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1. 发明授权

US5908719A Radiation mask adapted to be aligned with a photoresist layer and method of making the same 有权
标题翻译：适于与光致抗蚀剂层对准的辐射掩模及其制造方法
公开(公告)号：US5908719A
公开(公告)日：1999-06-01
申请号：US151922
申请日：1998-09-11
申请人： Henry Guckel , Harald Emmerich , Jonathan L. Klein
发明人： Henry Guckel , Harald Emmerich , Jonathan L. Klein
IPC分类号： G03F1/22 , G03F7/00 , G03F7/09 , G03F7/20 , G03F9/00 , G03F5/00
CPC分类号： G03F1/22 , G03F7/0035 , G03F7/094 , G03F7/2039 , G03F9/00 , G03F9/70 , G03F7/00
摘要： The present invention provides a procedure for achieving accurate alignment between an X-ray mask and a device substrate for the fabrication of multi-layer microstructures. A first photoresist layer on the substrate is patterned by a first X-ray mask to include first alignment holes along with a first layer microstructure pattern. Mask photoresist layers are attached to second and subsequent masks that are used to pattern additional photoresist layers attached to the microstructure device substrate. The mask photoresist layers are patterned to include mask alignment holes that correspond in geometry to the first alignment holes in the first photoresist layer on the device substrate. Alignment between a second mask and the first photoresist layer is achieved by assembly of the second mask onto the first photoresist layer using alignment posts placed in the first alignment holes in the first photoresist layer that penetrate into the mask alignment holes in the mask photoresist layers. The alignment procedure is particularly applicable to the fabrication of multi-layer metal microstructures using deep X-ray lithography and electroplating. The alignment procedure may be extended to multiple photoresist layers and larger device heights using spacer photoresist sheets between subsequent masks and the first photoresist layer that are joined together using alignment posts.
摘要翻译：本发明提供了用于实现X射线掩模和用于制造多层微结构的器件衬底之间的精确对准的步骤。通过第一X射线掩模对衬底上的第一光致抗蚀剂层进行构图，以包括第一对准孔以及第一层微结构图案。掩模光致抗蚀剂层附着到第二和随后的掩模，其用于图案附着到微结构器件衬底的附加光致抗蚀剂层。掩模光致抗蚀剂层被图案化以包括掩模对准孔，其几何形状对应于器件基板上的第一光致抗蚀剂层中的第一对准孔。第二掩模和第一光致抗蚀剂层之间的对准是通过使用位于第一光致抗蚀剂层中的第一对准孔中的对准柱将第二掩模组装到第一光致抗蚀剂层上而实现的，该第一光刻胶层渗透到掩模光致抗蚀剂层中的掩模对准孔中。对准程序特别适用于使用深X射线光刻和电镀制造多层金属微结构。使用在后续掩模之间的间隔光致抗蚀剂片和使用对准柱连接在一起的第一光致抗蚀剂层，可以将对准过程扩展到多个光致抗蚀剂层和更大的器件高度。

2. 发明授权

US5866281A Alignment method for multi-level deep x-ray lithography utilizing alignment holes and posts 失效
标题翻译：使用对准孔和柱的多层深X射线光刻的对准方法
公开(公告)号：US5866281A
公开(公告)日：1999-02-02
申请号：US753645
申请日：1996-11-27
申请人： Henry Guckel , Harald Emmerich , Jonathan L. Klein
发明人： Henry Guckel , Harald Emmerich , Jonathan L. Klein
IPC分类号： G03F1/22 , G03F7/00 , G03F7/09 , G03F7/20 , G03F9/00
CPC分类号： G03F1/22 , G03F7/0035 , G03F7/094 , G03F7/2039 , G03F9/00 , G03F9/70 , G03F7/00
摘要： The present invention provides a procedure for achieving accurate alignment between an X-ray mask and a device substrate for the fabrication of multi-layer microstructures. A first photoresist layer on the substrate is patterned by a first X-ray mask to include first alignment holes along with a first layer microstructure pattern. Mask photoresist layers are attached to second and subsequent masks that are used to pattern additional photoresist layers attached to the microstructure device substrate. The mask photoresist layers are patterned to include mask alignment holes that correspond in geometry to the first alignment holes in the first photoresist layer on the device substrate. Alignment between a second mask and the first photoresist layer is achieved by assembly of the second mask onto the first photoresist layer using alignment posts placed in the first alignment holes in the first photoresist layer that penetrate into the mask alignment holes in the mask photoresist layers. The alignment procedure is particularly applicable to the fabrication of multi-layer metal microstructures using deep X-ray lithography and electroplating. The alignment procedure may be extended to multiple photoresist layers and larger device heights using spacer photoresist sheets between subsequent masks and the first photoresist layer that are joined together using alignment posts.
摘要翻译：本发明提供了用于实现X射线掩模和用于制造多层微结构的器件衬底之间的精确对准的步骤。通过第一X射线掩模对衬底上的第一光致抗蚀剂层进行构图，以包括第一对准孔以及第一层微结构图案。掩模光致抗蚀剂层附着到第二和随后的掩模，其用于图案附着到微结构器件衬底的附加光致抗蚀剂层。掩模光致抗蚀剂层被图案化以包括掩模对准孔，其几何形状对应于器件基板上的第一光致抗蚀剂层中的第一对准孔。第二掩模和第一光致抗蚀剂层之间的对准是通过使用位于第一光致抗蚀剂层中的第一对准孔中的对准柱将第二掩模组装到第一光致抗蚀剂层上而实现的，该第一光刻胶层渗透到掩模光致抗蚀剂层中的掩模对准孔中。对准程序特别适用于使用深X射线光刻和电镀制造多层金属微结构。使用在后续掩模之间的间隔光致抗蚀剂片和使用对准柱连接在一起的第一光致抗蚀剂层，可以将对准过程扩展到多个光致抗蚀剂层和更大的器件高度。

3. 发明授权

US08426930B2 Sensor module 有权
标题翻译：传感器模块
公开(公告)号：US08426930B2
公开(公告)日：2013-04-23
申请号：US12661788
申请日：2010-03-23
申请人： Martin Holzmann , Christian Ohl , Harald Emmerich
发明人： Martin Holzmann , Christian Ohl , Harald Emmerich
IPC分类号： H01L23/13
CPC分类号： G01P15/0802 , B81B7/0054 , B81B2201/0235 , B81B2201/0242 , G01D11/245 , G01P1/023 , H01L24/97 , H01L2224/48091 , H01L2224/48137 , H01L2224/97 , H01L2924/15787 , H01L2924/181 , H01L2924/3025 , H01L2924/00014 , H01L2924/00 , H01L2924/00012
摘要： A sensor module includes a housing and a chip system disposed therein, the chip system being disposed on a substrate and being embedded in a sealing layer deposited on the substrate. The chip system is disposed in a window region of a frame structure disposed on the substrate, the frame structure featuring substantially the same thermal expansion properties as the substrate.
摘要翻译：传感器模块包括壳体和设置在其中的芯片系统，芯片系统设置在基板上并且嵌入在沉积在基板上的密封层中。芯片系统设置在设置在基板上的框架结构的窗口区域中，框架结构具有与基板大致相同的热膨胀特性。

4. 发明申请

US20090193891A1 Sensor ,Sensor Component and Method for Producing a Sensor 审中-公开
标题翻译：传感器，传感器组件和生产传感器的方法
公开(公告)号：US20090193891A1
公开(公告)日：2009-08-06
申请号：US12083420
申请日：2006-11-08
申请人： Dirk Ullmann , Harald Emmerich
发明人： Dirk Ullmann , Harald Emmerich
IPC分类号： G01D11/24 , H05K13/04
CPC分类号： G01D11/245 , H01L2224/45144 , H01L2224/48091 , H01L2224/48137 , H01L2224/48247 , H01L2224/8592 , H01L2924/07811 , H01L2924/181 , Y10T29/49826 , H01L2924/00014 , H01L2924/00 , H01L2924/00012
摘要： A sensor, a sensor component and a method for manufacturing a sensor are provided, in which sensors for measuring absolute values are inserted into cost-effective and technically simple plastic housings of the usual construction type, without having negative effects on the long-term stability of the absolute measuring values supplied by such sensors. In particular, parameter drifts and offsets in the parameters are induced by arranging a sensor element above an application-specific semiconductor element which evaluates the sensor's signals, and is connected to it via a flip-chip connection. Mechanical, thermal and moisture stresses are prevented and compensated for by introducing a suitable quantity of gel into the plastic housing.
摘要翻译：提供一种传感器，传感器部件和传感器的制造方法，其中用于测量绝对值的传感器插入到通常结构类型的经济有效且技术上简单的塑料外壳中，而不会对长期稳定性产生负面影响由这些传感器提供的绝对测量值。特别地，参数中的参数漂移和偏移通过将传感器元件布置在评估传感器的信号的特定应用的半导体元件之上而被引导，并且通过倒装芯片连接与其连接。通过将合适量的凝胶引入塑料外壳来防止和补偿机械，热和湿气的应力。

5. 发明授权

US06462392B1 Micromechanical cap structure and the respective manufacturing method 有权
标题翻译：微机械盖结构及各自的制造方法
公开(公告)号：US06462392B1
公开(公告)日：2002-10-08
申请号：US09776839
申请日：2001-02-05
申请人： Stefan Pinter , Harald Emmerich , Hans-Peter Trah , Helmut Baumann
发明人： Stefan Pinter , Harald Emmerich , Hans-Peter Trah , Helmut Baumann
IPC分类号： H01L2982
CPC分类号： G01P15/0802 , B81B3/007 , B81C2203/0163 , G01P1/023
摘要： A micromechanical cap structure and a corresponding manufacturing method are described, the cap structure having a substrate, in particular in the form of a wafer, having a cavity made therein. The cavity includes a bottom surface and two pairs of opposite parallel side wall sections. The cavity has at least one stabilizing wall section, which connects two side wall sections. This considerably increases the stability of the cap structure.
摘要翻译：描述了微机械帽结构和相应的制造方法，帽结构具有特别是晶片形式的衬底，其中形成有腔。空腔包括底面和两对相对平行的侧壁部分。空腔具有连接两个侧壁部分的至少一个稳定壁部分。这大大增加了盖结构的稳定性。

6. 发明授权

US08752431B2 Acceleration sensor method for operating an acceleration sensor 有权
标题翻译：用于操作加速度传感器的加速度传感器方法
公开(公告)号：US08752431B2
公开(公告)日：2014-06-17
申请号：US13148038
申请日：2009-12-11
申请人： Jochen Reinmuth , Harald Emmerich
发明人： Jochen Reinmuth , Harald Emmerich
IPC分类号： G01P15/125
CPC分类号： G01P15/125 , G01P2015/0831
摘要： An acceleration sensor includes a housing, a first seismic mass which is formed as a first asymmetrical rocker and is disposed in the housing via at least one first spring, a second seismic mass which is formed as a second asymmetrical rocker and is disposed in the housing via at least one second spring, and a sensor and evaluation unit which is designed to ascertain information regarding corresponding rotational movements of the first seismic mass and the second seismic mass in relation to the housing and to determine acceleration information with respect to an acceleration of the acceleration sensor, taking the ascertained information into account. In addition, a method for operating an acceleration sensor is disclosed. The rockers execute opposite rotational movements in response to the presence of an acceleration. A differential evaluation of the signals makes it possible to free the measuring signal of any existing interference signals.
摘要翻译：加速度传感器包括壳体，第一抗震块，其形成为第一不对称摇臂，并且经由至少一个第一弹簧设置在壳体中，第二抗震块形成为第二不对称摇臂并设置在壳体中经由至少一个第二弹簧以及传感器和评估单元，该传感器和评估单元被设计成确定关于第一地震质量块和第二地震质量块相对于壳体的相应旋转运动的信息，并且确定相对于壳体的加速度的加速度信息加速度传感器，考虑确定的信息。此外，公开了一种用于操作加速度传感器的方法。响应于加速度的存在，摇臂执行相反的旋转运动。信号的差分评估使得可以释放任何现有干扰信号的测量信号。

7. 发明申请

US20140083190A1 ACCELERATION SENSOR AND METHOD FOR OPERATING AN ACCELERATION SENSOR 有权
标题翻译：加速度传感器和运行加速度传感器的方法
公开(公告)号：US20140083190A1
公开(公告)日：2014-03-27
申请号：US13627450
申请日：2012-09-26
申请人： Rolf Kaack , Dietrich Schubert , Harald Emmerich , Patrick Wellner
发明人： Rolf Kaack , Dietrich Schubert , Harald Emmerich , Patrick Wellner
IPC分类号： G01P15/03 , G01P15/135
CPC分类号： G01P15/032 , G01P15/125 , G01P15/135 , G01P2015/0814 , G01P2015/0817 , G01P2015/0857
摘要： An acceleration sensor has a substrate, a seismic mass and a detection unit. The seismic mass is configured to be deflected based on an external acceleration acting on the acceleration sensor, the deflection being in the form of a deflection motion with respect to the substrate along a deflection direction. The detection unit is configured to be deflected for the detection of a deflection of the seismic mass, the detection being in the form of a detection motion with respect to the substrate along a detection direction. The detection unit is connected to the seismic mass in such a way that the amplitude of the deflection motion along the deflection direction is greater than the amplitude of the detection motion along the detection direction.
摘要翻译：加速度传感器具有基板，地震块和检测单元。地震质量被构造为基于作用在加速度传感器上的外部加速度而偏转，所述偏转以相对于基板沿着偏转方向的偏转运动的形式。检测单元被配置为偏转以检测地震质量块的偏转，该检测是沿检测方向相对于基板的检测运动的形式。检测单元以使得沿着偏转方向的偏转运动的振幅大于沿着检测方向的检测运动的幅度的方式连接到地震质量。

8. 发明申请

US20100271787A1 Sensor module 有权
标题翻译：传感器模块
公开(公告)号：US20100271787A1
公开(公告)日：2010-10-28
申请号：US12661788
申请日：2010-03-23
申请人： Martin Holzmann , Christian Ohl , Harald Emmerich
发明人： Martin Holzmann , Christian Ohl , Harald Emmerich
IPC分类号： H05K7/02 , H01L23/48 , H01L29/84
CPC分类号： G01P15/0802 , B81B7/0054 , B81B2201/0235 , B81B2201/0242 , G01D11/245 , G01P1/023 , H01L24/97 , H01L2224/48091 , H01L2224/48137 , H01L2224/97 , H01L2924/15787 , H01L2924/181 , H01L2924/3025 , H01L2924/00014 , H01L2924/00 , H01L2924/00012
摘要： A sensor module includes a housing and a chip system disposed therein, the chip system being disposed on a substrate and being embedded in a sealing layer deposited on the substrate. The chip system is disposed in a window region of a frame structure disposed on the substrate, the frame structure featuring substantially the same thermal expansion properties as the substrate.
摘要翻译：传感器模块包括壳体和设置在其中的芯片系统，芯片系统设置在基板上并且嵌入在沉积在基板上的密封层中。芯片系统设置在设置在基板上的框架结构的窗口区域中，框架结构具有与基板大致相同的热膨胀特性。

9. 发明申请

US20050066704A1 Method and device for the electrical zero balancing for a micromechanical component 审中-公开
标题翻译：用于微机械部件的电零平衡的方法和装置
公开(公告)号：US20050066704A1
公开(公告)日：2005-03-31
申请号：US10381992
申请日：2001-06-01
申请人： Leo Tanten , Jochen Franz , Martin Schoefthaler , Marius Rohr , Harald Emmerich , Matthias Maute , Thomas Walker
发明人： Leo Tanten , Jochen Franz , Martin Schoefthaler , Marius Rohr , Harald Emmerich , Matthias Maute , Thomas Walker
IPC分类号： G01C19/56 , G01P15/125 , G01P21/00
CPC分类号： G01P15/125 , G01C19/56 , G01P21/00
摘要： A method for the electrical zero balancing of a micro mechanical component including a first capacitor electrode rigidly suspended over a substrate, a second capacitor electrode rigidly suspended over the substrate, and a third capacitor electrode disposed there between, resiliently and deflectably suspended over the substrate, as well as a differential-capacitance detector for measuring a differential capacitance of the capacitances of the variable capacitors configured in this manner. In this context, a first electric potential is applied to the first capacitor electrode; a second electric potential is applied to the second capacitor electrode; a third electric potential is applied to the third capacitor electrode; and a fourth electric potential is applied to the substrate. The fourth electrical potential applied to the substrate for the electrical zero-point balancing is changed for the operation of the differential-capacitance detector.
摘要翻译：一种用于微机械部件的电零平衡的方法，所述微机械部件包括刚性地悬挂在基板上的第一电容器电极，刚性地悬挂在所述基板上的第二电容器电极和布置在其上的第三电容器电极，弹性地和偏转地悬挂在所述基板上，以及用于测量以这种方式配置的可变电容器的电容的差分电容的差分电容检测器。在本文中，第一电位被施加到第一电容器电极; 第二电位施加到第二电容器电极; 向第三电容器电极施加第三电位; 向基板施加第四电位。施加到用于电气零点平衡的基板的第四电位被改变用于差分电容检测器的操作。

10. 发明授权

US08786419B2 Method for controlling a device and a device for controlling the device 有权
标题翻译：用于控制设备的方法和用于控制设备的设备
公开(公告)号：US08786419B2
公开(公告)日：2014-07-22
申请号：US12611662
申请日：2009-11-03
申请人： Markus Ulm , Mathias Reimann , Harald Emmerich , Udo-Martin Gomez , Emma Abel
发明人： Markus Ulm , Mathias Reimann , Harald Emmerich , Udo-Martin Gomez , Emma Abel
IPC分类号： G01C19/00 , G01P3/44 , G01P15/08 , B60Q1/00 , G08G1/09
CPC分类号： B60R21/0132 , B60R2021/01327 , G01C19/5726 , G01C19/574 , G01P15/14 , G01P21/00
摘要： A device for controlling a device by using a rotation-rate sensor. In order to provide a device for determining a triggering signal for a safety device which allows a particularly compact implementation of the device, the device is set up to ascertain an acceleration variable on the basis of a first sensor signal for a first seismic mass of the rotation-rate sensor and the second sensor signal for a second seismic mass of the rotation-rate sensor and to control the device as a function of the acceleration variable.
摘要翻译：一种用于通过使用旋转速率传感器来控制设备的装置。为了提供一种用于确定安全装置的触发信号的装置，其允许特别紧凑的装置的实现，该装置被设置为基于第一传感器信号来确定加速度变量，该第一传感器信号用于旋转速率传感器和用于旋转速率传感器的第二地震质量的第二传感器信号，并且根据加速度变量来控制该装置。

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