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    • 6. 发明授权
    • Method of manufacturing a compound semiconductor thin film on a substrate
    • 在基板上制造化合物半导体薄膜的方法
    • US06211043B1
    • 2001-04-03
    • US09261518
    • 1999-03-03
    • Tsuyoshi NishioKuniyoshi OmuraTakeshi HibinoSatoshi ShibutaniMikio Murozono
    • Tsuyoshi NishioKuniyoshi OmuraTakeshi HibinoSatoshi ShibutaniMikio Murozono
    • H01L2120
    • H01L31/073C23C16/18C23C16/306H01L31/1828Y02E10/541Y02E10/543Y02P70/521
    • The present invention relates to a method of manufacturing a compound semiconductor thin film by the thermal decomposition of a metal organic compound and a solar cell using the above thin film. An organic solvent solution of the metal organic compound containing at least one metal-sulfur bond is pulverized into fine particles by an ultrasonic vibration method or by a spray injection method and the obtained fine particles or gaseous metal organic compound are thermally decomposed by contacting them on the heated surface of a thin film forming substrate and thus a compound semiconductor metal sulfide thin film is formed on the thin film forming substrate. With this method, a compound semiconductor thin film of large surface area with uniform quality can be manufactured at low manufacturing cost with good reproducibility. These metal sulfide thin films are of high purity, high density and high quality and thus can be used for various photo-electronic devices.
    • 本发明涉及通过使用上述薄膜的金属有机化合物和太阳能电池的热分解来制造化合物半导体薄膜的方法。 将含有至少一种金属 - 硫键的金属有机化合物的有机溶剂溶液通过超声波振动法或喷射法粉碎成微粒,所得到的微粒或气态金属有机化合物通过使其接触而热分解 在薄膜形成基板上形成薄膜形成基板的加热表面,从而形成化合物半导体金属硫化物薄膜。 通过这种方法,可以以低制造成本制造具有均匀质量的大表面积的化合物半导体薄膜,具有良好的再现性。 这些金属硫化物薄膜具有高纯度,高密度和高质量,因此可用于各种光电子器件。