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1. 发明申请

US20120287426A1 PATTERN INSPECTION METHOD AND DEVICE FOR SAME 审中-公开
标题翻译：模式检验方法及其设备
公开(公告)号：US20120287426A1
公开(公告)日：2012-11-15
申请号：US13520217
申请日：2011-01-27
申请人： Hideaki Sasazawa , Takenori Hirose , Shigeru Serikawa , Kiyotaka Horie
发明人： Hideaki Sasazawa , Takenori Hirose , Shigeru Serikawa , Kiyotaka Horie
IPC分类号： G01N21/89 , G01J3/42
CPC分类号： G11B5/855 , G01B11/0641 , G01N21/95607
摘要： In an optical inspection for patterned media for hard disks, a pattern inspection device is provided for inspecting patterns without being susceptible to variations in film thickness and film quality of an underlying film, the device includes optical characteristics detection means for detecting optical characteristics of multilayers by processing, upon the reflected light being dispersed and detected by the spectroscopic detection means, the reflected light from a non-patterned region on the substrate, and processing a detection signal corresponding to, and detecting optical characteristics of, the reflected light from the patterns including the multilayers; and pattern inspection means for inspecting the patterns formed on the multilayers, by viewing, upon the detection of the optical characteristics by the optical characteristics detection means, information on the optical characteristics of the reflected light from the multilayers, and processing information on the optical characteristics of the reflected light from the patterns including the multilayers.
摘要翻译：在用于硬盘的图案化介质的光学检查中，提供了用于检查图案的图案检查装置，而不会影响底层膜的膜厚度和膜质量的变化，该装置包括用于通过以下方式检测多层膜的光学特性的光学特性检测装置在由所述分光检测装置分散和检测的反射光中，对来自所述基板上的非图案化区域的反射光进行处理，并处理与来自所述图案的反射光相对应的检测信号和检测来自所述图案的反射光的检测信号，所述反射光包括多层以及用于检查形成在多层上的图案的图案检查装置，通过在通过光学特性检测装置检测到光学特性时观察，查看来自多层的反射光的光学特性的信息，以及关于光学特性的处理信息来自包括多层的图案的反射光。

2. 发明授权

US07969567B2 Method and device for detecting shape of surface of medium 有权
标题翻译：用于检测介质表面形状的方法和装置
公开(公告)号：US07969567B2
公开(公告)日：2011-06-28
申请号：US12482125
申请日：2009-06-10
申请人： Minoru Yoshida , Takenori Hirose , Hideaki Sasazawa , Shigeru Serikawa
发明人： Minoru Yoshida , Takenori Hirose , Hideaki Sasazawa , Shigeru Serikawa
IPC分类号： G01N21/00
CPC分类号： G11B20/1883 , G11B2020/1826 , G11B2220/20 , G11B2220/2516
摘要： A defect generated during a nano-imprint process is inspected by a scatterometry method. The scatterometry method is to illuminate the surface of a medium with light having a plurality of wave lengths by means of a first illuminator through a half mirror and an objective lens and cause light reflected on the medium to be incident on a spectrometer through the objective lens and the half mirror. A second illuminator illuminates a foreign material or scratch on the surface of the medium from an oblique direction with respect to the surface of the medium. Light is scattered from the foreign material or scratch and detected by first and second detectors. The first detector is placed in a direction defining a first elevation angle with the surface of the medium. The second detector is placed in a direction defining a second elevation angle with the surface of the medium. When coordinates of a defect that are obtained by the scatterometry method match coordinates of the foreign material or scratch, an inspection device determines that the defect is not generated during the nano-imprint process. When the matching is negative, the inspection device determines that the defect is generated during the nano-imprint process.
摘要翻译：在纳米压印过程中产生的缺陷通过散射法进行检查。散射方法是通过半反射镜和物镜通过第一照明器照亮具有多个波长的光的介质的表面，并使介质上反射的光通过物镜入射到光谱仪上和半反射镜。第二个照明器相对于介质的表面从倾斜的方向照射介质表面上的异物或划痕。光从异物或划痕散射并由第一和第二检测器检测。第一检测器被放置在与介质表面限定第一仰角的方向上。第二检测器被放置在与介质表面限定第二仰角的方向上。当通过散射测定方法获得的缺陷的坐标与异物或划痕的坐标匹配时，检查装置确定在纳米压印过程中不产生缺陷。当匹配为负时，检查装置确定在纳米压印过程中产生缺陷。

3. 发明申请

US20110001962A1 METHOD FOR DEFECT DETERMINATION IN FINE CONCAVE-CONVEX PATTERN AND METHOD FOR DEFECT DETERMINATION ON PATTERNED MEDIUM 失效
标题翻译：用于在精细凹凸图案中进行缺陷确定的方法和用于在图形化介质上进行缺陷确定的方法
公开(公告)号：US20110001962A1
公开(公告)日：2011-01-06
申请号：US12789188
申请日：2010-05-27
申请人： Hideaki Sasazawa , Takenori Hirose , Shigeru Serikawa
发明人： Hideaki Sasazawa , Takenori Hirose , Shigeru Serikawa
IPC分类号： G01N21/00
CPC分类号： G01N21/956 , G01N21/9501 , G01N21/95607 , G01N21/95692 , G11B5/82 , G11B5/855 , H01L22/10
摘要： In the inspection of a defect in a fine concave-convex pattern, a spectral waveform of a detection area of an inspection object is detected, area determination as to which area section determined by a pattern type of the inspection object the detection area belongs to is performed, a feature calculation equation and a determination index value which correspond to a determined area section and vary according to defect type is selected, feature calculation on the spectral waveform data in accordance with the selected feature calculation equation is performed, and a calculated feature value and the selected determination index value are compared to perform determination processing according to defect type.
摘要翻译：在检查精细凹凸图案中的缺陷时，检测检查对象的检测区域的光谱波形，关于由检测区域属于检查对象的图案类型确定的区域区域的区域确定选择对应于确定的区域部分并根据缺陷类型变化的特征计算方程和确定指标值，执行根据所选特征计算方程的光谱波形数据的特征计算，并且计算特征值并且将所选择的确定指标值进行比较，以根据缺陷类型执行确定处理。

4. 发明授权

US08411928B2 Scatterometry method and device for inspecting patterned medium 失效
标题翻译：用于检查图案化介质的散射法和装置
公开(公告)号：US08411928B2
公开(公告)日：2013-04-02
申请号：US12482126
申请日：2009-06-10
申请人： Hideaki Sasazawa , Takenori Hirose , Minoru Yoshida , Keiya Saito , Shigeru Serikawa
发明人： Hideaki Sasazawa , Takenori Hirose , Minoru Yoshida , Keiya Saito , Shigeru Serikawa
IPC分类号： G06K9/00
CPC分类号： G11B5/746 , G01B11/24 , G01N21/8851 , G01N21/956 , G11B5/855
摘要： An inspection region is specified using the design information to perform region division for measurement through a scatterometry method. The obtained detection data is classified by pattern into a periodic region and a non-periodic region. A spectroscopic characteristic is detected by an optical sensor to extract features. The extracted features are compared with features stored in a feature map database for each region to evaluate a state of a patterned medium.
摘要翻译：使用设计信息指定检查区域，以通过散射法进行测量的区域划分。所获得的检测数据通过图案分类为周期性区域和非周期性区域。通过光学传感器检测光谱特性以提取特征。将提取的特征与存储在每个区域的特征图数据库中的特征进行比较，以评估图案化介质的状态。

5. 发明申请

US20100085855A1 METHOD AND DEVICE FOR DETECTING SHAPE OF SURFACE OF MEDIUM 有权
标题翻译：用于检测中等表面形状的方法和装置
公开(公告)号：US20100085855A1
公开(公告)日：2010-04-08
申请号：US12482125
申请日：2009-06-10
申请人： Minoru YOSHIDA , Takenori Hirose , Hideaki Sasazawa , Shigeru Serikawa
发明人： Minoru YOSHIDA , Takenori Hirose , Hideaki Sasazawa , Shigeru Serikawa
IPC分类号： G11B27/36
CPC分类号： G11B20/1883 , G11B2020/1826 , G11B2220/20 , G11B2220/2516
摘要： A defect generated during a nano-imprint process is inspected by a scatterometry method. The scatterometry method is to illuminate the surface of a medium with light having a plurality of wave lengths by means of a first illuminator through a half mirror and an objective lens and cause light reflected on the medium to be incident on a spectrometer through the objective lens and the half mirror. A second illuminator illuminates a foreign material or scratch on the surface of the medium from an oblique direction with respect to the surface of the medium. Light is scattered from the foreign material or scratch and detected by first and second detectors. The first detector is placed in a direction defining a first elevation angle with the surface of the medium. The second detector is placed in a direction defining a second elevation angle with the surface of the medium. When coordinates of a defect that are obtained by the scatterometry method match coordinates of the foreign material or scratch, an inspection device determines that the defect is not generated during the nano-imprint process. When the matching is negative, the inspection device determines that the defect is generated during the nano-imprint process.
摘要翻译：在纳米压印过程中产生的缺陷通过散射法进行检查。散射方法是通过半反射镜和物镜通过第一照明器照亮具有多个波长的光的介质的表面，并使介质上反射的光通过物镜入射到光谱仪上和半反射镜。第二个照明器相对于介质的表面从倾斜的方向照射介质表面上的异物或划痕。光从异物或划痕散射并由第一和第二检测器检测。第一检测器被放置在与介质表面限定第一仰角的方向上。第二检测器被放置在与介质表面限定第二仰角的方向上。当通过散射测定方法获得的缺陷的坐标与异物或划痕的坐标匹配时，检查装置确定在纳米压印过程中不产生缺陷。当匹配为负时，检查装置确定在纳米压印过程中产生缺陷。

6. 发明授权

US08638430B2 Method for defect determination in fine concave-convex pattern and method for defect determination on patterned medium 失效
标题翻译：精细凹凸图案中缺陷测定方法及图案化介质缺陷测定方法
公开(公告)号：US08638430B2
公开(公告)日：2014-01-28
申请号：US12789188
申请日：2010-05-27
申请人： Hideaki Sasazawa , Takenori Hirose , Shigeru Serikawa
发明人： Hideaki Sasazawa , Takenori Hirose , Shigeru Serikawa
IPC分类号： G01N21/00 , G01N21/956 , H01L21/66 , G01N21/95
CPC分类号： G01N21/956 , G01N21/9501 , G01N21/95607 , G01N21/95692 , G11B5/82 , G11B5/855 , H01L22/10
摘要： In the inspection of a defect in a fine concave-convex pattern, a spectral waveform of a detection area of an inspection object is detected, area determination as to which area section determined by a pattern type of the inspection object the detection area belongs to is performed, a feature calculation equation and a determination index value which correspond to a determined area section and vary according to defect type is selected, feature calculation on the spectral waveform data in accordance with the selected feature calculation equation is performed, and a calculated feature value and the selected determination index value are compared to perform determination processing according to defect type.
摘要翻译：在检查精细凹凸图案中的缺陷时，检测检查对象的检测区域的光谱波形，关于由检测区域属于检查对象的图案类型确定的区域区域的区域确定选择对应于确定的区域部分并根据缺陷类型变化的特征计算方程和确定指标值，执行根据所选特征计算方程的光谱波形数据的特征计算，并且计算特征值并且将所选择的确定指标值进行比较，以根据缺陷类型执行确定处理。

7. 发明授权

US08253935B2 Disk surface inspection apparatus, inspection system thereof, and inspection method thereof 失效
标题翻译：磁盘表面检查装置及其检查系统及其检查方法
公开(公告)号：US08253935B2
公开(公告)日：2012-08-28
申请号：US12694297
申请日：2010-01-27
申请人： Tatsuo Hariyama , Hideaki Sasazawa , Minoru Yoshida , Shigeru Serikawa
发明人： Tatsuo Hariyama , Hideaki Sasazawa , Minoru Yoshida , Shigeru Serikawa
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/94 , G01N21/9506
摘要： The invention has a function of preparing a data base for a relation between a defect shape and an arrangement for the optical system capable of detecting the shape at high sensitivity and automatically adjusting the arrangement for the optical system. As the method of preparing the data base, a method of using optical simulation or an experimental method of using a sample having an optical shape is applied. A pinhole position and a beam size are adjusted automatically so as to attain the optimal arrangement for the optical system to an inputted defect shape based on the data base.
摘要翻译：本发明具有为能够以高灵敏度检测形状并自动调整光学系统的配置的光学系统的缺陷形状和布置之间的关系的准备数据库的功能。作为准备数据库的方法，应用使用光学模拟的方法或使用具有光学形状的样本的实验方法。自动调整针孔位置和光束尺寸，以便根据数据库为光学系统达到输入缺陷形状的最佳布置。

8. 发明申请

US20100201975A1 DISK SURFACE INSPECTION APPARATUS, INSPECTION SYSTEM THEREOF, AND INSPECTION METHOD THEREOF 失效
标题翻译：磁盘表面检查装置及其检查系统及其检查方法
公开(公告)号：US20100201975A1
公开(公告)日：2010-08-12
申请号：US12694297
申请日：2010-01-27
申请人： Tatsuo HARIYAMA , Hideaki Sasazawa , Minoru Yoshida , Shigeru Serikawa
发明人： Tatsuo HARIYAMA , Hideaki Sasazawa , Minoru Yoshida , Shigeru Serikawa
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/94 , G01N21/9506
摘要： The invention has a function of preparing a data base for a relation between a defect shape and an arrangement for the optical system capable of detecting the shape at high sensitivity and automatically adjusting the arrangement for the optical system. As the method of preparing the data base, a method of using optical simulation or an experimental method of using a sample having an optical shape is applied. A pinhole position and a beam size are adjusted automatically so as to attain the optimal arrangement for the optical system to an inputted defect shape based on the data base.
摘要翻译：本发明具有为能够以高灵敏度检测形状并自动调整光学系统的配置的光学系统的缺陷形状和布置之间的关系的准备数据库的功能。作为准备数据库的方法，应用使用光学模拟的方法或使用具有光学形状的样本的实验方法。自动调整针孔位置和光束尺寸，以便根据数据库为光学系统达到输入缺陷形状的最佳布置。

9. 发明申请

US20090190123A1 METHOD AND APPARATUS FOR DETECTING DEFECTS ON A DISK SURFACE 有权
标题翻译：用于检测磁盘表面缺陷的方法和装置
公开(公告)号：US20090190123A1
公开(公告)日：2009-07-30
申请号：US12359388
申请日：2009-01-26
申请人： Tatsuo HARIYAMA , Hideaki Sasazawa , Minoru Yoshida , Shigeru Serikawa
发明人： Tatsuo HARIYAMA , Hideaki Sasazawa , Minoru Yoshida , Shigeru Serikawa
IPC分类号： G01N21/88 , G06F15/00
CPC分类号： G01N21/8922 , G01N21/9501 , G01N21/9506 , G01N2021/8825 , G01N2021/8854
摘要： The present invention relates to an apparatus for detecting defects on a disk surface which projects light on the disk surface by a light transmitting system, receives specula reflection light and scattered light by a light receiving system, exposes defects by performing a two-dimensional frequency filter process on a signal, and performs a defect determination process to extract a linear-shaped isolative defect candidate. Next, the present invention performs a periodicity determination process to classify and detect the periodically generated linear and circular arc defects and the isolatively generated linear and circular arc defects.
摘要翻译：本发明涉及一种用于检测由透光系统在光盘表面上投射光的盘表面上的缺陷的装置，通过光接收系统接收镜反射光和散射光，通过执行二维频率滤波器来暴露缺陷对信号进行处理，并且执行缺陷确定处理以提取线性形状的隔离缺陷候选。接下来，本发明执行周期性确定处理，以分类和检测周期性产生的线性和圆弧缺陷以及隔离产生的线性和圆弧缺陷。

10. 发明授权

US07898652B2 Method and apparatus for detecting defects on a disk surface 有权
标题翻译：用于检测盘表面上的缺陷的方法和装置
公开(公告)号：US07898652B2
公开(公告)日：2011-03-01
申请号：US12359388
申请日：2009-01-26
申请人： Tatsuo Hariyama , Hideaki Sasazawa , Minoru Yoshida , Shigeru Serikawa
发明人： Tatsuo Hariyama , Hideaki Sasazawa , Minoru Yoshida , Shigeru Serikawa
IPC分类号： G01N21/00
CPC分类号： G01N21/8922 , G01N21/9501 , G01N21/9506 , G01N2021/8825 , G01N2021/8854
摘要： The present invention relates to an apparatus for detecting defects on a disk surface which projects light on the disk surface by a light transmitting system, receives specula reflection light and scattered light by a light receiving system, exposes defects by performing a two-dimensional frequency filter process on a signal, and performs a defect determination process to extract a linear-shaped isolative defect candidate. Next, the present invention performs a periodicity determination process to classify and detect the periodically generated linear and circular arc defects and the isolatively generated linear and circular arc defects.
摘要翻译：本发明涉及一种用于检测由透光系统在光盘表面上投射光的盘表面上的缺陷的装置，通过光接收系统接收镜反射光和散射光，通过执行二维频率滤波器来暴露缺陷对信号进行处理，并且执行缺陷确定处理以提取线性形状的隔离缺陷候选。接下来，本发明执行周期性确定处理，以分类和检测周期性产生的线性和圆弧缺陷以及隔离产生的线性和圆弧缺陷。

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