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    • 3. 发明授权
    • Imprint apparatus having attitude control
    • 压印装置具有姿态控制
    • US07985061B2
    • 2011-07-26
    • US12726375
    • 2010-03-18
    • Nobuhito SuehiraJunichi SekiShingo Okushima
    • Nobuhito SuehiraJunichi SekiShingo Okushima
    • B29C43/02
    • B29C43/021B29C33/424B29C43/003B29C43/04B29C43/14B29C2043/025B29C2043/142B29C2043/3634B82Y10/00B82Y40/00G03F7/0002
    • An imprint apparatus in which a mold having a processing surface on which a predetermined imprint is formed is provided and an uncured resin material placed on a substrate is filled and cured in a space between the mold and the substrate and is subjected to imprint of the predetermined imprint formed on the processing surface of the mold. The imprint apparatus includes an attitude control mechanism for controlling attitudes of the mold and the substrate so that a first gap between a first end of the mold and the substrate and a second gap between a second end of the mold and the substrate are different from each other, and a measuring mechanism for measuring attitudes and positions of the mold and the substrate. Also provided is a mechanism for imparting a relative movement between the substrate and the mold so that the resin material approaches the first end of the mold and enters through the first gap and fills at least a part of the space between the mold and the substrate.
    • 一种压印装置,其中具有形成有预定印记的处理表面的模具,并且将放置在基板上的未固化树脂材料填充并固化在模具和基板之间的空间中,并且经受预定的 形成在模具的加工表面上的印痕。 压印装置包括用于控制模具和基板的态度的姿态控制机构,使得模具的第一端和基板之间的第一间隙和模具的第二端与基板之间的第二间隙各自不同 以及用于测量模具和基板的姿态和位置的测量机构。 还提供了一种用于在基材和模具之间进行相对运动的机构,使得树脂材料接近模具的第一端并通过第一间隙进入并填充模具和基材之间的空间的至少一部分。
    • 4. 发明申请
    • NANOIMPRINTING METHOD AND MOLD FOR USE IN NANOIMPRINTING
    • 用于纳米压印的纳米压印方法和模具
    • US20090273124A1
    • 2009-11-05
    • US12405847
    • 2009-03-17
    • Motoki OkinakaJunichi SekiAtsunori TerasakiShingo Okushima
    • Motoki OkinakaJunichi SekiAtsunori TerasakiShingo Okushima
    • B29C35/08B29C59/02
    • G03F7/0002B82Y10/00B82Y40/00
    • A nanoimprinting method includes: forming at a region for performing a first nanoimprinting process on a substrate, a first patterning region with a first affinity to resin; forming at a region for performing a second nanoimprinting process on the substrate, a second patterning region with a second affinity to resin, the second affinity being lower than the first affinity; applying the resin to the first patterning region and transferring a pattern of a mold to the resin by the first nanoimprinting process; and modifying the second patterning region to a region with affinity to resin that is higher than the second affinity, then applying the resin to the modified region, and performing the second nanoimprinting process to process the second patterning region thereby connecting patterns formed at the first patterning region and the second patterning region to each other.
    • 纳米压印方法包括:在用于在衬底上进行第一纳米压印过程的区域上形成第一图案化区域,其对树脂具有第一亲和力; 在用于在所述基板上进行第二纳米压印处理的区域上形成第二图案化区域,所述第二图案形成区域对树脂具有第二亲和力,所述第二亲和力低于所述第一亲和力; 将所述树脂施加到所述第一图案形成区域并通过所述第一纳米压印工艺将模具的图案转移到所述树脂; 并且将所述第二图案形成区域修饰为与所述第二亲和力高于树脂的区域,然后将所述树脂施加到所述改性区域,并进行所述第二纳米压印处理以处理所述第二图案化区域,从而将形成在所述第一图案形成 区域和第二图案形成区域彼此。
    • 7. 发明授权
    • Nanoimprinting method and mold for use in nanoimprinting
    • 用于纳米压印的纳米印刷方法和模具
    • US08178026B2
    • 2012-05-15
    • US12405847
    • 2009-03-17
    • Motoki OkinakaJunichi SekiAtsunori TerasakiShingo Okushima
    • Motoki OkinakaJunichi SekiAtsunori TerasakiShingo Okushima
    • B29C35/08B29C59/02
    • G03F7/0002B82Y10/00B82Y40/00
    • A nanoimprinting method includes: forming at a region for performing a first nanoimprinting process on a substrate, a first patterning region with a first affinity to resin; forming at a region for performing a second nanoimprinting process on the substrate, a second patterning region with a second affinity to resin, the second affinity being lower than the first affinity; applying the resin to the first patterning region and transferring a pattern of a mold to the resin by the first nanoimprinting process; and modifying the second patterning region to a region with affinity to resin that is higher than the second affinity, then applying the resin to the modified region, and performing the second nanoimprinting process to process the second patterning region thereby connecting patterns formed at the first patterning region and the second patterning region to each other.
    • 纳米压印方法包括:在用于在衬底上进行第一纳米压印过程的区域上形成第一图案化区域,其对树脂具有第一亲和力; 在用于在所述基板上进行第二纳米压印处理的区域上形成第二图案化区域,所述第二图案形成区域对树脂具有第二亲和力,所述第二亲和力低于所述第一亲和力; 将所述树脂施加到所述第一图案形成区域并通过所述第一纳米压印工艺将模具的图案转移到所述树脂; 并且将所述第二图案形成区域修饰为与所述第二亲和力高于树脂的区域,然后将所述树脂施加到所述改性区域,并进行所述第二纳米压印处理以处理所述第二图案化区域,从而将形成在所述第一图案形成 区域和第二图案形成区域彼此。