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1. 发明申请

US20120287426A1 PATTERN INSPECTION METHOD AND DEVICE FOR SAME 审中-公开
标题翻译：模式检验方法及其设备
公开(公告)号：US20120287426A1
公开(公告)日：2012-11-15
申请号：US13520217
申请日：2011-01-27
申请人： Hideaki Sasazawa , Takenori Hirose , Shigeru Serikawa , Kiyotaka Horie
发明人： Hideaki Sasazawa , Takenori Hirose , Shigeru Serikawa , Kiyotaka Horie
IPC分类号： G01N21/89 , G01J3/42
CPC分类号： G11B5/855 , G01B11/0641 , G01N21/95607
摘要： In an optical inspection for patterned media for hard disks, a pattern inspection device is provided for inspecting patterns without being susceptible to variations in film thickness and film quality of an underlying film, the device includes optical characteristics detection means for detecting optical characteristics of multilayers by processing, upon the reflected light being dispersed and detected by the spectroscopic detection means, the reflected light from a non-patterned region on the substrate, and processing a detection signal corresponding to, and detecting optical characteristics of, the reflected light from the patterns including the multilayers; and pattern inspection means for inspecting the patterns formed on the multilayers, by viewing, upon the detection of the optical characteristics by the optical characteristics detection means, information on the optical characteristics of the reflected light from the multilayers, and processing information on the optical characteristics of the reflected light from the patterns including the multilayers.
摘要翻译：在用于硬盘的图案化介质的光学检查中，提供了用于检查图案的图案检查装置，而不会影响底层膜的膜厚度和膜质量的变化，该装置包括用于通过以下方式检测多层膜的光学特性的光学特性检测装置在由所述分光检测装置分散和检测的反射光中，对来自所述基板上的非图案化区域的反射光进行处理，并处理与来自所述图案的反射光相对应的检测信号和检测来自所述图案的反射光的检测信号，所述反射光包括多层以及用于检查形成在多层上的图案的图案检查装置，通过在通过光学特性检测装置检测到光学特性时观察，查看来自多层的反射光的光学特性的信息，以及关于光学特性的处理信息来自包括多层的图案的反射光。

2. 发明授权

US08547545B2 Method and apparatus for inspecting a surface of a substrate 失效
标题翻译：用于检查基板表面的方法和装置
公开(公告)号：US08547545B2
公开(公告)日：2013-10-01
申请号：US13210418
申请日：2011-08-16
申请人： Hideaki Sasazawa , Takayuki Ishiguro , Kiyotaka Horie , Yu Yanaka
发明人： Hideaki Sasazawa , Takayuki Ishiguro , Kiyotaka Horie , Yu Yanaka
IPC分类号： G01N21/88 , G01N21/55 , G01N21/47
CPC分类号： G01N21/8851 , G01N21/95 , G01N2021/4711 , G01N2021/556 , G01N2021/8854 , G01N2021/8874
摘要： The present invention provides a method and apparatus for inspecting a surface of a substrate. The apparatus includes: a rotatable stage on which a substrate to be inspected is placed; an inspection optical system having an illumination light source for emitting light to a substrate placed on the stage and a detector for detecting light from the substrate which is irradiated with the light from the illumination light source; an A/D converter for amplifying and A/D converting signals output from the detector in the inspection optical system; and a defect detector for detecting defects in a surface of the substrate by processing signals output from the detector and converted by the A/D converter and classifying the defected defects. The defect detector extracts micro defects in the surface of the substrate by processing the signals output from the detector, and detects linear defects existing discretely in a linear region.
摘要翻译：本发明提供一种用于检查基板表面的方法和装置。该装置包括：可旋转台，放置待检查的基板; 具有用于向放置在载物台上的基板发光的照明光源的检查光学系统和用于检测来自基板的光的检测器，所述检测光照射来自照明光源的光; A / D转换器，用于放大和A / D转换检测光学系统中的检测器输出的信号; 以及缺陷检测器，用于通过处理从检测器输出并由A / D转换器转换并对缺陷缺陷进行分类的信号来检测基板的表面中的缺陷。缺陷检测器通过处理从检测器输出的信号来提取衬底表面的微缺陷，并检测线性区域中离散存在的线性缺陷。

3. 发明申请

US20120320367A1 INSPECTION METHOD AND DEVICE FOR SAME 审中-公开
标题翻译：检测方法和装置
公开(公告)号：US20120320367A1
公开(公告)日：2012-12-20
申请号：US13577287
申请日：2011-02-01
申请人： Yu Yanaka , Shigeru Serikawa , Kiyotaka Horie , Ryuta Suzuki
发明人： Yu Yanaka , Shigeru Serikawa , Kiyotaka Horie , Ryuta Suzuki
IPC分类号： G01J3/42
CPC分类号： G11B5/84 , G01N21/956 , G11B5/855
摘要： In order to rapidly inspect shape defects in the object of inspection that is the minute pattern on a magnetic recording medium formed from patterned media, in the disclosed patterned media defect inspection method detected spectral waveform data is compared with reference-standard spectral reflectance waveform data, which is stored in a database and the pattern-shape of which is known, and defects are detected. The type of the defects is determined on the basis of the disparity, for each detected wavelength, between the spectral waveform data of the detected defects, and the reference-standard spectral reflectance waveform data.
摘要翻译：为了快速检查在由图案化介质形成的磁记录介质上的微小图案的检查对象中的形状缺陷，将所公开的图案化介质缺陷检查方法检测的光谱波形数据与参考标准光谱反射率波形数据进行比较，其被存储在数据库中，其图案形状是已知的，并且检测到缺陷。基于检测到的缺陷的光谱波形数据与参考标准光谱反射率波形数据之间的每个检测波长的差异来确定缺陷的类型。

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