专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06519118B2 Read head with read track width defining layer that planarizes the write gap layer of a write head 失效
公开(公告)号：US06519118B2
公开(公告)日：2003-02-11
申请号：US10094913
申请日：2002-03-11
申请人： Henry C. Chang , Cherngye Hwang , Robert Otto Schwenker
发明人： Henry C. Chang , Cherngye Hwang , Robert Otto Schwenker
IPC分类号： G11B5127
CPC分类号： B82Y25/00 , B82Y10/00 , G11B5/012 , G11B5/3116 , G11B5/3163 , G11B5/3903 , G11B5/3932 , G11B5/3967 , G11B2005/3996 , Y10T29/49025 , Y10T29/49032 , Y10T29/49041 , Y10T29/49044 , Y10T29/4905 , Y10T29/49052
摘要： A read track width defining layer is employed for defining first and second side edges of a read sensor. The read track width defining layer preferably remains in the head to planarize the read head at first and second hard bias and lead layers so as to overcome a problem of write gap curvature in an accompanying write head. The read track width defining layer is defined by a subtractive process about a bilayer photoresist layer. The subtractive process is selective to the read track width defining layer over a read sensor material layer therebelow. Ion milling is then employed for defining first and second side edges of a read sensor layer employing the read track width defining layer as a mask. First and second hard bias and lead layers are then deposited which make contiguous junctions with the first and second side edges of each of the read sensor and read track width defining layers. The photoresist is then removed and the remainder of the read head is completed.

2. 发明授权

US06434814B1 Method of manufacturing a magnetic head including a read head with read track width defining layer that planarizes the write gap layer of a write head 失效
标题翻译：一种制造磁头的方法，该磁头包括具有读磁道宽度限定层的读头，平面化写头的写间隙层
公开(公告)号：US06434814B1
公开(公告)日：2002-08-20
申请号：US09212724
申请日：1998-12-16
申请人： Henry C. Chang , Cherngye Hwang , Robert Otto Schwenker
发明人： Henry C. Chang , Cherngye Hwang , Robert Otto Schwenker
IPC分类号： G11B5127
CPC分类号： B82Y25/00 , B82Y10/00 , G11B5/012 , G11B5/3116 , G11B5/3163 , G11B5/3903 , G11B5/3932 , G11B5/3967 , G11B2005/3996 , Y10T29/49025 , Y10T29/49032 , Y10T29/49041 , Y10T29/49044 , Y10T29/4905 , Y10T29/49052
摘要： A method of making a magnetic head that has a read head with a track width includes the steps of depositing a read track width defining material layer on a read sensor material layer; forming a bi-layer photoresist mask on the read track width defining material layer that masks a read track width defining layer portion of the read track width defining material layer; removing by reactive ion etching (RIE) a portion of the read track width defining material layer not masked by the photoresist mask to form the read track width defining layer portion with exposed first and second side edges that are spaced apart a distance equal to the track width; removing by ion milling a first portion of the read sensor material layer not masked by the read track width defining layer portion to form a second portion of the read sensor material layer with exposed first and second side edges that have a width equal to the track width; depositing hard bias and lead material layers on the photoresist mask in contact with the first and second side edges of each of the second portion of the read sensor material layer and the read track width defining layer portion; and removing the photoresist mask, thereby lifting off a portion of the hard bias and lead material layers leaving first and second hard bias and lead layers connected to the first and second side edges of each of the second portion of the read sensor material layer and the read track width defining layer portion.
摘要翻译：制造具有带磁道宽度的读头的磁头的方法包括以下步骤：在读取的传感器材料层上沉积限定材料层的读取磁道宽度; 在所述读取磁道宽度限定材料层上形成双层光致抗蚀剂掩模，其掩蔽所述读取磁道宽度限定材料层的读取磁道宽度限定层部分; 通过反应离子蚀刻（RIE）去除未被光致抗蚀剂掩模掩蔽的读磁道宽度限定材料层的一部分，以形成具有暴露的第一和第二侧边缘，该第一和第二侧边缘间隔开等于轨道的距离宽度; 通过离子研磨读取的传感器材料层的第一部分而不被读取磁道宽度限定层部分掩蔽，以形成具有等于轨道宽度的宽度的暴露的第一和第二侧边缘的读取传感器材料层的第二部分 ; 在所述光致抗蚀剂掩模上沉积与所述读取传感器材料层的第二部分和所述读取磁道宽度限定层部分中的每一个的第一和第二侧边缘接触的硬偏压和引线材料层; 并且去除光致抗蚀剂掩模，从而剥离硬偏压和引线材料层的一部分，留下第一和第二硬偏压和引线层，其连接到读取传感器材料层的第二部分的第一和第二侧边缘，并且读取磁道宽度定义层部分。

3. 发明授权

US09349395B2 System and method for differential etching 有权
标题翻译：差分蚀刻的系统和方法
公开(公告)号：US09349395B2
公开(公告)日：2016-05-24
申请号：US13601739
申请日：2012-08-31
申请人： Robert G. Biskeborn , Calvin S. Lo , Cherngye Hwang , Andrew C. Ting
发明人： Robert G. Biskeborn , Calvin S. Lo , Cherngye Hwang , Andrew C. Ting
IPC分类号： G11B5/31 , H01J37/32
CPC分类号： H01J37/32825 , G11B5/3163 , H01J37/32816 , H01J37/3411 , H01J2237/334
摘要： A method according to one embodiment includes placing a substrate in a chamber; and plasma sputtering the substrate in a presence of a non-zero pressure of a vapor, wherein the vapor at the non-zero pressure is effective to diminish an etch rate of a first material of the substrate. A plasma sputtering apparatus according to one embodiment includes a chamber; a reservoir in the chamber for releasing a vapor at an established rate; a mount for a substrate; and a plasma source.
摘要翻译：根据一个实施例的方法包括将衬底放置在腔室中; 以及在非零压力蒸汽的存在下等离子体溅射所述衬底，其中所述非零压力下的蒸气有效地降低所述衬底的第一材料的蚀刻速率。根据一个实施例的等离子体溅射装置包括室; 用于以确定的速率释放蒸气的室中的储存器; 用于衬底的安装件; 和等离子体源。

4. 发明申请

US20140061033A1 SYSTEM AND METHOD FOR DIFFERENTIAL ETCHING 有权
标题翻译：用于差异蚀刻的系统和方法
公开(公告)号：US20140061033A1
公开(公告)日：2014-03-06
申请号：US13601739
申请日：2012-08-31
申请人： Robert G. Biskeborn , Calvin S. Lo , Cherngye Hwang , Andrew C. Ting
发明人： Robert G. Biskeborn , Calvin S. Lo , Cherngye Hwang , Andrew C. Ting
IPC分类号： C23F1/00 , C23F1/08
CPC分类号： H01J37/32825 , G11B5/3163 , H01J37/32816 , H01J37/3411 , H01J2237/334
摘要： A method according to one embodiment includes placing a substrate in a chamber; and plasma sputtering the substrate in a presence of a non-zero pressure of a vapor, wherein the vapor at the non-zero pressure is effective to diminish an etch rate of a first material of the substrate. A plasma sputtering apparatus according to one embodiment includes a chamber; a reservoir in the chamber for releasing a vapor at an established rate; a mount for a substrate; and a plasma source.
摘要翻译：根据一个实施例的方法包括将衬底放置在腔室中; 以及在非零压力蒸汽的存在下等离子体溅射所述衬底，其中所述非零压力下的蒸气有效地降低所述衬底的第一材料的蚀刻速率。根据一个实施例的等离子体溅射装置包括室; 用于以确定的速率释放蒸气的室中的储存器; 用于衬底的安装件; 和等离子体源。

5. 发明授权

US08611049B2 Magnetic heads having magnetic films that are more recessed than insulating films, and systems having such heads 失效
标题翻译：具有比绝缘膜更凹陷的磁性膜的磁头以及具有这种磁头的系统
公开(公告)号：US08611049B2
公开(公告)日：2013-12-17
申请号：US12975208
申请日：2010-12-21
申请人： Robert Glenn Biskeborn , Cherngye Hwang , Calvin Shyhjong Lo , Andrew C. Ting
发明人： Robert Glenn Biskeborn , Cherngye Hwang , Calvin Shyhjong Lo , Andrew C. Ting
IPC分类号： G11B5/127
CPC分类号： G11B5/00826 , G11B5/3116 , G11B5/3163
摘要： A structure according to one embodiment includes a substrate having a media facing side; and a thin film stack formed on the substrate, the thin film stack including magnetic films and insulating films, wherein the thin film stack is recessed from a plane extending along the media facing side of the substrate, wherein the magnetic films are recessed more than the insulating films, wherein the magnetic films each have a substantially flat media facing surface, wherein the insulating films each have a substantially flat media facing surface.
摘要翻译：根据一个实施例的结构包括具有介质面向侧的基板; 以及形成在所述基板上的薄膜叠层，所述薄膜叠层包括磁性膜和绝缘膜，其中所述薄膜叠层从沿着所述基板的面向介质侧延伸的平面凹陷，其中所述磁性膜比所述绝缘膜，其中所述磁性膜各自具有基本上平坦的介质面向表面，其中所述绝缘膜各自具有基本平坦的介质面向表面。

6. 发明授权

US08220136B2 Forming a planarized surface for at least one bar of sliders 有权
标题翻译：形成用于至少一个滑块的平坦化表面
公开(公告)号：US08220136B2
公开(公告)日：2012-07-17
申请号：US11800127
申请日：2007-05-03
申请人： Cherngye Hwang , Jorge Goitia , Kenneth L. Larson , Dennis R. McKean
发明人： Cherngye Hwang , Jorge Goitia , Kenneth L. Larson , Dennis R. McKean
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/4853 , G11B5/102 , G11B5/3163 , G11B5/3173 , Y10T29/49027 , Y10T29/49039 , Y10T29/49041 , Y10T29/49055 , Y10T29/53165 , Y10T156/10
摘要： A method for forming a planarized surface for at least one bar of sliders for utilization in a hard disk drive is disclosed. In general, at least one bar of sliders is placed on an adhesive layer. A single thermoplastic layer is then provided above the at least one bar of sliders. The single thermoplastic layer is then heated to a softening temperature such that the single thermoplastic layer will flow between the at least one bar of sliders. The single thermoplastic layer is then cooled to form a planarized surface of both said single thermoplastic layer and said at least one bar of sliders at said adhesive layer.
摘要翻译：公开了一种用于形成至少一个用于硬盘驱动器的滑块的平面化表面的方法。通常，将至少一个滑杆放置在粘合剂层上。然后在至少一个滑杆上方设置单个热塑性层。然后将单个热塑性层加热到软化温度，使得单个热塑性层将在至少一个滑块之间流动。然后将单个热塑性层冷却以在所述粘合剂层处形成所述单一热塑性层和所述至少一个滑块条的平坦化表面。

7. 发明授权

US08191234B2 Method of manufacturing a magnetic head with reinforcing islands 失效
标题翻译：制造具有加强岛的磁头的方法
公开(公告)号：US08191234B2
公开(公告)日：2012-06-05
申请号：US12184357
申请日：2008-08-01
申请人： Robert G. Biskeborn , Calvin S. Lo , Cherngye Hwang
发明人： Robert G. Biskeborn , Calvin S. Lo , Cherngye Hwang
IPC分类号： G11B5/23 , B44C1/22
CPC分类号： G11B5/3106 , G11B5/3163 , G11B5/3169 , Y10T29/49039 , Y10T29/49041 , Y10T29/49048
摘要： A method for protecting a thin film structure including fabricating a plurality of island structures in a recording gap of a magnetic recording head, exposing a substantial portion of the plurality of island structures by removing at least a portion of the surrounding recording gap material via at least one etching process, including ion milling, coating the magnetic recording head containing the plurality of island structures with a coating material, including silicon nitride or aluminum oxide, and removing at least a portion of the coating material via a removal process, including chemical-mechanical polishing or lapping, to expose an uppermost region of at least a portion of said plurality of island structures.
摘要翻译：一种用于保护薄膜结构的方法，包括在磁记录头的记录间隙中制造多个岛状结构，通过至少除去周围的记录间隙材料的至少一部分而暴露多个岛结构的大部分一个蚀刻工艺，包括离子铣削，用包括氮化硅或氧化铝的涂层材料涂覆包含多个岛状结构的磁记录头，以及通过去除工艺去除至少一部分涂层材料，包括化学机械抛光或研磨，以暴露所述多个岛结构的至少一部分的最上部区域。

8. 发明申请

US20110256423A1 HEAD COMPRISING A CRYSTALLINE ALUMINA LAYER 有权
标题翻译：包括结晶铝氧化铝层的头
公开(公告)号：US20110256423A1
公开(公告)日：2011-10-20
申请号：US12761394
申请日：2010-04-16
申请人： Robert G. Biskeborn , Cherngye Hwang , Calvin S. Lo , Andrew C. Ting
发明人： Robert G. Biskeborn , Cherngye Hwang , Calvin S. Lo , Andrew C. Ting
IPC分类号： G11B5/33 , C23C14/00 , B05D5/00
CPC分类号： G11B5/255 , G11B5/127 , G11B5/3106 , G11B5/3133
摘要： A magnetic head produced at low ambient temperatures that comprise a crystalline alumina layer for increasing the durability of the head is provided. According to one embodiment, a magnetic head for at least one of reading and writing data on to a magnetic data storage media. The magnetic head comprises a substrate, an at least partially crystalline alumina layer formed on the substrate, at least one of a write transducer and a read transducer formed on the substrate, and a surface for engaging the magnetic data storage media. In another embodiment, a method for forming an at least partially crystalline alumina film. The method comprises providing a substrate, and depositing alumina onto the substrate at an ambient temperature to form the at least partially crystalline alumina film.
摘要翻译：提供了一种在低环境温度下产生的包含结晶氧化铝层以提高头部耐久性的磁头。根据一个实施例，一种用于读取和写入数据到磁数据存储介质中的至少一个的磁头。磁头包括衬底，形成在衬底上的至少部分结晶的氧化铝层，形成在衬底上的写换能器和读换能器中的至少一个以及用于接合磁数据存储介质的表面。在另一个实施方案中，形成至少部分结晶的氧化铝膜的方法。该方法包括在环境温度下提供衬底和将氧化铝沉积到衬底上以形成至少部分结晶的氧化铝膜。

9. 发明授权

US06969625B2 CMP assisted liftoff micropatterning 失效
标题翻译： CMP辅助提升微图案
公开(公告)号：US06969625B2
公开(公告)日：2005-11-29
申请号：US10949433
申请日：2004-09-24
申请人： Marie-Claire Cyrille , Frederick H. Dill , Cherngye Hwang , Jui-Lung Li
发明人： Marie-Claire Cyrille , Frederick H. Dill , Cherngye Hwang , Jui-Lung Li
IPC分类号： G11B5/39 , G11B5/31 , H01L21/304 , H01L43/08 , H01L21/00 , H01L21/44
CPC分类号： G11B5/313
摘要： A method and structure for a microelectronic device comprises a first film over a substrate, a first polish resistant layer over the first film, a second film over the first polish resistant layer, a second polish resistant layer over the second film, wherein the first and second polish resistant layers comprise diamond-like carbon. The first film comprises an electrically resistive material, while the second film comprises low resistance conductive material. The first film is an electrical resistor embodied as a magnetic read sensor. The electrically resistive material is sensitive to magnetic fields. The device further comprises a generally vertical junction between the first and second films and a dielectric film abutted to the electrically resistive material.
摘要翻译：微电子器件的方法和结构包括：衬底上的第一膜，第一膜上的第一耐抛光层，第一耐抛光层上的第二膜，第二膜上的第二耐光层，其中第一和第二膜第二耐光层包括类金刚石碳。第一膜包括电阻材料，而第二膜包括低电阻导电材料。第一个胶片是一个实现为磁读取传感器的电阻器。电阻材料对磁场敏感。该装置还包括在第一和第二膜之间的大致垂直的接合点和邻接于电阻材料的电介质膜。

10. 发明申请

US20050041341A1 CMP assisted liftoff micropatterning 失效
公开(公告)号：US20050041341A1
公开(公告)日：2005-02-24
申请号：US10949433
申请日：2004-09-24
申请人： Marie-Claire Cyrille , Frederick Dill , Cherngye Hwang , Jui-Lung Li
发明人： Marie-Claire Cyrille , Frederick Dill , Cherngye Hwang , Jui-Lung Li
IPC分类号： G11B5/39 , G11B5/31 , H01L21/304 , H01L43/08 , G11B5/33 , G11B5/127 , H01L21/302 , H01L21/461
CPC分类号： G11B5/313
摘要： A method and structure for a microelectronic device comprises a first film over a substrate, a first polish resistant layer over the first film, a second film over the first polish resistant layer, a second polish resistant layer over the second film, wherein the first and second polish resistant layers comprise diamond-like carbon. The first film comprises an electrically resistive material, while the second film comprises low resistance conductive material. The first film is an electrical resistor embodied as a magnetic read sensor. The electrically resistive material is sensitive to magnetic fields. The device further comprises a generally vertical junction between the first and second films and a dielectric film abutted to the electrically resistive material.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式