可溶于有机溶剂的感光性聚酰亚胺组合物，其具有优异的粘合性，耐热性，机械性能和柔韧性，其显示了在照射光时可溶于碱的高灵敏度正型光致抗蚀剂的性质。本发明的聚酰亚胺组合物含有在所述光酸产生剂存在下显示正型光敏性的光致酸产生剂和溶剂可溶性聚酰亚胺。

5. 发明授权

US07648815B2 Negative photosensitive polyimide composition and method for forming image the same 有权
标题翻译：负光敏聚酰亚胺组合物和形成图像的方法相同
公开(公告)号：US07648815B2
公开(公告)日：2010-01-19
申请号：US10380221
申请日：2001-09-11
申请人： Hiroshi Itatani , Shunichi Matsumoto
发明人： Hiroshi Itatani , Shunichi Matsumoto
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： C08L79/08 , G03F7/037 , G03F7/0387 , Y10S430/114 , Y10S430/117
摘要： Disclosed is a composition of a negative-type photosensitive polyimide which is solvent soluble, which is excellent in adhesiveness, heat resistance, mechanical properties and in flexibility, which shows characteristics of alkali-soluble highly sensitive negative-type photoresist upon irradiation with light, The composition according to the present invention comprises a photo radical initiator and a solvent-soluble polyimide which shows negative-type photosensitivity in the presence of the photo radical initiator.
摘要翻译：公开了一种溶剂可溶性的组合物，其具有优异的粘合性，耐热性，机械性能和柔软性，其显示了在照射光时碱溶性高敏感性负型光致抗蚀剂的特性。根据本发明的组合物包含光自由基引发剂和在光自由基引发剂存在下显示负型光敏性的溶剂可溶性聚酰亚胺。

6. 发明授权

US06890626B1 Imide-benzoxazole polycondensate and process for producing the same 有权
标题翻译：酰苯并恶唑缩聚物及其制备方法
公开(公告)号：US06890626B1
公开(公告)日：2005-05-10
申请号：US10129844
申请日：2000-11-08
申请人： Hiroshi Itatani , Shunichi Matsumoto
发明人： Hiroshi Itatani , Shunichi Matsumoto
IPC分类号： C08G73/22 , G03F7/023 , G03F7/039 , H05K1/03 , B32B15/08 , C08G73/00
CPC分类号： C08G73/22 , G03F7/0233 , G03F7/039 , H05K1/0346 , Y10T428/24802 , Y10T428/24917 , Y10T428/31681
摘要： A polyimide-based polycondensate which may be used as an insulation film by coating a copper foil with the polycondensate and by heating the coated copper foil, which insulation film does not warp the foil, as well as a production process thereof, is disclosed. The polycondensate according to the invention is a solvent-soluble polycondensate containing a benzoxazole component having a carboxylic group and an imide component having a phenolic hydroxyl group, which is obtained by dehydration-condensing one or more tetracarboxylic dianhydrides with one or more aromatic diamines having an amino group and a phenolic hydroxyl group, the amino group and the phenolic hydroxyl group being located at ortho positions with respect to each other, by heating the one or more tetracarboxylic dianhydrides and the one or more aromatic diamines at 150° C. to 220° C. in the presence of an acid catalyst.
摘要翻译：公开了一种聚酰亚胺缩聚物，其可以通过用缩聚物涂覆铜箔并加热涂覆的铜箔（该绝缘膜不翘曲箔）作为绝缘膜，以及其制造方法。根据本发明的缩聚物是含有具有羧基的苯并恶唑组分和具有酚羟基的酰亚胺组分的溶剂可溶性缩聚物，其通过将一种或多种四羧酸二酐与一种或多种芳族二胺进行脱水缩合而获得，所述芳族二胺具有氨基和酚羟基，氨基和酚羟基相对于彼此位于相邻位置，通过在150℃加热一种或多种四羧酸二酐和一种或多种芳族二胺至220℃ 在酸催化剂存在下。

7. 发明授权

US08970836B2 Defect inspecting apparatus and defect inspecting method 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US08970836B2
公开(公告)日：2015-03-03
申请号：US14235916
申请日：2012-05-14
申请人： Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Yukihiro Shibata , Toshifumi Honda
发明人： Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Yukihiro Shibata , Toshifumi Honda
IPC分类号： G01N21/00 , G01N21/95 , G01N21/956 , G01N21/21 , G01N21/88 , G01B11/06
CPC分类号： G01N21/95 , G01B11/0641 , G01N21/211 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/8822 , G01N2021/9513 , G02F1/1303 , G02F1/136259
摘要： An invention being applied is a defect detecting apparatus that has: an illuminating optical system with a laser light source for irradiating a sample on whose surface a pattern is formed with light; a detecting optical system with a sensor for detecting light generated from the sample illuminated by the illuminating optical system; and a signal processing unit that extracts a defect from an image based on the light detected by the detecting optical system, in which an amplification rate of the sensor is dynamically changed during a time when the light is detected by the detecting optical system.
摘要翻译：一种应用的发明是一种缺陷检测装置，其具有：具有激光光源的照明光学系统，用于对其表面形成有图案的样品进行照射; 检测光学系统，其具有用于检测由照明光学系统照射的样本产生的光的传感器; 以及信号处理单元，其基于由检测光学系统检测到的光的时间期间传感器的放大率动态地改变的检测光学系统检测到的光，从图像中提取缺陷。

8. 发明申请

US20140268122A1 DEFECT INSPECTION METHOD AND DEFECT INSPECTION DEVICE 有权
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US20140268122A1
公开(公告)日：2014-09-18
申请号：US14232929
申请日：2012-06-28
申请人： Shunichi Matsumoto , Atsushi Taniguchi , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
发明人： Shunichi Matsumoto , Atsushi Taniguchi , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
IPC分类号： G01N21/95
CPC分类号： G01N21/9501 , G01N21/956 , G01N2201/126 , G01N2201/127 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect inspection method and device for irradiating a linear region on a surface-patterned sample mounted on a planarly movable table, with illumination light from an inclined direction relative to a direction of a line normal to the sample, next detecting in each of a plurality of directions an image of the light scattered from the sample irradiated with the illumination light, then processing signals obtained by the detection of the images of the scattered light, and thereby detecting a defect present on the sample; wherein the step of detecting the scattered light image in the plural directions is performed through elliptical lenses in which elevation angles of the optical axes thereof are different from each other, within one plane perpendicular to a plane formed by the normal to the surface of the table on which to mount the sample and the longitudinal direction of the linear region irradiated with the irradiation light, the elliptical lenses being formed of circular lenses having left and right portions thereof cut.
摘要翻译：一种用于照射安装在平面可移动台上的表面图案样品上的线性区域的缺陷检查方法和装置，其具有相对于垂直于样品的线的方向的倾斜方向的照明光，接下来在多个指示从照射光照射的样品散射的光的图像，然后处理通过检测散射光的图像而获得的信号，从而检测样品上存在的缺陷; 其特征在于，所述检测多个方向的散射光图像的步骤是通过椭圆形透镜进行的，所述椭圆透镜在光学轴的仰角彼此不同的垂直于与所述表的表面法线形成的平面的一个平面内在其上安装样品和用照射光照射的线性区域的纵向方向，椭圆形透镜由其左侧和右侧部分切割的圆形透镜形成。

9. 发明授权

US08741064B2 Heat treatment method and heat treatment apparatus 有权
标题翻译：热处理方法和热处理装置
公开(公告)号：US08741064B2
公开(公告)日：2014-06-03
申请号：US13533206
申请日：2012-06-26
申请人： Hisashi Inoue , Shunichi Matsumoto , Yasushi Takeuchi
发明人： Hisashi Inoue , Shunichi Matsumoto , Yasushi Takeuchi
IPC分类号： C23C16/00
CPC分类号： H01L21/67309 , C21D9/0068 , C23C16/56 , H01L21/67109
摘要： A substrate holder has two holder constituting bodies, each having a plurality of columns arranged on an imaginary circle, and substrate holding sections that hold circumferential portions of respective substrates. The holder constituting bodies hold the substrates so that either their front surfaces or their back surfaces face upward with a substrate having an upward facing front and a substrate having an upward facing rear being alternately arranged in a vertical direction. At least one of the holder constituting bodies moves in the vertical direction to change the positions of the holder constituting bodies relative to each other. A distance between a first pair of vertically adjacent substrates with their respective front surfaces facing each other is set to ensure treatment uniformity, and to be larger than a distance between a second pair of vertically adjacent substrates with their respective back surfaces facing each other.
摘要翻译：衬底保持器具有两个保持器构成体，每个保持器构造体具有布置在假想圆上的多个列，以及保持各个衬底周向部分的衬底保持部。保持器构成体保持基板，使得它们的前表面或其背面朝向上方具有面向上的基板和具有面向上的后部的基板沿垂直方向交替布置。保持构造体中的至少一个沿垂直方向移动，以改变保持器构成体相对于彼此的位置。设置第一对垂直相邻的基板与它们各自的前表面彼此面对的距离，以确保处理均匀性，并且大于第二对垂直相邻基板之间的距离，并且其相应的后表面彼此面对。

10. 发明授权

US08230806B2 Heat treatment method and heat treatment apparatus wherein the substrate holder is composed of two holder constituting bodies that move relative to each other 有权
标题翻译：热处理方法和热处理装置，其中基板保持件由相对于彼此移动的两个保持器构成体构成
公开(公告)号：US08230806B2
公开(公告)日：2012-07-31
申请号：US12987406
申请日：2011-01-10
申请人： Hisashi Inoue , Shunichi Matsumoto , Yasushi Takeuchi
发明人： Hisashi Inoue , Shunichi Matsumoto , Yasushi Takeuchi
IPC分类号： B05B5/00 , C23C16/00
CPC分类号： H01L21/67309 , C21D9/0068 , C23C16/56 , H01L21/67109
摘要： A heat treatment apparatus has a substrate holder with two holder constituting bodies that each have a plurality of columns and substrate holding sections. One of the holder constituting bodies holds substrates so that their front surfaces face upward, while the other holds the substrates so that their back surfaces face upward. At least one of the holder constituting bodies moves vertically to change the positions of the holder constituting bodies relative to each other. A distance between one of a first pair of vertically-adjacent substrates with respective front surfaces facing each other and the other of the first pair of substrates is set to ensure treatment uniformity and to be larger than a distance between one of a second pair of vertically-adjacent substrates with their respective back surfaces facing each other and the other of the second pair of substrates.
摘要翻译：热处理设备具有一个具有两个保持器构成体的衬底保持器，每个保持器构成体具有多个列和衬底保持部。保持器构造体中的一个保持基板，使得它们的前表面朝上，而另一个保持基板，使得它们的后表面朝上。保持器构造体中的至少一个垂直移动以改变保持器构造体相对于彼此的位置。第一对垂直相邻基板中的一个彼此相对的前表面和第一对基板之间的距离设定为确保处理均匀性并且大于第二对垂直方向之间的距离相邻的基板，其各自的后表面彼此相对，另一个是第二对基板。

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