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1. 发明授权

US4687930A Ion beam apparatus 失效
标题翻译：离子束装置
公开(公告)号：US4687930A
公开(公告)日：1987-08-18
申请号：US736123
申请日：1985-05-20
申请人： Hifumi Tamura , Shigehiko Yamamoto , Hiroyasu Shichi , Toru Ishitani
发明人： Hifumi Tamura , Shigehiko Yamamoto , Hiroyasu Shichi , Toru Ishitani
IPC分类号： H01J37/08 , G01Q30/10 , G01Q30/12 , H01J37/02 , H01J37/20 , H01J37/252 , H01J37/30 , H01J49/14 , G01N23/00
CPC分类号： H01J37/3002 , H01J37/02 , H01J49/142
摘要： The surface of a specimen such as a semiconductor wafer is processed and analyzed by the irradiator of the surface with an ion beam. The zone of the specimen to be processed and analyzed is kept by heating at a temperature higher than the melting point of an element or compound forming the ion species used for the irradiation. The means used for this heating may be an electron beam source, a light source, a resistance heating source, or a high-frequency heating source.
摘要翻译：通过离子束的表面的照射器对诸如半导体晶片的样品的表面进行处理和分析。通过在高于形成用于照射的离子种的元素或化合物的熔点的温度下加热来保持待处理和分析的样品的区域。用于该加热的装置可以是电子束源，光源，电阻加热源或高频加热源。

2. 发明授权

US4841143A Charged particle beam apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US4841143A
公开(公告)日：1989-06-20
申请号：US160408
申请日：1988-02-25
申请人： Hifumi Tamura , Hiroyasu Shichi , Kaoru Umemura
发明人： Hifumi Tamura , Hiroyasu Shichi , Kaoru Umemura
IPC分类号： G01N23/225 , G01Q70/10 , H01J37/22 , H01J37/252 , H01J37/256
CPC分类号： H01J37/256 , H01J37/244 , H01J2237/2449 , H01J2237/2527
摘要： A charged particle beam apparatus is disclosed, which comprises a charged particle source; focusing means for focusing a charged particle beam emitted by the charged particle source on a sample and irradiating it therewith; deflecting means for deflecting the charged particle beam so as to scan the sample therewith; secondary ion separating means disposed approximately symmetrically with respect to the axis of the charged particle beam at the proximity of said sample and separating positive and negative secondary ions generated by the irradiation of the sample into positive and negative ions; and mass analyzers for analyzing the mass of the separated positive and negative secondary ions, respectively.
摘要翻译：公开了一种带电粒子束装置，其包括带电粒子源; 用于将由带电粒子源发射的带电粒子束聚焦在样品上并将其照射的聚焦装置; 用于使带电粒子束偏转以便用其扫描样品的偏转装置; 二次离子分离装置相对于所述样品附近的带电粒子束的轴线近似对称设置，并且将由样品照射产生的正和负二次离子分离成正离子和负离子; 以及用于分析分离的正负二次离子的质量的质量分析器。

3. 发明授权

US4687938A Ion source 失效
标题翻译：离子源
公开(公告)号：US4687938A
公开(公告)日：1987-08-18
申请号：US808027
申请日：1985-12-12
申请人： Hifumi Tamura , Hiroyasu Shichi
发明人： Hifumi Tamura , Hiroyasu Shichi
IPC分类号： H01J27/26 , H01J37/08 , H01J37/26 , H01J27/00
CPC分类号： H01J27/26 , H01J37/08
摘要： An ion source includes an ion source material holder adapted to load an ion source material thereon and having an aperture at the bottom thereof, an ion emitter mounted on the ion source material holder at the aperture, heating means for heating the ion source material holder and the ion emitter, and an ion extracting electrode for extracting an ion beam from the ion emitter. The ion emitter is made of a mixture of a material having a large work function and a material having a small work function, in order to be able to emit both positive ions and negative ions from the ion emitter. The polarity of a voltage applied between the ion emitter and the ion extracting electrode is changed so that one of the positive ion beam and the negative ion beam can be selectively extracted from the ion emitter.
摘要翻译：离子源包括离子源材料保持器，其适于在其上装载离子源材料并且在其底部具有孔，安装在孔处的离子源材料保持器上的离子发射器，用于加热离子源材料保持器的加热装置和离子发射体和用于从离子发射器提取离子束的离子提取电极。离子发射器由具有大功函数的材料和具有小功函数的材料的混合物制成，以便能够从离子发射器发射正离子和负离子。改变施加在离子发射体和离子提取电极之间的电压的极性，使得能够从离子发射体中选择性地提取正离子束和负离子束中的一个。

4. 发明授权

US4774433A Apparatus for generating metal ions 失效
标题翻译：用于产生金属离子的装置
公开(公告)号：US4774433A
公开(公告)日：1988-09-27
申请号：US36488
申请日：1987-04-09
申请人： Yoshinori Ikebe , Hifumi Tamura , Hiroyasu Shichi , Eiichi Izumi
发明人： Yoshinori Ikebe , Hifumi Tamura , Hiroyasu Shichi , Eiichi Izumi
IPC分类号： H01J27/26 , H01J37/08 , H01J27/00
CPC分类号： H01J27/26
摘要： A mixture of an alkali metal compound and its reducing agent is heated by a heating means, whereby alkali metal vapors are generated and stored in a vapor reserver. The thus stored vapors permeate through a porous member heated by another heating means and are ionized. The thus formed ions are withdrawn by an ion withdrawal means.
摘要翻译：碱金属化合物及其还原剂的混合物通过加热装置加热，从而产生碱金属蒸汽并储存在蒸气储存器中。这样储存的蒸气渗透通过另一个加热装置加热的多孔构件并被电离。这样形成的离子被离子提取装置取出。

5. 发明授权

US08779380B2 Ion beam device 有权
标题翻译：离子束装置
公开(公告)号：US08779380B2
公开(公告)日：2014-07-15
申请号：US12995700
申请日：2009-03-30
申请人： Hiroyasu Shichi , Shinichi Matsubara , Norihide Saho , Masahiro Yamaoka , Noriaki Arai
发明人： Hiroyasu Shichi , Shinichi Matsubara , Norihide Saho , Masahiro Yamaoka , Noriaki Arai
IPC分类号： H01J27/00
CPC分类号： H01J27/26 , H01J27/022 , H01J37/023 , H01J37/067 , H01J37/08 , H01J37/26 , H01J37/28 , H01J2237/002 , H01J2237/006 , H01J2237/061 , H01J2237/0807 , H01J2237/2803
摘要： An ion beam device according to the present invention includes a gas field ion source (1) including an emitter tip (21) supported by an emitter base mount (64), a ionization chamber (15) including an extraction electrode (24) and being configured to surround the emitter tip (21), and a gas supply tube (25). A center axis line of the extraction electrode (24) overlaps or is parallel to a center axis line (14A) of the ion irradiation light system, and a center axis line (66) passing the emitter tip (21) and the emitter base mount (64) is inclinable with respect to a center axis line of the ionization chamber (15). Accordingly, an ion beam device including a gas field ion source capable of adjusting the direction of the emitter tip is provided.
摘要翻译：根据本发明的离子束装置包括气体离子源（1），其包括由发射极基座（64）支撑的发射极尖端（21），包括引出电极（24）的电离室（15）构造成围绕发射器尖端（21），以及气体供应管（25）。引出电极（24）的中心轴线与离子照射光系统的中心轴线（14A）重叠或平行，通过发射极尖端（21）和发射极基座（64）相对于所述电离室（15）的中心轴线是可倾斜的。因此，提供了包括能够调节发射极尖端的方向的气体场离子源的离子束装置。

6. 发明授权

US08481980B2 Ion source, ion beam processing/observation apparatus, charged particle beam apparatus, and method for observing cross section of sample 有权
标题翻译：离子源，离子束处理/观察装置，带电粒子束装置和观察样品截面的方法
公开(公告)号：US08481980B2
公开(公告)日：2013-07-09
申请号：US12108037
申请日：2008-04-23
申请人： Hiroyasu Shichi , Satoshi Tomimatsu , Kaoru Umemura , Noriyuki Kaneoka , Koji Ishiguro
发明人： Hiroyasu Shichi , Satoshi Tomimatsu , Kaoru Umemura , Noriyuki Kaneoka , Koji Ishiguro
IPC分类号： G21K5/10
CPC分类号： C23C14/3442 , H01J27/10 , H01J37/08 , H01J37/28 , H01J37/3023 , H01J37/3056 , H01J2237/006 , H01J2237/057 , H01J2237/0807 , H01J2237/0825 , H01J2237/0827 , H01J2237/31745 , H01J2237/31749
摘要： An ion beam machining and observation method relevant to a technique of cross sectional observation of an electronic component, through which a sample is machined by using an ion beam and a charged particle beam processor capable of reducing the time it takes to fill up a processed hole with a high degree of flatness at the filled area. The observation device is capable of switching the kind of gas ion beam used for machining a sample with the kind of a gas ion beam used for observing the sample. To implement the switch between the kind of a gas ion beam used for sample machining and the kind of a gas ion beam used for sample observation, at least two gas introduction systems are used, each system having a gas cylinder a gas tube, a gas volume control valve, and a stop valve.
摘要翻译：一种与电子部件的横截面观察技术有关的离子束加工和观察方法，通过使用离子束加工样品的电子部件和能够减少填充加工孔的时间的带电粒子束处理器在填充区域具有高度的平整度。观察装置能够切换用于用于观察样品的气体离子束的种类来加工样品的气体离子束的种类。为了实现用于样品加工的气体离子束的种类和用于样品观察的气体离子束的种类之间的切换，使用至少两个气体导入系统，每个系统具有气瓶，气体管，气体音量控制阀和截止阀。

7. 发明授权

US08455841B2 Ion microscope 有权
标题翻译：离子显微镜
公开(公告)号：US08455841B2
公开(公告)日：2013-06-04
申请号：US13381623
申请日：2010-06-04
申请人： Norihide Saho , Hiroyuki Tanaka , Noriaki Arai , Hiroyasu Shichi , Yoichi Ose
发明人： Norihide Saho , Hiroyuki Tanaka , Noriaki Arai , Hiroyasu Shichi , Yoichi Ose
IPC分类号： H01J37/26
CPC分类号： H01J37/08 , H01J37/28 , H01J2237/002 , H01J2237/0216 , H01J2237/061 , H01J2237/0807
摘要： Provided are a large-current and highly stable gas field ionization ion source, and a high-resolution ion microscope with a large focal depth. The present invention relates to an ion microscope provided with a gas field ionization ion source, in which disposed are a refrigerator for cooling the gas field ionization ion source independent of the main body of the ion microscope, and a refrigerant circulation circuit cooling mechanism for circulating a refrigerant between the gas field ionization ion source and the refrigerator. Consequently it is possible to reduce the mechanical vibration of the refrigerator, which propagates to the gas field ionization ion source, and to achieve both the improvement of the brightness of the ion source and the improvement of ion beam focusing performance.
摘要翻译：提供大电流和高度稳定的气田电离离子源，以及具有大焦深的高分辨率离子显微镜。本发明涉及一种具有气田电离离子源的离子显微镜，其中设置有用于冷却与离子显微镜主体无关的气田电离离子源的制冷机，以及用于循环的制冷剂循环回路冷却机构气体离子源和冰箱之间的制冷剂。因此，可以减小传播到气田电离离子源的冰箱的机械振动，并且实现离子源的亮度的提高和离子束聚焦性能的提高。

8. 发明授权

US07897936B2 Method and apparatus for specimen fabrication 有权
标题翻译：用于样品制造的方法和装置
公开(公告)号：US07897936B2
公开(公告)日：2011-03-01
申请号：US11822386
申请日：2007-07-05
申请人： Hiroyasu Shichi , Tohru Ishitani , Hidemi Koike , Kaoru Umemura , Eiichi Seya , Mitsuo Tokuda , Satoshi Tomimatsu , Hideo Kashima , Muneyuki Fukuda
发明人： Hiroyasu Shichi , Tohru Ishitani , Hidemi Koike , Kaoru Umemura , Eiichi Seya , Mitsuo Tokuda , Satoshi Tomimatsu , Hideo Kashima , Muneyuki Fukuda
IPC分类号： G21K1/00
CPC分类号： G01N23/20 , B23K15/0006 , B23K15/0013 , G01N1/286 , H01J2237/3114 , H01J2237/31745
摘要： A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.
摘要翻译：相对于样品表面以小于90度的入射角照射具有聚焦离子束的样品的样品制造方法，消除作为目标的微量样品的周边区域，将样品台围绕线段垂直于样品表面作为转动轴线，同时在样品表面上的入射角被固定的同时用聚焦离子束照射样品，并分离微量样品或制备待分离的微量样品。一种样品制造装置，用于通过扫描和偏转离子束来形成保持在样品台上的样品中的样品部分，其中离子束的光轴与样品台的表面之间的角度被固定并形成样品通过转动样品台来控制切片。

9. 发明授权

US07888639B2 Method and apparatus for processing a micro sample 有权
标题翻译：用于处理微量样品的方法和设备
公开(公告)号：US07888639B2
公开(公告)日：2011-02-15
申请号：US11980654
申请日：2007-10-31
申请人： Mitsuo Tokuda , Muneyuki Fukuda , Yasuhiro Mitsui , Hidemi Koike , Satoshi Tomimatsu , Hiroyasu Shichi , Hideo Kashima , Kaoru Umemura
发明人： Mitsuo Tokuda , Muneyuki Fukuda , Yasuhiro Mitsui , Hidemi Koike , Satoshi Tomimatsu , Hiroyasu Shichi , Hideo Kashima , Kaoru Umemura
IPC分类号： G01N23/00
CPC分类号： H04L29/06 , G01N23/225 , H01J37/256 , H01J37/3056 , H01J2237/20 , H01J2237/202 , H01J2237/31745 , H04L67/16 , H04L69/329
摘要： An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.
摘要翻译：本发明的目的是实现一种用于处理和观察微分样品的方法和装置，其能够以高分辨率，高精度和高产量在水平和垂直方向观察晶片的截面而不分裂任何作为样品的晶片。在本发明的装置中，在一个真空容器中包括聚焦离子束光学系统和电子光学系统，并且通过用带电粒子束的成形处理分离包含样品的所需区域的微小样品，并且在那里被包括用于提取分离的微小样本的操纵器和用于独立于晶片样品台驱动操纵器的操纵器控制器。

10. 发明授权

US07700931B2 Ion beam processing apparatus 有权
标题翻译：离子束处理装置
公开(公告)号：US07700931B2
公开(公告)日：2010-04-20
申请号：US11674262
申请日：2007-02-13
申请人： Hiroyasu Shichi , Satoshi Tomimatsu , Noriyuki Kaneoka , Kaoru Umemura , Koji Ishiguro
发明人： Hiroyasu Shichi , Satoshi Tomimatsu , Noriyuki Kaneoka , Kaoru Umemura , Koji Ishiguro
IPC分类号： G21K5/10 , H01J37/08 , A61N5/00 , G21G5/00 , G21K7/00 , G01N23/00
CPC分类号： H01J37/261 , H01J37/20 , H01J37/3045 , H01J2237/08 , H01J2237/20207 , H01J2237/24528 , H01J2237/28 , H01J2237/31713 , H01J2237/3174 , H01J2237/31749
摘要： The present invention provides an ion beam processing technology for improving the precision in processing a section of a sample using an ion beam without making a processing time longer than a conventionally required processing time, and for shortening the time required for separating a micro test piece without breaking the sample or the time required for making preparations for the separation. An ion beam processing apparatus is structured so that an axis along which an ion beam is drawn out of an ion source and an ion beam irradiation axis along which the ion beam is irradiated to a sample mounted on a first sample stage will meet at an angle. Furthermore, the ion beam processing apparatus has a tilting ability to vary an angle of irradiation, at which the ion beam is irradiated to the sample, by rotating a second sample stage, on which a test piece extracted from the sample by performing ion beam processing is mounted, about the tilting axis of the second sample stage. The ion beam processing apparatus is structured so that a segment drawn by projecting the axis, along which the ion beam is drawn out of the ion source, on a plane perpendicular to the ion beam irradiation axis can be at least substantially parallel to a segment drawn by projecting the tilting axis of the second sample stage on the plane perpendicular to the ion beam irradiation axis.
摘要翻译：本发明提供了一种离子束处理技术，用于提高使用离子束处理样品的一部分的精度，而不需要比常规所需的处理时间长的处理时间，并且缩短了分离微测试件所需的时间，而没有打破样品或准备分离所需的时间。离子束处理装置被构造成使得离子束从离子源拉出的轴和离子束照射到安装在第一样品台上的样品的离子束照射轴将以一定角度相遇。此外，离子束处理装置具有通过旋转第二样品台而使离子束照射到样品上的照射角度的倾斜能力，通过进行离子束处理从样品中提取试验片围绕第二样品台的倾斜轴安装。离子束处理装置被构造成使得通过将离子束从离子源拉出的轴在垂直于离子束照射轴线的平面上突出的拉伸而绘制的区段可以至少基本上平行于拉伸的区段通过将第二样品台的倾斜轴投影在垂直于离子束照射轴的平面上。

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