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1. 发明授权

US08697331B2 Compound, polymer, and radiation-sensitive composition 有权
标题翻译：化合物，聚合物和辐射敏感组合物
公开(公告)号：US08697331B2
公开(公告)日：2014-04-15
申请号：US12949795
申请日：2010-11-19
申请人： Hirokazu Sakakibara , Takehiko Naruoka , Makoto Shimizu , Yukio Nishimura , Nobuji Matsumura , Yuusuke Asano
发明人： Hirokazu Sakakibara , Takehiko Naruoka , Makoto Shimizu , Yukio Nishimura , Nobuji Matsumura , Yuusuke Asano
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： C07C69/96 , C08F220/18 , C08F220/22 , C08F220/24 , C08F220/26 , C09D133/18 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A compound is shown by a following formula (1), wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents a methylene group, an ethylene group, a 1-methylethylene group, a 2-methylethylene group, a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or a derivative thereof, each of R3 represents at least one of a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, and a linear or branched alkyl group having 1 to 4 carbon atoms, provided that two of R3 may bond to form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof together with the carbon atom that is bonded thereto, and X represents a linear or branched fluoroalkylene group having 1 to 20 carbon atoms.
摘要翻译：化合物由下式（1）表示，其中R1表示氢原子，甲基或三氟甲基，R2表示亚甲基，亚乙基，1-甲基亚乙基，2-甲基亚乙基，碳原子数4〜20的二价脂环式烃基或其衍生物，各R3表示碳原子数为4〜20的一价脂环族烃基，其衍生物和具有1个碳原子的直链或支链烷基中的至少一种至4个碳原子，条件是R3中的两个可以键合形成具有4至20个碳原子的二价脂环族烃基或其衍生物和与其键合的碳原子，并且X表示具有1个碳原子的直链或支链氟亚烷基至20个碳原子。

2. 发明申请

US20110151378A1 RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, POLYMER, AND RESIST PATTERN-FORMING METHOD 审中-公开
标题翻译：用于液体渗透光刻，聚合物和电阻形成方法的辐射敏感性树脂组合物
公开(公告)号：US20110151378A1
公开(公告)日：2011-06-23
申请号：US12949790
申请日：2010-11-19
申请人： Nobuji MATSUMURA , Akimasa Soyano , Yuusuke Asano , Takehiko Naruoka , Hirokazu Sakakibara , Makoto Shimizu , Yukio Nishimura
发明人： Nobuji MATSUMURA , Akimasa Soyano , Yuusuke Asano , Takehiko Naruoka , Hirokazu Sakakibara , Makoto Shimizu , Yukio Nishimura
IPC分类号： G03F7/004 , G03F7/20 , C08F220/28 , C08F220/22
CPC分类号： C07C69/96 , C08F220/18 , G03F7/0046 , G03F7/0397 , G03F7/2041 , C08F220/28 , C08F220/22
摘要： A radiation-sensitive resin composition for liquid immersion lithography includes a resin component, a photoacid generator and a solvent. The resin component includes an acid-dissociable group-containing resin in an amount of more than 50% by mass. The acid-dissociable group-containing resin includes a repeating unit that includes a fluorine atom and an acid-dissociable group in a side chain of the repeating unit.
摘要翻译：用于液浸光刻的辐射敏感性树脂组合物包括树脂组分，光致酸发生剂和溶剂。树脂组分包含大于50质量％的含酸解离基团的树脂。含酸解离基的树脂包括在重复单元的侧链中包含氟原子和酸解离基团的重复单元。

3. 发明申请

US20110104611A1 NOVEL COMPOUND, POLYMER, AND RADIATION-SENSITIVE COMPOSITION 有权
标题翻译：新型化合物，聚合物和辐射敏感组合物
公开(公告)号：US20110104611A1
公开(公告)日：2011-05-05
申请号：US12949795
申请日：2010-11-19
申请人： Hirokazu Sakakibara , Takehiko Naruoka , Makoto Shimizu , Yukio Nishimura , Nobuji Matsumura , Yuusuke Asano
发明人： Hirokazu Sakakibara , Takehiko Naruoka , Makoto Shimizu , Yukio Nishimura , Nobuji Matsumura , Yuusuke Asano
IPC分类号： G03F7/004 , C07C69/96 , C08F120/22
CPC分类号： C07C69/96 , C08F220/18 , C08F220/22 , C08F220/24 , C08F220/26 , C09D133/18 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A compound is shown by a following formula (1), wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents a methylene group, an ethylene group, a 1-methylethylene group, a 2-methylethylene group, a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or a derivative thereof, each of R3 represents at least one of a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, and a linear or branched alkyl group having 1 to 4 carbon atoms, provided that two of R3 may bond to form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof together with the carbon atom that is bonded thereto, and X represents a linear or branched fluoroalkylene group having 1 to 20 carbon atoms.
摘要翻译：化合物由下式（1）表示，其中R1表示氢原子，甲基或三氟甲基，R2表示亚甲基，亚乙基，1-甲基亚乙基，2-甲基亚乙基，碳原子数4〜20的二价脂环式烃基或其衍生物，各R3表示碳原子数为4〜20的一价脂环族烃基，其衍生物和具有1个碳原子的直链或支链烷基中的至少一种至4个碳原子，条件是R3中的两个可以键合形成具有4至20个碳原子的二价脂环族烃基或其衍生物和与其键合的碳原子，并且X表示具有1个碳原子的直链或支链氟亚烷基至20个碳原子。

4. 发明授权

US08722306B2 Radiation-sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US08722306B2
公开(公告)日：2014-05-13
申请号：US12602769
申请日：2008-05-26
申请人： Hirokazu Sakakibara , Makoto Shimizu , Takehiko Naruoka , Tomoki Nagai , Yoshifumi Oizumi
发明人： Hirokazu Sakakibara , Makoto Shimizu , Takehiko Naruoka , Tomoki Nagai , Yoshifumi Oizumi
IPC分类号： G03F7/004 , G03F7/028 , G03F7/039
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/30 , C08F2220/1808 , G03F7/0045 , G03F7/0392
摘要： A radiation-sensitive resin composition includes a resin (A1) that includes a repeating unit shown by the following formula (1-1) and a repeating unit shown by the following formula (1-2), and a radiation-sensitive acid generator (B). The radiation-sensitive resin composition exhibits excellent sensitivity, and can reduce a mask error factor (MEEF). wherein R1, R2, and R3 individually represent a linear or branched alkyl group having 1 to 4 carbon atoms, R4 represents a hydrogen atom, a linear or branched alkyl group having 2 to 4 carbon atoms, a linear or branched fluoroalkyl group having 1 to 4 carbon atoms, or a linear or branched alkoxy group having 1 to 4 carbon atoms, and q represents an integer from 0 to 3.
摘要翻译：辐射敏感性树脂组合物包括含有下述式（1-1）表示的重复单元和下述式（1-2）所示的重复单元的树脂（A1）和放射线敏感性酸发生剂 B）。辐射敏感性树脂组合物显示出优异的灵敏度，并且可以降低掩模误差因子（MEEF）。其中R1，R2和R3分别表示碳原子数为1〜4的直链或支链烷基，R4表示氢原子，碳原子数2〜4的直链或支链烷基，具有1〜 4个碳原子，或具有1〜4个碳原子的直链或支链烷氧基，q表示0〜3的整数。

5. 发明申请

US20100178608A1 RADIATION-SENSITIVE RESIN COMPOSITION 有权
标题翻译：辐射敏感性树脂组合物
公开(公告)号：US20100178608A1
公开(公告)日：2010-07-15
申请号：US12602769
申请日：2008-05-26
申请人： Hirokazu Sakakibara , Makoto Shimizu , Takehiko Naruoka , Tomoki Nagai , Yoshifumi Oizumi
发明人： Hirokazu Sakakibara , Makoto Shimizu , Takehiko Naruoka , Tomoki Nagai , Yoshifumi Oizumi
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , C08F220/18 , C08F220/30 , C08F2220/1808 , G03F7/0045 , G03F7/0392
摘要： A radiation-sensitive resin composition includes a resin (A1) that includes a repeating unit shown by the following formula (1-1) and a repeating unit shown by the following formula (1-2), and a radiation-sensitive acid generator (B). The radiation-sensitive resin composition exhibits excellent sensitivity, and can reduce a mask error factor (MEEF). wherein R1, R2, and R3 individually represent a linear or branched alkyl group having 1 to 4 carbon atoms, R4 represents a hydrogen atom, a linear or branched alkyl group having 2 to 4 carbon atoms, a linear or branched fluoroalkyl group having 1 to 4 carbon atoms, or a linear or branched alkoxy group having 1 to 4 carbon atoms, and q represents an integer from 0 to 3.
摘要翻译：辐射敏感性树脂组合物包括含有下述式（1-1）表示的重复单元和下述式（1-2）所示的重复单元的树脂（A1）和放射线敏感性酸发生剂 B）。辐射敏感性树脂组合物显示出优异的灵敏度，并且可以降低掩模误差因子（MEEF）。其中R1，R2和R3分别代表具有1-4个碳原子的直链或支链烷基，R4代表氢原子，具有2至4个碳原子的直链或支链烷基，具有1〜 4个碳原子，或具有1〜4个碳原子的直链或支链烷氧基，q表示0〜3的整数。

6. 发明申请

US20100255420A1 RADIATION SENSITIVE RESIN COMPOSITION AND POLYMER 审中-公开
标题翻译：辐射敏感性树脂组合物和聚合物
公开(公告)号：US20100255420A1
公开(公告)日：2010-10-07
申请号：US12740111
申请日：2008-10-21
申请人： Hirokazu Sakakibara , Makoto Shimizu , Takehiko Naruoka , Yoshifumi Ooizumi , Kentarou Harada , Takuma Ebata
发明人： Hirokazu Sakakibara , Makoto Shimizu , Takehiko Naruoka , Yoshifumi Ooizumi , Kentarou Harada , Takuma Ebata
IPC分类号： G03C1/00 , C08F118/02
CPC分类号： G03F7/0397 , C08F220/18 , C08L2312/06 , C09D133/14 , C09D133/16 , G03F7/0045 , G03F7/0046 , G03F7/2041 , C08F220/24 , C08F220/38
摘要： A radiation-sensitive resin composition includes a polymer, an acid-labile group-containing resin, a radiation-sensitive acid generator, and a solvent, the polymer including repeating units shown by following general formulas (1) and (2). wherein R1 and R2 represent a hydrogen atom, a methyl group, or a trifluoromethyl group, R3 represents a linear or branched alkyl group having 1 to 6 carbon atoms or an alicyclic hydrocarbon group having 4 to 20 carbon atoms in which at least one hydrogen atom is substituted with a fluorine atom, or a derivative thereof, and Z represents a group that includes a group that generates an acid upon exposure to light. The radiation-sensitive resin composition produces an excellent pattern shape, reduces the amount of elution into an immersion liquid upon contact during liquid immersion lithography, ensures that a high receding contact angle is formed by a resist film and an immersion liquid, and rarely causes development defects.
摘要翻译：辐射敏感性树脂组合物包括聚合物，含酸不稳定基团的树脂，辐射敏感性酸产生剂和溶剂，所述聚合物包括由以下通式（1）和（2）表示的重复单元。其中R 1和R 2表示氢原子，甲基或三氟甲基，R 3表示碳原子数1〜6的直链或支链烷基或碳原子数4〜20的脂环式烃基，其中至少一个氢原子被氟原子或其衍生物取代，Z表示包含在曝光时产生酸的基团的基团。放射线敏感性树脂组合物产生优异的图案形状，在液浸光刻期间减少接触时浸入液中的洗脱量，确保通过抗蚀剂膜和浸渍液形成高后退接触角，并且很少引起显影缺陷

7. 发明授权

US09150378B2 Sheet stack tray having sheet pressurizing member 有权
标题翻译：纸张堆叠托盘，具有片材加压构件
公开(公告)号：US09150378B2
公开(公告)日：2015-10-06
申请号：US14012437
申请日：2013-08-28
申请人： Kazuhito Shimura , Seiji Ono , Makoto Shimizu , Akira Sugiyama
发明人： Kazuhito Shimura , Seiji Ono , Makoto Shimizu , Akira Sugiyama
IPC分类号： B65H37/04 , B65H39/00 , B65H7/20 , B65H29/52 , B65H31/10 , B65H31/14 , B65H31/18 , B65H31/30 , B65H31/34 , B65H39/10 , B65H85/00
CPC分类号： B65H39/00 , B65H7/20 , B65H29/52 , B65H31/10 , B65H31/14 , B65H31/18 , B65H31/3027 , B65H31/34 , B65H39/10 , B65H85/00 , B65H2301/42192 , B65H2403/51 , B65H2404/1441 , B65H2404/61 , B65H2404/63 , B65H2404/691 , B65H2404/693 , B65H2511/152 , B65H2511/212 , B65H2511/222 , B65H2511/415 , B65H2511/514 , B65H2553/612 , B65H2553/83 , B65H2601/26 , B65H2601/321 , B65H2701/1313 , B65H2701/18292 , B65H2801/27 , B65H2701/139 , B65H2220/03 , B65H2220/01 , B65H2220/02 , B65H2220/11
摘要： In an apparatus structure having a sheet discharge mode to store sheets at a stack tray from a sheet discharging path and a sheet discharge mode to store binding-processed sheet bundles with collating and stacking, sheet holding means is arranged above a sheet placement face of the stack tray as a sheet pressurization force being variable in two steps, and then, the pressurization force of the sheet holding means is adjusted in two steps in accordance with the sheet discharge mode for storing sheets at the stack tray.
摘要翻译：在具有片材排出模式的装置结构中，片材排出方式是将纸张从片材排出路径存储在堆叠托盘上，并且将纸张排出模式存储在装订处理的纸张束中以进行整理和堆叠，片材保持装置布置在堆叠托盘作为纸张加压力可分两个步骤，然后，根据用于在堆叠托盘处存放纸张的纸张排出模式，片材保持装置的加压力分两步调节。

8. 发明授权

US08422396B2 Rate monitoring apparatus 有权
标题翻译：速率监控装置
公开(公告)号：US08422396B2
公开(公告)日：2013-04-16
申请号：US12561512
申请日：2009-09-17
申请人： Makoto Shimizu
发明人： Makoto Shimizu
IPC分类号： H04L12/26
CPC分类号： H04L47/215 , H04L43/0894 , H04L47/10 , H04L47/20 , H04L47/22 , H04L47/2483
摘要： A rate monitoring apparatus using a token bucket algorithm for controlling a packet flow, the apparatus includes a packet information storage unit having two storage media for storing packet information extracted from a packet data, a token identifying information storage unit having two storage media for storing identification information used for supplying a created token, and an operation unit for performing a policing operation by using a packet length, an allowable burst size, a token supply capacity and a currently transmittable data capacity, based on an identifying information included in the packet information and a comparison result between identification information included in the packet information and the identification information used for supplying the created token, these compared identification information being read out from the other storage medium different from the storage medium under writing in the packet information storage unit and the token identifying information storage unit.
摘要翻译：一种使用令牌桶算法来控制分组流的速率监视装置，该装置包括具有两个用于存储从分组数据提取的分组信息的存储介质的分组信息存储单元，具有用于存储标识的两个存储介质的令牌识别信息存储单元用于提供创建的令牌的信息;以及操作单元，用于基于分组信息中包括的识别信息，通过使用分组长度，可允许的突发大小，令牌供应容量和当前可发送的数据容量来执行管理操作，以及包含在分组信息中的识别信息与用于提供所创建的令牌的识别信息之间的比较结果，这些比较的识别信息是从与分组信息存储单元中写入的存储介质不同的其他存储介质读出的，并且令牌识别通知存储单元。

9. 发明授权

US07953309B2 Optical fiber and production method thereof 有权
标题翻译：光纤及其制造方法
公开(公告)号：US07953309B2
公开(公告)日：2011-05-31
申请号：US12261815
申请日：2008-10-30
申请人： Atsushi Mori , Masao Kato , Kouji Enbutsu , Shinichi Aozasa , Kiyoshi Oikawa , Takashi Kurihara , Kazuo Fujiura , Makoto Shimizu , Kouji Shikano
发明人： Atsushi Mori , Masao Kato , Kouji Enbutsu , Shinichi Aozasa , Kiyoshi Oikawa , Takashi Kurihara , Kazuo Fujiura , Makoto Shimizu , Kouji Shikano
IPC分类号： G02B6/032 , H04J14/02 , C03B37/022
CPC分类号： C03B37/01211 , C03B37/0122 , C03B37/01268 , C03B37/02781 , C03B2201/30 , C03B2201/60 , C03B2201/86 , C03B2203/10 , C03B2203/12 , C03B2203/14 , C03B2203/16 , C03B2203/22 , C03B2203/42 , C03B2205/10 , C03C13/048 , G02B6/02028 , G02B6/02214 , G02B6/02252 , G02B6/02266 , G02B6/02276 , G02B6/02333 , G02B6/02338 , G02B6/02347 , G02B6/02361 , G02B6/02366 , G02B6/02371 , G02B6/03627 , G02B6/03633 , G02B6/03644
摘要： An optical fiber, which has a zero-material dispersion wavelength equal to or greater than 2 μm, and a high nonlinear susceptibility χ3 equal to or greater than 1×10−12 esu, and uses tellurite glass having sufficient thermal stability for processing into a low loss fiber, employs a PCF structure or HF structure having strong confinement into a core region. This enables light to propagate at a low loss. The size and geometry of air holes formed in the core region, and the spacing between adjacent air holes make it possible to control the zero dispersion wavelength within an optical telecommunication window (1.2-1.7 μm), and to achieve large nonlinearity with a nonlinear coefficient γ equal to or greater than 500 W−1 km−1.
摘要翻译：具有等于或大于2μm的零材料色散波长和等于或大于1×10-12埃的高非线性磁化率χ3的光纤，并且使用具有足够热稳定性的碲化物玻璃加工成低损耗光纤采用具有较强限制的核心区域的PCF结构或HF结构。这使得光以低损耗传播。在核心区域形成的空气孔的尺寸和几何形状以及相邻气孔之间的间隔使得可以控制光通信窗口（1.2-1.7μm）内的零色散波长，并且通过非线性系数获得大的非线性 γ等于或大于500W-1km-1。

10. 发明申请

US20100063232A1 POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN 有权
标题翻译：可聚合磺酸钠盐和树脂
公开(公告)号：US20100063232A1
公开(公告)日：2010-03-11
申请号：US12514168
申请日：2007-11-09
申请人： Tomoki Nagai , Takuma Ebata , Makoto Shimizu , Jonathan Joachim Jodry , Satoru Narizuka , Masaki Fujiwara
发明人： Tomoki Nagai , Takuma Ebata , Makoto Shimizu , Jonathan Joachim Jodry , Satoru Narizuka , Masaki Fujiwara
IPC分类号： C08F28/02 , C07C69/533
CPC分类号： C07C309/12 , C07C381/12 , C08F20/38 , G03F7/0045 , G03F7/0046 , G03F7/0392
摘要： A resin that includes a repeating unit shown by the following formula (10) has an excellent performance as a radiation sensitive acid generator, and exhibits only a small adverse effect on the environment and a human body. wherein R1 represents a hydrogen atom or the like, M+ represents a specific cation, and n is an integer from 1 to 5.
摘要翻译：包含下式（10）所示的重复单元的树脂作为辐射敏感性酸发生剂具有优异的性能，并且对环境和人体仅表现出小的不利影响。其中R1表示氢原子等，M +表示特定阳离子，n为1至5的整数。

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